公开(公告)号：US07289224B2

公开(公告)日：2007-10-30

申请号：US10941631

申请日：2004-09-15

Applicant: Xavier Colonna De Lega ,  Peter J. De Groot ,  Michael Kuchel

Inventor： Xavier Colonna De Lega ,  Peter J. De Groot ,  Michael Kuchel

IPC: G01B9/02

CPC classification number: G03F7/70491 ,  G01B9/02019 ,  G01B9/02022 ,  G01B9/02084 ,  G01B9/02087 ,  G01B9/0209 ,  G01B11/0675 ,  G01B2290/30 ,  G01B2290/70 ,  G03F7/70608 ,  G03F7/70641 ,  G03F7/70775 ,  G03F9/7003 ,  G03F9/7049 ,  G03F9/7088

Abstract: An optical system includes a photolithography system, a low coherence interferometer, and a detector. The photolithography system is configured to illuminate a portion of an object with a light pattern and has a reference surface. The low coherence interferometer has a reference optical path and a measurement optical path. Light that passes along the reference optical path reflects at least once from the reference surface and light that passes along the measurement optical path reflects at least once from the object. The detector is configured to detect a low coherence interference signal including light that has passed along the reference optical path and light that has passed along the measurement optical path. The low coherence interference signal is indicative of a spatial relationship between the reference surface and the object.

Abstract translation: 光学系统包括光刻系统，低相干干涉仪和检测器。 光刻系统被配置为用光图案照射物体的一部分并具有参考表面。 低相干干涉仪具有参考光路和测量光路。 沿着基准光路通过的光至少从参考面反射一次，并且沿测量光路通过的光从物体反射至少一次。 检测器被配置为检测包括沿着参考光路已经通过的光和沿着测量光路已经通过的光的低相干干涉信号。 低相干干涉信号指示参考表面和对象之间的空间关系。

公开(公告)号：US07271918B2

公开(公告)日：2007-09-18

申请号：US10795579

申请日：2004-03-08

Applicant: Peter J. De Groot ,  Robert Stoner ,  Xavier Colonna De Lega

Inventor： Peter J. De Groot ,  Robert Stoner ,  Xavier Colonna De Lega

IPC: G01B11/02

CPC classification number: G01B11/0675 ,  G01B9/0201 ,  G01B9/02011 ,  G01B9/02044 ,  G01B9/02057 ,  G01B9/02072 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B2290/70

Abstract: A method including comparing information derivable from a scanning interferometry signal for a first surface location of a test object to information corresponding to multiple models of the test object, wherein the multiple models are parametrized by a series of characteristics for the test object. The information corresponding to the multiple models may include information about at least one amplitude component of a transform of a scanning interferometry signal corresponding to each of the models of the test object.

Abstract translation: 一种方法，包括将来自测试对象的第一表面位置的扫描干涉测量信号的可导出信息与对应于所述测试对象的多个模型的信息进行比较，其中所述多个模型由所述测试对象的一系列特征参数化。 对应于多个模型的信息可以包括关于与测试对象的每个模型相对应的扫描干涉测量信号的变换的至少一个幅度分量的信息。

公开(公告)号：US07239398B2

公开(公告)日：2007-07-03

申请号：US11520031

申请日：2006-09-12

Applicant: Peter J. De Groot ,  Robert Stoner ,  Xavier Colonna De Lega

Inventor： Peter J. De Groot ,  Robert Stoner ,  Xavier Colonna De Lega

IPC: G01B11/02

CPC classification number: G01B11/0675 ,  G01B9/0201 ,  G01B9/02057 ,  G01B9/02072 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B2290/50 ,  G01B2290/70 ,  G01N21/211 ,  G01N21/8422 ,  G01N21/9501

Abstract: A method including comparing information derivable from a scanning interferometry signal for a first surface location of a test object to information corresponding to multiple models of the test object, wherein the multiple models are parametrized by a series of characteristics for the test object. The derivable information being compared may relate to a shape of the scanning interferometry signal for the first surface location of the test object.

公开(公告)号：US07102761B2

公开(公告)日：2006-09-05

申请号：US10855788

申请日：2004-05-27

Applicant: Xavier Colonna De Lega ,  David A. Grigg ,  Peter J. De Groot

Inventor： Xavier Colonna De Lega ,  David A. Grigg ,  Peter J. De Groot

IPC: G01B9/02

CPC classification number: G01B9/02063 ,  G01B9/02057 ,  G01B9/0209 ,  G01B11/0675

Abstract: An interferometry method includes: imaging test light reflected from at least a first portion of a test surface to interfere with reference light on a camera and form an interference pattern, wherein the imaging defines a depth of focus for the light reflected from the test surface, and wherein the test light and reference light are derived from a common source; varying an optical path length difference between the test light and reference light over a range larger than the depth of focus, wherein the optical path length difference corresponds to a difference between a first optical path between the common source and the camera for the test light and a second optical path between the common source and the camera for the reference light; and maintaining the first portion of the test surface within the depth of focus as the optical path length difference is varied.

Abstract translation: 干涉测量方法包括：对从测试表面的至少第一部分反射的测试光进行成像，以干涉照相机上的参考光并形成干涉图案，其中所述成像为从所述测试表面反射的光定义焦深， 并且其中所述测试光和参考光源自公共源; 在大于焦深的范围内改变测试光和参考光之间的光程长度差，其中光程长度差对应于测试光的公共源和照相机之间的第一光路之间的差，以及 用于参考光的公共源和照相机之间的第二光路; 以及当所述光路长度差被改变时，将所述测试表面的所述第一部分保持在所述焦深内。

公开(公告)号：US06195168B1

公开(公告)日：2001-02-27

申请号：US09514215

申请日：2000-02-25

Applicant: Xavier Colonna De Lega ,  Peter De Groot ,  Leslie L. Deck

Inventor： Xavier Colonna De Lega ,  Peter De Groot ,  Leslie L. Deck

IPC: G01B0902

CPC classification number: G01B9/02039 ,  G01B9/02024 ,  G01B9/02082 ,  G01B9/0209 ,  G01B11/2441

Abstract: The invention features an interferometry system for a measuring a surface profile or thickness of a measurement object. In one aspect, the interferometry system includes: a broadband infrared source which during operation generates broadband infrared radiation including central wavelengths greater than about 1 micron; a scanning interferometer which during operation directs a first infrared wavefront along a reference path and a second infrared wavefront along a measurement path contacting the measurement object, and, after the second wavefront contacts the measurement object, combines the wavefronts to produce an optical interference pattern, the first and second infrared wavefronts being derived from the broadband infrared radiation; a detector producing data in response to the optical interference pattern; and a controller which during operation causes the scanning interferometer to vary the optical path difference between the reference and measurement paths over a range larger than the coherence length of the broadband source and analyzes the data as a function of the varying optical path difference to determine the surface profile.

Abstract translation: 本发明的特征在于用于测量测量对象的表面轮廓或厚度的干涉测量系统。 在一个方面，干涉测量系统包括：宽带红外光源，其在操作期间产生包括大于约1微米的中心波长的宽带红外辐射; 扫描干涉仪，其在操作期间沿着参考路径引导第一红外波前沿，并沿着与所述测量对象接触的测量路径引导第二红外波前，并且在所述第二波前接触所述测量对象之后，组合所述波前以产生光学干涉图案， 第一和第二红外波前是从宽带红外辐射得到的; 响应于光学干涉图案产生数据的检测器; 以及控制器，其在操作期间使得扫描干涉仪在大于宽带源的相干长度的范围上改变参考和测量路径之间的光程差，并且根据变化的光程差分析数据以确定 表面轮廓。

公开(公告)号：US08189202B2

公开(公告)日：2012-05-29

申请号：US12535357

申请日：2009-08-04

Applicant: Jan Liesener ,  Xavier Colonna de Lega ,  Peter de Groot

Inventor： Jan Liesener ,  Xavier Colonna de Lega ,  Peter de Groot

IPC: G01B11/02

CPC classification number: G01B9/02043 ,  G01B9/02057 ,  G01B9/02083 ,  G01B9/0209 ,  G01B2290/70 ,  G03F7/70633 ,  H01L23/544 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Systems are disclosed that include an interferometer configured to direct test light to an overlay test pad and subsequently combine it with reference light, the test and reference light being derived from a common source, one or more optics configured to direct at least a portion of the combined light to a multi-element detector so that different regions of the detector correspond to different illumination angles of the overlay test pad by the test light, the detector being configured to produce an interference signal based on the combined light, and an electronic processor in communication with the multi-element detector. The overlay test pad comprises a first patterned structure and a second patterned structure and the electronic processor is configured to determine information about the relative alignment between the first and second patterned structures based on the interference signal.

Abstract translation: 公开了一种系统，其包括被配置为将测试光引导到覆盖测试焊盘并随后将其与参考光组合的干涉仪，测试和参考光源自公共源，一个或多个光学器件被配置为引导至少一部分 将光组合到多元件检测器，使得检测器的不同区域对应于测试光的覆盖测试垫的不同照明角度，检测器被配置为基于组合的光产生干涉​​信号，以及电子处理器 与多元素检测器通信。 覆盖测试焊盘包括第一图案化结构和第二图案化结构，并且电子处理器被配置为基于干扰信号来确定关于第一和第二图案化结构之间的相对对准的信息。

公开(公告)号：US07978338B2

公开(公告)日：2011-07-12

申请号：US12541325

申请日：2009-08-14

Applicant: Peter De Groot ,  Mark Davidson ,  Jan Liesener ,  Xavier Colonna De Lega ,  Leslie L. Deck

Inventor： Peter De Groot ,  Mark Davidson ,  Jan Liesener ,  Xavier Colonna De Lega ,  Leslie L. Deck

IPC: G01B11/02

CPC classification number: G01B9/0209 ,  G01B9/02007 ,  G01B9/0201 ,  G01B9/02027 ,  G01B9/02039 ,  G01B9/02057 ,  G01B9/02068 ,  G01B9/02077 ,  G01B11/2441 ,  G01B2290/45 ,  G01B2290/70 ,  Y10T29/49002

Abstract: Interferometry system are disclosed that include a detector sub-system including a monitor detector, interferometer optics for combining test light from a test object with primary reference light from a first reference interface and secondary reference light from a second reference interface to form a monitor interference pattern on a monitor detector, wherein the first and second reference interfaces are mechanically fixed with respect to each other and the test light, a scanning stage configured to scan an optical path difference (OPD) between the test light and the primary and secondary reference light to the monitor detector while the detector sub-system records the monitor interference pattern for each of a series of OPD increments, and an electronic processor electronically coupled to the detector sub-system and the scanning stage, the electronic processor being configured to determine information about the OPD increments based on the detected monitor interference pattern.

Abstract translation: 公开了一种干涉测量系统，其包括检测器子系统，该检测器子系统包括监视器检测器，用于将来自测试对象的测试光与来自第一参考接口的主要参考光组合的来自第二参考接口的第二参考光组合的干涉仪光学元件，以形成监视器干涉图案 在监视器检测器上，其中所述第一参考接口和所述第二参考接口相对于彼此和所述测试光机械地固定;扫描台，被配置为扫描所述测试光和所述主参考光与所述次参考光之间的光程差（OPD） 监视器检测器，同时检测器子系统记录用于一系列OPD增量中的每一个的监视器干涉图案，以及电子处理器，电子耦合到检测器子系统和扫描级，电子处理器被配置为确定关于 OPD根据检测到的监视器干扰模式递增。

公开(公告)号：US07684049B2

公开(公告)日：2010-03-23

申请号：US12017531

申请日：2008-01-22

Applicant: Peter De Groot ,  Michael J. Darwin ,  Robert Stoner ,  Gregg M. Gallatin ,  Xavier Colonna De Lega

Inventor： Peter De Groot ,  Michael J. Darwin ,  Robert Stoner ,  Gregg M. Gallatin ,  Xavier Colonna De Lega

IPC: G01B11/02

CPC classification number: G01B11/0675 ,  G01B9/02057 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B2290/50 ,  G01B2290/70 ,  G01N21/8422 ,  G03F7/70625

Abstract: Disclosed is an interferometry analysis method that includes comparing information derivable from multiple interferometry signals corresponding to different surface locations of a test object to information corresponding to multiple models of the test object, wherein the multiple models are parameterized by a series of characteristics that relate to one or more under-resolved lateral features of the test object; and outputting information about the under-resolved surface feature based on the comparison.

Abstract translation: 公开了一种干涉测量分析方法，其包括将可对应于测试对象的不同表面位置的多个干涉测量信号的信息与对应于测试对象的多个模型的信息进行比较，其中，多个模型通过一系列与一个 或更多的未解决的测试对象的横向特征; 并基于该比较输出关于未解决的表面特征的信息。

公开(公告)号：US07619746B2

公开(公告)日：2009-11-17

申请号：US11780360

申请日：2007-07-19

Applicant: Xavier Colonna De Lega

Inventor： Xavier Colonna De Lega

IPC: G01B11/02

CPC classification number: G01B9/02027 ,  G01B9/02043 ,  G01B9/02057 ,  G01B9/02072 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B2290/50 ,  G01B2290/70 ,  G01N21/211

Abstract: A method is disclosed which includes, for each of multiple areas of a test surface on a test object having different reflectivities, using an interferometry system to measure each area in a first mode of operation that measures information about the reflectivity of the area over a range of angles and wavelengths; using the same interferometry-system to measure the test surface in a second mode of operation that interferometrically profiles a topography of the test surface over a range including at least some of the multiple areas; and correcting the profile based on the information about the reflectivity of the multiple areas to reduce errors.

Abstract translation: 公开了一种方法，其包括对于具有不同反射率的测试对象上的测试表面的多个区域中的每个区域，使用干涉测量系统来测量第一操作模式中的每个区域，该第一操作模式测量关于区域的反射率的信息 的角度和波长; 使用相同的干涉测量系统在第二操作模式中测量所述测试表面，所述第二操作模式在包括所述多个区域中的至少一些区域的范围内对测试表面的形貌进行干涉测量; 并且基于关于多个区域的反射率的信息来校正简档以减少错误。

公开(公告)号：US07616323B2

公开(公告)日：2009-11-10

申请号：US11335871

申请日：2006-01-19

Applicant: Xavier Colonna De Lega ,  Peter De Groot

Inventor： Xavier Colonna De Lega ,  Peter De Groot

IPC: G01B11/02

CPC classification number: G01B9/023 ,  G01B9/02004 ,  G01B9/02027 ,  G01B9/02043 ,  G01B9/02044 ,  G01B9/02057 ,  G01B9/02072 ,  G01B9/02074 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B11/0675 ,  G01B11/2441 ,  G01B2290/45 ,  G01B2290/70 ,  G01N21/21 ,  G01N21/211

Abstract: Disclosed is a system including: (i) an interferometer configured to direct test electromagnetic radiation to a test surface and reference electromagnetic radiation to a reference surface and subsequently combine the electromagnetic radiation to form an interference pattern, the electromagnetic radiation being derived from a common source; (ii) a multi-element detector; and (iii) one or more optics configured to image the interference pattern onto the detector so that different elements of the detector correspond to different illumination angles of the test surface by the test electromagnetic radiation. The apparatus is configured to operate in a first mode in which the combined light is directed to the detector so that the different regions of the detector correspond to the different illumination angles of the test surface by the test light, and a second mode in which the different regions of the detector correspond to the different regions of the test surface illuminated by the test light to enable a profiling mode of operation.

Abstract translation: 公开了一种系统，包括：（i）干涉仪，被配置为将测试电磁辐射引导到测试表面并将电磁辐射引用到参考表面，并且随后组合电磁辐射以形成干涉图案，所述电磁辐射是从公共源 ; （ii）多元素检测器; 和（iii）一个或多个光学元件，被配置为将干涉图案成像到检测器上，使得检测器的不同元件对应于测试电磁辐射的测试表面的不同照明角度。 该装置被配置为以第一模式操作，其中组合的光被引导到检测器，使得检测器的不同区域对应于被测试光的测试表面的不同照明角度，其中第二模式 检测器的不同区域对应于由测试光照射的测试表面的不同区域，以使得能够进行轮廓操作模式。