公开(公告)号：US08911926B2

公开(公告)日：2014-12-16

申请号：US13857554

申请日：2013-04-05

Applicant: Samsung Display Co., Ltd.

Inventor： Jeong-Won Kim ,  Min Kang ,  Bong-Yeon Kim ,  Jin-Ho Ju ,  Dong-Min Kim ,  Tae-Gyun Kim ,  Joo-Kyoung Park ,  Chul-Won Park ,  Jun-Hyuk Woo ,  Won-Young Lee ,  Hyun-Joo Lee ,  Eun Jeagal

IPC: G03C1/52 ,  G03F7/022 ,  G03F7/00 ,  B21B27/10 ,  B05D3/10 ,  B21B45/02

CPC classification number: G03F7/022 ,  B05D3/107 ,  B21B27/10 ,  B21B45/02 ,  G03F7/00 ,  G03F7/0045 ,  G03F7/40

Abstract: A method of forming a metal pattern is disclosed. In the method, a metal layer is formed on a base substrate. A photoresist composition is coated on the metal layer to form a coating layer. The photoresist composition includes a binder resin, a photo-sensitizer, a mercaptopropionic acid compound and a solvent. The coating layer is exposed to a light. The coating layer is partially removed to form a photoresist pattern. The metal layer is patterned by using the photoresist pattern as a mask.

Abstract translation: 公开了一种形成金属图案的方法。 在该方法中，在基底基板上形成金属层。 将光致抗蚀剂组合物涂覆在金属层上以形成涂层。 光致抗蚀剂组合物包括粘合剂树脂，光敏剂，巯基丙酸化合物和溶剂。 涂层被曝光。 部分去除涂层以形成光致抗蚀剂图案。 通过使用光致抗蚀剂图案作为掩模来对金属层进行构图。

公开(公告)号：US08691479B1

公开(公告)日：2014-04-08

申请号：US13779482

申请日：2013-02-27

Applicant: Samsung Display Co., Ltd.

Inventor： Bong-Yeon Kim ,  Min Kang ,  Jeong Won Kim ,  Jin Ho Ju ,  Jun Hyuk Woo ,  Hyun Joo Lee

IPC: G03F1/32

CPC classification number: G03F1/32 ,  G03F1/38

Abstract: An optical mask for forming a pattern is provided. The optical mask includes: a substrate including a light blocking pattern formed on portions of the substrate, wherein the light blocking pattern includes a halftone layer and a light blocking layer formed on the halftone layer, and the halftone layer and the light blocking layer overlap such that at least an edge portion of the halftone layer is exposed. A pitch of the light blocking pattern may about 6 μm, and a transmission ratio of the halftone layer may range from about 10% to about 50%.

公开(公告)号：US09733569B2

公开(公告)日：2017-08-15

申请号：US14697068

申请日：2015-04-27

Applicant: SAMSUNG DISPLAY CO. LTD.

Inventor： Yong Son ,  Min Kang ,  Bong-Yeon Kim ,  Hyun-Joo Lee ,  Jin-Ho Ju

IPC: G03F1/38 ,  G03F7/32 ,  G02B5/18 ,  G03F7/00 ,  G03F7/16 ,  G03F7/20

CPC classification number: G03F7/32 ,  G02B5/1866 ,  G03F1/38 ,  G03F7/0007 ,  G03F7/16 ,  G03F7/20 ,  G03F7/2053

Abstract: A mask includes a transparent substrate and a light blocking pattern. The light blocking pattern includes a light blocking part and a diffraction pattern. The light blocking part is disposed on the transparent substrate and is configured to block light. The diffraction pattern includes a plurality of protrusion parts and is configured to diffract the light. The plurality of protrusion parts protrudes from a side of the blocking part and is separated from each other.

公开(公告)号：US20170192348A1

公开(公告)日：2017-07-06

申请号：US15464228

申请日：2017-03-20

Applicant: Samsung Display Co., Ltd.

Inventor： DongEon Lee ,  Min Kang ,  Bong Yeon Kim ,  Yong Son ,  Junhyuk Woo ,  Hyunjoo Lee ,  Jinho Ju

IPC: G03F1/30 ,  G03F9/00 ,  G03F7/20

CPC classification number: G03F1/30 ,  G03F1/26 ,  G03F7/2002 ,  G03F7/2008 ,  G03F7/70191 ,  G03F7/70283 ,  G03F9/7003 ,  G03F9/7007

Abstract: A method of forming a pattern includes: preparing a target substrate including a photoresist layer on a base substrate; aligning a phase shift mask to the target substrate, the phase shift mask including a mask substrate comparted into a first region including a first sub region and second sub regions at sides of the first sub region, and second regions at sides of the first region, the phase shift mask including a phase shift layer on the mask substrate corresponding to the first region; fully exposing the photoresist layer at the first sub region and the second regions by utilizing the phase shift mask; and removing the photoresist layer at the first sub region and the second regions to form first and second photoresist patterns corresponding to the second sub regions. Transmittance of the phase shift layer is selected to fully expose the photoresist layer in the first sub region.

公开(公告)号：US09417516B2

公开(公告)日：2016-08-16

申请号：US14794079

申请日：2015-07-08

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Bongyeon Kim ,  Min Kang ,  Yong Son ,  Hyunjoo Lee ,  Myounggeun Cha ,  Jinho Ju

IPC: H01L21/00 ,  G03F1/26 ,  G03F7/20 ,  H01L21/02

CPC classification number: H01L21/0268 ,  G03F1/30 ,  G03F7/0043 ,  G03F7/20 ,  H01L21/02532 ,  H01L21/02678

Abstract: Provided is a method of manufacturing a display apparatus, the method including forming an amorphous silicon layer on a substrate; changing amorphous silicon in the amorphous silicon layer into crystalline silicon by irradiating the amorphous silicon with a laser beam emitted through a phase shift mask; and forming a display device, the phase shift mask including a base substrate; a barrier layer on the base substrate and including a plurality of transmissive portions which are spaced apart from each other in a first direction; and phase shift portions which alternately fill the plurality of transmissive portions in the first direction.

Abstract translation: 提供一种制造显示装置的方法，所述方法包括在基板上形成非晶硅层; 通过用通过相移掩模发射的激光束照射非晶硅，将非晶硅层中的非晶硅变成晶体硅; 以及形成显示装置，所述相移掩模包括基底基板; 在所述基底基板上的阻挡层，并且包括在第一方向上彼此间隔开的多个透射部; 以及在第一方向交替地填充多个透射部的相移部。

公开(公告)号：US09389515B2

公开(公告)日：2016-07-12

申请号：US14677823

申请日：2015-04-02

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jeong Won Kim ,  Jin Ho Ju ,  Jong Kwang Lee ,  Min Kang ,  Tae Gyun Kim

IPC: G03F7/027 ,  G03F7/40 ,  G03F7/022 ,  G03F7/023 ,  G02F1/1343 ,  G03F7/30

CPC classification number: G03F7/40 ,  G02F1/134309 ,  G02F1/13439 ,  G03F7/0226 ,  G03F7/023 ,  G03F7/30

Abstract: A method for forming a pattern includes forming a photosensitive film by coating a photosensitive resin composition on a substrate, exposing the photosensitive film to light through a mask that includes a light transmission region and a non-light transmission region, coating a developing solution on the photosensitive film, and forming a photosensitive film pattern by baking the photosensitive film, wherein the photosensitive resin composition includes an alkali soluble base resin, a photoacid generator and a photoactive compound.

公开(公告)号：US20160170294A1

公开(公告)日：2016-06-16

申请号：US14691530

申请日：2015-04-20

Applicant: Samsung Display Co., Ltd.

Inventor： Yong SON ,  Min Kang ,  Bong Yeon Kim ,  Hyun Joo Lee ,  Jin Ho Ju

IPC: G03F1/26 ,  G03F7/20 ,  G03F7/40 ,  G03F1/76

CPC classification number: G03F1/54 ,  G03F1/32

Abstract: A phase shift mask enables much smaller scale of electronic circuit pattern. A phase shift mask comprises a transparent substrate, a phase shift pattern arranged on the transparent substrate to change a phase of light that penetrates the transparent substrate, and a metal coating layer arranged on at least a part of a surface of the phase shift pattern.

Abstract translation: 相移掩模可实现更小规模的电子电路图案。 相移掩模包括透明基板，布置在透明基板上以改变穿透透明基板的光的相位的相移图案，以及布置在相移图案的表面的至少一部分上的金属涂层。

公开(公告)号：US09069258B2

公开(公告)日：2015-06-30

申请号：US13835567

申请日：2013-03-15

Applicant: Samsung Display Co., LTD.

Inventor： Bong-Yeon Kim ,  Min Kang ,  Seung-Bo Shim ,  Jong-kwang Lee ,  Jin-Ho Ju ,  Jeong-Won Kim ,  Tae-Gyun Kim ,  Chul-Won Park ,  Jun-Hyuk Woo ,  Hyun-Joo Lee

IPC: G03F1/42

CPC classification number: G03F1/42

Abstract: A mask may include a circuit area and a pixel area. The circuit area includes a circuit pattern. The pixel area includes a pixel pattern which is extended in a length direction and an assist pattern which is at an end portion of the pixel pattern and adjacent to the circuit area.

Abstract translation: 掩模可以包括电路区域和像素区域。 电路区域包括电路图案。 像素区域包括在长度方向上延伸的像素图案和处于像素图案的端部并且与电路区域相邻的辅助图案。