公开(公告)号：US5719084A

公开(公告)日：1998-02-17

申请号：US564922

申请日：1995-11-29

申请人： Thomas G. Mallon ,  Chi-yi Kao ,  Wei-jen Hsia ,  Atsushi Shimoda

发明人： Thomas G. Mallon ,  Chi-yi Kao ,  Wei-jen Hsia ,  Atsushi Shimoda

IPC分类号： H01L21/31 ,  H01L21/3105 ,  H01L21/316 ,  H01L21/768 ,  H01L21/469

CPC分类号： H01L21/31051 ,  H01L21/76819 ,  H01L21/7682

摘要： A method is provided for the controlled formation of voids in integrated circuit doped glass dielectric films. The film can be formed of borophosphosilica glass (BPSG) or other types of doped glass. The method involves the steps of providing a substrate on which conductors are formed, depositing a first layer of doped glass to a thickness in a predetermined ratio to the size of the space between conductors, reflowing the first doped glass layer, applying one or more additional doped glass layers to make up for any shortfall in desired total doped glass thickness, and performing a high temperature densification to smooth each additional layer. The method provides for increased integrated circuit speed by controlled formation of voids which have a low dielectric constant and therefore reduce capacitance between adjacent conductors. The method can be performed using existing doped glass deposition and reflow equipment.

摘要翻译： 提供了一种用于在集成电路掺杂的玻璃介电膜中控制形成空隙的方法。 该膜可由硼磷石玻璃（BPSG）或其他类型的掺杂玻璃形成。 该方法包括以下步骤：提供其上形成有导体的基板，将第一掺杂玻璃层以与导体之间的空间的尺寸预定比例的厚度沉积，回流第一掺杂玻璃层，施加一个或多个附加 掺杂的玻璃层以弥补所需的总掺杂玻璃厚度的任何不足，并且执行高温致密化以平滑每个附加层。 该方法通过控制形成具有低介电常数并因此降低相邻导体之间的电容的空隙来提供增加的集成电路速度。 该方法可以使用现有的掺杂玻璃沉积和回流设备进行。

公开(公告)号：US20140172494A1

公开(公告)日：2014-06-19

申请号：US14237181

申请日：2012-05-14

申请人： Junko Hosoda ,  Kenichi Funaki ,  Atsushi Shimoda

发明人： Junko Hosoda ,  Kenichi Funaki ,  Atsushi Shimoda

IPC分类号： G06Q10/06

CPC分类号： G06Q10/06315 ,  G06Q10/087

摘要： The invention displays multiple inventory period combinations, as multiple multi-base inventory deployment proposals having assessed values for items such as cash flow and inventory value, each of said assessed values being within a range entered by an inventory deployment decision-maker. For each product included in request information, the invention finds a minimum period (the total lead time from when a given item leaves the applicable warehouse until the item reaches the base that sells the applicable product) and a maximum period (the total lead time needed for all component parts configuring the item to reach the warehouse, added to the minimum period), for each item configuring said product and each warehouse base. The invention computes product-specific inventory period combination information for each warehouse base, and creates inventory period combination information by combining said product-specific inventory period combination information for each product type. The invention performs an inventory management calculation for the inventory period combination information, computes the value of an assessment index, and compares said value to the maximum value thereof. The invention selects an inventory period combination having an assessment index value within a permitted range, as a candidate display proposal. For the candidate display proposal, the invention computes a display evaluation value for each display proposal evaluation item by multiplying a display evaluation coefficient by an inventory value.

摘要翻译： 本发明显示多个库存周期组合，作为多个多基准库存部署提议已经评估了诸如现金流和库存值之类的项目的价值，每个所述评估值在库存部署决策者输入的范围内。 对于请求信息中包含的每个产品，本发明找到最短期间（从给定物品离开适用仓库直到物品到达销售适用产品的基地的总交货时间）和最长期间（所需的总时间 对于配置项目到达仓库的所有组件，添加到最小期间），对于配置所述产品和每个仓库基础的每个项目。 本发明为每个仓库基础计算产品专用库存周期组合信息，并通过组合每个产品类型的所述产品专用库存周期组合信息来创建库存周期组合信息。 本发明对库存周期组合信息执行库存管理计算，计算评估指标的值，并将所述值与其最大值进行比较。 本发明选择具有允许范围内的评估指标值的库存周期组合作为候选显示提案。 对于候选显示提案，本发明通过将显示评估系数乘以库存值来计算每个显示提案评估项目的显示评估值。

公开(公告)号：US20110110752A1

公开(公告)日：2011-05-12

申请号：US12883602

申请日：2010-09-16

申请人： Susumu TAUCHI ,  Hideaki Kondo ,  Teruo Nakata ,  Keita Nogi ,  Atsushi Shimoda ,  Takafumi Chida

发明人： Susumu TAUCHI ,  Hideaki Kondo ,  Teruo Nakata ,  Keita Nogi ,  Atsushi Shimoda ,  Takafumi Chida

IPC分类号： H01L21/677

CPC分类号： H01L21/67184 ,  H01L21/67196 ,  H01L21/67766 ,  H01L21/67778

摘要： The invention provides a vacuum processing system of a semiconductor processing substrate and a vacuum processing method using the same, comprising an atmospheric transfer chamber having a plurality of cassette stands, a lock chamber arranged on a rear side of the atmospheric transfer chamber, and a first vacuum transfer chamber connected to a rear side of the lock chamber, wherein the first vacuum transfer chamber does not have any vacuum processing chamber connected thereto and has transfer intermediate chambers connected thereto, and the transfer intermediate chambers have subsequent vacuum transfer chambers connected thereto, and wherein the wafers are transferred via the lock chamber to the first vacuum transfer chamber to be processed in each of the subsequent vacuum processing chambers, which are further transferred via any of the transfer intermediate chambers connected to the first vacuum transfer chamber to the subsequent vacuum transfer chambers, and the respective wafers transferred to the subsequent vacuum transfer chambers other than the first vacuum transfer chamber are transferred to the respective vacuum processing chambers connected to each of the vacuum processing chambers and processed therein.

摘要翻译： 本发明提供了一种半导体处理基板的真空处理系统和使用该真空处理方法的真空处理方法，包括具有多个盒架的大气传送室，布置在大气传送室后侧的锁定室，以及第一 真空传送室连接到锁定室的后侧，其中第一真空传送室不具有连接到其上的任何真空处理室，并且具有连接到其上的传送中间室，并且传送中间室具有连接到其上的随后的真空传送室， 其中所述晶片经由所述锁定室传送到所述第一真空传送室，以在随后的每个真空处理室中被处理，所述真空处理室进一步通过连接到所述第一真空传送室的任何转移中间室转移到随后的真空转印 室和相应的晶片tr 推送到除了第一真空转移室之后的后续真空转移室被转移到连接到每个真空处理室的各个真空处理室中并在其中处理。

公开(公告)号：US07062081B2

公开(公告)日：2006-06-13

申请号：US09783604

申请日：2001-02-15

申请人： Atsushi Shimoda ,  Ichirou Ishimaru ,  Yuji Takagi ,  Takuo Tamura ,  Yuichi Hamamura ,  Kenji Watanabe ,  Yasuhiko Ozawa ,  Seiji Isogai

发明人： Atsushi Shimoda ,  Ichirou Ishimaru ,  Yuji Takagi ,  Takuo Tamura ,  Yuichi Hamamura ,  Kenji Watanabe ,  Yasuhiko Ozawa ,  Seiji Isogai

IPC分类号： G06K9/00

CPC分类号： G06T7/0004 ,  G06T2207/30148 ,  H01L22/20

摘要： In order to allow critical flaws in an inspected item to be determined early during a production process, the present invention includes the following steps: a step of detecting defects in a production process for the inspected item and storing defect positions; a step of collecting detailed defect information and storing the detailed information in association with defect positions; a step of storing positions at which flaws were generated based on a final inspection of the inspected item; a step of comparing defect positions with positions at which flaws were generated; and a step of classifying and displaying detailed information based on the comparison results.

摘要翻译： 为了在生产过程中早期确定检查项目中的关键缺陷，本发明包括以下步骤：检测检查项目的生产过程中的缺陷并存储缺陷位置的步骤; 收集详细缺陷信息并存储与缺陷位置相关联的详细信息的步骤; 基于检查项目的最终检查来存储产生缺陷的位置的步骤; 将缺陷位置与产生缺陷的位置进行比较的步骤; 并根据比较结果对详细信息进行分类和显示。

公开(公告)号：US06476388B1

公开(公告)日：2002-11-05

申请号：US09421093

申请日：1999-10-19

申请人： Ryo Nakagaki ,  Yuji Takagi ,  Atsushi Shimoda ,  Kenji Obara ,  Yasuhiko Ozawa ,  Hideka Bamba ,  Seiji Isogai ,  Kenji Watanabe ,  Chie Shishido ,  Toshiei Kurosaki

发明人： Ryo Nakagaki ,  Yuji Takagi ,  Atsushi Shimoda ,  Kenji Obara ,  Yasuhiko Ozawa ,  Hideka Bamba ,  Seiji Isogai ,  Kenji Watanabe ,  Chie Shishido ,  Toshiei Kurosaki

IPC分类号： G21K700

CPC分类号： G01N23/225 ,  H01J37/222 ,  H01J37/265 ,  H01J2237/24495 ,  H01J2237/2485 ,  H01J2237/2817

摘要： The invention is a scanning electron microscope including a switching control unit for controlling to switch at least scanning unit to switch a digital image signal of a low magnification based on a wide image taking field of view to and from a digital image signal of a high magnification based on a narrow image taking field of view from an A/D conversion unit and a beam spot diameter control unit for controlling to switch a spot diameter of electron beam on a surface of an object substrate in controlling to switch the signals by the switching control unit and a defect portion analyzing method using the scanning electron microscope.

摘要翻译： 本发明是一种扫描电子显微镜，其特征在于，具备切换控制部，该切换控制部基于与高倍率的数字图像信号相对应的宽拍摄视场，至少切换扫描部，切换低倍率的数字图像信号 基于来自A / D转换单元的窄图像拍摄视场和光束光斑直径控制单元，用于控制通过切换控制切换信号来控制在对象基板的表面上切换电子束的光斑直径 单元和使用扫描电子显微镜的缺陷部分析方法。

公开(公告)号：US5278103A

公开(公告)日：1994-01-11

申请号：US23304

申请日：1993-02-26

申请人： Thomas G. Mallon ,  Chi-yi Kao ,  Wei-jen Hsia ,  Atsushi Shimoda

发明人： Thomas G. Mallon ,  Chi-yi Kao ,  Wei-jen Hsia ,  Atsushi Shimoda

IPC分类号： H01L21/31 ,  H01L21/3105 ,  H01L21/316 ,  H01L21/768 ,  H01L21/473

CPC分类号： H01L21/31051 ,  H01L21/76819 ,  H01L21/7682

摘要： A method is provided for the controlled formation of voids in integrated circuit doped glass dielectric films. The film can be formed of borophosphosilica glass (BPSG) or other types of doped glass. The method involves the steps of providing a substrate on which conductors are formed, depositing a first layer of doped glass to a thickness in a predetermined ratio to the size of the space between conductors, reflowing the first doped glass layer, applying one or more additional doped glass layers to make up for any shortfall in desired total doped glass thickness, and performing a high temperature densification to smooth each additional layer. The method provides for increased integrated circuit speed by controlled formation of voids which have a low dielectric constant and therefore reduce capacitance between adjacent conductors. The method can be performed using existing doped glass deposition and reflow equipment.

摘要翻译： 提供了一种用于在集成电路掺杂的玻璃介电膜中控制形成空隙的方法。 该膜可由硼磷石玻璃（BPSG）或其他类型的掺杂玻璃形成。 该方法包括以下步骤：提供其上形成有导体的基板，将第一掺杂玻璃层以与导体之间的空间的尺寸预定比例的厚度沉积，回流第一掺杂玻璃层，施加一个或多个附加 掺杂的玻璃层以弥补所需的总掺杂玻璃厚度的任何不足，并且执行高温致密化以平滑每个附加层。 该方法通过控制形成具有低介电常数并因此降低相邻导体之间的电容的空隙来提供增加的集成电路速度。 该方法可以使用现有的掺杂玻璃沉积和回流设备进行。

公开(公告)号：US20070299640A1

公开(公告)日：2007-12-27

申请号：US11766156

申请日：2007-06-21

申请人： Atsushi Shimoda ,  Tetsuro Adachi

发明人： Atsushi Shimoda ,  Tetsuro Adachi

IPC分类号： G06G7/48 ,  G06F7/60

CPC分类号： G06F17/50 ,  G06F2217/08

摘要： To provide a technology for simultaneously designing a plurality of products and respectively evaluating each of the plurality of products thus designed, a module type constituting a product is specified, modules included in the module type are specified based on an attribute table storage area, candidate products are created by combining the modules thus specified, parameters corresponding to modules included in the candidate products are specified based on the parameter file storage area, an index for each of the candidate products is obtained by using the parameters thus specified, and the index thus obtained is displayed on a display unit.

摘要翻译： 为了提供用于同时设计多个产品并分别评估如此设计的多个产品中的每一个的技术，指定构成产品的模块类型，包括在模块类型中的模块基于属性表存储区域，候选产品 通过组合如此指定的模块来创建，基于参数文件存储区域来指定与候选产品中包括的模块相对应的参数，通过使用如此指定的参数来获得每个候选产品的索引，并且获得这样的索引 显示在显示单元上。

公开(公告)号：US20060085278A1

公开(公告)日：2006-04-20

申请号：US11218763

申请日：2005-09-06

申请人： Atsushi Shimoda ,  Atsuhiro Ishida ,  Hirotaka Morita

发明人： Atsushi Shimoda ,  Atsuhiro Ishida ,  Hirotaka Morita

IPC分类号： G06Q30/00

CPC分类号： G06Q30/02 ,  G06Q30/0601

摘要： A renewal proposal support system that performs communication with a sales terminal device includes a configuration information storage unit for storing information on components of a product provided for a customer, a component information storage unit for storing the components, a configuration rule storage unit for storing information on advisability of combination between the components, and a control unit for performing processing on a change of one of the components. The control means refers to the configuration information storage unit, thereby displaying the components on the sales terminal device, and notifies an operator of the sales terminal device of other component that cannot be combined with the one of the components targeted for the change, upon receipt of a command for the change of the one of the components from the sales terminal device.

摘要翻译： 与销售终端装置进行通信的更新建议支援系统包括配置信息存储单元，用于存储关于为顾客提供的商品的组成部分的信息，用于存储组件的组件信息存储单元，用于存储信息的配置规则存储单元 关于组件之间的组合的可取性，以及用于对一个部件的改变进行处理的控制单元。 控制装置参考配置信息存储单元，从而在销售终端设备上显示组件，并且在接收到时向销售终端设备通知其他组件的其他组件不能与为改变目标的组件之一组合 用于更改销售终端设备中的一个组件的命令。

公开(公告)号：US06756589B1

公开(公告)日：2004-06-29

申请号：US09743560

申请日：2001-01-09

申请人： Kenji Obara ,  Yuji Takagi ,  Atsushi Shimoda ,  Ryou Nakagaki ,  Seiji Isogai ,  Yasuhiko Ozawa ,  Hideka Banba ,  Kenji Watanabe ,  Chie Shishido

发明人： Kenji Obara ,  Yuji Takagi ,  Atsushi Shimoda ,  Ryou Nakagaki ,  Seiji Isogai ,  Yasuhiko Ozawa ,  Hideka Banba ,  Kenji Watanabe ,  Chie Shishido

IPC分类号： H01L2166

CPC分类号： H01J37/28 ,  G01N21/956 ,  G01N21/95692 ,  G01N2021/8867 ,  H01J2237/2817 ,  H01L22/12

摘要： During closer inspection with a local defect area being magnified, it is desirable to reduce image acquisition time by making the number of stage moves as few as possible so that a defect can be observed efficiently. To accomplish this, the invention offers a method of observing samples characterized by: acquiring a reference sample image not including any defect on a sample by capturing an image of the sample, based on the information on the defect developed on the sample and detected by an inspection apparatus; adjusting the position of the sample so that the defect will fall within the field of view of image capture, based on the above information; acquiring a defective sample image including the defect on the sample by capturing an image of the sample in the adjusted position; locating the defect on the defective sample image by comparing the reference sample image and the defective sample image; acquiring a magnified image of the defect by capturing a magnified view of the local area where the located defect exists within the field of view of image capture; and displaying the magnified image of the defect on a screen.

摘要翻译： 在局部缺陷区域放大的仔细检查中，期望通过使台数移动尽可能少地减少图像获取时间，从而可以有效地观察到缺陷。 为了实现这一点，本发明提供了一种观察样本的方法，其特征在于：基于在样品上形成的缺陷的信息，通过采集样本的检测信息来获取样本上不包括任何缺陷的参考样本图像， 检验仪器; 基于上述信息，调整样本的位置使得缺陷落入图像捕获视野内; 通过在调整位置拍摄样本的图像来获取包含样本上的缺陷的缺陷样本图像; 通过比较参考样本图像和有缺陷的样本图像来定位缺陷样本图像上的缺陷; 通过在图像捕获视野内捕获定位缺陷的局部区域的放大视图来获取缺陷的放大图像; 并在屏幕上显示缺陷的放大图像。

公开(公告)号：US06556955B2

公开(公告)日：2003-04-29

申请号：US10012380

申请日：2001-12-12

申请人： Yasuhiro Yoshitake ,  Masataka Shiba ,  Atsushi Shimoda

发明人： Yasuhiro Yoshitake ,  Masataka Shiba ,  Atsushi Shimoda

IPC分类号： G06F1116

CPC分类号： H01L22/20 ,  G01N21/95607 ,  H01L2924/0002 ,  H01L2924/00

摘要： A method of reviewing defects on a substrate. The method includes inputting information of defects on a substrate detected by a detection apparatus, identifying cluster of defects detected on the substrate by using the inputted information, selecting defects to be reviewed from the cluster identified, reviewing the selected defects, and classifying the reviewed defects.