摘要:
There is provided a method of fabrication a storage capacitor. A bottom semiconductor film having an electrical conductivity if formed for subsequent formation of a phase splitting glass film on the bottom semiconductor film. The phase splitting glass film is subjected to a heat treatment to allow the phase splitting glass film to be split into at least two different glass films which have different components. The phase splitting glass film is subjected to an etching in which one of the glass films has a higher etching rate than an etching rate of another of the glass films so that the one glass film having the higher etching rate only is removed, while the another glass film remains thereby a mask pattern comprising the remaining another glass film is formed. The bottom semiconductor film is subjected to a dry etching using the mask to form trench grooves defined by trench pillars in the bottom semiconductor film. A dielectric film is formed on surfaces of the trench grooves and trench pillars. A top semiconductor film having an electrical conductivity is formed on the dielectric film.
摘要:
One semiconductor device includes a capacitor having a lower electrode which is arranged on a semiconductor substrate, a second protective film, a dielectric film which has a defect that extends in the film thickness direction from an upper surface that faces the second protective film, a third protective film which has at least a defect filling film that is formed of an insulating body filling the defect, a first protective film which covers the dielectric film and the third protective film, and an upper electrode which covers the first protective film.
摘要:
This disclosure provides a method of fabricating a semiconductor stack and associated device, such as a capacitor and DRAM cell. In particular, a bottom electrode has a material selected for lattice matching characteristics. This material may be created from a relatively inexpensive metal oxide which is processed to adopt a conductive, but difficult-to-produce oxide state, with specific crystalline form; to provide one example, specific materials are disclosed that are compatible with the growth of rutile phase titanium dioxide (TiO2) for use as a dielectric, thereby leading to predictable and reproducible higher dielectric constant and lower effective oxide thickness and, thus, greater part density at lower cost.
摘要:
According to one embodiment, an apparatus includes a first antenna corresponding to a frequency band not higher than a predetermined frequency, a second antenna corresponding to a frequency band higher than the predetermined frequency, a first cable includes one end connected to the first antenna, a second cable includes one end connected to the second antenna, a first mixer/distributor connected to another end of the first cable and another end of the second cable, a third cable includes one end connected to the first mixer/distributor, and a wireless communication module connected to another end of the third cable, wherein the first mixer/distributor is configured to mix a first signal received by the first antenna and a second signal received by the second antenna, and to output a mixed signal to the third cable, and the wireless communication module is configured to receive the mixed signal via the third cable.
摘要:
Information equipment according to an embodiment includes a display housing with a display unit, a first radio communication antenna disposed at an end part of the display housing, a second radio communication antenna using a frequency band adjacent to or overlapped with that of the first radio communication antenna, and a third radio communication antenna disposed at an end part between the first and the second radio communication antennas, and uses a frequency band not adjacent to nor overlapped with those of the first and the second radio communication antennas.
摘要:
The object of the present invention is to embed an insulating film in a hole having a high aspect ratio and a small width without the occurrence of a void. The thickness of a polishing stopper layer is reduced by making separate layers respectively serve as a mask during forming the hole in a semiconductor substrate, and a stopper during removing the insulating film filled in the hole.
摘要:
According to one embodiment, an information processing apparatus includes an antenna, a switch circuit, a wireless communication module and a resonance frequency controller. The switch circuit is configured to switch a resonance frequency band of the antenna between a first resonance frequency band and a second resonance frequency band. The wireless communication module is configured to execute wireless communication by use of the first resonance frequency band and wireless communication by use of the second resonance frequency band. The resonance frequency controller is configured to control the switch circuit in order to set the resonance frequency band of the antenna to one of the first resonance frequency band and the second resonance frequency band based on status information indicating an execution state of wireless communication by use of the wireless communication module. The resonance frequency controller acquires the status information from the wireless communication module.
摘要:
A hole pattern forming method that forms a fine hole pattern in a work target layer that is formed on a semiconductor substrate, includes: forming a three-layer structure by laminating a carbon film layer, an intermediate mask layer, and a photoresist layer in that order on the work target layer; after patterning a hole pattern in the photoresist layer, patterning the hole pattern in the intermediate mask layer with the patterned photoresist layer serving as a mask; forming a sidewall oxide film on exposed portions of the photoresist layer, the intermediate mask layer, and the carbon film layer; forming a sidewall portion that includes the sidewall oxide film on inner wall surfaces of the hole pattern by etching back the sidewall oxide film; and after patterning a fine hole pattern in the carbon film layer with the sidewall portion and the intermediate mask layer serving as a mask, patterning the fine hole pattern in the work target layer with the patterned carbon film layer serving as a mask.
摘要:
A method for manufacturing a semiconductor device includes forming a first interlayer insulating film over a semiconductor substrate; forming a first opening in the first interlayer insulating film; forming a second interlayer insulating film on the first interlayer insulating film such that the first opening is not filled; and forming a second opening in the second interlayer insulating film such that the second opening is connected to the first opening.
摘要:
According to one embodiment, an information processing apparatus includes a display unit. A display portion is provided in the display unit. Antennas are provided in the display unit. The antennas include a first antenna which serves as a transmitting antenna and a second antenna which serves as a receiving antenna. An antenna switching unit makes, when the display unit is used in a state where the first antenna is located in a side of the display unit which side is closest to a user, the first antenna serve as the receiving antenna, and the second antenna serve as the transmitting antenna.