公开(公告)号：US20190139887A1

公开(公告)日：2019-05-09

申请号：US16096272

申请日：2016-07-01

Applicant: Intel Corporation

Inventor： Kevin L. LIN ,  Richard E. SCHENKER ,  Jeffery D. BIELEFELD ,  Rami HOURANI ,  Manish CHANDHOK

IPC: H01L23/528 ,  H01L23/522 ,  H01L21/768

Abstract: Dielectric helmet-based approaches for back end of line (BEOL) interconnect fabrication, and the resulting structures, are described. In an example, a semiconductor structure includes a substrate. A plurality of alternating first and second conductive line types is disposed along a same direction of a back end of line (BEOL) metallization layer disposed in an inter-layer dielectric (ILD) layer disposed above the substrate. A dielectric layer is disposed on an uppermost surface of the first conductive line types but not along sidewalls of the first conductive line types, and is disposed along sidewalls of the second conductive line types but not on an uppermost surface of the second conductive line types.

公开(公告)号：US20190035677A1

公开(公告)日：2019-01-31

申请号：US16070172

申请日：2016-03-30

Applicant: Intel Corporation

Inventor： Manish CHANDHOK ,  Richard E. SCHENKER ,  Hui Jae YOO ,  Kevin L. LIN ,  Jasmeet S. CHAWLA ,  Stephanie A. BOJARSKI ,  Satyarth SURI ,  Colin T. CARVER ,  Sudipto NASKAR

IPC: H01L21/768 ,  H01L23/522 ,  H01L21/311

CPC classification number: H01L21/76802 ,  H01L21/0337 ,  H01L21/31138 ,  H01L21/31144 ,  H01L21/7682 ,  H01L21/76843 ,  H01L21/76847 ,  H01L21/76865 ,  H01L21/76883 ,  H01L21/76885 ,  H01L21/76889 ,  H01L21/76897 ,  H01L23/5226 ,  H01L23/53209 ,  H01L23/53271

Abstract: A plurality of interconnect features are formed in an interconnect layer on a first insulating layer on a substrate. An opening in the first insulating layer is formed through at least one of the interconnect features. A gap fill layer is deposited in the opening.

公开(公告)号：US20190013246A1

公开(公告)日：2019-01-10

申请号：US16068095

申请日：2016-03-28

Applicant: INTEL CORPORATION

Inventor： Charles H. WALLACE ,  Manish CHANDHOK ,  Paul A NYHUS ,  Eungnak HAN ,  Stephanie A. BOJARSKI ,  Florian GSTREIN ,  Gurpreet SINGH

IPC: H01L21/8234 ,  H01L27/088 ,  H01L29/06 ,  H01L27/02 ,  H01L29/08 ,  H01L29/78 ,  H01L21/308 ,  H01L29/165

Abstract: Aligned pitch-quartered patterning approaches for lithography edge placement error advanced rectification are described. For example, a method of fabricating a semiconductor structure includes forming a first patterned hardmask on a semiconductor substrate. A second hardmask layer is formed on the semiconductor substrate. A segregated di-block co-polymer is formed on the first patterned hardmask and on the second hardmask layer. Second polymer blocks are removed from the segregated di-block co-polymer. A second patterned hardmask is formed from the second hardmask layer and a plurality of semiconductor fins is formed in the semiconductor substrate using first polymer blocks as a mask. A first fin of the plurality of semiconductor fins is removed. Subsequent to removing the first fin, a second fin of the plurality of semiconductor fins is removed.

公开(公告)号：US20250120100A1

公开(公告)日：2025-04-10

申请号：US18402595

申请日：2024-01-02

Applicant: Intel Corporation

Inventor： Sudipto NASKAR ,  Manish CHANDHOK ,  Abhishek A. SHARMA ,  Roman CAUDILLO ,  Scott B. CLENDENNING ,  Cheyun LIN

IPC: H10B12/00

Abstract: Embodiments herein describe techniques for a semiconductor device including a three dimensional capacitor. The three dimensional capacitor includes a pole, and one or more capacitor units stacked around the pole. A capacitor unit of the one or more capacitor units includes a first electrode surrounding and coupled to the pole, a dielectric layer surrounding the first electrode, and a second electrode surrounding the dielectric layer. Other embodiments may be described and/or claimed.

公开(公告)号：US20230101212A1

公开(公告)日：2023-03-30

申请号：US17958295

申请日：2022-09-30

Applicant: Intel Corporation

Inventor： Manish CHANDHOK ,  Elijah V. KARPOV ,  Mohit K. HARAN ,  Reken PATEL ,  Charles H. WALLACE ,  Gurpreet SINGH ,  Florian GSTREIN ,  Eungnak HAN ,  Urusa ALAAN ,  Leonard P. GULER ,  Paul A. NYHUS

IPC: H01L21/768 ,  H01L29/66 ,  H01L23/535 ,  H01L29/78

Abstract: Contact over active gate (COAG) structures with conductive trench contact taps are described. In an example, an integrated circuit structure includes a plurality of gate structures above a substrate, each of the gate structures including a gate insulating layer thereon. A plurality of conductive trench contact structures is alternating with the plurality of gate structures, each of the conductive trench contact structures including a trench insulating layer thereon. One of the plurality of conductive trench contact structures includes a conductive tap structure protruding through the corresponding trench insulating layer. An interlayer dielectric material is above the trench insulating layers and the gate insulating layers. A conductive structure is in direct contact with the conductive tap structure of the one of the plurality of conductive trench contact structures.

公开(公告)号：US20220140069A1

公开(公告)日：2022-05-05

申请号：US17578839

申请日：2022-01-19

Applicant: Intel Corporation

Inventor： Sudipto NASKAR ,  Manish CHANDHOK ,  Abhishek A. SHARMA ,  Roman CAUDILLO ,  Scott B. CLENDENNING ,  Cheyun LIN

IPC: H01L49/02 ,  H01L27/108

Abstract: Embodiments herein describe techniques for a semiconductor device including a three dimensional capacitor. The three dimensional capacitor includes a pole, and one or more capacitor units stacked around the pole. A capacitor unit of the one or more capacitor units includes a first electrode surrounding and coupled to the pole, a dielectric layer surrounding the first electrode, and a second electrode surrounding the dielectric layer. Other embodiments may be described and/or claimed.

公开(公告)号：US20220140068A1

公开(公告)日：2022-05-05

申请号：US17578043

申请日：2022-01-18

Applicant: Intel Corporation

Inventor： Sudipto NASKAR ,  Manish CHANDHOK ,  Abhishek A. SHARMA ,  Roman CAUDILLO ,  Scott B. CLENDENNING ,  Cheyun LIN

IPC: H01L49/02 ,  H01L27/108

Abstract: Embodiments herein describe techniques for a semiconductor device including a three dimensional capacitor. The three dimensional capacitor includes a pole, and one or more capacitor units stacked around the pole. A capacitor unit of the one or more capacitor units includes a first electrode surrounding and coupled to the pole, a dielectric layer surrounding the first electrode, and a second electrode surrounding the dielectric layer. Other embodiments may be described and/or claimed.

公开(公告)号：US20220102210A1

公开(公告)日：2022-03-31

申请号：US17033483

申请日：2020-09-25

Applicant: Intel Corporation

Inventor： Paul A. NYHUS ,  Charles H. WALLACE ,  Manish CHANDHOK ,  Mohit K. HARAN ,  Gurpreet SINGH ,  Eungnak HAN ,  Florian GSTREIN ,  Richard E. SCHENKER ,  David SHYKIND ,  Jinnie ALOYSIUS ,  Sean PURSEL

IPC: H01L21/768 ,  H01L27/088 ,  H01L23/522 ,  H01L23/532

Abstract: Contact over active gate (COAG) structures are described. In an example, an integrated circuit structure includes a plurality of gate structures above substrate, each of the gate structures including a gate insulating layer thereon. A plurality of conductive trench contact structures is alternating with the plurality of gate structures, each of the conductive trench contact structures including a trench insulating layer thereon. A remnant of a di-block-co-polymer is over a portion of the plurality of gate structures or the plurality of conductive trench contact structures. An interlayer dielectric material is over the di-block-co-polymer, over the plurality of gate structures, and over the plurality of conductive trench contact structures. An opening in the interlayer dielectric material. A conductive structure is in the opening, the conductive structure in direct contact with a corresponding one of the trench contact structures or with a corresponding one of the gate contact structures.

公开(公告)号：US20220093399A1

公开(公告)日：2022-03-24

申请号：US17544684

申请日：2021-12-07

Applicant: Intel Corporation

Inventor： Marie KRYSAK ,  Florian GSTREIN ,  Manish CHANDHOK

IPC: H01L21/033 ,  C01G27/02 ,  H01L21/311 ,  C01G19/02 ,  C01G23/04 ,  C01F7/02 ,  C01G25/02 ,  H01L21/02 ,  C01F7/00 ,  H01L21/768

Abstract: A dielectric composition including a metal oxide particle including a diameter of 5 nanometers or less capped with an organic ligand at at least a 1:1 ratio. A method including synthesizing metal oxide particles including a diameter of 5 nanometers or less; and capping the metal oxide particles with an organic ligand at at least a 1:1 ratio. A method including forming an interconnect layer on a semiconductor substrate; forming a first hardmask material and a different second hardmask material on the interconnect layer, wherein at least one of the first hardmask material and the second hardmask material is formed over an area of interconnect layer target for a via landing and at least one of the first hardmask material and the second hardmask material include metal oxide nanoparticles; and forming an opening to the interconnect layer selectively through one of the first hardmask material and the second hardmask material.

公开(公告)号：US20200027827A1

公开(公告)日：2020-01-23

申请号：US16337889

申请日：2016-09-30

Applicant: Intel Corporation

Inventor： Kevin LIN ,  Manish CHANDHOK

IPC: H01L23/522 ,  H01L23/528 ,  H01L21/768 ,  H01L23/532

Abstract: Systems and methods for maskless gap (for example, air gap) integration into multilayer interconnects having one or more interconnect lines (for example, metal interconnect lines) embedded in a dielectric layer of the interconnects are described. In various embodiments, the described systems and methods may serve to reduce electrical shorting between adjacent vias in the interconnects. In one embodiment, a spacer layer may be provided to mask portions of an interlayer dielectric (ILD) in the interconnect. These masked portions of the ILD can protect regions between adjacent interconnect lines (for example, metal interconnect lines) from electrical shorting during subsequent metal layer depositions, for example, during a fabrication sequence of the interconnects. Further, the vias may enclose a gap (for example, an air gap) without the need for additional masking steps. Further, such gaps may be inherently self-aligned to the vias and/or spacer layers. Moreover, the gaps may act to reduce capacitance and thereby increase the performance (circuit timing, power consumption, etc.) of the interconnect.