公开(公告)号：US10151978B2

公开(公告)日：2018-12-11

申请号：US15517505

申请日：2014-11-18

Applicant: Seagate Technology LLC

Inventor： XiaoMin Yang ,  Shuaigang Xiao ,  Kim Y. Lee ,  David S. Kuo

IPC: G03F7/11 ,  G03F7/40 ,  H01L21/027 ,  G03F7/16 ,  C08L53/00 ,  B81C1/00 ,  G03F7/00 ,  G03F7/09 ,  G03F7/20

Abstract: Provided herein is a method, including creating a first layer over a substrate, wherein the first layer is configured for directed self-assembly of a block copolymer thereover; creating a continuous second layer over the first layer by directed self-assembly of a block copolymer, wherein the second layer is also configured for directed self-assembly of a block copolymer thereover; and creating a third layer over the continuous second layer by directed self-assembly of a block copolymer. Also provided is an apparatus, comprising a continuous first layer comprising a thin film of a first, phase-separated block copolymer, wherein the first layer comprises a first chemoepitaxial template configured for directed self-assembly of a block copolymer thereon; and a second layer on the first layer, wherein the second layer comprises a thin film of a second, phase-separated block copolymer.

公开(公告)号：US09934806B2

公开(公告)日：2018-04-03

申请号：US15403040

申请日：2017-01-10

Applicant: Seagate Technology LLC

Inventor： Shuaigang Xiao ,  David S. Kuo ,  XiaoMin Yang ,  Kim Y. Lee ,  Yautzong Hsu ,  Koichi Wago

IPC: G11B5/596 ,  G11B20/12

CPC classification number: G11B5/59638 ,  G11B5/59655 ,  G11B5/746 ,  G11B5/84 ,  G11B5/855 ,  G11B20/1217 ,  G11B2020/1281

Abstract: Provided herein is a method, including creating a first pattern in a data region of a substrate, and creating a second pattern in a servo region of a substrate. A circumferential line pattern is created overlapping the first pattern to create rectangle-shaped protrusions in the data region of the substrate. A chevron pattern is created overlapping the second pattern to create chevron-derived protrusions in the servo region of the substrate.

公开(公告)号：US09865294B2

公开(公告)日：2018-01-09

申请号：US15233277

申请日：2016-08-10

Applicant: Seagate Technology LLC

Inventor： ShuaiGang Xiao ,  XiaoMin Yang ,  David S. Kuo ,  Kim Yang Lee ,  Yautzong Hsu

IPC: G11B5/855 ,  G11B5/596 ,  G11B20/12

CPC classification number: G11B5/855 ,  G11B5/59633 ,  G11B20/1217 ,  G11B2020/1281

Abstract: Provided herein is a method including forming a data zone guiding pattern and forming a servo zone guiding pattern. A servo pattern and a data pattern are simultaneously formed. Directed self-assembly of block copolymers is guided by the data zone guiding pattern and the servo zone guiding pattern.

公开(公告)号：US09773520B2

公开(公告)日：2017-09-26

申请号：US14158611

申请日：2014-01-17

Applicant: Seagate Technology LLC

Inventor： XiaoMin Yang ,  Shuaigang Xiao ,  Yautzong Hsu ,  HongYing Wang ,  Kim Y. Lee

IPC: G03F7/20 ,  H01L21/28 ,  G11B5/855 ,  G03F7/00

CPC classification number: G11B5/855 ,  G03F7/0002

Abstract: The embodiments disclose a method of using a trimmed imprinted resist and chemical contrast pattern to guide a directed self-assembly (DSA) of a predetermined lamellar block copolymer (BCP), creating chromium (Cr) lamellar guiding lines using the BCP and DSA in a dry Cr lift-off process and etching the Cr lamellar guiding line patterns into a substrate to fabricate the imprint template.

公开(公告)号：US09638995B2

公开(公告)日：2017-05-02

申请号：US14199889

申请日：2014-03-06

Applicant: Seagate Technology LLC

Inventor： René van de Veerdonk ,  XiaoMin Yang ,  Kim Lee ,  Justin Hwu

IPC: G03F7/00 ,  B82Y10/00 ,  G11B5/74 ,  G11B5/855

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  G11B5/746 ,  G11B5/855

Abstract: The embodiments disclose a method including depositing a resist layer using a mixture of several different length polymer strings materials spanning a range of natural periodicity, and imprinting the mixture of several different length polymer strings using sheared guiding patterns to increase flexibility.

公开(公告)号：US09626996B2

公开(公告)日：2017-04-18

申请号：US14588865

申请日：2015-01-02

Applicant: Seagate Technology LLC

Inventor： XiaoMin Yang ,  Zhaoning Yu ,  Kim Yang Lee ,  Michael Feldbaum ,  Yautzong Hsu ,  Wei Hu ,  Shuaigang Xiao ,  Henry Yang ,  HongYing Wang ,  Rene Johannes Marinus van de Veerdonk ,  David Kuo

IPC: G03F7/004 ,  G11B5/855 ,  H01L21/3065 ,  G03F7/40 ,  H01L21/027 ,  G03F7/20 ,  H01L21/02 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/00 ,  B81C1/00 ,  B32B27/36 ,  B32B27/28 ,  B32B27/30 ,  B32B3/30 ,  G03F7/16 ,  B05D1/00 ,  C23F4/00

CPC classification number: G11B5/855 ,  B05D1/005 ,  B32B3/30 ,  B32B27/283 ,  B32B27/302 ,  B32B27/308 ,  B32B27/36 ,  B32B2457/14 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y40/00 ,  C23F4/00 ,  G03F7/0002 ,  G03F7/0035 ,  G03F7/165 ,  G03F7/2022 ,  G03F7/203 ,  G03F7/2059 ,  G03F7/40 ,  H01L21/02112 ,  H01L21/0274 ,  H01L21/3065 ,  Y10T428/24612

Abstract: Provided herein is a method, including a) transferring an initial pattern of an initial template to a substrate; b) performing block copolymer self-assembly over the substrate with a density multiplication factor k; c) creating a subsequent pattern in a subsequent template with the density multiplication factor k; and d) repeating steps a)-c) with the subsequent template as the initial template until a design specification for the subsequent pattern with respect to pattern density and pattern resolution is met.

公开(公告)号：US09299609B2

公开(公告)日：2016-03-29

申请号：US14339052

申请日：2014-07-23

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： XiaoMin Yang ,  Shuaigang Xiao ,  Yautzong Hsu ,  Zhaoning Yu ,  Kim Y. Lee ,  David S. Kuo

IPC: H01L21/66 ,  G01R31/26 ,  H01L21/768

CPC classification number: H01L21/0338 ,  G03F7/0002 ,  G11B5/746 ,  H01L21/0332 ,  H01L21/0335 ,  H01L21/0337

Abstract: Provided is an apparatus that includes a substrate; a first hard-mask pattern that includes a number of first features disposed over a top surface of the substrate; and a second hard-mask pattern disposed over the first hard-mask layer. The second hard-mask pattern includes a number of second features overlapping one or more of the first features.

Abstract translation: 提供一种包括基板的装置; 第一硬掩模图案，其包括设置在所述基板的顶表面上的多个第一特征; 以及设置在第一硬掩模层上的第二硬掩模图案。 第二硬掩模图案包括与第一特征中的一个或多个重叠的多个第二特征。

公开(公告)号：US20160027681A1

公开(公告)日：2016-01-28

申请号：US14339052

申请日：2014-07-23

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： XiaoMin Yang ,  Shuaigang Xiao ,  Yautzong Hsu ,  Zhaoning Yu ,  Kim Y. Lee ,  David S. Kuo

IPC: H01L21/768

CPC classification number: H01L21/0338 ,  G03F7/0002 ,  G11B5/746 ,  H01L21/0332 ,  H01L21/0335 ,  H01L21/0337

Abstract: Provided is an apparatus that includes a substrate; a first hard-mask pattern that includes a number of first features disposed over a top surface of the substrate; and a second hard-mask pattern disposed over the first hard-mask layer. The second hard-mask pattern includes a number of second features overlapping one or more of the first features.

Abstract translation: 提供一种包括基板的装置; 第一硬掩模图案，其包括设置在所述基板的顶表面上的多个第一特征; 以及设置在第一硬掩模层上的第二硬掩模图案。 第二硬掩模图案包括与第一特征中的一个或多个重叠的多个第二特征。

公开(公告)号：US20150294680A1

公开(公告)日：2015-10-15

申请号：US14251303

申请日：2014-04-11

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： XiaoMin Yang ,  Shuaigang Xiao ,  Kim Y. Lee ,  Koichi Wago ,  Philip Steiner

IPC: G11B5/84

CPC classification number: G11B5/746 ,  G03F7/0002 ,  G11B5/855

Abstract: The embodiments disclose a method including patterning a template substrate to have different densities using hierarchical block copolymer density patterns in different zones including a first pattern and a second pattern, using a first directed self-assembly to pattern a first zone in the substrate using a first block copolymer material, and using a second directed self-assembly to pattern a second zone in the substrate using a second block copolymer material.

Abstract translation: 实施方案公开了一种方法，其包括使用第一定向自组装使用第一和第二图案在第一图案和第二图案中分层嵌段共聚物密度图案在不同区域中图案化模板基底以具有不同的密度，以使用第一 嵌段共聚物材料，并且使用第二定向自组装来使用第二嵌段共聚物材料在基材中图案化第二区域。

公开(公告)号：US09079216B2

公开(公告)日：2015-07-14

申请号：US13798087

申请日：2013-03-13

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： Shuaigang Xiao ,  XiaoMin Yang ,  Yautzong Hsu ,  HongYing Wang ,  Kim Lee

IPC: B44C1/22 ,  C23F1/00 ,  G11B5/65 ,  B05D3/10 ,  B05D3/00 ,  B05C21/00 ,  G03F7/20 ,  G11B5/74 ,  G11B5/855 ,  H01L21/02 ,  H01L21/3065

CPC classification number: B05D3/107 ,  B05C21/005 ,  B05D3/007 ,  G03F7/20 ,  G11B5/746 ,  G11B5/855 ,  H01L21/02112 ,  H01L21/3065 ,  Y10T428/24802

Abstract: The embodiments disclose a method of fabricating servo integrated templates including depositing a protective layer on servo zone resist layer patterns, patterning integrated data zone features into a substrate, depositing a protective layer on data zones and removing the servo zone protective layer and patterning integrated servo zone features into the substrate and removing the data zone protective layer creating a substrate template used in fabricating data and servo zone integrated patterned stacks.

Abstract translation: 这些实施例公开了一种制造伺服集成模板的方法，包括在伺服区抗蚀剂层图案上沉积保护层，将集成的数据区特征图案化成衬底，在数据区上沉积保护层并移除伺服区保护层， 特征进入衬底并移除数据区保护层，形成用于制造数据和伺服区集成图案化堆叠的衬底模板。