公开(公告)号：US20130078569A1

公开(公告)日：2013-03-28

申请号：US13624579

申请日：2012-09-21

Applicant: Rohm and Haas Electronic Materials LLC ,  Dow Global Technologies LLC

Inventor： Vipul Jain ,  D. Patrick Green ,  James W. Thackeray ,  Brad C. Bailey ,  Su Jin Kang

IPC: C07C69/80 ,  G03F7/20 ,  G03F7/004

CPC classification number: C07C67/29 ,  C07C69/76 ,  G03F7/0392

Abstract: A molecular glass compound comprises a vinyl ether adduct of an aromatic vinyl ether of formula C(R1)2═C(R2)—O-(L)n-Ar1, and a calix[4]arene, wherein R1 and R2 are each independently a single bond, H, C1-20 alkyl, C1-20 haloalkyl, C6-20 aryl, C6-20 haloaryl, C7-20 aralkyl, or C7-20 haloaralkyl, L is a C1-20 linking group, n is 0 or 1, and Ar1 is a halo-containing monocyclic, or substituted or unsubstituted polycyclic or fused polycyclic C6-20 aromatic-containing moiety, wherein R1 and R2 are connected to Ar1 when either or both of R1 and R2 is a single bond and n is 0. A photoresist, comprising the molecular glass compound, a solvent, and a photoacid generator, a coated substrate, comprising (a) a substrate having one or more layers to be patterned on a surface thereof; and (b) a layer of a photoresist composition over the one or more layers to be patterned, and a method of forming the molecular glass compound, are also disclosed.

Abstract translation: 分子玻璃化合物包括式C（R 1）2 = C（R 2）-O-（L）n -Ar 1的芳族乙烯基醚和杯[4]芳烃的乙烯基醚加合物，其中R 1和R 2各自 独立地单键，H，C 1-20烷基，C 1-20卤代烷基，C 6-20芳基，C 6-20卤代芳基，C 7-20芳烷基或C 7-20卤代烷基，L是C 1-20连接基团，n是0 或1，并且Ar 1是含卤素的单环或取代或未取代的多环或稠合多环C 6-20芳族部分，其中当R 1和R 2中的任一个或两个为单键时，R 1和R 2连接到Ar 1，n 包括分子玻璃化合物，溶剂和光致酸产生剂的涂覆基材，包括（a）在其表面上具有待图案化的一层或多层的基材; 和（b）一层或多层待图案化的光致抗蚀剂组合物层，以及形成分子玻璃化合物的方法。

公开(公告)号：US12276910B2

公开(公告)日：2025-04-15

申请号：US17339522

申请日：2021-06-04

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Emad Aqad ,  Brandon Wenning ,  Choong-Bong Lee ,  James W. Thackeray ,  Ke Yang ,  James F. Cameron

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/18 ,  C08F220/28 ,  G03F7/004 ,  G03F7/038

Abstract: A photoresist composition comprising: a first polymer comprising a first repeating unit comprising a hydroxy-aryl group and a second repeating unit comprising an acid-labile group; a second polymer comprising a first repeating unit comprising an acid-labile group, a second repeating unit comprising a lactone group, and a third repeating unit comprising a base-soluble group, wherein the base-soluble group has a pKa of less than or equal to 12, and wherein the base-soluble group does not comprise a hydroxy-substituted aryl group; a photoacid generator; and a solvent, wherein the first polymer and the second polymer are different from each other.

公开(公告)号：US11932713B2

公开(公告)日：2024-03-19

申请号：US16236883

申请日：2018-12-31

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Emad Aqad ,  James F. Cameron ,  James W. Thackeray

IPC: G03F7/38 ,  C07F11/00 ,  C08F230/04 ,  C09D133/04 ,  C09D133/14 ,  C09D143/00 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/09 ,  G03F7/11 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32

CPC classification number: C08F230/04 ,  C07F11/00 ,  C09D133/04 ,  C09D133/14 ,  C09D143/00 ,  G03F7/0042 ,  G03F7/038 ,  G03F7/039 ,  G03F7/091 ,  G03F7/094 ,  G03F7/11 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2004 ,  G03F7/322 ,  G03F7/38

Abstract: New monomer and polymer materials that comprise one or more Te atoms. In one aspect, tellurium-containing monomers and polymers are provided that are useful for Extreme Ultraviolet Lithography.

公开(公告)号：US20180284605A1

公开(公告)日：2018-10-04

申请号：US15475630

申请日：2017-03-31

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Emad Aqad ,  James W. Thackeray

IPC: G03F7/004 ,  C07C69/54 ,  C08F220/28 ,  G03F7/038 ,  G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32

Abstract: A monomer having formula (I): wherein in formula (I), groups and variables are the same as described in the specification.

公开(公告)号：US20170037171A1

公开(公告)日：2017-02-09

申请号：US14820699

申请日：2015-08-07

Applicant: The University of Queensland ,  Rohm and Haas Electronic Materials LLC

Inventor： James W. Thackeray ,  Ke Du ,  Peter Trefonas, III ,  Idriss Blakey ,  Andrew Keith Whittaker

IPC: C08F220/28 ,  B05D1/00 ,  G03F7/20

CPC classification number: G01N21/6428 ,  A24B1/04 ,  A24B13/00 ,  A24B15/10 ,  B05D1/005 ,  B07C5/3427 ,  B07C5/366 ,  B07C2501/0018 ,  B65G27/00 ,  C08F220/28 ,  C08F2220/281 ,  C08F2438/03 ,  C10L1/003 ,  C10N2240/56 ,  G01N21/359 ,  G01N21/55 ,  G01N21/6486 ,  G01N21/84 ,  G01N21/85 ,  G01N21/94 ,  G01N21/95 ,  G01N21/952 ,  G01N2021/6417 ,  G01N2021/6439 ,  G01N2021/646 ,  G01N2021/8411 ,  G01N2021/845 ,  G01N2021/8466 ,  G01N2021/8592 ,  G03F7/091 ,  G03F7/094 ,  G03F7/20 ,  C08F2220/286 ,  C08F2220/185 ,  C08F220/22

Abstract: A copolymer is prepared by the polymerization of monomers that include an ultraviolet absorbing monomer, and a base-solubility-enhancing monomer. The copolymer is useful for forming a topcoat layer for electron beam and extreme ultraviolet lithographies. Also described are a layered article including the topcoat layer, and an associated method of forming an electronic device.

Abstract translation: 通过包含紫外线吸收单体和碱溶性增强单体的单体的聚合制备共聚物。 该共聚物可用于形成用于电子束和极紫外光刻的顶涂层。 还描述了包括顶涂层的层状制品以及形成电子装置的相关方法。

公开(公告)号：US09405189B2

公开(公告)日：2016-08-02

申请号：US14020371

申请日：2013-09-06

Applicant: The Texas A&M University System ,  Rohm and Haas Electronic Materials LLC

Inventor： Sangho Cho ,  Guorong Sun ,  Karen L. Wooley ,  James W. Thackeray ,  Peter Trefonas, III

IPC: G03F7/039 ,  G03F7/038 ,  G03F7/004 ,  G03F7/075 ,  C08F293/00 ,  C08G61/08 ,  C09D165/00 ,  C08L65/00

CPC classification number: G03F7/039 ,  C08F293/005 ,  C08F2438/03 ,  C08G61/08 ,  C08G2261/126 ,  C08G2261/128 ,  C08G2261/1426 ,  C08G2261/3324 ,  C08G2261/418 ,  C08G2261/80 ,  C08G2261/90 ,  C08K5/17 ,  C08K5/20 ,  C08L65/00 ,  C09D165/00 ,  G03F7/0002 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0388 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/0757 ,  G03F7/0758 ,  G03F7/322 ,  G03F7/325 ,  C08F2220/185 ,  C08F220/22 ,  C08F2220/283 ,  C08L53/00

Abstract: Disclosed herein is a photoresist composition comprising a graft block copolymer; a solvent and a photoacid generator; where the graft block copolymer comprises a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises a surface energy reducing moiety that comprises a halocarbon moiety or a silicon containing moiety; and a second block polymer; the second block polymer being covalently bonded to the first block; wherein the second block comprises the backbone polymer and a second graft polymer; where the second graft polymer comprises a functional group that is operative to undergo deprotection and alter the solubility of the graft block copolymer; where the graft block copolymer has a bottle brush topology.

Abstract translation: 本文公开了包含接枝嵌段共聚物的光致抗蚀剂组合物; 溶剂和光酸产生剂; 其中所述接枝嵌段共聚物包含第一嵌段聚合物; 所述第一嵌段聚合物包含主链聚合物和第一接枝聚合物; 其中第一接枝聚合物包含表面能减少部分，其包含卤代烃部分或含硅部分; 和第二嵌段聚合物; 第二嵌段聚合物共价键合到第一嵌段; 其中所述第二嵌段包含主链聚合物和第二接枝聚合物; 其中第二接枝聚合物包含可操作以进行去保护并改变接枝嵌段共聚物的溶解度的官能团; 其中接枝嵌段共聚物具有瓶刷拓扑结构。

公开(公告)号：US20160103392A1

公开(公告)日：2016-04-14

申请号：US14833284

申请日：2015-08-24

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Paul J. LaBeaume ,  Vipul Jain ,  Suzanne M. Coley ,  James W. Thackeray ,  James F. Cameron ,  Amy M. Kwok ,  David A. Valeri

IPC: G03F7/038 ,  G03F7/20 ,  G03F7/32 ,  G03F7/16

CPC classification number: G03F7/038 ,  C07C309/12 ,  C07C381/12 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  C08F220/38 ,  G03F7/0045 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  H01L21/0274

Abstract: A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.

公开(公告)号：US20160102158A1

公开(公告)日：2016-04-14

申请号：US14833273

申请日：2015-08-24

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Paul J. LaBeaume ,  Vipul Jain ,  James W. Thackeray ,  James F. Cameron ,  Suzanne M. Coley ,  Amy M. Kwok ,  David A. Valeri

IPC: C08F28/02 ,  G03F7/32 ,  G03F7/20 ,  G03F7/004 ,  G03F7/16

CPC classification number: G03F7/0045 ,  C08F228/02 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

Abstract: A polymer includes repeat units, most of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. Each of the photoacid-generating repeat units comprises an anion and a photoacid-generating cation that collectively have structure (I) wherein q, r, R1, m, X, and Z− are defined herein. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.

Abstract translation: 聚合物包括重复单元，其中大多数是产生光致酸的重复单元。 每个产生光酸的重复单元包括光产酸功能和碱溶性增强功能。 每个产生光致酸的重复单元包括阴离子和产生光酸的阳离子，其共同具有结构（I），其中q，r，R1，m，X和Z-在本文中定义。 该聚合物可用作光致抗蚀剂组合物的组分，该组合物还包括在酸作用下在碱性显影剂中表现出溶解度变化的第二聚合物。

公开(公告)号：US20160102157A1

公开(公告)日：2016-04-14

申请号：US14833245

申请日：2015-08-24

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Vipul Jain ,  Paul J. LaBeaume ,  James W. Thackeray ,  James F. Cameron ,  Suzanne M. Coley ,  Amy M. Kwok ,  David A. Valeri

IPC: C08F22/10 ,  G03F7/32 ,  G03F7/20 ,  G03F7/004 ,  G03F7/16

CPC classification number: C08F22/10 ,  C07C309/12 ,  C07C381/12 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  C08F220/38 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/38 ,  H01L21/0274 ,  H01L21/0275

Abstract: A polymer includes repeat units, at least half of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.

Abstract translation: 聚合物包括重复单元，其中至少一半是产生光致酸的重复单元。 每个产生光酸的重复单元包括光产酸功能和碱溶性增强功能。 该聚合物可用作光致抗蚀剂组合物的组分，该组合物还包括在酸作用下在碱性显影剂中表现出溶解度变化的第二聚合物。

公开(公告)号：US20150072292A1

公开(公告)日：2015-03-12

申请号：US14020371

申请日：2013-09-06

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC ,  THE TEXAS A&M UNIVERSITY SYSTEM

Inventor： Sangho Cho ,  Guorong Sun ,  Karen L. Wooley ,  James W. Thackeray ,  Peter Trefonas, III

IPC: G03F7/039 ,  C08L53/00 ,  G03F7/038

CPC classification number: G03F7/039 ,  C08F293/005 ,  C08F2438/03 ,  C08G61/08 ,  C08G2261/126 ,  C08G2261/128 ,  C08G2261/1426 ,  C08G2261/3324 ,  C08G2261/418 ,  C08G2261/80 ,  C08G2261/90 ,  C08K5/17 ,  C08K5/20 ,  C08L65/00 ,  C09D165/00 ,  G03F7/0002 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0388 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/0757 ,  G03F7/0758 ,  G03F7/322 ,  G03F7/325 ,  C08F2220/185 ,  C08F220/22 ,  C08F2220/283 ,  C08L53/00

Abstract: Disclosed herein is a photoresist composition comprising a graft block copolymer; a solvent and a photoacid generator; where the graft block copolymer comprises a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises a surface energy reducing moiety that comprises a halocarbon moiety or a silicon containing moiety; and a second block polymer; the second block polymer being covalently bonded to the first block; wherein the second block comprises the backbone polymer and a second graft polymer; where the second graft polymer comprises a functional group that is operative to undergo deprotection and alter the solubility of the graft block copolymer; where the graft block copolymer has a bottle brush topology.

Abstract translation: 本文公开了包含接枝嵌段共聚物的光致抗蚀剂组合物; 溶剂和光酸产生剂; 其中所述接枝嵌段共聚物包含第一嵌段聚合物; 所述第一嵌段聚合物包含主链聚合物和第一接枝聚合物; 其中第一接枝聚合物包含表面能减少部分，其包含卤代烃部分或含硅部分; 和第二嵌段聚合物; 第二嵌段聚合物共价键合到第一嵌段; 其中所述第二嵌段包含主链聚合物和第二接枝聚合物; 其中第二接枝聚合物包含可操作以进行脱保护并改变接枝嵌段共聚物的溶解度的官能团; 其中接枝嵌段共聚物具有瓶刷拓扑结构。