Drive laser for EUV light source
    21.
    发明授权
    Drive laser for EUV light source 有权
    驱动激光用于EUV光源

    公开(公告)号:US07518787B2

    公开(公告)日:2009-04-14

    申请号:US11452558

    申请日:2006-06-14

    IPC分类号: H01S4/00 H01S3/22 H01S3/223

    摘要: A laser light source is disclosed having a laser oscillator producing an output beam; a first amplifier amplifying the output beam to produce a first amplified beam, and a second amplifier amplifying the first amplified beam to produce a second amplified beam. For the source, the first amplifier may have a gain medium characterized by a saturation energy (Es, 1) and a small signal gain (go, 1); and the second amplifier may have a gain medium characterized by a saturation energy (Es, 2) and a small signal gain (go, 2), with (go, 1)>(go, 2) and (Es, 2)>(Es, 1). In another aspect, a laser oscillator of a laser light source may be a cavity dumped laser oscillator, e.g. a mode-locked laser oscillator, q-switched laser oscillator and may further comprising a temporal pulse stretcher.

    摘要翻译: 公开了具有产生输出光束的激光振荡器的激光源; 放大所述输出光束以产生第一放大光束的第一放大器,以及放大所述第一放大光束以产生第二放大光束的第二放大器。 对于源,第一放大器可以具有以饱和能量(Es,1)和小信号增益(go,1)为特征的增益介质; 并且第二放大器可以具有特征在于饱和能量(Es,2)和小信号增益(go,2)的增益介质,其中(go,1)>(go,2)和(Es,2)>( Es,1)。 在另一方面,激光光源的激光振荡器可以是空腔倾覆的激光振荡器,例如。 模式锁定激光振荡器,q切换激光振荡器,并且还可以包括时间脉冲展开器。

    Laser system
    22.
    发明申请
    Laser system 有权
    激光系统

    公开(公告)号:US20080165337A1

    公开(公告)日:2008-07-10

    申请号:US11981450

    申请日:2007-10-30

    IPC分类号: G03B27/54 G03F7/26

    摘要: A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.

    摘要翻译: 一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统,其可以包括种子激光振荡器,其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级,其接收种子激光振荡器的输出并放大种子激光振荡器的输出,以形成激光系统输出,其包括激光输出光束 脉冲,其可以包括环形功率放大级。

    Drive laser for EUV light source
    23.
    发明申请
    Drive laser for EUV light source 有权
    驱动激光用于EUV光源

    公开(公告)号:US20070291350A1

    公开(公告)日:2007-12-20

    申请号:US11452558

    申请日:2006-06-14

    IPC分类号: H01S3/00

    摘要: A laser light source is disclosed having a laser oscillator producing an output beam; a first amplifier amplifying the output beam to produce a first amplified beam, and a second amplifier amplifying the first amplified beam to produce a second amplified beam. For the source, the first amplifier may have a gain medium characterized by a saturation energy (Es, 1) and a small signal gain (go, 1); and the second amplifier may have a gain medium characterized by a saturation energy (Es, 2) and a small signal gain (go, 2), with (go, 1)>(go, 2) and (Es, 2)>(Es, 1). In another aspect, a laser oscillator of a laser light source may be a cavity dumped laser oscillator, e.g. a mode-locked laser oscillator, q-switched laser oscillator and may further comprising a temporal pulse stretcher.

    摘要翻译: 公开了具有产生输出光束的激光振荡器的激光源; 放大所述输出光束以产生第一放大光束的第一放大器,以及放大所述第一放大光束以产生第二放大光束的第二放大器。 对于源极,第一放大器可以具有以饱和能量(E S,S 1)和小信号增益(g 1,...)为特征的增益介质; 并且第二放大器可以具有特征在于饱和能量(E SUB,2 N)和小信号增益(g 0,o 2)的增益介质,其中(g < (o,SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB >)。 在另一方面,激光光源的激光振荡器可以是空腔倾覆的激光振荡器,例如。 模式锁定激光振荡器,q切换激光振荡器,并且还可以包括时间脉冲展开器。

    Collector for EUV light source
    24.
    发明授权
    Collector for EUV light source 失效
    EUV光源收集器

    公开(公告)号:US07288777B2

    公开(公告)日:2007-10-30

    申请号:US11603471

    申请日:2006-11-21

    IPC分类号: H01J35/20

    摘要: An apparatus/method is disclosed that may comprise an EUV light source which may comprise a collector which may comprise an elliptical collector mirror having a first focus at a plasma initiation point and a second focus at an intermediate focus of the EUV light source; a debris shield intermediate the plasma initiation point and the elliptical collector mirror comprising a plurality of radially extending channels extending from the first focus and aligned to the second focus and in symmetry about an axis of rotation passing through the first focus and aligned to a longitudinal axis of the elliptical collector mirror. The plurality of channels may be formed between a plurality of generally planer foils extending radially from the first focus and aligned to the second focus and in symmetry about an axis of rotation passing through the first focus and aligned to a longitudinal axis of the collector mirror.

    摘要翻译: 公开了一种可以包括EUV光源的装置/方法,该EUV光源可以包括收集器,该收集器可以包括在EUV光源的中间焦点处具有等离子体起始点的第一焦点和第二焦点的椭圆形收集器反射镜; 位于等离子体起始点之间的碎片屏蔽和椭圆形收集器镜,其包括从第一焦点延伸并对准到第二焦点并围绕穿过第一焦点的旋转轴对称的多个径向延伸的通道,并且对准纵向轴线 的椭圆收集镜。 多个通道可以形成在从第一焦点径向延伸并与第二焦点对准的多个大致平面的箔片之间并且围绕穿过第一焦点的旋转轴线对称并且与收集器反射镜的纵向轴线对准。

    High resolution etalon-grating spectrometer

    公开(公告)号:US06538737B2

    公开(公告)日:2003-03-25

    申请号:US10003513

    申请日:2001-10-31

    IPC分类号: G01J314

    摘要: A high resolution etalon-grating spectrometer. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The etalon and the grating are placed in a leak-fight enclosure filled with a gas, such as nitrogen or helium. The wavelength scanning of the spectrometer is done by changing the gas pressure in the enclosure during the scan.

    Laser system
    29.
    发明授权
    Laser system 有权
    激光系统

    公开(公告)号:US08908735B2

    公开(公告)日:2014-12-09

    申请号:US13231882

    申请日:2011-09-13

    摘要: A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.

    摘要翻译: 一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统,其可以包括种子激光振荡器,其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级,其接收种子激光振荡器的输出并放大种子激光振荡器的输出,以形成激光系统输出,其包括激光输出光束 脉冲,其可以包括环形功率放大级。