公开(公告)号：US09627171B2

公开(公告)日：2017-04-18

申请号：US14410999

申请日：2013-06-10

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Hiroshi Makino ,  Hideyuki Kazumi ,  Minoru Yamazaki ,  Yuzuru Mizuhara ,  Miki Isawa

IPC: G21K7/00 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/147 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24485 ,  H01J2237/2449 ,  H01J2237/2806 ,  H01J2237/281

Abstract: An objective of the present invention is to provide a charged particle beam device with which information based on a charged particle which is discharged from a bottom part of high-aspect structure is revealed more than with previous technology. To achieve the objective, proposed is a charged particle beam device comprising: a first orthogonal electromagnetic field generator which deflects charged particles which are discharged from a material; a second orthogonal electromagnetic field generator which further deflects the charged particles which are deflected by the first orthogonal electromagnetic field generator; an aperture forming member having a charged particle beam pass-through aperture; and a third orthogonal electromagnetic field generator which deflects the charged particles which have passed through the aperture forming member.

公开(公告)号：US20160379902A1

公开(公告)日：2016-12-29

申请号：US14849129

申请日：2015-09-09

Applicant: Kabushiki Kaisha Toshiba

Inventor： Yoshinori HAGIO ,  Nobuhiro KOMINE

IPC: H01L21/66 ,  H01J37/06 ,  H01J37/244 ,  H01J37/29

CPC classification number: H01J37/244 ,  H01J37/265 ,  H01J2237/0432 ,  H01J2237/22 ,  H01J2237/24578 ,  H01J2237/281 ,  H01L22/12 ,  H01L22/20

Abstract: A measurement apparatus according to an embodiment includes an electron emission unit and a detection unit that detects a reflection electron reflected by a recessed shape pattern. In addition, the measurement apparatus includes a time measurement unit that measures a response time from when the electron beam is emitted to when the reflection electron is detected. Further, the measurement apparatus includes a bent amount calculation unit that calculates the amount of bent, i.e., a position deviation amount, between an upper surface portion and a bottom surface portion of the recessed shape pattern. The bent amount calculation unit calculates the amount of bent on the basis of a condition for determining the incidence path of the electron beam to the recessed shape pattern, and the response time.

Abstract translation: 根据实施例的测量装置包括电子发射单元和检测由凹陷形状图案反射的反射电子的检测单元。 此外，测量装置包括测量从发射电子束到检测到反射电子时的响应时间的时间测量单元。 此外，测量装置包括弯曲量计算单元，该弯曲量计算单元计算凹形状图案的上表面部分和底表面部分之间的弯曲量，即位置偏移量。 弯曲量计算单元基于用于确定电子束到凹形图案的入射路径的条件和响应时间来计算弯曲量。

公开(公告)号：US20160379795A1

公开(公告)日：2016-12-29

申请号：US15183952

申请日：2016-06-16

Applicant: Hitachi High-Technologies Corporation

Inventor： Ryota WATANABE ,  Yuko SASAKI ,  Akira IKEGAMI

IPC: H01J37/21 ,  H01J37/28

CPC classification number: H01J37/21 ,  H01J37/28 ,  H01J2237/2448 ,  H01J2237/24578 ,  H01J2237/281

Abstract: An object of the invention is to provide a charged particle beam apparatus which can perform optimized adjustment of a focusing condition of a charged particle beam focused on a sample and optimized adjustment of an orbit of a charged particle emitted from the sample. In order to achieve the above-described object, there is provided a charged particle beam apparatus including a passage restriction member that partially restricts passage of a charged particle emitted from a sample, a first lens that is arranged between the passage restriction member and the sample, and that controls an orbit of the charged particle emitted from the sample, and a second lens that is arranged between the passage restriction member and the charged particle source, and that changes a focusing condition of the charged particle beam in accordance with a control condition of the first lens.

Abstract translation: 本发明的目的是提供一种带电粒子束装置，其能够对聚焦在样品上的带电粒子束的聚焦条件进行优化调整，并优化对从样品发射的带电粒子轨道的调整。 为了实现上述目的，提供了一种带电粒子束装置，其包括：通道限制部件，其部分地限制从样品发射的带电粒子的通过;布置在通道限制部件和样品之间的第一透镜 并且控制从样品发射的带电粒子的轨道，以及布置在通道限制构件和带电粒子源之间的第二透镜，并且根据控制条件改变带电粒子束的聚焦条件 的第一个镜头。

公开(公告)号：US09305740B2

公开(公告)日：2016-04-05

申请号：US13920284

申请日：2013-06-18

Applicant: Jürgen Frosien ,  Benjamin John Cook

Inventor： Jürgen Frosien ,  Benjamin John Cook

IPC: H01J37/04 ,  H01J37/147 ,  H01J37/153 ,  H01J37/26

CPC classification number: H01J37/045 ,  H01J37/1478 ,  H01J37/153 ,  H01J37/263 ,  H01J2237/1534 ,  H01J2237/281 ,  H01J2237/2815

Abstract: A charged particle beam device is described. In one aspect, the charged particle beam device includes a charged particle beam source, and a switchable multi-aperture for generating two or more beam bundles from a charged particle beam which includes: two or more aperture openings, wherein each of the two or more aperture openings is provided for generating a corresponding beam bundle of the two or more beam bundles; a beam blanker arrangement configured for individually blanking the two or more beam bundles; and a stopping aperture for blocking beam bundles. The device further includes a control unit configured to control the individual blanking of the two or more beam bundles for switching of the switchable multi-aperture and an objective lens configured for focusing the two or more beam bundles on a specimen or wafer.

Abstract translation: 描述带电粒子束装置。 一方面，带电粒子束装置包括带电粒子束源和用于从带电粒子束产生两束或更多束束的可切换多孔，该多束光束包括：两个或更多孔径开口，其中两个或更多个 提供孔径开口以产生两个或更多束束的相应束束; 束消除器配置，其被配置为单独地消隐所述两个或更多个束束; 以及用于阻挡束束的止动孔。 该装置还包括控制单元，该控制单元被配置为控制用于切换可切换多孔的两个或更多束束的单独消隐，以及被配置用于将两束或更多束束聚焦在样本或晶片上的物镜。

公开(公告)号：US09257259B2

公开(公告)日：2016-02-09

申请号：US13807577

申请日：2011-06-08

Applicant: Kinya Kobayashi ,  Toshiyuki Yokosuka ,  Chahn Lee

Inventor： Kinya Kobayashi ,  Toshiyuki Yokosuka ,  Chahn Lee

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/244

CPC classification number: H01J37/28 ,  H01J37/147 ,  H01J37/244 ,  H01J2201/025 ,  H01J2237/24592 ,  H01J2237/281

Abstract: Provided is an electron beam scanning method for forming an electric field for appropriately guiding electrons emitted from a pattern to the outside of the pattern, and also provided is a scanning electron microscope. When an electron beam for forming charge is irradiated to a sample, a first electron beam is irradiated to a first position (1) and a second position (2) having the center (104) of a pattern formed on the sample as a symmetrical point, and is then additionally irradiated to two central positions (3, 4) between the first and second irradiation position, the two central positions (3, 4) being on the same radius centered on the symmetrical point as are the first and second positions. Further, after that, the irradiation of the first electron beam to the central positions between existing scanning positions on the radius is repeated.

Abstract translation: 提供了一种电子束扫描方法，用于形成用于将从图案发射的电子适当地引导到图案的外部的电场，并且还提供了扫描电子显微镜。 当用于形成电荷的电子束照射到样品时，第一电子束被照射到第一位置（1）和第二位置（2），其具有在样品上形成的图案的中心（104）作为对称点 然后另外照射到第一和第二照射位置之间的两个中心位置（3,4），两个中心位置（3,4）处于与第一和第二位置对称的点对中的相同的半径上。 此外，在此之后，重复将第一电子束照射到半径上的现有扫描位置之间的中心位置。

公开(公告)号：US09159528B2

公开(公告)日：2015-10-13

申请号：US14294639

申请日：2014-06-03

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Takashi Ogawa ,  Yasutsugu Usami ,  Mitsuhiro Togashi

IPC: H01J37/26 ,  H01J37/12 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/12 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24485 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/281

Abstract: An electron beam apparatus includes at least one electron beam column. The at least one beam column includes an electron beam optical system to irradiate an electron beam on a surface of a sample, and a detection system to detect electrons generated from the electron beam. The electron beam optical system includes an object lens to focus the electron beam on a surface of the sample. The object lens includes an electrostatic lens having a first electrode to which a first voltage is applied, a second electrode that is grounded, a third electrode to which a second voltage is applied, and a fourth electrode that is grounded. The first through fourth electrodes sequentially arranged relative to the sample.

Abstract translation: 电子束装置包括至少一个电子束柱。 所述至少一个光束柱包括用于照射样品表面上的电子束的电子束光学系统和用于检测从电子束产生的电子的检测系统。 电子束光学系统包括将电子束聚焦在样品的表面上的物镜。 物镜包括具有第一电极施加第一电压的静电透镜，接地的第二电极，施加第二电压的第三电极和接地的第四电极。 第一至第四电极相对于样品顺序排列。

公开(公告)号：US20150060662A1

公开(公告)日：2015-03-05

申请号：US14468674

申请日：2014-08-26

Applicant: Hermes-Microvision, Inc.

Inventor： Zhongwei Chen ,  Weiming Ren ,  Xuerang Hu ,  Xuedong Liu

IPC: H01J37/141 ,  H01J37/26 ,  H01J37/147 ,  H01J37/073 ,  H01J37/20

CPC classification number: H01J37/141 ,  H01J37/145 ,  H01J37/28 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/15 ,  H01J2237/281 ,  H01J2237/2817

Abstract: An apparatus of plural charged particle beams with multi-axis magnetic lens is provided to perform multi-functions of observing a specimen surface, such as high-throughput inspection and high-resolution review of interested features thereof and charge-up control for enhancing image contrast and image resolution. In the apparatus, two or more sub-columns are formed and each of the sub-columns performs one of the multi-functions. Basically the sub-columns take normal illumination to get high image resolutions, but one or more may take oblique illuminations to get high image contrasts.

Abstract translation: 提供具有多轴磁性透镜的多个带电粒子束的装置，以执行观察样品表面的多功能，例如高通量检测和其感兴趣特征的高分辨率检查以及用于增强图像对比度的充电控制 和图像分辨率。 在该装置中，形成两个或多个子列，并且每个子列执行多功能之一。 基本上，子列采取正常照明以获得高图像分辨率，但是一个或多个可能采取倾斜照明以获得高图像对比度。

公开(公告)号：US20150008322A1

公开(公告)日：2015-01-08

申请号：US14379715

申请日：2013-02-18

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Toshiyuki Yokosuka ,  Chahn Lee ,  Hideyuki Kazumi ,  Hiroshi Makino ,  Yuzuru Mizuhara ,  Miki Isawa ,  Michio Hatano ,  Yoshinori Momonoi

IPC: H01J37/28 ,  G01B15/04

CPC classification number: H01J37/28 ,  G01B15/00 ,  G01B15/04 ,  H01J2237/0048 ,  H01J2237/0492 ,  H01J2237/24495 ,  H01J2237/281 ,  H01J2237/2815 ,  H01J2237/2817

Abstract: An object of the invention is to provide a scanning electron microscope which forms an electric field to lift up, highly efficiently, electrons discharged from a hole bottom or the like even if a sample surface is an electrically conductive material. To achieve the above object, according to the invention, a scanning electron microscope including a deflector which deflects a scanning position of an electron beam, and a sample stage for loading a sample thereon, is proposed. The scanning electron microscope includes a control device which controls the deflector or the sample stage in such a way that before scanning a beam on a measurement target pattern, a lower layer pattern situated in a lower layer of the measurement target pattern undergoes beam irradiation on another pattern situated in the lower layer.

Abstract translation: 本发明的目的是提供一种形成电场的扫描电子显微镜，即使样品表面是导电材料，也能高效地提高从孔底等排出的电子。 为了实现上述目的，根据本发明，提出了一种扫描电子显微镜，其包括使电子束的扫描位置偏转的偏转器和用于在其上装载样品的样品台。 扫描电子显微镜包括控制装置，其以这样的方式控制偏转器或样品台，即在测量目标图案上扫描光束之前，位于测量对象图案的下层中的下层图案在另一个上进行光束照射 图案位于下层。

公开(公告)号：US20140361168A1

公开(公告)日：2014-12-11

申请号：US14294639

申请日：2014-06-03

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Takashi OGAWA ,  Yasutsugu USAMI ,  Mitsuhiro TOGASHI

IPC: H01J37/26

CPC classification number: H01J37/12 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24485 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/281

Abstract: An electron beam apparatus includes at least one electron beam column. The at least one beam column includes an electron beam optical system to irradiate an electron beam on a surface of a sample, and a detection system to detect electrons generated from the electron beam. The electron beam optical system includes an object lens to focus the electron beam on a surface of the sample. The object lens includes an electrostatic lens having a first electrode to which a first voltage is applied, a second electrode that is grounded, a third electrode to which a second voltage is applied, and a fourth electrode that is grounded. The first through fourth electrodes sequentially arranged relative to the sample.

Abstract translation: 电子束装置包括至少一个电子束柱。 所述至少一个光束柱包括用于照射样品表面上的电子束的电子束光学系统和用于检测从电子束产生的电子的检测系统。 电子束光学系统包括将电子束聚焦在样品的表面上的物镜。 物镜包括具有第一电极施加第一电压的静电透镜，接地的第二电极，施加第二电压的第三电极和接地的第四电极。 第一至第四电极相对于样品顺序排列。

公开(公告)号：US20130037716A1

公开(公告)日：2013-02-14

申请号：US13639999

申请日：2011-04-20

Applicant: Satoshi Tadaka ,  Naomasa Suzuki ,  Naoma Ban ,  Tatsuichi Kato

Inventor： Satoshi Tadaka ,  Naomasa Suzuki ,  Naoma Ban ,  Tatsuichi Kato

IPC: H01J37/04 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/026 ,  H01J2237/2594 ,  H01J2237/281 ,  H01J2237/2815

Abstract: The present invention provides a contact hole observation technology for avoiding a situation in which it is difficult to observe a contact hole as a nonuniform charge is formed in the contact hole due to a tilted electron beam during a process for forming a preliminary charge on a sample. The present invention also provides a scanning electron microscope based on such a contact hole observation technology. During a preliminary charge process, an electron beam is allowed to become incident in a plurality of directions to perform a precharge, thereby reducing a region within the contact hole that is not irradiated with the electron beam. This reduces the number of secondary electrons that become lost on the wall surface of the contact hole, thereby making it possible to acquire information about the bottom of the contact hole. Further, the precharge is processed by dividing a precharge irradiation region into a plurality of ring-shaped regions concentric with an observation region and precharging each of the ring-shaped regions in a plurality of scanning directions.

Abstract translation: 本发明提供一种接触孔观察技术，用于避免在样品中形成初步电荷的过程中由于倾斜的电子束在接触孔中形成不均匀电荷难以观察到接触孔的情况 。 本发明还提供了一种基于这种接触孔观察技术的扫描电子显微镜。 在预充电过程中，允许电子束在多个方向上入射以进行预充电，从而减少接触孔内未被电子束照射的区域。 这就减少了在接触孔的壁表面上损失的二次电子的数量，从而可以获得关于接触孔的底部的信息。 此外，通过将预充电照射区域划分成与观察区域同心的多个环状区域并且在多个扫描方向上对每个环状区域进行预充电来进行预充电。