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21.
公开(公告)号:US20230420436A1
公开(公告)日:2023-12-28
申请号:US17846109
申请日:2022-06-22
Applicant: Intel Corporation
Inventor: Sagar Suthram , Ravindranath Vithal Mahajan , Debendra Mallik , Omkar G. Karhade , Wilfred Gomes , Pushkar Sharad Ranade , Abhishek A. Sharma , Tahir Ghani , Anand S. Murthy , Nitin A. Deshpande
IPC: H01L25/18 , H01L23/00 , H01L23/522 , H01L23/48 , H01L25/00
CPC classification number: H01L25/18 , H01L24/08 , H01L23/5226 , H01L23/481 , H01L25/50 , H01L2224/08145
Abstract: Embodiments of an integrated circuit (IC) die comprise: a first region having a first surface; a second region attached to the first region along a first planar interface that is orthogonal to the first surface; and a third region attached to the second region along a second planar interface that is parallel to the first planar interface, the third region having a second surface, the second surface being coplanar with the first surface. The first region and the third region comprise a plurality of layers of conductive traces in a dielectric material, the conductive traces being orthogonal to the first and second surfaces; and bond-pads on the first and second surfaces, the bond-pads comprising portions of the respective conductive traces exposed on the first and second surfaces.
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公开(公告)号:US20230307541A1
公开(公告)日:2023-09-28
申请号:US17702593
申请日:2022-03-23
Applicant: Intel Corporation
Inventor: Abhishek A. Sharma , Wilfred Gomes , Tahir Ghani , Anand S. Murthy , Pushkar Sharad Ranade , Sagar Suthram
IPC: H01L29/78 , H01L29/423 , H01L29/51 , H01L29/66
CPC classification number: H01L29/78391 , H01L29/42364 , H01L29/516 , H01L29/6684
Abstract: Disclosed herein are transistor gate-channel arrangements with transistor gate stacks that include thick hysteretic elements (i.e., hysteretic elements having a thickness of at least 10-15 nanometers, e.g., between 55 and 100 nanometers), and related methods and devices. Transistor gate stacks disclosed herein include a multilayer gate insulator having a thick hysteretic element and an interface layer, where the thick hysteretic element is between the interface layer and a gate electrode material, and the interface layer is between the thick hysteretic element and a channel material of a transistor. The interface layer may be a dielectric material with an effective dielectric constant of at least 20 and/or be a dielectric material that is thinner than about 3 nanometers. Such an interface layer may help improve gate control and allow use of thick hysteretic elements while maintaining transistor performance in terms of, e.g., gate leakage, carrier mobility, and subthreshold swing.
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公开(公告)号:US20250107108A1
公开(公告)日:2025-03-27
申请号:US18473421
申请日:2023-09-25
Applicant: Intel Corporation
Inventor: Abhishek A. Sharma , Sagar Suthram , Wilfred Gomes , Tahir Ghani , Anand S. Murthy , Pushkar Sharad Ranade
IPC: H10B80/00 , H01L23/00 , H01L25/065 , H01L25/18
Abstract: An IC device may include memory layers bonded to a logic layer with inclination. An angle between a memory layer and the logic layer may be in a range from approximately 0 to approximately 90 degrees. The memory layers may be over the logic layer. The IC device may include one or more additional logic layers that are parallel to a memory layer or perpendicular to a memory layer. The one or more additional logic layers may be over the logic layer. A memory layer may include memory cells. The logic layer may include logic circuits (e.g., sense amplifier, word line driver, etc.) that control the memory cells. Bit lines (or word lines) in different memory layers may be coupled to each other. A bit line and a word line in a memory layer may be controlled by logic circuits in different logic layers.
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公开(公告)号:US20250107107A1
公开(公告)日:2025-03-27
申请号:US18471402
申请日:2023-09-21
Applicant: Intel Corporation
Inventor: Abhishek A. Sharma , Sagar Suthram , Wilfred Gomes , Pushkar Sharad Ranade , Anand S. Murthy , Tahir Ghani
IPC: H10B80/00 , H01L23/00 , H01L25/065 , H01L25/18
Abstract: An IC device may include memory layers over a logic layer. A memory layer may include memory arrays and one or more peripheral circuits coupled to the memory arrays. A memory array may include memory cells arranged in rows and columns. A row of memory cells may be associated with a word line. A column of memory cells may be associated with a bit line. The logic layer includes one or more logic circuits that can control data read operations and data write operations of the memory layers. The logic layer may also include a power interconnect, which facilitates power delivery to the memory layers, and a signal interconnect, which facilitates signal transmission within the IC device. The IC device may further include vias that couple the memory layers to the logic layer. Each via may be connected to one or more memory layers and the logic layer.
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公开(公告)号:US20250079398A1
公开(公告)日:2025-03-06
申请号:US18460817
申请日:2023-09-05
Applicant: Intel Corporation
Inventor: Sagar Suthram , Wilfred Gomes , Ravindranath Vithal Mahajan , Debendra Mallik , Pushkar Sharad Ranade , Nitin A. Deshpande , Abhishek A. Sharma
IPC: H01L25/065 , H01L23/00 , H01L23/528 , H10B80/00
Abstract: Embodiments of a microelectronic assembly may include a first integrated circuit (IC) die having a first surface, a second surface opposite the first surface, and a third surface orthogonal to the first and second surfaces, the first IC die including conductive traces that are parallel to the first and second surfaces and exposed at the third surface; a second IC die having a fourth surface and including voltage regulator circuitry; and a third IC die having a fifth surface, wherein the third surface of the first IC die is electrically coupled to the fifth surface of the third IC die by first interconnects, the fourth surface of the second IC die is electrically coupled to the fifth surface of the third IC die by second interconnects, and the first IC die is electrically coupled to the second IC die by conductive pathways in the third IC die.
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公开(公告)号:US20240222328A1
公开(公告)日:2024-07-04
申请号:US18148543
申请日:2022-12-30
Applicant: Intel Corporation
Inventor: Sagar Suthram , Wilfred Gomes , Nisha Ananthakrishnan , Kemal Aygun , Ravindranath Vithal Mahajan , Debendra Mallik , Pushkar Sharad Ranade , Abhishek A. Sharma
IPC: H01L25/065 , H01L23/522 , H01L23/528 , H01L23/532 , H10B12/00
CPC classification number: H01L25/0657 , H01L23/5226 , H01L23/5283 , H01L23/53295 , H10B12/39
Abstract: Embodiments of a microelectronic assembly include: a first integrated circuit (IC) die having a first memory circuit and a second memory circuit, a second IC die; a third IC die; and a package substrate. The first IC die comprises: a first portion comprising a first active region and a first backend region in contact with the first active region; and a second portion comprising a second active region and a second backend region in contact with the second active region. The second portion is surrounded by the first portion in plan view, the first memory circuit is in the first portion, the second memory circuit is in the second portion, the first active region comprises transistors that are larger than transistors in the second active region, and the first backend region comprises conductive traces that have a larger pitch than conductive traces in the second backend region.
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公开(公告)号:US20240088017A1
公开(公告)日:2024-03-14
申请号:US17930825
申请日:2022-09-09
Applicant: Intel Corporation
Inventor: Abhishek A. Sharma , Tahir Ghani , Wilfred Gomes , Anand S. Murthy , Pushkar Sharad Ranade , Sagar Suthram
IPC: H01L23/522 , H01L21/768 , H01L49/02
CPC classification number: H01L23/5226 , H01L21/76802 , H01L23/5223 , H01L23/5227 , H01L23/5228 , H01L28/10 , H01L28/20 , H01L28/40
Abstract: Described herein are full wafer devices that include passive devices formed in one or more interconnect layers. Interconnect layers are formed over a front side of the full wafer device. A passive device is formed using an additive process that results in a seam running through the passive device. The seam may be, for example, an air gap, a change in material structure, or a region with a different chemical makeup from the surrounding passive device. In some embodiments, the passive devices are formed in global interconnect layers coupling multiple does of the full wafer device.
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公开(公告)号:US20230422496A1
公开(公告)日:2023-12-28
申请号:US18314862
申请日:2023-05-10
Applicant: Intel Corporation
Inventor: Sagar Suthram , Tahir Ghani , Anand S. Murthy , Wilfred Gomes , Pushkar Sharad Ranade , Abhishek A. Sharma , Rishabh Mehandru
IPC: H10B41/27 , H01L27/092 , H01L29/06 , H01L29/423 , H01L29/786 , H01L23/528 , H01L23/522 , H10B41/35 , H10B41/10 , H10B43/10 , H10B43/27 , H10B43/35
CPC classification number: H10B41/27 , H01L27/092 , H01L29/0665 , H01L29/42392 , H01L29/78696 , H01L23/5283 , H01L23/5226 , H10B41/35 , H10B41/10 , H10B43/10 , H10B43/27 , H10B43/35
Abstract: IC devices with logic circuits using vertical transistors with backside source or drain (S/D) regions, and related assemblies and methods, are disclosed herein. An example vertical transistor includes an elongated structure (e.g., a nanoribbon) of one or more semiconductor materials extending between a first side (e.g., a back side) and an opposing second side (e.g., a front side) of a substrate. The first S/D region of the transistor may be provided at the first side of the substrate, while the second S/D region of the transistor may be provided at the second side, with the channel region of the transistor being the portion of the elongated structure between the first and second S/D regions. Implementing various logic circuits using vertical transistors with backside S/D regions may provide a promising way to increasing densities of transistors on the limited real estate of semiconductor chips and/or decreasing short-channel effects associated with continuous scaling of IC components.
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29.
公开(公告)号:US20230420432A1
公开(公告)日:2023-12-28
申请号:US17846173
申请日:2022-06-22
Applicant: Intel Corporation
Inventor: Sagar Suthram , Ravindranath Vithal Mahajan , Debendra Mallik , Omkar G. Karhade , Wilfred Gomes , Pushkar Sharad Ranade , Abhishek A. Sharma , Tahir Ghani , Anand S. Murthy , Nitin A. Deshpande
CPC classification number: H01L25/167 , H01L24/08 , H01L23/3107 , H01L24/80 , H01L24/94 , G02B6/4298 , H01L2224/08145 , H01L2224/80895 , H01L2224/80896
Abstract: Embodiments of an integrated circuit (IC) die comprise a first region having a first surface and a second surface, the first surface being orthogonal to the second surface; a second region comprising a semiconductor material, the second region attached to the first region along a first planar interface that is orthogonal to the first surface and parallel to the second surface; and a third region comprising optical structures of a photonic IC, the third region attached to the second region along a second planar interface that is parallel to the first planar interface. The first region comprises: a plurality of layers of conductive traces in a dielectric material, each layer of the conductive traces being parallel to the second surface such that the conductive traces are orthogonal to the first surface; and bond-pads on the first surface, the bond-pads comprising portions of respective conductive traces exposed on the first surface.
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30.
公开(公告)号:US20230420411A1
公开(公告)日:2023-12-28
申请号:US17846153
申请日:2022-06-22
Applicant: Intel Corporation
Inventor: Sagar Suthram , Ravindranath Vithal Mahajan , Debendra Mallik , Omkar G. Karhade , Wilfred Gomes , Pushkar Sharad Ranade , Abhishek A. Sharma , Tahir Ghani , Anand S. Murthy , Nitin A. Deshpande , Joshua Fryman , Stephen Morein , Matthew Adiletta
IPC: H01L25/065 , H01L23/00 , H01L25/18 , H01L25/00
CPC classification number: H01L25/0652 , H01L24/08 , H01L25/18 , H01L24/06 , H01L25/50 , H01L2224/80379 , H01L2924/05042 , H01L2924/05442 , H01L2924/059 , H01L24/05 , H01L2224/05647 , H01L2224/05567 , H01L2224/06102 , H01L2224/06183 , H01L2224/08146 , H01L2224/08137 , H01L2224/0557 , H01L24/80 , H01L24/13 , H01L2224/13025 , H01L24/16 , H01L2224/16225 , H01L2224/80006
Abstract: Embodiments of an integrated circuit (IC) die comprise: a metallization stack including a dielectric material, a plurality of layers of conductive traces in the dielectric material and conductive vias through the dielectric material; and a substrate attached to the metallization stack along a planar interface. The metallization stack comprises bond-pads on a first surface, a second surface, a third surface, a fourth surface, and a fifth surface. The first surface is parallel to the planar interface between the metallization stack and the substrate, the second surface is parallel to the third surface and orthogonal to the first surface, and the fourth surface is parallel to the fifth surface and orthogonal to the first surface and the second surface.
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