Methods and apparatus for high-throughput formation of nano-scale arrays
    24.
    发明授权
    Methods and apparatus for high-throughput formation of nano-scale arrays 有权
    用于高通量形成纳米级阵列的方法和装置

    公开(公告)号:US09493022B2

    公开(公告)日:2016-11-15

    申请号:US13389113

    申请日:2010-08-05

    CPC classification number: B41M3/006 B81C1/00031 B81C2201/0184 B81C2201/0187

    Abstract: An apparatus for forming an array of deposits on a substrate is disclosed. The apparatus may include a stencil capable of releasable attached to the substrate and having an array of openings and at least one alignment mark. The apparatus may further include a high throughput deposition printer aligned with the stencil to form an array of deposits on the substrate. The array of deposits may be aligned with the array of openings through the at least one alignment mark and an optional alignment device. Methods of manufacturing the stencil and using it to generate multiplexed or combinatorial arrays are also disclosed.

    Abstract translation: 公开了一种用于在衬底上形成沉积物阵列的装置。 该装置可以包括能够可释放地附接到基底并具有开口阵列和至少一个对准标记的模版。 该装置还可以包括与模板对准的高通量沉积打印机,以在衬底上形成沉积物阵列。 沉积物阵列可以与通过至少一个对准标记的开口阵列和可选的对准装置对齐。 还公开了制造模板并将其用于生成多路复用或组合阵列的方法。

    SWITCH AND METHOD FOR MANUFACTURING THE SAME, AND RELAY
    26.
    发明申请
    SWITCH AND METHOD FOR MANUFACTURING THE SAME, AND RELAY 审中-公开
    开关及其制造方法和继电器

    公开(公告)号:US20140034465A1

    公开(公告)日:2014-02-06

    申请号:US13961279

    申请日:2013-08-07

    Abstract: A switch and a relay include a contact with a smooth contacting surface. A side surface of a fixed contact faces a side surface of a movable contact. The fixed contact has an insulating layer and a base layer stacked on a fixed contact substrate, and a first conductive layer formed thereon through electrolytic plating. The side surface of the first conductive layer that faces the movable contact becomes the fixed contact (contacting surface). The movable contact has an insulating layer and a base layer stacked on the movable contact substrate, and a movable contact formed thereon through electrolytic plating. A side surface of a second conductive layer that faces the fixed contact becomes the movable contact (contacting surface). The fixed contact and the movable contact have surfaces that contact the side surfaces of the mold portion when growing the first and second conductive layers through electrolytic plating.

    Abstract translation: 开关和继电器包括具有光滑接触表面的触点。 固定触点的侧表面面对活动触点的侧表面。 固定触点具有层叠在固定接触基板上的绝缘层和基层,以及通过电解电镀形成在其上的第一导电层。 第一导电层的面对可动触点的侧表面成为固定触点(接触面)。 可动触头具有堆叠在可动触点基板上的绝缘层和基极层,以及通过电解电镀形成的可动触点。 面对固定触点的第二导电层的侧表面成为可动触头(接触面)。 固定触点和可动触点具有通过电解电镀生长第一和第二导电层时与模具部分的侧表面接触的表面。

    Methods and Apparatus for High-Throughput Formation of Nano-Scale Arrays
    28.
    发明申请
    Methods and Apparatus for High-Throughput Formation of Nano-Scale Arrays 有权
    纳米尺度阵列高通量形成的方法与装置

    公开(公告)号:US20120180676A1

    公开(公告)日:2012-07-19

    申请号:US13389113

    申请日:2010-08-05

    CPC classification number: B41M3/006 B81C1/00031 B81C2201/0184 B81C2201/0187

    Abstract: An apparatus for forming an array of deposits on a substrate is disclosed. The apparatus may include a stencil capable of releasable attached to the substrate and having an array of openings and at least one alignment mark. The apparatus may further include a high throughput deposition printer aligned with the stencil to form an array of deposits on the substrate. The array of deposits may be aligned with the array of openings through the at least one alignment mark and an optional alignment device. Methods of manufacturing the stencil and using it to generate multiplexed or combinatorial arrays are also disclosed.

    Abstract translation: 公开了一种用于在衬底上形成沉积物阵列的装置。 该装置可以包括能够可释放地附接到基底并具有开口阵列和至少一个对准标记的模版。 该装置还可以包括与模板对准的高通量沉积打印机,以在衬底上形成沉积物阵列。 沉积物阵列可以与通过至少一个对准标记的开口阵列和可选的对准装置对齐。 还公开了制造模板并将其用于生成多路复用或组合阵列的方法。

    DIGITAL LITHOGRAPHY USING REAL TIME QUALITY CONTROL
    30.
    发明申请
    DIGITAL LITHOGRAPHY USING REAL TIME QUALITY CONTROL 有权
    使用实时质量控制的数字刻印

    公开(公告)号:US20090185018A9

    公开(公告)日:2009-07-23

    申请号:US11204648

    申请日:2005-08-15

    Abstract: A digital lithography system including a droplet source (printhead) for selectively ejecting liquid droplets of a phase-change masking material, and an imaging system for capturing (generating) image data representing printed features formed by the ejected liquid droplets. The system also includes a digital control system that detects defects in the printed features, for example, by comparing the image data with stored image data. The digital control system then modifies the printed feature to correct the defect, for example, by moving the printhead over the defect and causing the printhead to eject droplets onto the defect's location. In one embodiment, a single-printhead secondary printer operates in conjunction with a multi-printhead main printer to correct defects.

    Abstract translation: 一种数字光刻系统,包括用于选择性地喷射相变掩模材料的液滴的液滴源(打印头)和用于捕获(产生)表示喷射液滴形成的打印特征的图像数据的成像系统。 该系统还包括数字控制系统,其检测打印特征中的缺陷,例如通过将图像数据与存储的图像数据进行比较。 然后,数字控制系统修改打印的特征以校正缺陷,例如通过将打印头移动到缺陷上并使打印头将液滴喷射到缺陷的位置上。 在一个实施例中,单打印头二次打印机与多打印头主打印机一起操作以校正缺陷。

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