公开(公告)号：US20080053151A1

公开(公告)日：2008-03-06

申请号：US11897406

申请日：2007-08-30

Applicant: Tatsuhiro Sato

Inventor： Tatsuhiro Sato

IPC: C03B19/00 ,  C03C3/078 ,  C03C3/095 ,  C03C3/112

CPC classification number: C03C1/00 ,  C03B19/063 ,  C03B32/005 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/24 ,  C03B2201/36 ,  C03C3/06 ,  C03C3/112 ,  C03C4/20 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2201/3411 ,  C03C2201/3435 ,  C03C2201/36

Abstract: A mixed quartz powder contains quartz powder and two or more types of doping element in an amount of from 0.1 to 20 mass %. The aforementioned doped elements include a first dope element selected from the group consisting of N, C and F, and a second dope element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, the lanthanides and the actinides. The “quartz powder” is a powder of crystalline quartz or it is a powder of glassy SiO2 particles. It is made form natural occurring quartz or it is fabricated synthetically. The “quartz powder” may be doped. The compounding ratio of the total amount (M1) of the aforementioned first elements and the total amount (M2) of the aforementioned second elements as the ratio of the number of atoms (M1)/(M2) is preferably from 0.1 to 20. Al as well as the aforementioned doped elements is preferably included in a mixed quartz powder of this invention.

Abstract translation: 混合石英粉含有0.1〜20质量％的石英粉和2种以上的掺杂元素。 上述掺杂元素包括选自N，C和F的第一掺杂元素和选自Mg，Ca，Sr，Ba，Sc，Y，Ti，Zr，Hf的第二掺杂元素， 镧系元素和锕系元素。 “石英粉”是结晶石英的粉末，或是玻璃状SiO 2颗粒的粉末。 它由天然石英制成，或者由合成制成。 可以掺杂“石英粉”。 上述第一元素的总量（M1）与上述第二元素的总量（M2）的配位比优选为0.1〜20。作为原子数（M1）/（M2）的比例，优选为0.1〜20。 以及上述掺杂元素优选包括在本发明的混合石英粉末中。

公开(公告)号：US20070277555A1

公开(公告)日：2007-12-06

申请号：US11833397

申请日：2007-08-03

Applicant: Keigo HINO

Inventor： Keigo HINO

IPC: C03B19/06 ,  C03B19/00 ,  C03C3/06

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/04 ,  C03B2201/23 ,  C03C2201/23

Abstract: The invention provides a process for producing a synthetic quartz glass, comprising: (a) depositing fine quartz glass particles synthesized by flame hydrolysis of a glass-forming material, on a substrate, to form a porous quartz glass base; (b) presintering the porous quartz glass base; (c) heat-treating the presintered porous quartz glass base by holding it under vacuum at a temperature in the range of from 1,100° C. to below the vitrification temperature for a certain time period; and (d) heating the thus heat-treated porous quartz glass base to a temperature not lower than the vitrification temperature to obtain a synthetic quartz glass. According to the process for synthetic quartz glass production of the invention, a synthetic quartz glass having a reduced OH group amount and a uniform OH group concentration can be obtained. From the synthetic quartz glass, an optical member having excellent optical properties can be obtained.

Abstract translation: 本发明提供了一种生产合成石英玻璃的方法，包括：（a）在基材上沉积通过玻璃形成材料的火焰水解合成的精细石英玻璃颗粒，以形成多孔石英玻璃基底; （b）预烧结多孔石英玻璃基底; （c）通过将预烧结的多孔石英玻璃基板在1100℃至低于玻璃化温度的温度下在真空下进行一段时间的热处理; 和（d）将由此热处理的多孔石英玻璃基底加热至不低于玻璃化温度的温度，以获得合成石英玻璃。 根据本发明的合成石英玻璃的制造方法，可以得到OH基量少且OH基浓度均匀的合成石英玻璃。 可以从合成石英玻璃得到光学特性优异的光学部件。

公开(公告)号：US07089766B2

公开(公告)日：2006-08-15

申请号：US11034359

申请日：2005-01-10

Applicant: Gerald E. Burke ,  Steven B. Dawes ,  V. Srikant ,  Pushkar Tandon

Inventor： Gerald E. Burke ,  Steven B. Dawes ,  V. Srikant ,  Pushkar Tandon

IPC: C03B37/018 ,  C03B37/029

CPC classification number: G03F7/70216 ,  C03B19/1407 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B37/01202 ,  C03B37/01406 ,  C03B37/01413 ,  C03B37/0142 ,  C03B37/0146 ,  C03B2201/12 ,  C03B2203/22 ,  C03B2207/02 ,  C03B2207/06 ,  C03B2207/08 ,  C03B2207/14 ,  C03B2207/20 ,  C03B2207/30 ,  C03B2207/38 ,  C03B2207/40 ,  C03B2207/42 ,  C03B2207/46 ,  C03B2207/54 ,  C03B2207/70 ,  C03B2207/81 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/20 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/32 ,  F23D14/22 ,  F23D14/32 ,  G03F1/60 ,  G03F7/70958

Abstract: Methods, apparatus and precursors for producing substantially water-free silica soot, preforms and glass. The methods and apparatus make substantially water-free fused silica preforms or glass by removing water as a reaction product, removing water from the atmosphere, removing water from the transport process, or combinations thereof. In a first embodiment, substantially water-free soot, preforms or glass are achieved by using a hydrogen-free fuel, such as carbon monoxide, in the deposition process. In another embodiment, a soot producing burner has parameters that enable operation on a substantially hydrogen-free fuel. End burners, which minimize water production, are also described. Such water-free methods are useful in depositing fluorine-doped soot because of the low water present and the efficiency in which fluorine is incorporated. In another embodiment, glassy barrier layer methods and apparatus are described for minimizing dopant migration, especially fluorine. Laser and induction methods and apparatus for forming the barrier layer are depicted. A chlorine, fluorine and silica precursor, such as chlorofluorosilane, may be utilized to form fluorinated soot. Other methods and apparatus are directed to combinations of conventional and substantially water-free processes. One embodiment is directed to combustion enhancing additives for addition to the substantially hydrogen-free fuels. The methods and apparatus in accordance with the invention are particularly useful for producing photomask substrates and optical fiber preforms.

Abstract translation: 用于生产基本上无水的二氧化硅烟灰，预成型件和玻璃的方法，装置和前体。 该方法和装置通过除去水作为反应产物，从大气中除去水分，从运输过程中除去水或其组合，从而使基本上无水的熔融二氧化硅预制件或玻璃。 在第一实施方案中，在沉积工艺中通过使用无氢燃料如一氧化碳来实现基本上无水的烟灰，预型体或玻璃。 在另一个实施方案中，产生烟灰的燃烧器具有能够在基本上无氢燃料上操作的参数。 还描述了最小化水的生产的终端燃烧器。 这种无水方法由于存在低的水和掺入氟的效率而用于沉积氟掺杂烟灰。 在另一个实施例中，描述了用于最小化掺杂剂迁移，特别是氟的玻璃状阻挡层方法和装置。 描述了用于形成阻挡层的激光和感应方法和装置。 可以使用氯，氟和二氧化硅前体，例如氯氟硅烷来形成氟化烟灰。 其它方法和装置涉及常规和基本无水方法的组合。 一个实施方案涉及用于加入基本上无氢燃料的燃烧增强添加剂。 根据本发明的方法和装置特别适用于制造光掩模基片和光纤预制棒。

公开(公告)号：US20060137397A1

公开(公告)日：2006-06-29

申请号：US11148504

申请日：2005-06-08

Applicant: Dana Bookbinder ,  Richard Fiacco ,  Kenneth Hrdina ,  Lisa Moore ,  Susan Schiefelbein

Inventor： Dana Bookbinder ,  Richard Fiacco ,  Kenneth Hrdina ,  Lisa Moore ,  Susan Schiefelbein

IPC: C03B20/00 ,  C03C3/06

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/54 ,  G03F7/70958

Abstract: Disclosed are high purity synthetic silica material having an internal transmission at 193 nm of at least 99.65%/cm and method of preparing such material. The material is also featured by a high compositional homogeneity in a plane transverse to the intended optical axis. The soot-to-glass process for making the material includes a step of consolidating the soot preform in the presence of H2O and/or O2.

Abstract translation: 公开了具有193nm以上的内透射率为至少99.65％/ cm 3的高纯度合成二氧化硅材料及其制备方法。 该材料的特征还在于横向于预期光轴的平面中具有高的组成均匀性。 用于制造材料的烟灰对玻璃工艺包括在H 2 O 2和/或O 2 2的存在下固化烟灰预制件的步骤。

公开(公告)号：US20050239626A1

公开(公告)日：2005-10-27

申请号：US10523323

申请日：2003-07-19

Applicant: Akira Fujinoki ,  Hiroyuki Nishimura ,  Kunio Yoshida

Inventor： Akira Fujinoki ,  Hiroyuki Nishimura ,  Kunio Yoshida

IPC: G02B1/00 ,  C03B20/00 ,  C03C3/06 ,  C03C4/00

CPC classification number: C03C4/0085 ,  C03C3/06 ,  C03C2201/21 ,  C03C2201/23

Abstract: It is an object of the present invention to provide synthetic quartz glass optical materials suitable for use in YAG of higher order harmonics. The damage threshold value in J/cm2 (energy density at which cracks occur generated by irradiation) is to be considered when synthetic quartz glass material is irradiated with YAG laser of third or higher order harmonics with single pulses or continuously. Regarding a synthetic quartz glass optical material in use for the optical parts constituting the prism and lens used in a laser beam machine, this invention provides a synthetic quartz glass material suitably used for the YAG laser with the third or higher order of harmonic, choosing the following conditions: OH group concentration is in the range of ≧1 to ≦300 ppm; contained hydrogen molecule concentration is in the range of ≧2×1018 to ≧2×1019 molecules/cm3; transmittance of ultraviolet rays at 245 nm of wavelength is 99.9% or more; and the fictive temperature is in the range of ≧880 to ≦990° C.

Abstract translation: 本发明的目的是提供适用于较高次谐波的YAG的合成石英玻璃光学材料。 当合成石英玻璃材料用单个脉冲的三次或更高次谐波的YAG激光照射时，考虑J / cm 2的损伤阈值（通过照射产生裂纹的能量密度） 或连续。 关于构成用于激光束机的棱镜和透镜的光学部件的合成石英玻璃光学材料，本发明提供了适用于具有第三或更高次谐波的YAG激光器的合成石英玻璃材料，选择 以下条件：OH基浓度在> = 1〜<= 300ppm的范围内; 含有氢分子浓度在> = 2×10 18 /分钟/分钟/分钟的范围内; 波长245nm处紫外线的透过率为99.9％以上; 并且假想温度在> = 880至<= 990℃的范围内。

公开(公告)号：US06807823B2

公开(公告)日：2004-10-26

申请号：US10298924

申请日：2002-11-19

Applicant: Yuichi Ohga ,  Tadashi Enomoto

Inventor： Yuichi Ohga ,  Tadashi Enomoto

IPC: C03C306

CPC classification number: C03C23/0025 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2207/30 ,  C03B2207/32 ,  C03B2207/36 ,  C03B2207/70 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/54

Abstract: A process for producing fluorine-containing glass. An SiO2 soot is synthesized by hydrolyzing SiCl4. The soot is heated in a chlorine-compound-free atmosphere containing a fluorine compound gas to form a fluorine-containing silica glass. The glass contains not more than 10 ppm OH group, not more than 10 ppm Cl, and not less than 1,000 ppm F. The concentration ratio of F/Cl is 10,000 or more.

Abstract translation: 含氟玻璃的制造方法。 通过水解SiCl4合成SiO 2烟炱。 烟灰在含氟化合物气体的无氯化合物的气氛中加热，形成含氟二氧化硅玻璃。 该玻璃含有不超过10ppm的OH基团，不超过10ppm的Cl，且不小于1,000ppm F.F / Cl的浓度比为10,000以上。

公开(公告)号：US06682859B2

公开(公告)日：2004-01-27

申请号：US09997785

申请日：2001-11-28

Applicant: Lisa A. Moore ,  Charlene M. Smith

Inventor： Lisa A. Moore ,  Charlene M. Smith

IPC: G03F900

CPC classification number: G03F7/70216 ,  C03B19/1407 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2207/30 ,  C03B2207/32 ,  C03B2207/36 ,  C03B2207/38 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/20 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/32 ,  C03C2203/54 ,  G03F1/60 ,  G03F7/70958

Abstract: High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed with the silicon oxyfluoride glass having a preferred fluorine content

Abstract translation: 公开了具有优选氟含量<0.5重量％的氟氧化硅玻璃，适合用作光刻应用中的低于190nm的VUV波长区域的光掩模基板的高纯度氟氧化硅玻璃。 本发明的氟氧化硅玻璃在157nm波长下是透射的，使其特别适用于157nm波长区域的光掩模衬底。 本发明的光掩模基材是“真空”的氟氧化硅玻璃，其在真空紫外（VUV）波长区域中表现出非常高的透射率，同时保持通常与高纯度熔融石英相关的优异的热和物理性能。 除了含氟并且具有很少或不具有OH含量之外，本发明的适合用作157nm的光掩模衬底的氟氧化硅玻璃的特征还在于具有小于1×10 17分子/ cm 3的分子氢和低 氯水平。

公开(公告)号：US06649268B1

公开(公告)日：2003-11-18

申请号：US09520190

申请日：2000-03-07

Applicant: Norio Komine ,  Seishi Fujiwara ,  Akiko Yoshida ,  Hiroki Jinbo ,  Norihisa Yamaguchi

Inventor： Norio Komine ,  Seishi Fujiwara ,  Akiko Yoshida ,  Hiroki Jinbo ,  Norihisa Yamaguchi

IPC: C03B804

CPC classification number: C03B19/1415 ,  C03B19/1407 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/22 ,  C03B2207/24 ,  C03B2207/32 ,  C03B2207/36 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/50 ,  C03C2203/40

Abstract: An optical member made of silica glass manufactured by the direct method where a material gas comprising an organosilicon compound is allowed to react in an oxidizing flame, said optical member having a 2×1014 molecules/cm3 or less concentration of formyl radical generated by X-ray irradiation whose dose is 0.01 Mrad or more and 1 Mrad or less.

Abstract translation: 通过直接法制造的由石英玻璃制成的光学构件，其中包含有机硅化合物的材料气体在氧化火焰中反应，所述光学构件具有2×10 14分子/ cm 3或更低浓度的甲酰基 其剂量为0.01Mrad以上且1Mrad以下的X射线照射产生。

公开(公告)号：US06627468B2

公开(公告)日：2003-09-30

申请号：US09875009

申请日：2001-06-07

Applicant: Keiko Chiba

Inventor： Keiko Chiba

IPC: H01L2100

CPC classification number: G03F7/70158 ,  C03C3/06 ,  C03C15/00 ,  C03C2201/02 ,  C03C2201/23 ,  G02B5/1857 ,  G03F7/70316 ,  G03F7/70958

Abstract: The present invention provides a method for manufacturing an optical element to be used for an optical system and an optical instrument using the optical system, and a method for manufacturing a device using the optical instrument, wherein the optical element is manufactured by the steps including the steps for processing a high purity silica glass by lithography, and the hydrogen molecule content is adjusted after manufacturing the optical element.

Abstract translation: 本发明提供了一种用于制造用于光学系统的光学元件的方法和使用该光学系统的光学仪器，以及一种使用该光学仪器的装置的制造方法，其中该光学元件由包括 通过光刻处理高纯度二氧化硅玻璃的步骤，并且在制造光学元件之后调节氢分子含量。

公开(公告)号：US06611650B2

公开(公告)日：2003-08-26

申请号：US09925678

申请日：2001-08-09

Applicant: Hiroyuki Hayami ,  Terunobu Iio ,  Toshikazu Gozen ,  Hirokazu Kuzushita ,  Michitsugu Mori ,  Takashi Okamura ,  Shuichi Ohmori

Inventor： Hiroyuki Hayami ,  Terunobu Iio ,  Toshikazu Gozen ,  Hirokazu Kuzushita ,  Michitsugu Mori ,  Takashi Okamura ,  Shuichi Ohmori

IPC: G02B600

CPC classification number: C03C3/06 ,  C03B37/01413 ,  C03B37/01426 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/23 ,  C03B2207/30 ,  C03B2207/32 ,  C03C13/045 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/26 ,  G02B6/06

Abstract: A silica optical fiber is provided, which contains a pure-silica core and a cladding layer formed on the pure-silica core, wherein the pure-silica core contains a C element and has a content of elements belonging to the third period-the seventh period of the periodic table, except Si element that constitutes the quartz structure, of not more than 100 ppm. The present invention can provide a silica optical fiber superior in the resistance to high energy electromagnetic waves such as UV light and &ggr;-rays.