Abstract:
A CCD amplifier circuit including an active load type source-grounded inverting amplifier circuit which includes a driving MOS transistor, an active load MOS transistor connected to the driving MOS transistor, and a control circuit. The control circuit controls the voltage at the gate electrode of the active load MOS transistor with a control signal of low output impedance which is substantially inversely proportional to the drain-source voltage of the active load MOS transistor and level-shifted by a predetermined voltage. Further, a CCD delay line includes a floating diffusion region of predetermined impurities formed at an end of a charge-coupled device with a gate section having a predetermined fixed gate voltage, and a switched capacitor integrator for detecting the injection charge of the floating diffusion region to detect signal charges transferred to the floating diffusion region from the charge-coupled device. The CCD amplifier circuit is employed as an output circuit of the switched capacitor integrator.
Abstract:
A phase difference-detecting apparatus for detecting a relative distance between a pair of focused images obtained from a subject luminous flux passed through an objective lens to thereby judge a focusing state of the objective lens. The apparatus includes a pair of signal generating sections which receive the subject flux and provide first and second time series signals. A switching-capacitor integrator is provided including a plurality of capacitive elements and switching elements for intermittently connecting the capacitive elements to each other, and for receiving the first and second time series signals. A control device compares the sizes of the first and second time series signals with each other to thereby generate a control signal corresponding to a relation of size between the first and second time series signals. The switching elements are controlled on the basis of the control signal to cause the switching-capacitor integrator to generate an electric charge corresponding to an integrated value of an absolute value of a difference between the first and second time series signals, and to cause the switching-capacitor integrator to generate, as a correlation value, an integrated value on the basis of the first and second time series signals in predetermined numbers whenever the quantity of relative movement is changed. The switching-capacitor integrator includes a gain control including a plurality of switchable capacitances.
Abstract:
A horizontal transfer section for a solid state image-pickup matrix, in which the parallel signals are first read by a first horizontal CCD. A second horizontal CCD is aligned in parallel with the first one and having a deeper potential well. A gate electrode separates the two CCDs. Thereby, the gate electrode can transfer charges from the first to the second CCD and the first CCD can be refilled with different signals. The two horizontal CCDs can be serially read out by common clocking signals.
Abstract:
A nonvolatile semiconductor memory device including at least one memory cell which comprises a floating-gate, a control gate and a single impurity diffusion region formed exclusively for the memory cell. In this device, a small depletion region and a large depletion region due to the charged and discharged state of the floating-gate represent the information "1" and "0".
Abstract:
A semiconductor memory has plural cell transistors that are arranged in a matrix. The cell transistor comprises a silicon substrate, a control gate, a pair of electrically isolated floating gates. Plural projections are formed in the P type silicon substrate, and a pair of N type diffusion regions as the source and the drain is formed in both sides of the projection. The control gate faces the projection via a fourth insulation layer. The side surface of the floating gates faces the side surfaces of the projection via a first insulation layer, and faces the control gate via a third insulation layer. The floating gate faces the diffusion region via the first insulation layer.
Abstract:
A cell transistor includes source/drain regions formed at a lower level than part of its channel region. A select transistor has a channel region and source/drain regions formed at substantially the same level as the source/drain regions of the cell transistor. One of the source/drain regions of the cell transistor and one of the source/drain regions of the select transistor are electrically interconnected to each other in substantially the same plane.
Abstract:
A cell transistor includes source/drain regions formed at a lower level than part of its channel region. A select transistor has a channel region and source/drain regions formed at substantially the same level as the source/drain regions of the cell transistor. One of the source/drain regions of the cell transistor and one of the source/drain regions of the select transistor are electrically interconnected to each other in substantially the same plane.
Abstract:
A multiple-bit transistor includes P type semiconductor including a projection, a gate insulation layer, a pair of N type source/drain regions, tunnel insulation layers, a pair of floating gates, inter-polycrystalline insulation layers, and a control gate. The root portion of the projection, which is defined by a straight line virtually connecting the source/drain regions, is higher in the concentration of the P type impurity than the other portion. A potential difference for write-in is set up between the source/drain regions while a write voltage is applied to the control gate, thereby causing electrons to be ballistically injected into at least one of the floating gates.
Abstract:
A sole state imaging device includes a photodetection diode and an insulated gate field effect transistor provided adjacent to the photodetection diode for optical signal detection. In a method of making the device, a carrier pocket is formed in a second well region, and an element isolation insulating film is formed to isolate adjacent unit pixels from each other. In addition, an element isolation region of an opposite conductivity type is formed to isolate a second semiconductor layer of one conductivity type in such a way as to include the lower surface of the element isolation insulating film and reach a first semiconductor layer.
Abstract:
Disclosed is a solid state imaging device, comprising: a photodetection diode; and an insulated gate field effect transistor provided adjacent to the photodetection diode for optical signal detection. In this case, a carrier pocket is provided in a second well region, and an element isolation insulating film is formed to isolate adjacent unit pixels from each other. In addition, an element isolation region of an opposite conductivity type is formed to isolate a second semiconductor layer of one conductivity type in such a way as to include the lower surface of the element isolation insulating film and reach a first semiconductor layer.