CAPITAL ASSET PLANNING SYSTEM
    21.
    发明申请
    CAPITAL ASSET PLANNING SYSTEM 审中-公开
    资本资产计划制度

    公开(公告)号:US20130138482A1

    公开(公告)日:2013-05-30

    申请号:US13479198

    申请日:2012-05-23

    IPC分类号: G06Q10/06

    CPC分类号: G06Q10/06375 G06Q40/06

    摘要: A capital asset planning system for selecting assets for improvement within an infrastructure that includes one or more data sources descriptive of the infrastructure, one or more databases, coupled to the one or more data sources, to compile the one or more data sources, one or more processors, each coupled to and having respective communication interfaces to receive data from the one or more databases. The processor includes a predictor to generate a first metric of estimated infrastructure effectiveness based, at least in part, on a current status of the infrastructure, a second metric of estimated infrastructure effectiveness based, at least in part, on a user-selected, proposed changed configuration of the infrastructure, and a net metric of infrastructure effectiveness based, at least in part, on said first metric and said second metric. The system also includes a display, coupled to have the one or more processors, for visually presenting the net metric of infrastructure effectiveness, in which the assets for improvement are selected based, at least in part, on the net metric of infrastructure effectiveness.

    摘要翻译: 一种资本资产规划系统,用于在基础设施内选择资产以进行改进,所述基础设施包括描述基础设施的一个或多个数据源,耦合到所述一个或多个数据源的一个或多个数据库,以编译所述一个或多个数据源,一个或多个数据源, 更多的处理器,每个处理器耦合到并具有各自的通信接口以从一个或多个数据库接收数据。 所述处理器包括预测器,用于至少部分地基于所述基础设施的当前状态来生成估计的基础设施有效性的第一度量,所述预测器至少部分地基于用户选择的,提出的 改变了基础设施的配置,以及至少部分地基于所述第一度量和所述第二度量的基础设施有效性的净度。 该系统还包括耦合以具有一个或多个处理器的显示器,用于可视地呈现基础设施有效性的净度量度,其中至少部分地基于基础设施有效性的净度度量来选择用于改进的资产。

    Polymeric coating of substrate processing system components for contamination control
    22.
    发明授权
    Polymeric coating of substrate processing system components for contamination control 有权
    用于污染控制的基底处理系统部件的聚合物涂层

    公开(公告)号:US08337619B2

    公开(公告)日:2012-12-25

    申请号:US12234038

    申请日:2008-09-19

    摘要: A method of treating a metal surface of a portion of a substrate processing system to lower a defect concentration near a processed surface of a substrate includes forming a protective coating on the metal surface, wherein the protective coating includes nickel (Ni) and a fluoropolymer. Forming the protective coating on the metal surface can further include forming a nickel layer on the metal surface, impregnating the nickel layer with a fluoropolymer, and removing fluoropolymer from the surface leaving a predominantly nickel surface so the fluoropolymer is predominantly subsurface. A substrate processing system includes a process chamber into which a reactant gas is introduced, a pumping system for removing material from the process chamber, a first component with a protective coating, wherein the protective coating forms a surface of the component which is exposed to an interior of the substrate processing chamber or an interior of the pumping system. The protective coating includes nickel (Ni) and a flouropolymer.

    摘要翻译: 处理基板处理系统的一部分的金属表面以降低基板的加工表面附近的缺陷浓度的方法包括在金属表面上形成保护涂层,其中保护涂层包括镍(Ni)和含氟聚合物。 在金属表面上形成保护涂层还可以包括在金属表面上形成镍层,用含氟聚合物浸渍镍层,以及从表面除去含氟聚合物,留下主要的镍表面,因此含氟聚合物主要是在下表面。 基板处理系统包括其中引入反应气体的处理室,用于从处理室中去除材料的泵送系统,具有保护涂层的第一部件,其中所述保护涂层形成暴露于所述部件的表面 衬底处理室的内部或泵送系统的内部。 保护涂层包括镍(Ni)和氟聚合物。

    Film formation apparatus and methods including temperature and emissivity/pattern compensation
    23.
    发明授权
    Film formation apparatus and methods including temperature and emissivity/pattern compensation 有权
    成膜装置及方法,包括温度和发射率/图案补偿

    公开(公告)号:US07691204B2

    公开(公告)日:2010-04-06

    申请号:US11242298

    申请日:2005-09-30

    CPC分类号: C23C16/481 C23C16/52

    摘要: A film formation system 10 has a processing chamber 15 bounded by sidewalls 18 and a top cover 11. In one embodiment, the top cover 11 has a reflective surface 13 for reflecting radiant energy back onto a substrate 19, pyrometers 405 for measuring the temperature of the substrate 19 across a number of zones, and at least one emissometer 410 for measuring the actual emissivity of the substrate 19. In another embodiment, a radiant heating system 313 is disposed under the substrate support 16. The temperature of the substrate 19 is obtained from pyrometric data from the pyrometers 405, and the emissometer 410.

    摘要翻译: 成膜系统10具有由侧壁18和顶盖11限定的处理室15.在一个实施例中,顶盖11具有用于将辐射能量反射回到基板19上的反射表面13,用于测量温度 穿过多个区域的基板19和用于测量基板19的实际发射率的至少一个辐射计410.在另一实施例中,辐射加热系统313设置在基板支撑件16下方。获得基板19的温度 来自高温计405的高温测量数据和发射计410。

    SYSTEMS AND METHODS FOR MARTINGALE BOOSTING IN MACHINE LEARNING
    24.
    发明申请
    SYSTEMS AND METHODS FOR MARTINGALE BOOSTING IN MACHINE LEARNING 有权
    在机器学习中提高机器的系统和方法

    公开(公告)号:US20080270329A1

    公开(公告)日:2008-10-30

    申请号:US12045458

    申请日:2008-03-10

    IPC分类号: G06F15/18

    CPC分类号: G06N99/005 G06K9/6256

    摘要: Boosting algorithms are provided for accelerated machine learning in the presence of misclassification noise. In an exemplary embodiment, a machine learning method having multiple learning stages is provided. Each learning stage may include partitioning examples into bins, choosing a base classifier for each bin, and assigning an example to a bin by counting the number of positive predictions previously made by the base classifier associated with the bin.

    摘要翻译: 提供增强算法用于在存在错误分类噪声的情况下加速机器学习。 在一个示例性实施例中,提供了具有多个学习阶段的机器学习方法。 每个学习阶段可以包括将示例分割成分区,为每个分组选择一个基本分类器,并且通过对与该分组相关联的基本分类器先前做出的肯定预测的数量进行计数,将一个示例分配给一个分组。

    Innervated stochastic controller for real time business decision-making support
    25.
    发明授权
    Innervated stochastic controller for real time business decision-making support 有权
    内置随机控制器实时业务决策支持

    公开(公告)号:US07395252B2

    公开(公告)日:2008-07-01

    申请号:US11349711

    申请日:2006-02-08

    IPC分类号: G06F17/00 G06N5/00

    摘要: An Innervated Stochastic Controller optimizes business decision-making under uncertainty through time. The Innervated Stochastic Controller uses a unified reinforcement learning algorithm to treat multiple interconnected operational levels of a business process in a unified manner. The Innervated Stochastic Controller generates actions that are optimized with respect to both financial profitability and engineering efficiency at all levels of the business process. The Innervated Stochastic Controller can be configured to evaluate real options. In one embodiment of the invention, the Innervated Stochastic Controller is configured to generate actions that are martingales. In another embodiment of the invention, the Innervated Stochastic Controller is configured as a computer-based learning system for training power grid operators to respond to grid exigencies.

    摘要翻译: 内在随机控制器通过时间优化不确定性下的业务决策。 内在随机控制器采用统一的强化学习算法,统一处理业务流程的多个互联操作级别。 内在随机控制器产生针对业务流程各个层面的财务盈利能力和工程效率优化的行动。 内置随机控制器可以配置为评估实际选项。 在本发明的一个实施例中,内在随机控制器被配置为产生mart的动作。 在本发明的另一个实施例中,内置随机控制器被配置为用于训练电网运营商以响应网格紧急情况的基于计算机的学习系统。

    Petroleum reservoir simulation and characterization system and method
    27.
    发明授权
    Petroleum reservoir simulation and characterization system and method 失效
    石油储层模拟与表征系统及方法

    公开(公告)号:US06826483B1

    公开(公告)日:2004-11-30

    申请号:US09687813

    申请日:2000-10-13

    IPC分类号: G01V128

    CPC分类号: G01V1/30

    摘要: A single intranet, internet, or World Wide Web-accessible interface is provided for, initiation of, interactive adjustments to, and access to the outputs of an integrated workflow of a plurality of analytical computer applications for characterization and analysis of traits and optimal management of the extraction of oil, gas, and water from a subsurface reservoir. By combining disparate analytical application tools in a seamless and remotely accessible, package, incompatibility problems caused by the disparate nature of petroleum analysis methods is reduced. The assumptions, analytic processes, and input data used for one analysis may be readily retrieved and re-evaluated for that reservoir or for future evaluations of the same or other reservoirs. Thus a flexible database of analysis tools and data may be implemented for access, input, and output of workflow and analytical data in the field, in conjunction with standard main computer servers, software and plug-ins, and portable remote computers.

    摘要翻译: 提供单个内部网,互联网或万维网可访问接口,用于对多个分析计算机应用程序的集成工作流程的输出进行交互式调整和访问,以用于表征和分析特征和最佳管理 从地下储层抽取油,气和水。 通过将不同的分析应用工具结合在一个无缝和可远程访问的包装中,减少了由石油分析方法不同性质引起的不兼容问题。 用于一次分析的假设,分析过程和输入数据可以容易地检索并重新评估该储层,或用于将来评估相同或其他储层。 因此,与标准主计算机服务器,软件和插件以及便携式远程计算机相结合,可实现分析工具和数据的灵活数据库,用于访问,输入和输出现场的工作流和分析数据。

    Gas inlets for wafer processing chamber
    28.
    发明授权
    Gas inlets for wafer processing chamber 失效
    晶圆处理室气体入口

    公开(公告)号:US06500734B2

    公开(公告)日:2002-12-31

    申请号:US09325597

    申请日:1999-06-02

    IPC分类号: H01L2120

    摘要: A system for supplying processing fluid to a substrate processing apparatus having walls, the inner surfaces of which define a processing chamber in which a substrate supporting susceptor is located. The system consists of a number of fluid storages, each which stores a separate processing fluid, at least two fluid conduits along which processing fluid flows from the fluid storages to the processing apparatus and a fluid inlet which connects the fluid conduits to the processing chamber. The inlet has a separate fluid passage, corresponding to each of the fluid conduits, formed along it. Each fluid passage opens at or near an inner surface of a wall to define a fluid mixing zone, so that fluid moving along one fluid passage is prevented from mixing with fluid moving along any other passage until reaching the mixing zone.

    摘要翻译: 一种用于向具有壁的基板处理装置提供处理流体的系统,其内表面限定了处理室,其中基板支撑基座位于该处理室中。 该系统由许多流体储存器组成,每个流体存储器存储单独的处理流体,至少两个流体管道,处理流体从该流体流体流过流体储存器至处理装置;以及流体入口,其将流体导管连接到处理室。 入口具有与沿其形成的每个流体管道相对应的单独的流体通道。 每个流体通道在壁的内表面处或附近打开以限定流体混合区,从而防止沿着一个流体通道移动的流体与沿着任何其它通道移动的流体混合直至到达混合区。

    Quartz pin lift for single wafer chemical vapor deposition/etch process chamber
    30.
    发明授权
    Quartz pin lift for single wafer chemical vapor deposition/etch process chamber 失效
    用于单晶化学气相沉积/蚀刻处理室的石英引脚提升

    公开(公告)号:US06190113B1

    公开(公告)日:2001-02-20

    申请号:US08846250

    申请日:1997-04-30

    IPC分类号: C23C1600

    CPC分类号: H01L21/68742 Y10S414/135

    摘要: A wafer support device is provided. The wafer support device includes a susceptor having a surface configured to support a bottom surface of a wafer. The susceptor has a plurality of guiding recesses. The wafer support device also includes a pin lift that has a plurality of pins extending therefrom. The plurality of pins is configured to be passed via the plurality of guiding recesses of the susceptor to engage the bottom surface of the wafer. The susceptor is configured to be moved relative to the plurality of pins in a direction substantially orthogonal to the surface of the susceptor.

    摘要翻译: 提供了晶片支撑装置。 晶片支撑装置包括具有被配置为支撑晶片的底表面的表面的基座。 基座具有多个导向凹槽。 晶片支撑装置还包括具有从其延伸的多个销的销升降器。 多个销被配置为经由基座的多个引导凹槽传递以接合晶片的底表面。 基座被构造成在基本上正交于基座的表面的方向上相对于多个销移动。