Abstract:
The embodiments of the present disclosure provide a display panel. The display panel includes a first substrate, a second substrate disposed opposite to the first substrate, and a liquid crystal layer between the first substrate and the second substrate, a plurality of first electrodes disposed on a side, close to the second substrate, of the first substrate and spaced apart at intervals, a first dielectric layer for planarizing the plurality of first electrodes, a second dielectric layer disposed on a side, close to the liquid crystal layer, of the first dielectric layer, a light shielding portion disposed on the side, close to the liquid crystal layer, of the second substrate, and a control circuit configured to apply a voltage between the first electrode and the second electrode so that the liquid crystal layer is in a first state or a second state.
Abstract:
The present disclosure provides a fingerprint recognition unit and a fabrication method thereof, a fingerprint recognition module and a display device. The fingerprint recognition unit includes: a bearing substrate; a receiving electrode layer on the bearing substrate; a piezoelectric material layer on a side of the receiving electrode layer away from the bearing substrate; and a driving electrode layer on a side of the piezoelectric material layer away from the receiving electrode layer. A density of the driving electrode layer is greater than 5 g/cm3, and a thickness of the driving electrode layer, a thickness of the piezoelectric material layer and a thickness of the bearing substrate are configured such that a vibration nodal plane of the piezoelectric material layer is within the piezoelectric material layer.
Abstract:
A transducer, a method of manufacturing a transducer, and a transducing device are provided. The transducer includes a receiving unit and a transmitting unit. The receiving unit includes a first receiving electrode, a first piezoelectric film, and a second receiving electrode which are sequentially stacked, and the receiving unit is configured to convert a first acoustic wave signal into an electrical signal by using a piezoelectric effect of the first piezoelectric film. The transmitting unit is configured to receive a control signal, which is based on the electrical signal, to transmit a second acoustic wave signal.
Abstract:
The present disclosure provides a display substrate and a manufacturing method thereof, and a display device. In the display substrate of the present disclosure, a first transistor comprises a first gate electrode, a first electrode, a second electrode, and a first active layer; and a second transistor comprises a second gate electrode, a third electrode, a fourth electrode, and a second active layers, wherein the first active layer comprises a silicon material, the second active layer comprises an oxide semiconductor material, and wherein the third electrode and the first gate electrode are disposed in the same layer, and the fourth electrode and the first electrode, the second electrodes are disposed in the same layer.
Abstract:
The present disclosure provides an OLED substrate and a manufacturing method thereof, a display device and a manufacturing method thereof, and belongs to the technical field of display technology. A manufacturing method for an OLED substrate of the present disclosure includes: forming, by a patterning process, a pattern including first electrodes of OLED devices and a pixel defining layer provided above the first electrodes above the base substrate, wherein the pixel defining layer includes a plurality of pixel partition walls spaced apart from each other, each of the pixel partition walls defines one of the first electrodes.
Abstract:
The present invention relates to an array substrate, a fabricating method thereof, and a display device. The array substrate comprises a thin film transistor, an auxiliary electrode which is arranged in a same layer as an active layer of the thin film transistor, and a transparent cathode which is electrically connected with the auxiliary electrode, wherein the active layer is an oxide semiconductor, and the auxiliary electrode is an electric conductor which is formed by performing a modification treatment on the oxide semiconductor. According to technical solutions of the present invention, the active layer and the auxiliary electrode are arranged in a same layer, a pattern of the active layer and the auxiliary electrode can be formed by a same etching process, and a separate process for forming the auxiliary electrode is not required, thus reducing the overall process time of the array substrate and saving the fabricating cost. (FIG. 1)
Abstract:
Embodiments of the disclosure disclose an array substrate and a fabrication method thereof, and a display device. The fabrication method of the array substrate comprises: forming a thin film transistor; forming a passivation layer covering the thin film transistor, the passivation layer having a via hole and the via hole exposing at least a portion of a drain electrode of the thin film transistor; forming a via-hole conductive layer, the via-hole conductive layer covering the portion of the drain electrode exposed at the via hole and connected to the drain electrode; treating the via-hole conductive layer, so that a reflectivity of the via-hole conductive layer is lower than a reflectivity of the drain electrode; and forming a pixel electrode, the pixel electrode being connected with the drain electrode through the via-hole conductive layer.
Abstract:
An array substrate and a display device are provided. The array substrate comprises a plurality of signal lines (40), a plurality of connecting lines (50) and a driving module (60) in a peripheral region (1) outside a display region (2); the connecting lines (50) are configured for connecting the signal lines (40) and the driving module (60), to transmit signal from the signal lines (40) to the driving module (60), wherein, at least one of the connecting lines (50) and at least one of the signal lines (40) are designed to intersect with and insulated from each other in a first region (N). The at least one of the signal lines (40) includes, in a second region (O) other than the first region (N), a first electrode line layer (401) and a second electrode line layer (402), while, in the first region (N), includes the first electrode line layer (401) but does not include the second electrode line layer (402). The array substrate may prevent problems of electrostatic accumulation or short circuit from occurring between the connecting lines (50) and the second electrode line layer (402).
Abstract:
The present invention provides a method for manufacturing a quantum dot light-emitting element and a display device. The method comprises mixing a quantum dot light-emitting material and a hole-transporting material or mixing the quantum dot light-emitting material and an electron-transporting material, and dissolving a mixture into an organic solvent to form a mixed solvent, applying the mixed solvent to a substrate for manufacturing a quantum dot light-emitting element, removing the organic solvent form the mixed solvent to stratify the quantum dot light-emitting material and the hole-transporting material or the electron-transporting material on the substrate for manufacturing a quantum dot light-emitting element to form a quantum dot light-emitting layer and a hole-transporting layer or an electron-transporting layer.
Abstract:
A thin film transistor is disclosed in the present invention. The thin film transistor comprises: a substrate, an active layer, a first etching barrier layer, a second etching barrier layer, a source and a drain, wherein: the active layer is disposed over the substrate; the first etching barrier layer is disposed over the active layer; the second etching barrier layer is disposed over the first etching barrier layer; the source and the drain are disposed over the second etching barrier layer, and are connected to each other through the active layer by means of via holes formed in the first etching barrier layer and the second etching barrier layer by etching; and a length of the first etching barrier layer at a channel position is less than a length of the second etching barrier layer. A method of manufacturing the thin film transistor, an array substrate and a display apparatus are also disclosed in the present invention. A length of a channel of the thin film transistor according to the present invention is less than the length of the channel of the conventional thin film transistor. Thereby, size and energy consumption of the thin film transistor are reduced, an aperture ratio of a liquid crystal panel is increased, and a turn-on current of the thin film transistor is increased, so that whole performance of the thin film transistor is further improved.