公开(公告)号：US08636937B2

公开(公告)日：2014-01-28

申请号：US12083829

申请日：2005-10-20

Applicant: Fengxiang Zhang ,  Hong Yee Low

Inventor： Fengxiang Zhang ,  Hong Yee Low

IPC: B29C59/02

CPC classification number: B29C59/02 ,  B81C99/0085 ,  B81C2201/0153 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10T428/24479

Abstract: A method for forming hierarchical patterns on an article by nanoimprinting is disclosed. The method includes using a first mold to form a primary pattern on the article at a first temperature and a first pressure, the first temperature and the first pressure being able to reduce the elastic modulus of the article; and using a second mold to form a second pattern on the primary pattern at a second temperature that is below the article's glass transition temperature, the forming of the second pattern being at a second pressure.

Abstract translation: 公开了一种通过纳米压印在文章上形成分层图案的方法。 该方法包括使用第一模具在第一温度和第一压力下在制品上形成主要图案，第一温度和第一压力能够降低制品的弹性模量; 并且使用第二模具在低于制品的玻璃化转变温度的第二温度下在初级图案上形成第二图案，第二图案的形成处于第二压力。

公开(公告)号：US08613879B2

公开(公告)日：2013-12-24

申请号：US12223198

申请日：2007-01-24

Applicant: Micah James Atkin

Inventor： Micah James Atkin

IPC: B29C59/02

CPC classification number: B01L3/502707 ,  B01L2200/12 ,  B01L2300/0816 ,  B01L2300/0887 ,  B29C59/022 ,  B32B38/00 ,  B32B38/0008 ,  B32B38/162 ,  B32B39/00 ,  B32B2038/1891 ,  B32B2310/0831 ,  B32B2310/14 ,  B32B2425/00 ,  B32B2457/08 ,  B81C1/0046 ,  B81C2201/0153

Abstract: A method of forming a stamped feature (P) on a substrate (S) includes: applying a plurality of stamping tool segments (32, 40a, 40b, 40c, 50, 60, 70, 80, 92) to at least one surface of the substrate. An arrangement (30, 90) for forming a stamped feature (P) on a substrate (S) includes a plurality of stamping tool segments (32, 40a, 40b, 40c, 50, 60, 70, 80, 92) that actuatable individually, in concert in groups of more than one, or combinations thereof.

Abstract translation: 在衬底（S）上形成冲压特征（P）的方法包括：将多个冲压工具段（32,50a，40b，40c，50,60,70,80,92）施加到至少一个表面 底物。 用于在衬底（S）上形成冲压特征（P）的装置（30,90）包括多个单独致动的冲压工具段（32,50a，40b，40c，50,60,70,80,92） ，多于一个的组合，或其组合。

公开(公告)号：US08409488B2

公开(公告)日：2013-04-02

申请号：US10562014

申请日：2004-06-22

Applicant: Tormen Massimo

Inventor： Tormen Massimo

IPC: B29C55/00

CPC classification number: G03F7/0002 ,  B29C33/02 ,  B81C99/0085 ,  B81C2201/0153 ,  B81C2201/036 ,  B82Y10/00 ,  B82Y40/00

Abstract: A lithographic process for forming a pattern in relief (20) on a mass (10) of polymeric material comprises the steps of: preparing the mass (10) of polymeric material and a die (12) having a surface region (14) facing towards the mass (10) of polymeric material and which reproduces in negative the pattern in relief (20); heating the die (12) and putting the mass (10) of polymeric material into contact with the die (12) in any temporal sequence, in such a way that the part of the mass (10) of polymeric material in contact with the surface zone (14) is subject to softening; and separating the die (12) from the mass (10) of polymeric material on the surface of which the pattern in relief (20) has been formed. The heating of at least one part of the die (12) is obtained by generation of thermal energy upon dissipation of another form of energy in at least one region (16) of the die (12).

Abstract translation: 用于在聚合物材料（10）上形成浮雕（20）中的图案的平版印刷工艺包括以下步骤：制备聚合物材料块（10）和模具（12），所述模具（12）具有面向 聚合物材料的质量（10）并且以凹凸（20）的形式呈现为负值; 加热模具（12）并将聚合材料的质量块（10）以任何时间顺序与模具（12）接触，使得聚合材料质量（10）的与表面接触的部分 区域（14）容易软化; 以及将模具（12）与形成有凹凸图案（20）的表面上的聚合材料块（10）分离。 模具（12）的至少一部分的加热通过在模具（12）的至少一个区域（16）中消散另一形式的能量时产生热能而获得。

公开(公告)号：US20100169042A1

公开(公告)日：2010-07-01

申请号：US12600527

申请日：2008-04-02

Applicant: Yuki Aritsuka ,  Morihisa Hoga

Inventor： Yuki Aritsuka ,  Morihisa Hoga

IPC: G06F15/00

CPC classification number: G01B21/20 ,  B81C99/0065 ,  B81C2201/0153 ,  B81C2201/0198 ,  G03F1/84

Abstract: A system for measuring a shape, includes an external storage unit storing tolerances of first and second shape factors defining a design shape of a measuring object; a first measuring tool measuring the first shape factor of the measuring object to obtain measurement data; and a measurement processing unit determining a shape of the measuring object. The measurement processing unit includes; a comparison module comparing the measurement data of the first shape factor with the tolerance of the first shape factor; a verification module composing a predicted shape using the measurement data and verifying whether the predicted shape is formed as a figure; a calculation module calculating predicted data of the second shape factor from the predicted shape; and a determination module determining a measurement shape by comparing the predicted data with the tolerance of the second shape factor.

Abstract translation: 一种用于测量形状的系统，包括存储限定测量对象的设计形状的第一和第二形状因子的公差的外部存储单元; 第一测量工具，测量测量对象的第一形状因子以获得测量数据; 以及测量处理单元，确定测量对象的形状。 测量处理单元包括： 将所述第一形状因子的测量数据与所述第一形状系数的公差进行比较的比较模块; 使用所述测量数据构成预测形状的验证模块，并验证所述预测形状是否形成为图形; 计算模块，根据所述预测形状计算所述第二形状因子的预测数据; 以及确定模块，通过将预测数据与第二形状因子的公差进行比较来确定测量形状。

公开(公告)号：US07741142B2

公开(公告)日：2010-06-22

申请号：US11286065

申请日：2005-11-22

Applicant: Manish Sharma

Inventor： Manish Sharma

IPC: H01L21/4763

CPC classification number: B81C1/00063 ,  B81B2201/06 ,  B81C2201/0133 ,  B81C2201/0153

Abstract: The present invention provides a method of fabricating a biosensor. The method includes providing a substrate which has a surface coating. The surface coating is deformable and the substrate includes a layered structure which has at least two electrically conductive layers separated by at least one electrically insulating layer. The method also includes imprinting a structure into the surface coating. Further, the method includes etching at least a region of the imprinted structure and the substrate to remove at least a portion of the structure and the substrate. The structure is shaped so that the etching forms at least a portion of the biosensor in the substrate and exposes at least a portion of each electrically conductive layer to form electrodes of the biosensor.

Abstract translation: 本发明提供一种制造生物传感器的方法。 该方法包括提供具有表面涂层的基底。 表面涂层是可变形的，并且衬底包括具有由至少一个电绝缘层分开的至少两个导电层的分层结构。 该方法还包括将结构压印到表面涂层中。 此外，所述方法包括蚀刻所述压印结构的至少一个区域和所述衬底以去除所述结构和所述衬底的至少一部分。 该结构被成形为使得蚀刻形成衬底中的生物传感器的至少一部分并且暴露出每个导电层的至少一部分以形成生物传感器的电极。

公开(公告)号：US20100133716A1

公开(公告)日：2010-06-03

申请号：US12621608

申请日：2009-11-19

Applicant: Jurjen F. Winkel ,  Withelmus T. Huck ,  Ximin He

Inventor： Jurjen F. Winkel ,  Withelmus T. Huck ,  Ximin He

IPC: B29C33/40 ,  B05D3/12 ,  B05D3/06

CPC classification number: B81C1/00031 ,  B81C2201/0153 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L51/447

Abstract: A method of forming a relief pattern on the surface of a substrate comprises the steps of providing a substrate, coating a thin layer of polymeric material onto the substrate, drying the polymeric material to leave residual lateral stress within the material, bringing a patterned stamp into contact with the polymeric material and applying pressure to the stamp such that the polymeric material ruptures patternwise and dewets at the surface of the substrate to form openings in the polymeric layer according to the pattern on the stamp.

Abstract translation: 在衬底的表面上形成浮雕图案的方法包括以下步骤：提供衬底，在衬底上涂覆薄层的聚合物材料，干燥聚合物材料以在材料内留下残留的横向应力，使图案化的印模进入 与聚合物材料接触并向印模施加压力，使得聚合物材料在图案表面破裂并在基材的表面露面以根据印模上的图案在聚合物层中形成开口。

公开(公告)号：US07682552B2

公开(公告)日：2010-03-23

申请号：US10851113

申请日：2004-05-24

Applicant: Chin-Chung Nien ,  Ta-Chuan Liu ,  Hong Hocheng

Inventor： Chin-Chung Nien ,  Ta-Chuan Liu ,  Hong Hocheng

IPC: G01B11/00

CPC classification number: G03F7/0002 ,  B81C1/0046 ,  B81C99/0065 ,  B81C2201/0153 ,  B82Y10/00 ,  B82Y40/00

Abstract: The present invention relates to a capacitive measurement method and system for a nanoimprint process, which arranges a plurality of electrode plates on both the backside of the master mold and the surface of the supporting base carrying the wafer substrate to form a plurality of capacitive structures. By monitoring the capacitance variation signal caused by the continuous variations in the thickness and the material properties of the resist during the imprint process, the status of the resist can be monitored and recorded, which is used as the references for determining the timing to demold in the nanoimprint process and for maintaining the flatness of the resist. Accordingly, the nanoimprint process can be automated easier and the quality and the throughput of of the nanometer scaled imprint product can be improved.

Abstract translation: 本发明涉及一种用于纳米压印工艺的电容测量方法和系统，其在主模的背面和承载晶片衬底的支撑基体的表面上布置多个电极板以形成多个电容结构。 通过监测由压印过程中厚度的连续变化和抗蚀剂的材料特性引起的电容变化信号，可以监测和记录抗蚀剂的状态，作为确定脱模时间的参考 纳米压印工艺和用于保持抗蚀剂的平整度。 因此，纳米压印工艺可以更容易自动化，并且能够提高纳米压印产品的质量和生产量。

公开(公告)号：US20100068489A1

公开(公告)日：2010-03-18

申请号：US12150249

申请日：2008-04-24

Applicant: Boris Kobrin ,  Romuald Nowak ,  Jeffrey D. Chinn

Inventor： Boris Kobrin ,  Romuald Nowak ,  Jeffrey D. Chinn

IPC: B32B5/00 ,  B32B9/00 ,  B05D5/12 ,  B28B7/38

CPC classification number: C23C16/403 ,  B81B3/0075 ,  B81C99/0085 ,  B81C2201/0153 ,  B81C2201/112 ,  C23C16/405 ,  C23C16/45525

Abstract: The carbon-doped metal oxide films described provide a low coefficient of friction, typically ranging from about 0.05 to about 0.4. Applied over a silicon substrate, for example, the carbon-doped metal oxide films provide anti-stiction properties, where the measured work of adhesion for a coated MEMS cantilever beam is less than 10 μJ/m2. The films provide unexpectedly low water vapor transmission. In addition, the carbon-doped metal oxide films are excellent when used as a surface release coating for nanoimprint lithography. The carbon content in the carbon-doped metal oxide films ranges from about 5 atomic % to about 20 atomic %.

Abstract translation: 所述的碳掺杂的金属氧化物膜提供低摩擦系数，通常为约0.05至约0.4。 施加在硅衬底上，例如，碳掺杂的金属氧化物膜提供抗静电性质，其中测量的涂覆的MEMS悬臂梁的粘附力小于10μJ/ m 2。 这些膜提供了意想不到的低水蒸汽传输。 此外，当用作纳米压印光刻的表面剥离涂层时，碳掺杂的金属氧化物膜是优异的。 碳掺杂的金属氧化物膜中的碳含量为约5原子％至约20原子％。

公开(公告)号：US20100001434A1

公开(公告)日：2010-01-07

申请号：US12223198

申请日：2007-01-24

Applicant: Micah James Atkin

Inventor： Micah James Atkin

IPC: B29C59/02

CPC classification number: B01L3/502707 ,  B01L2200/12 ,  B01L2300/0816 ,  B01L2300/0887 ,  B29C59/022 ,  B32B38/00 ,  B32B38/0008 ,  B32B38/162 ,  B32B39/00 ,  B32B2038/1891 ,  B32B2310/0831 ,  B32B2310/14 ,  B32B2425/00 ,  B32B2457/08 ,  B81C1/0046 ,  B81C2201/0153

Abstract: A method of forming a stamped feature (P) on a substrate (S) includes: applying a plurality of stamping tool segments (32, 40a, 40b, 40c, 50, 60, 70, 80, 92) to at least one surface of the substrate. An arrangement (30, 90) for forming a stamped feature (P) on a substrate (S) includes a plurality of stamping tool segments (32, 40a, 40b, 40c, 50, 60, 70, 80, 92) that actuatable individually, in concert in groups of more than one, or combinations thereof.

Abstract translation: 在衬底（S）上形成冲压特征（P）的方法包括：将多个冲压工具段（32,50a，40b，40c，50,60,70,80,92）施加到至少一个表面 底物。 用于在衬底（S）上形成冲压特征（P）的装置（30,90）包括多个单独致动的冲压工具段（32,50a，40b，40c，50,60,70,80,92） ，多于一个的组合，或其组合。

公开(公告)号：US11878299B2

公开(公告)日：2024-01-23

申请号：US17169181

申请日：2021-02-05

Applicant: Illumina, Inc.

Inventor： Hui Han ,  Dajun Yuan ,  M. Shane Bowen

IPC: B01L3/00 ,  B29C65/16 ,  B29C65/14 ,  H01J37/32 ,  G03F7/038 ,  G03F7/00 ,  B81C1/00 ,  B32B17/10 ,  B32B17/06 ,  G03F7/30 ,  G03F7/16 ,  G03F7/20

CPC classification number: B01L3/502707 ,  B29C65/1406 ,  B29C65/1612 ,  B32B17/06 ,  B32B17/10 ,  B81C1/0038 ,  G03F7/0002 ,  G03F7/038 ,  H01J37/32009 ,  B01L2200/12 ,  B01L2300/0816 ,  B01L2300/0877 ,  B01L2300/0887 ,  B01L2300/0896 ,  B81C2201/0153 ,  G03F7/16 ,  G03F7/2002 ,  G03F7/30 ,  H01J2237/3341

Abstract: Imprinted substrates are often used to produce miniaturized devices for use in electrical, optic and biochemical applications. Imprinting techniques, such as nanoimprinting lithography, may leave residues in the surface of substrates that affect bonding and decrease the quality of the produced devices. An imprinted substrate with residue-free region, or regions with a reduced amount of residue for improved bonding quality is introduced. Methods to produce imprinted substrates without residues from the imprinting process are also introduced. Methods include physical exclusion methods, selective etching methods and energy application methods. These methods may produce residue-free regions in the surface of the substrate that can be used to produce higher strength bonding.