Semiconductor device and method for manufacturing the same
    32.
    发明授权
    Semiconductor device and method for manufacturing the same 有权
    半导体装置及其制造方法

    公开(公告)号:US08581291B2

    公开(公告)日:2013-11-12

    申请号:US12556134

    申请日:2009-09-09

    Abstract: Provided is an optical semiconductor device includes: a light-emitting layer having a first main surface, a second main surface opposed to the first main surface, a first electrode and a second electrode which are formed on the second main surface; a fluorescent layer provided on the first main surface; a light-transmissive layer provided on the fluorescent layer and made of a light-transmissive inorganic material; a first metal post provided on the first electrode; a second metal post provided on the second electrode; a sealing layer provided on the second main surface so as to seal in the first and second metal posts with one ends of the respective first and second metal posts exposed; a first metal layer provided on the exposed end of the first metal post; and a second metal layer provided on the exposed end of the second metal post.

    Abstract translation: 本发明提供一种光半导体装置,具备:具有第一主面,与第一主面相对的第二主面的发光层,形成在第二主面上的第一电极和第二电极; 设置在所述第一主表面上的荧光层; 设置在荧光层上并由透光性无机材料制成的透光层; 设置在所述第一电极上的第一金属柱; 设置在所述第二电极上的第二金属柱; 密封层,设置在所述第二主表面上,以便密封在所述第一和第二金属柱中,所述第一和第二金属柱的一端暴露; 设置在第一金属柱的暴露端上的第一金属层; 以及设置在第二金属柱的暴露端上的第二金属层。

    PROBE FOR ELECTRICAL INSPECTION, METHOD FOR FABRICATING THE SAME, AND METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE
    34.
    发明申请
    PROBE FOR ELECTRICAL INSPECTION, METHOD FOR FABRICATING THE SAME, AND METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE 审中-公开
    电气检查用探针,其制造方法以及制造半导体器件的方法

    公开(公告)号:US20100244869A1

    公开(公告)日:2010-09-30

    申请号:US12731609

    申请日:2010-03-25

    CPC classification number: G01R1/06722 G01R1/06761

    Abstract: An aspect of the present disclosure, there is provided An electrical inspection probe, including, a leading end portion of the electrical inspection probe, the leading end portion contacting with a solder bump located outward the electrical inspection probe, a base material configured at the leading end portion, the base material being constituted with a conductive material, a gold layer on a surface of the base material at least in the leading end portion, a rhodium layer on a surface of the gold layer at least in the leading end portion, and a ruthenium layer on a surface of the rhodium layer at least in the leading end portion.

    Abstract translation: 本发明的一个方面,提供了一种电气检查探针,其包括电检查探针的前端部,前端部与位于电检查探针外侧的焊料凸块接触,基体材料配置在前导部 所述基材由导电材料构成,至少在所述前端部的所述基材的表面上的金层,在所述金层的至少前端部的表面上的铑层,以及 铑层的至少在前端部的铑层。

    Disk substrate for a perpendicular magnetic recording medium and a perpendicular magnetic recording medium using the substrate
    36.
    发明授权
    Disk substrate for a perpendicular magnetic recording medium and a perpendicular magnetic recording medium using the substrate 有权
    用于垂直磁记录介质的磁盘基板和使用该基板的垂直磁记录介质

    公开(公告)号:US07622205B2

    公开(公告)日:2009-11-24

    申请号:US11104274

    申请日:2005-04-12

    CPC classification number: G11B5/667 G11B5/7315

    Abstract: A disk substrate for a perpendicular magnetic recording medium is, disclosed. The substrate exhibits sufficient productivity, serves the function of a soft magnetic backing layer of the perpendicular magnetic recording medium, and scarcely generates noise. A perpendicular magnetic recording medium using such a substrate also is disclosed. The disk substrate comprises at least a soft magnetic underlayer formed on a nonmagnetic base plate by means of an electroless plating method. The thermal expansion coefficient of the soft magnetic underlayer is larger than a thermal expansion coefficient of the nonmagnetic disk-shaped base plate. A saturation magnetostriction constant λs satisfies a relation λs≧−1×10−5.

    Abstract translation: 公开了一种用于垂直磁记录介质的盘基片。 基板表现出足够的生产率,起到垂直磁记录介质的软磁背衬层的功能,并且几乎不产生噪声。 还公开了使用这种基板的垂直磁记录介质。 盘状基板通过无电镀法至少包含在非磁性基板上形成的软磁性底层。 软磁性底层的热膨胀系数大于非磁性盘状基板的热膨胀系数。 饱和磁致伸缩常数lambdas满足关系lambdas> = - 1×10-5。

    SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
    37.
    发明申请
    SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF 审中-公开
    半导体器件及其制造方法

    公开(公告)号:US20080211076A1

    公开(公告)日:2008-09-04

    申请号:US12040209

    申请日:2008-02-29

    CPC classification number: B81B7/0077 B81C2203/0136 B81C2203/0145

    Abstract: A semiconductor device capable of elevating a yield rate of products to improve the productivity and also ensuring high reliability in production and a manufacturing method of the semiconductor device are provided. The semiconductor device includes a semiconductor substrate 2, a MEMS part 3 formed on a surface of the semiconductor substrate 2 and a cap part arranged at a distance from the MEMS part 3 and also arranged on the surface of the semiconductor substrate 2 so as to cover the MEMS part 3. In the semiconductor device, the cap part is formed by a sidewall area E surrounding the MEMS part 3 and a top board area F having a hollow layer and also forming a closed space together with the semiconductor substrate 2 and the sidewall area E.

    Abstract translation: 提供能够提高产品的成品率以提高生产率并且还确保高生产可靠性的半导体器件和半导体器件的制造方法。 半导体器件包括半导体衬底2,形成在半导体衬底2的表面上的MEMS部分3和与MEMS部分3相距一定距离地布置并且还被布置在半导体衬底2的表面上以覆盖 MEMS部件3.在半导体器件中,盖部分由围绕MEMS部件3的侧壁区域E和具有中空层的顶板区域F形成,并且还与半导体衬底2和侧壁一起形成封闭空间 区域E.

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