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    Method for manufacturing porous silicon
    34.
    发明授权
    Method for manufacturing porous silicon 有权
    多孔硅制造方法

    公开(公告)号：US07396479B1

    公开(公告)日：2008-07-08

    申请号：US10883466

    申请日：2004-06-30

    申请人： Kramadhati Ravi ,  Alan M. Myers

    发明人： Kramadhati Ravi ,  Alan M. Myers

    IPC分类号： B31D3/00 ,  H01L21/30 ,  H01L21/46

    CPC分类号： H01L23/473 ,  B81C1/005 ,  B81C1/00507 ,  B81C2201/0109 ,  B81C2201/0115 ,  F04B19/006 ,  F04B37/02 ,  H01L2924/0002 ,  H01L2924/00

    摘要： A method for preparing porous silicon in which an oxidized single crystal silicon wafer is first bonded to a polycrystalline wafer. The oxidized high quality wafer is then thinned to the desired thickness by grinding and polishing. An oxide may then be deposited on the wafer and patterned to expose regions were the porous silicon will be formed. The single crystal silicon wafer may then etched in the unmasked areas of the pattern to thin the single crystal silicon wafer to the desired thickness in the range of 0.1 microns to 1.0 microns. Next, the porous silicon may be formed using standard techniques. Once the porous silicon is formed the polycrystalline silicon wafer may be ground away and the oxide layer may be undercut to expose the porous silicon. Finally, an appropriate liner material may be applied to the porous silicon.

    摘要翻译： 一种多孔硅的制造方法，其中首先将氧化的单晶硅晶片接合到多晶晶片。 然后通过研磨和抛光将氧化的高质量晶片减薄至所需厚度。 然后可以将氧化物沉积在晶片上并且被图案化以暴露出将形成多孔硅的区域。 然后可以在图案的未屏蔽区域中蚀刻单晶硅晶片，以将单晶硅晶片细化至0.1微米至1.0微米范围内的所需厚度。 接下来，可以使用标准技术形成多孔硅。 一旦多孔硅形成，多晶硅晶片可能被磨掉，并且氧化物层可能被切削以露出多孔硅。 最后，可以将合适的衬垫材料施加到多孔硅上。

    Dull1 coding for a starch synthase and uses thereof
    36.
    发明授权
    Dull1 coding for a starch synthase and uses thereof 失效
    Dull1编码淀粉合成酶及其用途

    公开(公告)号：US06639125B1

    公开(公告)日：2003-10-28

    申请号：US09554467

    申请日：2000-05-12

    申请人： Alan M. Myers ,  Martha Graham James

    发明人： Alan M. Myers ,  Martha Graham James

    IPC分类号： C12N1529

    CPC分类号： C12N9/1051 ,  B01J4/02 ,  C07H21/04 ,  C07K2319/00 ,  C12N15/8245 ,  C12Y204/01011

    摘要： The maize gene dull1 (du1) of the present invention is a determinant of the structure of endosperm starch. Mutations of du1 affect the activity of at least two enzymes involved in starch biosynthesis, namely the starch synthase, SSII, and the starch branching enzyme, SBEIIa. Du1 codes for a predicted 1674 residue protein, and is expressed with a unique temporal pattern in endosperm but is undetectable in leaf or root. The size of the Du1 product and its expression pattern match precisely the known characteristics of maize SSII. The Du1 product contains two different repeated regions in its unique amino terminus, one of which is identical to a conserved segment of the starch debranching enzymes. The cDNA provided for in the present invention encodes SSII, and mutations within this gene affect multiple aspects of starch biogenesis by disrupting an enzme complex containing starch synthase(s), starch branching enzyme(s), and possibly starch debranching enzyme.

    摘要翻译： 本发明的玉米基因dull1（du1）是胚乳淀粉结构的决定因素。 du1的突变影响淀粉生物合成中至少两种酶的活性，即淀粉合成酶，SSII和淀粉分支酶SBEIIa。 Du1编码预测的1674残基蛋白，并且在胚乳中以独特的时间模式表达，但在叶或根中是不可检测的。 Du1产品的大小及其表达模式与玉米SSII的已知特征精确匹配。 Du1产品在其独特的氨基末端含有两个不同的重复区域，其中之一与淀粉脱支酶的保守区段相同。 本发明中提供的cDNA编码SSII，并且该基因内的突变通过破坏含有淀粉合成酶，淀粉分支酶和可能的淀粉脱支酶的含量复合物影响淀粉生物发生的多个方面。

    Method for making a sub 100 nanometer semiconductor device using conventional lithography steps
    37.
    发明授权
    Method for making a sub 100 nanometer semiconductor device using conventional lithography steps 失效
    使用常规光刻步骤制造亚100纳米半导体器件的方法

    公开(公告)号：US06596646B2

    公开(公告)日：2003-07-22

    申请号：US09918622

    申请日：2001-07-30

    申请人： Ebrahim Andideh ,  Alan M. Myers

    发明人： Ebrahim Andideh ,  Alan M. Myers

    IPC分类号： H01L21302

    CPC分类号： H01L21/32139 ,  H01L21/31144

    摘要： A method of forming a semiconductor device is described. In that method, a masking layer is formed on a substrate. A layer of photoresist is then deposited and patterned on that layer to expose a first part of the masking layer while covering a second part of the masking layer. After the exposed part of that layer is etched, the resulting device is exposed to a plasma generated from a forming gas. Part of the second part of the masking layer is then removed by exposing the resulting device to a solution, while part of the second part of the masking layer is retained.

    摘要翻译： 描述形成半导体器件的方法。 在该方法中，在基板上形成掩模层。 然后在该层上沉积并图案化一层光致抗蚀剂以暴露掩模层的第一部分，同时覆盖掩模层的第二部分。 在蚀刻该层的暴露部分之后，将所得到的器件暴露于由成形气体产生的等离子体。 然后通过将所得到的器件暴露于溶液中去除掩模层的第二部分的一部分，同时保留掩模层的第二部分的一部分。

    Isolation of SU1, a starch debranching enzyme, the product of the maize gene sugary1
    38.
    发明授权
    Isolation of SU1, a starch debranching enzyme, the product of the maize gene sugary1 失效
    分离SU1，淀粉脱支酶，玉米基因的产物含糖1

    公开(公告)号：US5912413A

    公开(公告)日：1999-06-15

    申请号：US410784

    申请日：1995-03-24

    申请人： Alan M. Myers ,  Martha Graham James

    发明人： Alan M. Myers ,  Martha Graham James

    IPC分类号： C12N9/44 ,  C12N15/29 ,  C12N15/82 ,  A01H4/00 ,  A01H5/00

    CPC分类号： C12N9/2457 ,  C12N15/8245 ,  C12N9/2451 ,  C12N9/246 ,  C12Y302/01041 ,  C12Y302/01068

    摘要： SU1, a starch debranching enzyme active in maize endosperm (Zea mays), and the cDNA and gene sequences encoding SU1 are disclosed. The amino acid sequence is significantly similar to that of bacterial isoamylases, enzymes that hydrolyze .alpha.-(1.fwdarw.6) glycosidic bonds. Amino acid sequence similarity establishes SU1 as a member of the .alpha.-amylase superfamily of starch hydrolytic enzymes. Also disclosed are antibodies reactive with the SU1 protein, methods of producing antibodies to the SU1 protein, methods of producing fusion proteins including SU1 and methods of producing transgenic plants with a modified su1 gene. The expressed SU1 protein can serve as a replacement for the bacterial and fungal enzymes currently used in the starch processing industry.

    摘要翻译： SU1是在玉米胚乳（Zea mays）中活性的淀粉脱支酶，并且公开了编码SU1的cDNA和基因序列。 氨基酸序列与细菌异戊酰酶（水解α-（1-> 6）糖苷键的酶显着相似。 氨基酸序列相似性建立了SU1作为淀粉水解酶的α-淀粉酶超家族的成员。 还公开了与SU1蛋白反应的抗体，产生SU1蛋白的抗体的方法，产生包括SU1的融合蛋白的方法和用修饰的su1基因产生转基因植物的方法。 表达的SU1蛋白可以用作淀粉加工业中目前使用的细菌和真菌酶的替代物。