Data recording device with conducting microtips and production method thereof
    33.
    发明授权
    Data recording device with conducting microtips and production method thereof 失效
    数据记录装置及其制作方法

    公开(公告)号:US07453789B2

    公开(公告)日:2008-11-18

    申请号:US10576096

    申请日:2004-10-26

    Abstract: The invention relates to a data-recording device comprising conductive microtips and to the production method thereof. According to the invention, the microtip comprises one end which is intended to be brought into electrical contact with a recording medium. Moreover, the microtip comprises a longitudinal conducting core having an essentially constant cross-section. In addition, the microtip is surrounded by a sheath of non-conducting material, such that the free ends of the core and the sheath are level at the end of the microtip. The cross-section of the sheath can diminish towards the end of the microtip, e.g. such as to form a truncated-cone-shaped part. The core can comprise a carbon nanotube. Furthermore, a multitude of microtips can be disposed in the form of a network, the ends thereof generating an essentially-flat common surface. The inventive method comprises an abrasion step.

    Abstract translation: 本发明涉及包含导电微尖头的数据记录装置及其制造方法。 根据本发明,微尖头包括旨在与记录介质电接触的一端。 此外,微尖端包括具有基本恒定横截面的纵向导电芯。 此外,微尖端由非导电材料的护套包围,使得芯和护套的自由端在微尖端的末端处水平。 鞘的横截面可以朝向微尖端的端部减小,例如, 例如形成截锥形部分。 核心可以包括碳纳米管。 此外,可以以网络的形式布置多个微尖端,其端部产生基本平坦的公共表面。 本发明的方法包括磨损步骤。

    METHOD FOR REALIZING AN ELECTRIC LINKAGE IN A SEMICONDUCTOR ELECTRONIC DEVICE BETWEEN A NANOMETRIC CIRCUIT ARCHITECTURE AND STANDARD ELECTRONIC COMPONENTS
    36.
    发明申请
    METHOD FOR REALIZING AN ELECTRIC LINKAGE IN A SEMICONDUCTOR ELECTRONIC DEVICE BETWEEN A NANOMETRIC CIRCUIT ARCHITECTURE AND STANDARD ELECTRONIC COMPONENTS 有权
    在纳米电路结构和标准电子元件之间的半导体电子器件中实现电连接的方法

    公开(公告)号:US20080174024A1

    公开(公告)日:2008-07-24

    申请号:US11971147

    申请日:2008-01-08

    Abstract: A method for realizes electric connections in a semiconductor electronic device between a nanometric circuit architecture and standard electronic components. The method includes: providing a nanometric circuit architecture comprising a succession of conductive nanowires substantially parallel to each other and extended along a direction x; realizing, above the succession, an insulating layer; opening, in the insulating layer, a window of nanometric width b extended along a direction inclined by an angle α with respect to the direction x to substantially cross the whole succession of nanowires, with exposure of a succession of exposed portions of the nanowires, one for each nanowire; realizing, above the insulating layer, a plurality of conductive dies extended along a direction y substantially orthogonal to the direction x and addressed towards the standard electronic components, each of such dies overlapping said window onto a respective exposed portion of a nanowire with obtainment of a plurality of contacts realizing said electric connections.

    Abstract translation: 一种用于在纳米电路结构和标准电子部件之间实现半导体电子器件中的电连接的方法。 该方法包括:提供纳米级电路架构,其包括基本上彼此平行并沿着x方向延伸的一系列导电纳米线; 在继承之上实现绝缘层; 在绝缘层中打开沿着相对于方向x倾斜角度α的方向延伸的纳米宽度b的窗口,以基本上穿过整个纳米线序列,暴露出一连串的纳米线的暴露部分,一个 对于每个纳米线; 在绝缘层之上实现沿着基本上正交于方向x的方向y延伸并且朝向标准电子部件寻址的多个导电模具,每个这样的模具将所述窗口重叠到纳米线的相应的暴露部分上,获得一个 多个触点实现所述电连接。

    Method and system for reading the resistance state of junctions in crossbar memory
    38.
    发明授权
    Method and system for reading the resistance state of junctions in crossbar memory 有权
    用于读取交叉记忆体中结点电阻状态的方法和系统

    公开(公告)号:US07340356B2

    公开(公告)日:2008-03-04

    申请号:US11010597

    申请日:2004-12-13

    Abstract: Various embodiments of the present invention are directed to methods for determining the resistance state of nanowire-crossbar junctions, and can also be used to determine the resistance state of sub-microscale crossbar junctions. A pair of wires interconnected through the crossbar junction is biased to determine a first signal for the crossbar junction. The pair of wires interconnected through the crossbar junction is then biased again to increase the resistance of the crossbar junction. The pair of wires interconnected through the crossbar junction is then biased again to determine a second signal for the crossbar junction. The first signal is compared to the second signal to determine the resistance state of the crossbar junction.

    Abstract translation: 本发明的各种实施方案涉及用于确定纳米线 - 交叉连接点的电阻状态的方法,并且还可以用于确定亚微米交叉点结的电阻状态。 通过交叉连接点互连的一对导线被偏置以确定交叉连接点的第一信号。 然后通过交叉连接点互连的一对电线被再次偏置以增加交叉连接点的电阻。 然后通过交叉连接点互连的一对导线再次被偏置以确定交叉连接点的第二信号。 将第一信号与第二信号进行比较以确定交叉连接点的电阻状态。

    Crossbar-array designs and wire addressing methods that tolerate misalignment of electrical components at wire overlap points
    40.
    发明授权
    Crossbar-array designs and wire addressing methods that tolerate misalignment of electrical components at wire overlap points 有权
    横线阵列设计和线寻址方法,可以容忍电线重叠点处的电气元件的未对准

    公开(公告)号:US07307345B2

    公开(公告)日:2007-12-11

    申请号:US11264464

    申请日:2005-11-01

    Abstract: Various embodiments of the present invention are directed to crossbar array designs that interfaces wires to address wires, despite misalignments between electrical components and wires. In one embodiment, a nanoscale device may be composed of a first layer of two or more wires and a second layer of two or more address wires that overlays the first layer. The nanoscale device may also include an intermediate layer positioned between the first layer and the second layer. Two or more redundant electrical component patterns may be fabricated within the intermediate layer so that one or more of the electrical component patterns is aligned with the first and second layers.

    Abstract translation: 尽管本发明的各种实施例涉及将电线接合到地址线的交叉列阵列设计,尽管电气部件和电线之间未对准。 在一个实施例中,纳米级器件可以由两条或更多条线的第一层和覆盖第一层的两条或更多条地址线的第二层组成。 纳米级器件还可以包括位于第一层和第二层之间的中间层。 可以在中间层内制造两个或更多个冗余电组件图案,使得一个或多个电组件图案与第一层和第二层对准。

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