WBG and UWBG Semiconductor with P- and N-type Conductivity and Process For Making the Same

    公开(公告)号:US20230197454A1

    公开(公告)日:2023-06-22

    申请号:US17714204

    申请日:2022-04-06

    CPC classification number: H01L21/26546 H01L29/24 H01L29/207 H01L29/2003

    Abstract: Methods for efficient doping of wide-bandgap (WBG) and ultrawide-bandgap (UWBG) semiconductors by implantation, and WBG and UWBG semiconductors made using the disclosed methods. A p-type semiconductor region is formed by implanting specified acceptor and donor co-dopant atoms in a predetermined ratio, e.g., two acceptors to one donor (ADA), into the semiconductor lattice. An n-type type semiconductor region is by implanting specified donor and acceptor co-dopant atoms in a predetermined ratio, e.g., two donors to one acceptor (DAD), into the semiconductor lattice. Compensator atoms are also implanted into the lattice to complete formula units in the crystal lattice structure and preserve the stoichiometry of the semiconductor material. The doped material is then annealed to activate the dopants and repair any damage to the lattice that might have occurred during implantation.

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