公开(公告)号：US06538737B2

公开(公告)日：2003-03-25

申请号：US10003513

申请日：2001-10-31

申请人： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Daniel J. W. Brown

发明人： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Daniel J. W. Brown

IPC分类号： G01J314

CPC分类号： G01J3/12 ,  G01J1/4257 ,  G01J3/22 ,  G01J3/26 ,  G01J9/02

摘要： A high resolution etalon-grating spectrometer. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The etalon and the grating are placed in a leak-fight enclosure filled with a gas, such as nitrogen or helium. The wavelength scanning of the spectrometer is done by changing the gas pressure in the enclosure during the scan.

公开(公告)号：US07885309B2

公开(公告)日：2011-02-08

申请号：US11787180

申请日：2007-04-13

申请人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt ,  Richard L. Sandstrom ,  Ivan Lalovic

发明人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt ,  Richard L. Sandstrom ,  Ivan Lalovic

IPC分类号： H01S3/22

CPC分类号： H01S3/225 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/083 ,  H01S3/10092 ,  H01S3/2251 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2383 ,  H01S2301/02

摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.

公开(公告)号：US20100258748A1

公开(公告)日：2010-10-14

申请号：US12720190

申请日：2010-03-09

申请人： Georgiy O. Vaschenko ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard L. Sandstrom ,  Alexander I. Ershov ,  David Brandt ,  Joshua J. Miller

发明人： Georgiy O. Vaschenko ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard L. Sandstrom ,  Alexander I. Ershov ,  David Brandt ,  Joshua J. Miller

IPC分类号： G21K5/02

CPC分类号： H05G2/005 ,  G03F7/70033 ,  G21K5/00 ,  H05G2/003 ,  H05G2/006

摘要： A system and method generating an extreme ultraviolet light in an extreme ultraviolet light chamber including a collector mirror, a droplet generation system having a droplet outlet aligned to output a plurality of droplets along a target material path and a first catch including a first open end substantially aligned to the target material path and at least one internal surface oriented toward a second end of the first catch, the second end being opposite from the first open end.

摘要翻译： 一种在包括收集反射镜的极紫外光室中产生极紫外光的系统和方法，具有液滴出口的液滴产生系统，该液滴产生系统沿着目标材料路径排列以输出多个液滴;以及第一捕集器，其基本上包括第一开口端 与目标材料路径对准并且至少一个内表面朝向第一卡扣的第二端定向，第二端与第一开口端相对。

公开(公告)号：US07058107B2

公开(公告)日：2006-06-06

申请号：US10804281

申请日：2004-03-18

申请人： David S. Knowles ,  Daniel J. W. Brown ,  Richard L. Sandstrom ,  German E. Rylov ,  Eckehard D. Onkels ,  Herve A. Besaucele ,  David W. Myers ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard C. Ujazdowski ,  Richard M. Ness ,  Scott T. Smith ,  William G. Hulburd

发明人： David S. Knowles ,  Daniel J. W. Brown ,  Richard L. Sandstrom ,  German E. Rylov ,  Eckehard D. Onkels ,  Herve A. Besaucele ,  David W. Myers ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard C. Ujazdowski ,  Richard M. Ness ,  Scott T. Smith ,  William G. Hulburd

IPC分类号： H01S3/22

CPC分类号： H01S3/2366 ,  G01J9/00 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333

摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line selection package for selecting the strongest F2 spectral line.

摘要翻译： 一种注射种子模块化气体放电激光系统，其能够以约4,000Hz或更大的脉冲速率和约5mJ或更大的脉冲能量产生高质量的脉冲激光束。 提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。 可以单独控制室，允许主振荡器中的波长参数的单独优化和放大室中的脉冲能量参数的优化。 配置为MOPA并被专门设计用作集成电路光刻的光源的F 2 N 2激光系统中的优选实施例。 在优选的MOPA实施例中，每个腔室包括单个切向风扇，其通过在比脉冲之间的大约0.25毫秒更短的时间内清除来自放电区域的碎屑来提供足够的气流以允许以4000Hz或更高的脉冲速率操作。 主振荡器配备有用于选择最强的F 2/2谱线的线选择包。

公开(公告)号：US06985508B2

公开(公告)日：2006-01-10

申请号：US10627215

申请日：2003-07-24

申请人： David S. Knowles ,  Daniel J. W. Brown ,  Herve A. Besaucele ,  David W. Meyers ,  Alexander I. Ershov ,  William N. Partlo ,  Richard L. Sandstrom ,  Palash P. Das ,  Stuart L. Anderson ,  Igor V. Fomenkov ,  Richard C. Ujazdowski ,  Eckehard D. Onkels ,  Richard M. Ness ,  Scott T. Smith ,  William G. Hulburd ,  Jeffrey Oicles

发明人： David S. Knowles ,  Daniel J. W. Brown ,  Herve A. Besaucele ,  David W. Meyers ,  Alexander I. Ershov ,  William N. Partlo ,  Richard L. Sandstrom ,  Palash P. Das ,  Stuart L. Anderson ,  Igor V. Fomenkov ,  Richard C. Ujazdowski ,  Eckehard D. Onkels ,  Richard M. Ness ,  Scott T. Smith ,  William G. Hulburd ,  Jeffrey Oicles

IPC分类号： H01S3/22

CPC分类号： G01J1/4257 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.

摘要翻译： 一种注射种子模块化气体放电激光系统，其能够以约4,000Hz或更大的脉冲速率和约5mJ或更大的脉冲能量产生高质量的脉冲激光束。 提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。 可以单独控制室，允许主振荡器中的波长参数的单独优化和放大室中的脉冲能量参数的优化。 配置为MOPA并被专门用于集成电路光刻的光源的ArF准分子激光系统中的优选实施例。 在优选的MOPA实施例中，每个腔室包括单个切向风扇，其通过在比脉冲之间的大约0.25毫秒更短的时间内清除来自放电区域的碎屑来提供足够的气流以允许以4000Hz或更高的脉冲速率操作。 主振荡器配备有具有非常快的调谐镜的线窄化封装，能够以4000Hz或更高的重复频率在脉冲到脉冲的基础上控制中心线波长，精度小于0.2μm。

公开(公告)号：US06603549B2

公开(公告)日：2003-08-05

申请号：US09931726

申请日：2001-08-16

申请人： Steven F. Haas ,  Richard L. Sandstrom ,  Thomas Hofmann ,  Alexander I. Ershov

发明人： Steven F. Haas ,  Richard L. Sandstrom ,  Thomas Hofmann ,  Alexander I. Ershov

IPC分类号： G01J318

CPC分类号： G01J3/26 ,  G01J1/4257 ,  G01J3/02 ,  G01J3/027 ,  G01J3/12 ,  G01J3/1809 ,  G01J3/22 ,  G01J3/28 ,  G01J9/02

摘要： A simple, reliable, easy to use method for calculating bandwidth data of very narrow band laser beams based on bandwidth data obtained with a spectrometer in circumstances where the laser bandwidths are not large compared to the slit function of the spectrometer. The slit function of the spectrometer is determined. Spectral data of the laser beam is measured with the spectrometer to produce a measured laser beam spectrum which represents a convolution of the laser beam spectrum and the spectrometer slit function. This measured laser spectrum is then mathematically convolved with the slit function of the spectrometer to produce a doubly convolved spectrum. Bandwidth values representing true laser bandwidths are determined from measured laser spectrum and the doubly convolved spectrum. Preferably the true laser bandwidths are calculated by determining the difference between “twice a measured laser bandwidth” and a corresponding “doubly convolved bandwidth”. This method provides an excellent estimate of the true laser bandwidth because “twice the measured laser bandwidth” represents two laser bandwidths and two spectrometer slit function bandwidths and the “doubly convolved bandwidth” represents one laser bandwidth and two spectrometer slit function bandwidths. Thus, the difference is a representation of the true laser bandwidth. In a preferred embodiment the bandwidth parameters measured are the full width half-maximum bandwidth and the 95% integral bandwidth.

公开(公告)号：USRE42588E1

公开(公告)日：2011-08-02

申请号：US11352522

申请日：2006-02-10

申请人： John P. Fallon ,  Richard L. Sandstrom ,  William N. Partlo ,  Alexander I. Ershov ,  Toshihiko Ishihara ,  John Meisner ,  Richard M. Ness ,  Paul C. Melcher ,  John A. Rule ,  Robert N. Jacques

发明人： John P. Fallon ,  Richard L. Sandstrom ,  William N. Partlo ,  Alexander I. Ershov ,  Toshihiko Ishihara ,  John Meisner ,  Richard M. Ness ,  Paul C. Melcher ,  John A. Rule ,  Robert N. Jacques

IPC分类号： H01S3/22

CPC分类号： H01S3/2333 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2366

摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Feedback timing control techniques are provided for controlling the relative timing of the discharges in the two chambers with an accuracy in the range of about 2 to 5 billionths of a second even in burst mode operation. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.

摘要翻译： 本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。 在优选实施例中，激光器是具有主振荡器的生产线机器，该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。 提供了反馈定时控制技术，即使在脉冲串模式操作中，也可以精确地控制两个室中的放电的相对定时，其精确度在大约2至50亿分之一秒的范围内。 该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。

公开(公告)号：US07838854B2

公开(公告)日：2010-11-23

申请号：US12220560

申请日：2008-07-25

申请人： J. Martin Algots ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  William N. Partlo ,  Richard L. Sandstrom ,  Oscar Hemberg ,  Alexander N. Bykanov ,  Dennis W. Cobb

发明人： J. Martin Algots ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  William N. Partlo ,  Richard L. Sandstrom ,  Oscar Hemberg ,  Alexander N. Bykanov ,  Dennis W. Cobb

IPC分类号： H01J35/20

CPC分类号： H05G2/003 ,  H05G2/005 ,  H05G2/006

摘要： An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.

摘要翻译： 公开了一种EUV等离子体形成靶递送系统和方法，其可以包括：目标液滴形成机构，其包括磁阻或电子限制材料，终止于输出孔的液体等离子体源材料通道; 将电荷施加到液滴形成喷射流或沿着选定路径离开通道的各个液滴的充电机构; 在输出孔之间的液滴偏转器和等离子体引发位置周期性地偏转来自所选择的路径的液滴;液体靶材料输送机构，包括具有输入开口和输出孔的液体靶材料输送通道; 产生在液体目标材料内的干扰力的电动干扰力产生机构，具有输出孔的液体目标传送液滴形成机构; 和/或围绕输出孔周边的润湿屏障。

公开(公告)号：US07564888B2

公开(公告)日：2009-07-21

申请号：US11805583

申请日：2007-05-23

申请人： Alexander I. Ershov ,  James J. Ferrell ,  Thomas Hofmann ,  Daniel J. Reiley ,  Christopher R. Remen ,  Richard L. Sandstrom

发明人： Alexander I. Ershov ,  James J. Ferrell ,  Thomas Hofmann ,  Daniel J. Reiley ,  Christopher R. Remen ,  Richard L. Sandstrom

IPC分类号： H01S3/22 ,  H01S3/10

CPC分类号： H01S3/225 ,  H01S3/0057 ,  H01S3/03 ,  H01S3/034

摘要： An apparatus and method is disclosed which may comprise a high power excimer or molecular fluorine gas discharge laser DUV light source system which may comprise: a pulse stretcher which may comprise: an optical delay path mirror, an optical delay path mirror gas purging assembly which may comprise: a purging gas supply system directing purging gas across a face of the optical delay line mirror. The optical delay path mirror may comprise a plurality of optical delay path mirrors; the purging gas supply system may direct purging gas across a face of each of the plurality of optical delay line mirrors. The purging gas supply system may comprise: a purging gas supply line; a purging gas distributing and directing mechanism which may direct purging gas across the face of the respective optical delay path mirror.

摘要翻译： 公开了一种装置和方法，其可以包括高功率准分子或分子氟气体放电激光DUV光源系统，其可以包括：脉冲展宽器，其可以包括：光学延迟路径反射镜，光学延迟路径镜气体清洗组件，其可以 包括：吹扫气体供应系统，其引导净化气体穿过光学延迟线反射镜的表面。 光学延迟路径镜可以包括多个光学延迟路径镜; 净化气体供应系统可以引导净化气体穿过多个光学延迟线反射镜中的每一个的表面。 净化气体供应系统可以包括：净化气体供应管线; 吹扫气体分配和引导机构，其可以将吹扫气体引导通过相应的光学延迟路径反射镜的表面。

公开(公告)号：US20090080476A1

公开(公告)日：2009-03-26

申请号：US11973671

申请日：2007-10-10

申请人： William N. Partlo ,  Alexander I. Ershov ,  German Rylov ,  Igor V. Fomenkov ,  Daniel J.W. Brown ,  Christian J. Wittak ,  Rajasekhar M. Rao ,  Robert A. Bergstedt ,  John Fitzgerald ,  Richard L. Sandstrom ,  Vladimir B. Fleurov ,  Robert N. Jacques ,  Ed Danielewicz ,  Robin Swain ,  Edward Arriola ,  Mike Wyatt ,  Walter Crosby

发明人： William N. Partlo ,  Alexander I. Ershov ,  German Rylov ,  Igor V. Fomenkov ,  Daniel J.W. Brown ,  Christian J. Wittak ,  Rajasekhar M. Rao ,  Robert A. Bergstedt ,  John Fitzgerald ,  Richard L. Sandstrom ,  Vladimir B. Fleurov ,  Robert N. Jacques ,  Ed Danielewicz ,  Robin Swain ,  Edward Arriola ,  Mike Wyatt ,  Walter Crosby

IPC分类号： H01S3/139 ,  H01S3/083

CPC分类号： H01S3/0057 ,  G03F7/70341 ,  G03F7/70583

摘要： An apparatus and method which may comprise a pulsed gas discharge laser which may comprise a seed laser portion; an amplifier portion receiving the seed laser output and amplifying the optical intensity of each seed pulse; a pulse stretcher which may comprise: a first beam splitter operatively connected with the first delay path and a second pulse stretcher operatively connected with the second delay path; a first optical delay path tower containing the first beam splitter; a second optical delay path tower containing the second beam splitter; one of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors located in the first tower and in the second tower; the other of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors only in one of the first tower and the second tower.

摘要翻译： 一种可包括可包括种子激光器部分的脉冲气体放电激光器的装置和方法; 接收种子激光输出并放大每个种子脉冲的光强度的放大器部分; 脉冲展开器，其可以包括：与第一延迟路径可操作地连接的第一分束器和与第二延迟路径可操作地连接的第二脉冲展开器; 包含第一分束器的第一光学延迟路径塔; 包含第二分束器的第二光学延迟路径塔; 第一和第二光学延迟路径中的一个可以包括：多个反射镜，其限定相应的光学延迟路径，包括位于第一塔架和第二塔架中的反射镜; 第一和第二光学延迟路径中的另一个可以包括：多个反射镜限定相应的光学延迟路径，其仅包括在第一塔架和第二塔架之一中的镜子。