PROCESS FOR METAL COATING OF INORGANIC PARTICLES BY MEANS OF CURRENTLESS METAL DEPOSITION
    24.
    发明申请
    PROCESS FOR METAL COATING OF INORGANIC PARTICLES BY MEANS OF CURRENTLESS METAL DEPOSITION 审中-公开
    通过无电金属沉积金属涂层无机颗粒的方法

    公开(公告)号:US20160297718A1

    公开(公告)日:2016-10-13

    申请号:US15100613

    申请日:2014-11-27

    Abstract: The invention relates to a process for producing metal-coated inorganic particles by means of currentless deposition technique in which the inorganic particles are first functionalized, then introduced into an aqueous metal-salt solution containing metal ions, and the metal is reduced by adding a reducing agent to the aqueous metal-salt mixture containing the functionalized particles and the metal is deposited on the functionalized particles, wherein the functionalization of the inorganic particles takes place by means of aminophosphonic acids, aminocarboxylic acids and/or aminoalcohol phosphoric acid esters, and the aminophosphonic acid, the aminocarboxylic acid and/or the aminoalcohol phosphoric acid ester form(s) a monolayer on the surface of the inorganic particles. The metal-coated inorganic particles can be introduced into metal matrices due to their improved surface properties.

    Abstract translation: 本发明涉及通过无电极沉积技术制备金属涂覆的无机颗粒的方法,其中无机颗粒首先被官能化,然后被引入含有金属离子的金属盐水溶液中,并且通过添加还原 将含有官能化颗粒和金属的含金属盐混合物的试剂沉积在官能化​​颗粒上,其中无机颗粒的官能化通过氨基膦酸,氨基羧酸和/或氨基醇磷酸酯和氨基膦酸 酸,氨基羧酸和/或氨基醇磷酸酯形式在无机颗粒表面上的单层。 金属涂覆的无机颗粒由于其表面性能的改善而可以被引入到金属基质中。

    Manufacture of structures comprising silicon dioxide on a surface
    27.
    发明授权
    Manufacture of structures comprising silicon dioxide on a surface 有权
    在表面上制造包含二氧化硅的结构

    公开(公告)号:US09193599B2

    公开(公告)日:2015-11-24

    申请号:US13825472

    申请日:2011-09-21

    Abstract: A substrate surface comprises at least partially at least one elongated structure, wherein each elongated structure comprises a plurality of channels, said channels extending in the direction of the longitudinal axis of the elongated structure, wherein said at least one elongated structure comprises silicon dioxide. The structures are manufactured by: a) providing a reaction solution comprising a silicate, a micelle forming agent, an alkane, a salt, and at least 1.5 M HCl, having a pH of 2 or lower, b) stirring not more than 10 minutes, c) bringing the reaction solution into contact with a substrate surface and d) treating the obtained material with one method selected from a) heat treating the material above 300° C., b) treating the material with at least one selected from H2O2, and H2SO4, c) treating the material with microwaves to digest the micelle forming agent.

    Abstract translation: 衬底表面至少部分地包括至少一个细长结构,其中每个细长结构包括多个通道,所述通道沿细长结构的纵向轴线的方向延伸,其中所述至少一个细长结构包括二氧化硅。 该结构通过以下方法制造:a)提供包含硅酸盐,胶束形成剂,烷烃,盐和至少1.5M HCl,PH为2或更低的反应溶液,b)搅拌不超过10分钟 c)使反应溶液与基材表面接触,和d)用选自以下的一种方法处理所得材料:a)将材料热处理于300℃以上,b)用至少一种选自H 2 O 2, 和H2SO4,c)用微波处理材料以消化胶束形成剂。

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