利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

67 条记录 (耗时 0.039 秒)

    Gas sensing using ultrasound
    23.
    发明授权
    Gas sensing using ultrasound 有权
    气体传感使用超声波

    公开(公告)号：US08689606B2

    公开(公告)日：2014-04-08

    申请号：US13203987

    申请日：2010-03-10

    申请人： Martijn Schellekens ,  Josephus Arnoldus Henricus Maria Kahlman ,  Martinus Gernardus Van Der Mark ,  Peter Dirksen

    发明人： Martijn Schellekens ,  Josephus Arnoldus Henricus Maria Kahlman ,  Martinus Gernardus Van Der Mark ,  Peter Dirksen

    IPC分类号： G01N29/02

    CPC分类号： G01N33/497 ,  G01N29/2406 ,  G01N29/348 ,  G01N33/004 ,  G01N2291/0215 ,  G01N2291/02809

    摘要： A sensor chip (1030) for gas has cells (200) for emitting and receiving ultrasound and is configured for a sufficiently large frequency range and for measuring concentration of at least one of the gas components based on at least two responses within the range. The frequency range can be achieved by varying the size of cell membranes (230), varying bias voltages, and/or varying air pressure for an array (205) of cMUTs or MEMS microphones. The sensor chip can be applied in, for example, capnography. A measurement air chamber (515) is implemented in the respiratory pathway (400), and it and/or the pathway may be designed to reduce turbulence in the exhaled breath (120) subject to ultrasound interrogation. The chip (1030) can be implemented as self-contained in the monitoring of parameters, obviating the need for off-chip sensors.

    摘要翻译： 用于气体的传感器芯片（1030）具有用于发射和接收超声波的电池（200），并且被配置为足够大的频率范围，并且用于基于该范围内的至少两个响应来测量至少一个气体成分的浓度。 频率范围可以通过改变cMUT或MEMS麦克风的阵列（205）的细胞膜（230）的尺寸，改变的偏置电压和/或变化的空气压力来实现。 传感器芯片可以应用于例如二氧化碳图谱中。 在呼吸路径（400）中实施测量空气室（515），并且其和/或路径可被设计成减少经过超声询问的呼出呼吸（120）中的湍流。 芯片（1030）可以被实现为独立于监视参数，从而避免了片外传感器的需要。

    Method for production and using a capacitive micro-machined ultrasonic transducer
    24.
    发明授权
    Method for production and using a capacitive micro-machined ultrasonic transducer 有权
    生产和使用电容微加工超声波换能器的方法

    公开(公告)号：US08327521B2

    公开(公告)日：2012-12-11

    申请号：US12678453

    申请日：2008-09-17

    申请人： Peter Dirksen ,  Anthonie Van Der Lugt

    发明人： Peter Dirksen ,  Anthonie Van Der Lugt

    IPC分类号： H04R31/00

    CPC分类号： B06B1/0292 ,  A61B8/00 ,  H04R19/005 ,  Y10T29/43 ,  Y10T29/49005 ,  Y10T29/4908

    摘要： Methods are provided for production of pre-collapsed capacitive micro-machined ultrasonic transducers (cMUTs). Methods disclosed generally include the steps of obtaining a nearly completed traditional cMUT structure prior to etching and sealing the membrane, defining holes through the membrane of the cMUT structure for each electrode ring fixed relative to the top face of the membrane, applying a bias voltage across the membrane and substrate of the cMUT structure so as to collapse the areas of the membrane proximate to the holes to or toward the substrate, fixing and sealing the collapsed areas of the membrane to the substrate by applying an encasing layer, and discontinuing or reducing the bias voltage. CMUT assemblies are provided, including packaged assemblies, integrated assemblies with an integrated circuit/chip (e.g., a beam-steering chip) and a cMUT/lens assembly. Advantageous cMUT-based applications utilizing the disclosed pre-collapsed cMUTs are also provided, e.g., ultrasound transducer-based applications, catheter-based applications, needle-based applications and flowmeter applications.

    摘要翻译： 提供了用于生产预塌陷电容式微加工超声波换能器（cMUT）的方法。 所公开的方法通常包括以下步骤：在蚀刻和密封膜之前获得几乎完成的传统cMUT结构，通过cMUT结构的膜定义孔，用于相对于膜的顶面固定的每个电极环，施加偏压 cMUT结构的膜和基底，以便将膜的靠近孔的区域折叠到基底或朝向基底，通过施加包封层将膜的折叠区域固定和密封到基底，并且中断或者减少 偏压。 提供CMUT组件，包括封装组件，具有集成电路/芯片（例如，光束转向芯片）和cMUT /透镜组件的集成组件。 还提供了利用所公开的预塌陷cMUT的有利的基于cMUT的应用，例如基于超声换能器的应用，基于导管的应用，基于针的应用和流量计应用。

    Removable pellicle for immersion lithography
    26.
    发明授权
    Removable pellicle for immersion lithography 有权
    浸没光刻用可拆卸防护薄膜

    公开(公告)号：US08067147B2

    公开(公告)日：2011-11-29

    申请号：US10596647

    申请日：2004-12-22

    申请人： Peter Dirksen ,  Robert Duncan Morton ,  Peter Zandbergen ,  David Van Steenwinckel ,  Yuri Aksenov ,  Jeroen Herman Lammers ,  Johannes Van Wingerden ,  Laurent Marinier

    发明人： Peter Dirksen ,  Robert Duncan Morton ,  Peter Zandbergen ,  David Van Steenwinckel ,  Yuri Aksenov ,  Jeroen Herman Lammers ,  Johannes Van Wingerden ,  Laurent Marinier

    IPC分类号： G03F7/00

    CPC分类号： G03F7/70341 ,  G03F7/70983

    摘要： A method of irradiating to pattern a photosensitive layer such as a resist (L2) immersed in a fluid (L3), involves applying a removable transparent layer (L4, L5), projecting the radiation onto the resist through the immersion fluid and through the transparent layer, such that imperfections in the fluid are out of focus as projected on the surface, and subsequently removing the transparent layer. The transparent layer can help distance such imperfections from the focus of the radiation on the surface and so can reduce or eliminate shadowing. Hence the irradiation can be more complete, and defects reduced. It can be particularly effective for imperfections in the form of small bubbles or particles in the immersion fluid especially at the fluid/surface interface for example. The radiation can be for any purpose including inspection, processing, patterning and so on. The removal of the transparent layer can be combined with a step of developing the resist layer.

    摘要翻译： 一种照射方法来照射浸没在流体（L3）中的抗蚀剂（L2）的感光层，包括施加可去除的透明层（L4，L5），通过浸没流体将辐射投射到抗蚀剂上，并通过透明 使得流体中的缺陷如投射在表面上而失焦，随后去除透明层。 透明层可以帮助将这种缺陷从辐射的焦点远离在表面上，因此可以减少或消除阴影。 因此，照射可以更完整，并且缺陷减少。 对于浸入液体中的小气泡或颗粒形式的缺陷，特别是在流体/表面界面处的缺陷可能特别有效。 辐射可以用于任何目的，包括检查，加工，图案化等。 可以将透明层的去除与显影抗蚀剂层的步骤组合。

    Lithographic projection device, method an substrate for manufacturing electronic devices, and obtained electronic device
    29.
    发明申请
    Lithographic projection device, method an substrate for manufacturing electronic devices, and obtained electronic device 审中-公开
    光刻投影装置，制造电子装置用基板的方法以及获得的电子装置

    公开(公告)号：US20070103658A1

    公开(公告)日：2007-05-10

    申请号：US10596510

    申请日：2004-12-07

    申请人： Peter Dirksen

    发明人： Peter Dirksen

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70308 ,  G03F7/70633

    摘要： The invention proposes a lithographic projection device such as a wafer stepper for forming a pattern on a substrate or wafer, comprising a(n) (actinic) radiation or light source (2), illumination optics (4) for directing light issuing from said light source onto a mask (6) and projection optics (8) for directing diffracted radiation or light from said mask to the substrate/wafer to be imaged, wherein an optical filter (9) is provided downstream of said projection optics and an imageable substrate (7) having an optical filter (9) on the side to be imaged.

    摘要翻译： 本发明提出了一种光刻投影装置，例如用于在衬底或晶片上形成图案的光刻投影装置，包括（n）（光化）辐射或光源（2），照明光学器件（4），用于引导从所述光 来源于掩模（6）和投影光学器件（8），用于将衍射的辐射或来自所述掩模的光引导到待成像的衬底/晶片，其中在所述投影光学器件的下游提供滤光器（9）和可成像衬底（ 7）在要成像的一侧具有滤光器（9）。