公开(公告)号：US4118794A

公开(公告)日：1978-10-03

申请号：US851691

申请日：1977-11-15

申请人： Fumio Mizuno ,  Masamichi Ishihara

发明人： Fumio Mizuno ,  Masamichi Ishihara

IPC分类号： G11C11/404 ,  G11C11/4097 ,  H01L27/105 ,  H01L27/108 ,  G11C11/24

CPC分类号： H01L27/10805 ,  G11C11/404 ,  G11C11/4097 ,  H01L27/105

摘要： A memory cell of a dynamic storage device is composed of a MOSFET and a capacitor. On a single semiconductor substrate, a plurality of such memory cells are regularly arranged so as to form a plurality of columns, with the result that they constitute a memory cell array or a memory cell mat. The capacitor for the memory cell is made up of a semiconductor region of the type which possesses a conductivity opposite to that of the semiconductor substrate, and a conductor film which is formed of polycrystalline silicon or the like on the semiconductor region through a comparatively thin insulating film. The areas of the capacitors in the memory cell column situated at an end portion of the memory cell mat are made larger than those of the capacitors of the memory cells at an inner or central portion of the memory cell mat. The memory cells at the end portion of the memory cell mat come to have information holding times equivalent to those of the memory cells at the central portion of the memory cell mat.

摘要翻译： 动态存储装置的存储单元由MOSFET和电容器组成。 在单个半导体衬底上，多个这样的存储单元被规则地排列以形成多个列，结果它们构成存储单元阵列或存储单元垫。 用于存储单元的电容器由具有与半导体衬底的导电性相反的导电性的半导体区域和由半导体区域上的多晶硅等形成的导体膜构成，该导体膜通过较薄的绝缘 电影。 位于存储单元垫的端部的存储单元列中的电容器的面积比在存储单元垫的内部或中央部分的存储单元的电容器的面积大。 存储单元垫的端部处的存储单元具有与存储单元垫的中央部分的存储单元相同的信息保持时间。

公开(公告)号：US07642514B2

公开(公告)日：2010-01-05

申请号：US12005387

申请日：2007-12-27

申请人： Atsushi Takane ,  Haruo Yoda ,  Hideo Todokoro ,  Fumio Mizuno ,  Shoji Yoshida ,  Mitsuji Ikeda ,  Mitsugu Sato ,  Makoto Ezumi

发明人： Atsushi Takane ,  Haruo Yoda ,  Hideo Todokoro ,  Fumio Mizuno ,  Shoji Yoshida ,  Mitsuji Ikeda ,  Mitsugu Sato ,  Makoto Ezumi

IPC分类号： H01J37/21

CPC分类号： G06T5/002 ,  G06T5/003 ,  G06T5/20 ,  G06T5/50 ,  G06T7/13 ,  G06T7/62 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/21 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/21 ,  H01J2237/216 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/281 ,  H01J2237/2815 ,  H01J2237/2817

摘要： It is an object of the present invention to obtain an image which is focused on all portions of a sample and to provide a charged particle beam apparatus capable of obtaining a two-dimensional image which has no blurred part over an entire sample. In order to achieve the above object, the present invention comprises means for changing a focus condition of a charged particle beam emitted from a charged particle source, a charged particle detector for detecting charged particles irradiated from a surface portion of said sample in response to the emitted charged particle beam, and means for composing a two-dimensional image of the surface portion of the sample based on signals on which said charged particle beam is focused, said signals being among signals output from the charged particle detector.

摘要翻译： 本发明的目的是获得一种聚焦于样品的所有部分的图像，并提供一种能够获得在整个样品上没有模糊部分的二维图像的带电粒子束装置。 为了实现上述目的，本发明包括用于改变从带电粒子源发射的带电粒子束的聚焦条件的装置，用于检测从所述样品的表面部分照射的带电粒子的带电粒子检测器， 发射的带电粒子束，以及用于基于所述带电粒子束聚焦的信号来组合样品的表面部分的二维图像的装置，所述信号在从带电粒子检测器输出的信号中。

公开(公告)号：US06653633B2

公开(公告)日：2003-11-25

申请号：US10356498

申请日：2003-02-03

申请人： Atsushi Takane ,  Haruo Yoda ,  Hideo Todokoro ,  Fumio Mizuno ,  Shoji Yoshida ,  Mitsuji Ikeda ,  Mitsugu Sato ,  Makoto Ezumi

发明人： Atsushi Takane ,  Haruo Yoda ,  Hideo Todokoro ,  Fumio Mizuno ,  Shoji Yoshida ,  Mitsuji Ikeda ,  Mitsugu Sato ,  Makoto Ezumi

IPC分类号： H01J3726

CPC分类号： G06T5/002 ,  G06T5/003 ,  G06T5/20 ,  G06T5/50 ,  G06T7/13 ,  G06T7/62 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/21 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/21 ,  H01J2237/216 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/281 ,  H01J2237/2815 ,  H01J2237/2817

摘要： It is an object of the present invention to obtain an image which is focused on all portions of a sample and to provide a charged particle beam apparatus capable of obtaining a two-dimensional image which has no blurred part over an entire sample. In order to achieve the above object, the present invention comprises means for changing a focus condition of a charged particle beam emitted from a charged particle source, a charged particle detector for detecting charged particles irradiated from a surface portion of said sample in response to the emitted charged particle beam, and means for composing a two-dimensional image of the surface portion of the based on signals on which said charged particle beam is focused, said signals being among signals output from the charged particle detector.

摘要翻译： 本发明的目的是获得一种聚焦于样品的所有部分的图像，并提供一种能够获得在整个样品上没有模糊部分的二维图像的带电粒子束装置。 为了实现上述目的，本发明包括用于改变从带电粒子源发射的带电粒子束的聚焦条件的装置，用于检测从所述样品的表面部分照射的带电粒子的带电粒子检测器， 发射的带电粒子束，以及用于根据所述带电粒子束聚焦的信号来构成表面部分的二维图像的装置，所述信号在从带电粒子检测器输出的信号中。

公开(公告)号：US06538249B1

公开(公告)日：2003-03-25

申请号：US09612302

申请日：2000-07-07

申请人： Atsushi Takane ,  Haruo Yoda ,  Hideo Todokoro ,  Fumio Mizuno ,  Shoji Yoshida ,  Mitsuji Ikeda ,  Mitsugu Sato ,  Makoto Ezumi

发明人： Atsushi Takane ,  Haruo Yoda ,  Hideo Todokoro ,  Fumio Mizuno ,  Shoji Yoshida ,  Mitsuji Ikeda ,  Mitsugu Sato ,  Makoto Ezumi

IPC分类号： H01J3726

CPC分类号： G06T5/002 ,  G06T5/003 ,  G06T5/20 ,  G06T5/50 ,  G06T7/13 ,  G06T7/62 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/21 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/21 ,  H01J2237/216 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/281 ,  H01J2237/2815 ,  H01J2237/2817

摘要： It is an object of the present invention to obtain an image which is focused on all portions of a sample and to provide a charged particle beam apparatus capable of obtaining a two-dimensional image which has no blurred part over an entire sample. In order to achieve the above object, the present invention comprises means for changing a focus condition of a charged particle beam emitted from a charged particle source, a charged particle detector for detecting charged particles irradiated from a surface portion of said sample in response to the emitted charged particle beam, and means for composing a two-dimensional image of the surface portion of the based on signals on which said charged particle beam is focused, said signals being among signals output from the charged particle detector.

摘要翻译： 本发明的目的是获得一种聚焦于样品的所有部分的图像，并提供一种能够获得在整个样品上没有模糊部分的二维图像的带电粒子束装置。 为了实现上述目的，本发明包括用于改变从带电粒子源发射的带电粒子束的聚焦条件的装置，用于检测从所述样品的表面部分照射的带电粒子的带电粒子检测器， 发射的带电粒子束，以及用于根据所述带电粒子束聚焦的信号来组合表面部分的二维图像的装置，所述信号是从带电粒子检测器输出的信号。

公开(公告)号：US6157451A

公开(公告)日：2000-12-05

申请号：US316962

申请日：1999-05-24

申请人： Fumio Mizuno

发明人： Fumio Mizuno

IPC分类号： G01B11/02 ,  G01B15/00 ,  G01N37/00 ,  G01Q10/02 ,  G01Q30/04 ,  G01Q60/24 ,  G01R31/265 ,  G06T1/00 ,  H01L21/66 ,  G01B11/00

CPC分类号： G01B15/00 ,  H01L22/12 ,  G01R31/265 ,  H01J2237/2814

摘要： A sample CD measurement system adapted for measuring the CD of a measurement portion accurately even in the case where the shape of the measurement portion and the direction of measurement are arbitrary. Before the CD measurement, a measurement reference image corresponding to the measurement portion is registered in a computer and controller. At the time of the CD measurement, the measurement reference image is read and compared with an image of the measurement portion to thereby obtain a difference in shape between the image of the measurement portion and the measurement reference image on the basis of a result of the comparison to thereby obtain the CD of the measurement portion on the basis of the difference in shape.

摘要翻译： 即使在测量部分的形状和测量方向是任意的情况下，也可以精确地测量测量部分的CD的样本CD测量系统。 在CD测量之前，将与测量部分对应的测量参考图像登记在计算机和控制器中。 在CD测量时，读取测量参考图像并将其与测量部分的图像进行比较，从而基于测量部分的结果获得测量部分的图像与测量参考图像之间的形状差异 进行比较，从而基于形状的差异获得测量部分的CD。

公开(公告)号：US5866904A

公开(公告)日：1999-02-02

申请号：US970201

申请日：1997-11-14

申请人： Hideo Todokoro ,  Kenji Takamoto ,  Tadashi Otaka ,  Fumio Mizuno ,  Satoru Yamada ,  Sadao Terakado ,  Katsuhiro Kuroda ,  Ken Ninomiya ,  Tokuo Kure

发明人： Hideo Todokoro ,  Kenji Takamoto ,  Tadashi Otaka ,  Fumio Mizuno ,  Satoru Yamada ,  Sadao Terakado ,  Katsuhiro Kuroda ,  Ken Ninomiya ,  Tokuo Kure

IPC分类号： G01Q30/02 ,  G01B15/00 ,  G01B15/04 ,  G01Q30/04 ,  H01J37/26

CPC分类号： G01B15/00 ,  G01B15/04 ,  H01J2237/2448 ,  H01J2237/24495 ,  H01J2237/281

摘要： An electron beam which can transmit through part of a specimen and can reach a portion not exposing to the electron beam is irradiated and a scanning image is obtained on the basis of a signal secondarily generated from a portion irradiated with the electron beam. Dimension-measuring start and end points are set on the scanning image and a dimension therebetween is measured. A cubic model is assumed, the cubic model is modified so as to match the scanning image, and dimension measurement is carried out on the basis of a modified cubic model.

公开(公告)号：US5777327A

公开(公告)日：1998-07-07

申请号：US771748

申请日：1996-12-20

申请人： Fumio Mizuno

发明人： Fumio Mizuno

IPC分类号： G01B15/04 ,  G03F1/00 ,  G03F7/20 ,  G06T7/00 ,  H01J37/22 ,  H01J37/28 ,  H01L21/027 ,  H01L21/66 ,  H01J37/00

CPC分类号： G03F7/70616 ,  G03F1/84 ,  H01J37/28 ,  H01J2237/2817

摘要： A pattern shape inspection apparatus for displaying a specimen image on a display apparatus, and inspecting a pattern shape of the specimen image includes a memory for memorizing a reference image corresponding to an observation region and a display for simultaneously displaying the reference image and the specimen image. At least one of the image parameters of the specimen image and the reference image is corrected to aid in the comparison.

摘要翻译： 用于在显示装置上显示标本图像并检查样本图像的图案形状的图案形状检查装置包括用于存储与观察区域相对应的参考图像的存储器和用于同时显示参考图像和标本图像的显示 。 对样本图像和参考图像的图像参数中的至少一个进行校正以帮助进行比较。

公开(公告)号：US5750990A

公开(公告)日：1998-05-12

申请号：US771325

申请日：1996-12-20

申请人： Fumio Mizuno ,  Osamu Satoh

发明人： Fumio Mizuno ,  Osamu Satoh

IPC分类号： G01B11/00 ,  G01B15/00 ,  G01N23/04 ,  G01Q30/02 ,  G01Q30/04 ,  G01Q60/24 ,  H01J37/28 ,  H01L21/027 ,  H01L21/66

CPC分类号： G01B15/00 ,  G01B11/00 ,  G01N23/04 ,  H01J37/28 ,  B82Y35/00 ,  H01J2237/2814 ,  H01J2237/2817

摘要： In a pattern dimension measuring method for scanning a sample at a predetermined scanning pitch by a scanning probe as in a scanning electron microscope, forming a sample image using a scanning signal obtained from the sample, scanning a predetermined portion of a pattern to be measured in a sample image by said probe, and measuring a dimension of said predetermined portion by processing obtained scanning signal according to a predetermined algorithm, said scanning pitch is varied according to the case for positioning the pattern to be measured and the case for measuring the pattern dimension when observing in a low magnification, and said scanning pitch for measuring the pattern dimension is adjusted to be small, about a diameter of the probe.

摘要翻译： 在扫描型电子显微镜中，通过扫描探针以预定的扫描间隔扫描样品的图案尺寸测量方法中，使用从样品获得的扫描信号形成样本图像，将待测样式的预定部分扫描 通过所述探针的样本图像，并且根据预定算法通过处理获得的扫描信号来测量所述预定部分的尺寸，所述扫描间距根据用于定位要测量的图案的情况和用于测量图案尺寸的情况而变化 当以低放大倍数观察时，将用于测量图案尺寸的所述扫描间距调整为小于探针的直径。

公开(公告)号：US5736300A

公开(公告)日：1998-04-07

申请号：US694263

申请日：1996-08-08

申请人： Fumio Mizuno ,  Noboru Moriuchi ,  Seiichiro Shirai ,  Masayuki Morita

发明人： Fumio Mizuno ,  Noboru Moriuchi ,  Seiichiro Shirai ,  Masayuki Morita

IPC分类号： G03F1/00 ,  G03F1/26 ,  G03F1/30 ,  G03F1/68 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  G03C5/00

CPC分类号： G03F1/26 ,  G03F1/29 ,  G03F1/30 ,  G03F7/70283 ,  G03F7/70433

摘要： One object of the present invention is to provide the reduced projection exposure method which enables the exposure of various and fine patterns in manufacturing process of semiconductor devices or semiconductor integrated circuit devices. Structure of the present invention to attain the above object is to carry out the reduced projection exposure using a phase shift mask provided with a prescribed correction pattern on the end of the mask pattern domain of a constant mode or the boundary of the mask pattern domain of plural modes. According to this structure, as the end effects etc. are canceled by the correction pattern, the various and fine patterns can be exposed.

公开(公告)号：US5198396A

公开(公告)日：1993-03-30

申请号：US825078

申请日：1992-01-24

申请人： Fumio Mizuno

发明人： Fumio Mizuno

IPC分类号： C04B35/46 ,  C04B35/468 ,  H01B3/12 ,  H01G4/12 ,  H01L23/15 ,  H01L23/66 ,  H01P7/10

CPC分类号： C04B35/4686 ,  H01L23/15 ,  H01L23/66 ,  H01P7/10 ,  H01L2924/0002 ,  H01L2924/3011

摘要： Disclosed herein is a microwave dielectric ceramic composition which comprises a compound represented by the formula BaO.multidot.xTiO.sub.2 (where 3.7.ltoreq.x.ltoreq.4.5) which is incorporated with 1.0-10 wt. % Ba.sub.3 Ti.sub.12 Zn.sub.7 O.sub.34 and 2-8 wt. % Ta.sub.2 O.sub.5. It has well-balanced performance owing to a Q value not less than 8000 (at 4.5 GHz), a relative permittivity .epsilon. not less than 31, and a practical temperature coefficient in the range of -15 to +10 ppm/.degree.C. It may be further incorporated with 0.1-0.4 wt. % MnO.sub.2 for improved sinterability in addition to the above-mentioned performance.