公开(公告)号：US20020139299A1

公开(公告)日：2002-10-03

申请号：US10075349

申请日：2002-02-14

Inventor： Norbert Hoogen ,  Dieter Lencer ,  Christoph Pekal

IPC: B05C011/00

CPC classification number: B05B3/1057 ,  B05B13/02 ,  B05B13/0636 ,  D06B1/02 ,  D06B23/04

Abstract: A wetting device for the mat (10) of a carrier material comprises a grasping frame which is constituted by side ledges (101, 102, 104), whereby the mat to be coated (10) can be fixed by clamps (105) to the side ledges. At least one of the side ledges of the frame is configured flexible (bendable), since it preferably comprises several segments (101, 102) which are hinged together. Thus, the clamped mat (10) can be brought into a cylindrical configuration in which it can be coated by a spray device which is introduced into the inner space of the cylinder. Due to the subsequent bending of the flexible side ledge in the opposite direction, the mat (10) can be brought into a second cylindrical configuration for which its other upper surface constitutes the inner side of the cylinder and is thus available for being coated by the spray device. During the spraying operation, the cylinder axis is preferably orientated vertically in order to avoid non-homogeneities of the coating because of the gravitation.

Abstract translation: 用于载体材料的垫（10）的润湿装置包括由侧壁（101,102,104）构成的抓握框架，由此待涂覆的垫（10）可以通过夹具（105）固定到 侧壁。 框架的至少一个侧壁被构造为柔性（可弯曲的），因为其优选地包括铰接在一起的多个段（101,102）。 因此，夹紧的垫（10）可以被制成圆柱形构造，其中可以通过被引入到缸的内部空间的喷射装置来涂覆。 由于柔性侧凸缘随后在相反方向上弯曲，垫子（10）可以被带入第二圆柱形构型，其另一个上表面构成气缸的内侧，因此可用于被 喷雾装置。 在喷涂操作期间，气缸轴线优选地垂直定向，以避免由于重力引起的涂层的不均匀性。

公开(公告)号：US20020132380A1

公开(公告)日：2002-09-19

申请号：US10033343

申请日：2001-11-02

Applicant:

Inventor： Akira Nakano ,  Tadahiro Ohmi

IPC: B05D001/00 ,  C23F001/00 ,  G01L021/30 ,  B05C011/00 ,  H01L021/306 ,  C23C016/00

CPC classification number: H01J37/32082 ,  C23C16/505 ,  C23C16/52 ,  H01J37/32935

Abstract: A plasma processing apparatus includes a plurality of plasma processing units. Each of the plasma processing units has a plasma excitation electrode, a radiofrequency generator connected to the plasma excitation electrode, and a matching circuit which matches the impedance between the radiofrequency generator and the plasma processing unit. The absolute value nullnullRAnull of the difference nullRA between the AC resistance RA0 at a time t0 and the AC resistance RA1 at a later time t1 and the absolute value nullnullRBnull of the difference nullRB between the AC resistance RB0 at the time t0 and the AC resistance RB1 at the later time t1 are maintained at a value less than an upper limit. Based on these values, whether or not the plasma processing apparatus which is reassembled or used at a user site maintains a required level of performance is evaluated.

Abstract translation: 等离子体处理装置包括多个等离子体处理单元。 每个等离子体处理单元具有等离子体激励电极，连接到等离子体激励电极的射频发生器和与射频发生器和等离子体处理单元之间的阻抗匹配的匹配电路。 绝对值| DELTARA | 时刻t0的交流电阻RA0与后期的交流电阻RA1之间的差值DELTARA与绝对值| DELTARB | 时刻t0的交流电阻RB0与后期时刻t1的交流电阻RB1之间的差值DELTARB保持在小于上限的值。 基于这些值，评价在用户现场重新组装或使用的等离子体处理装置是否保持所需的性能水平。

公开(公告)号：US20020092467A1

公开(公告)日：2002-07-18

申请号：US09758206

申请日：2001-01-12

Inventor： Richard W. Stowe

IPC: B05C011/00

CPC classification number: C03C25/12 ,  B05C3/12 ,  B05C9/14 ,  B05D3/067 ,  B05D7/20

Abstract: An apparatus for passing multiple fibers having curable coating thereon through a high intensity curing zone comprises an irradiator having a curing zone; a transparent tube enclosing the curing zone; a plurality of coating dies disposed upstream of the irradiator to coat the fibers; and a plurality of take-up mechanisms disposed downstream of the irradiator to guide the fibers through the curing zone. The coating dies and the take-up mechanisms are rotatably displaced relative to each other about a longitudinal axis through the centerline of the curing zone so that the fibers at an intermediate location between the coating dies and the take-up mechanisms define a cylindrical volume having a diameter less than the diameter of the tube so that the multiple fibers can pass simultaneously through the tube.

Abstract translation: 一种用于通过高强度固化区使其上具有可固化涂层的多根纤维的装置包括具有固化区的辐射器; 封闭固化区的透明管; 多个涂覆模具，设置在辐照器的上游以涂覆纤维; 以及设置在辐照器下游以引导纤维穿过固化区的多个卷取机构。 涂层模具和卷取机构围绕穿过固化区的中心线的纵向轴线相对于彼此可旋转地移位，使得在涂覆模具和卷绕机构之间的中间位置处的纤维限定了具有圆柱形体积的圆柱体积， 直径小于管的直径，使得多根纤维可以同时通过管。

公开(公告)号：US20020063097A1

公开(公告)日：2002-05-30

申请号：US09994755

申请日：2001-11-28

Inventor： Akira Fukunaga ,  Hiroshi Nagasawa

IPC: B05C011/00

CPC classification number: C25D21/14 ,  C25D7/123 ,  C25D17/001 ,  C25D21/12 ,  G01N30/461 ,  B01D15/34 ,  B01D15/327

Abstract: A plating apparatus comprises a plating unit having a plating bath for holding a plating liquid therein, and a plating liquid monitoring unit having a liquid chromatography device and an arithmetical unit. The liquid chromatography device serves to separate and quantify an additive in a sample of the plating liquid. The arithmetical unit serves to compare a quantified value of the additive with a given concentration predetermined for the additive and to produce an output signal representing the compared result. The plating apparatus further comprises an additive replenishing unit for adding a solution including the additive from an additive tank to the plating liquid in the plating bath based on the output signal from the arithmetical unit in the plating liquid monitoring unit.

Abstract translation: 电镀装置包括具有用于保持电镀液的电镀液的电镀单元和具有液相色谱装置和算术单元的电镀液监测单元。 液相色谱装置用于分离和定量电镀液样品中的添加剂。 算术单元用于将添加剂的量化值与对于添加剂预定的给定浓度进行比较，并产生表示比较结果的输出信号。 电镀装置还包括添加剂补充单元，其基于来自电镀液监测单元中的算术单元的输出信号，将包含添加剂的添加剂的溶液与电镀液中的镀液相加。

公开(公告)号：US20020017240A1

公开(公告)日：2002-02-14

申请号：US09826812

申请日：2001-04-06

Applicant: Taiyo Yuden Co., Ltd.

Inventor： Naoki Obana ,  Minoru Yuasa ,  Kazuo Naganuma

IPC: B05C011/00

CPC classification number: H01G13/006

Abstract: An external electrode forming apparatus is used to form external electrodes on the component chips. The external electrode forming apparatus comprises a component conveyer belt, a belt feeding mechanism, a component-inserting machine, a component-reversing machine, a paste-coating machine, and a component-discharging machine. For the component-inserting machine, the component-reversing machine, and the component-discharging machine, pressure pins are used to insert or move the component chips. These pressure pins have at the tip part a taper portion with a tip shape smaller than that of the component holding hole. Since the pressure pins of this type are used, the tip portions of these pressure pins may be prevented from impinging upon the opening edges of the component holding holes, and the pressure pins after the impingement may be hindered from forcibly being inserted into the component holding holes, whereby damage to the interiors of the component holding holes can be extremely diminished.

公开(公告)号：US20020011207A1

公开(公告)日：2002-01-31

申请号：US09864309

申请日：2001-05-25

Inventor： Shigeyuki Uzawa ,  Izumi Tsukamoto

IPC: B05C011/00

CPC classification number: H01L21/67161 ,  H01L21/67017 ,  H01L21/67109 ,  H01L21/67173

Abstract: The interior of a port mechanism for exchanging a wafer between a coating/developing system and an exposure apparatus is evacuated, and a predetermined atmospheric gas is introduced. In loading/unloading a wafer into/from the exposure apparatus, the wafer is heated/cooled as needed.

Abstract translation: 用于在涂覆/显影系统和曝光设备之间更换晶片的端口机构的内部被抽真空，并且引入预定的气氛气体。 在将晶片装入/从曝光装置卸载时，根据需要对晶片进行加热/冷却。

公开(公告)号：US20020007782A1

公开(公告)日：2002-01-24

申请号：US09844491

申请日：2001-04-27

Inventor： William A. Cavallaro

IPC: B05C011/00

CPC classification number: H05K13/0061 ,  H05K13/0469

Abstract: In a conveyor system with a radiant heating system, convection is provided with hollow elongated tubes having small holes for providing a gentle air flow toward a workpiece to heat the workpiece with convection and radiation.

Abstract translation: 在具有辐射加热系统的传送系统中，对流设置有具有小孔的中空细长管，用于向对工件提供平缓的气流以通过对流和辐射加热工件。

公开(公告)号：US20020002944A1

公开(公告)日：2002-01-10

申请号：US09924333

申请日：2001-08-07

Inventor： Paul D. Shirley

IPC: F24J003/00 ,  C23F001/02 ,  B05C011/00

CPC classification number: H01L21/68728 ,  H01L21/67109

Abstract: A method and apparatus for controlling a temperature of a microelectronic substrate. In one embodiment, the apparatus can include a substrate support configured to engage and support the microelectronic substrate. The apparatus can further include a temperature controller having one or more thermal links coupled directly with the substrate when the substrate is supported by the substrate support. The thermal links can maintain thermal contact with the substrate when the substrate is either stationary or mobile relative to the temperature controller. The temperature controller can heat or cool different portions of the substrate at different rates with one or more of several heat transfer devices, including liquid jets, gas jets, resistive electrical elements and/or thermoelectric elements.

Abstract translation: 一种用于控制微电子衬底的温度的方法和装置。 在一个实施例中，设备可以包括被配置为接合和支撑微电子衬底的衬底支撑件。 该装置还可包括温度控制器，该温度控制器具有一个或多个热连接件，当衬底由衬底支撑件支撑时，该热连接件与衬底直接耦合。 当衬底相对于温度控制器静止或移动时，热连接可以保持与衬底的热接触。 温度控制器可以使用包括液体射流，气体射流，电阻电气元件和/或热电元件在内的几种热传递装置中的一种或多种来以不同的速率加热或冷却衬底的不同部分。

公开(公告)号：US20020000034A1

公开(公告)日：2002-01-03

申请号：US09816603

申请日：2001-03-23

Inventor： Mark Lynn Jenson

IPC: H01M006/46 ,  H01M002/00 ,  B05C011/00

CPC classification number: H01M10/4264 ,  A61N1/3787 ,  C23C14/0031 ,  C23C14/0676 ,  C23C14/08 ,  C23C16/047 ,  G02F1/13306 ,  G02F2001/13324 ,  H01G11/08 ,  H01G11/26 ,  H01G11/56 ,  H01L23/58 ,  H01L31/073 ,  H01L31/1828 ,  H01L2224/16225 ,  H01L2224/48091 ,  H01L2224/49109 ,  H01L2924/09701 ,  H01L2924/10253 ,  H01L2924/12044 ,  H01M2/0207 ,  H01M2/1066 ,  H01M2/145 ,  H01M2/20 ,  H01M4/0421 ,  H01M4/0423 ,  H01M4/0426 ,  H01M4/1391 ,  H01M4/1393 ,  H01M4/1397 ,  H01M4/382 ,  H01M4/405 ,  H01M4/483 ,  H01M4/581 ,  H01M4/5825 ,  H01M4/587 ,  H01M4/8885 ,  H01M4/9016 ,  H01M6/185 ,  H01M6/186 ,  H01M6/188 ,  H01M6/40 ,  H01M6/42 ,  H01M8/1007 ,  H01M8/1286 ,  H01M10/0436 ,  H01M10/0472 ,  H01M10/052 ,  H01M10/0525 ,  H01M10/0562 ,  H01M10/058 ,  H01M10/0585 ,  H01M10/42 ,  H01M10/425 ,  H01M10/4257 ,  H01M10/44 ,  H01M10/46 ,  H01M10/465 ,  H01M14/00 ,  H01M14/005 ,  H01M2002/0205 ,  H01M2004/021 ,  H01M2008/1293 ,  H04M1/0262 ,  H05K1/16 ,  Y02E10/543 ,  Y02E60/122 ,  Y02E60/13 ,  Y02P70/521 ,  Y02P70/54 ,  Y10S117/902 ,  Y10T29/49108 ,  Y10T29/49114 ,  Y10T29/49115 ,  Y10T29/4913 ,  Y10T29/5313 ,  Y10T29/53135 ,  H01L2924/00014 ,  H01L2924/00

Abstract: A system for making a thin-film device includes a substrate-supply station that supplies a substrate having a major surface area. The substrate has a first layer on a first surface area of the substrate's major surface area. Also included is a device for depositing a second layer onto the first layer, wherein the device supplies energy to the second layer to aid in layer formation without substantially heating the substrate.

Abstract translation: 一种用于制造薄膜器件的系统包括提供具有主表面积的衬底的衬底供应站。 衬底在衬底的主要表面积的第一表面区域上具有第一层。 还包括用于在第一层上沉积第二层的装置，其中该装置向第二层提供能量以帮助层形成而基本上不加热衬底。

公开(公告)号：US20010048841A1

公开(公告)日：2001-12-06

申请号：US09185785

申请日：1998-11-04

Inventor： RICHARD MICHAEL GIRARDOT ,  GENE MICHAEL ALTONEN ,  LYLE BROWN TUTHILL ,  CURTIS BOBBY MOTLEY

IPC: B43K023/00 ,  A45D040/20 ,  B05C011/00

CPC classification number: A61M35/003 ,  A45D40/00 ,  A45D40/26 ,  A45D2200/1018 ,  A45D2200/1036 ,  A45D2200/1045

Abstract: The present invention provides an applicator for applying and distributing a substance onto a target surface. The applicator comprises a substantially planar sheet of compressible, conformable material having opposed first and second surfaces and an interior region between said first and second surfaces. The sheet of material has a thickness between the first and second surfaces which decreases when the sheet of material is subjected to an externally-applied force in a direction substantially normal to the first surface. The applicator further includes at least one discrete reservoir extending inwardly of the first surface into the interior of the sheet of material which is at least partially filled with a substance and at least one discrete aperture formed in the first surface which is in fluid communication with the reservoir. Compression of the sheet of material via an externally-applied force substantially normal to said first surface expresses product from the aperture and translational motion of the first surface relative to a target surface applies and distributes said product onto the target surface. In a preferred embodiment, a plurality of apertures are associated with corresponding reservoirs forming a delivery zone near one end of a hand-held applicator, and the sheet material is preferably resilient both in compression and in bending to conform to irregular target surfaces. A wide variety of substances are contemplated, including particularly antiperspirant/deodorant products. Other embodiments include a single reservoir feeding a plurality of apertures.

Abstract translation: 本发明提供了一种用于将物质施加和分配到目标表面上的施加器。 涂抹器包括具有相对的第一和第二表面以及在所述第一表面和第二表面之间的内部区域的基本上平面的可压缩且可顺应的材料片材。 当片材材料在基本上垂直于第一表面的方向上受到外部施加的力时，该片材料在第一和第二表面之间具有减小的厚度。 施加器还包括至少一个分离的储存器，其向第一表面向内延伸进入材料片的内部，该片材至少部分地填充有物质，并且形成在第一表面中的至少一个离散孔，其与第一表面流体连通 水库 通过基本上垂直于所述第一表面的外部施加的力来压缩片材材料表示产品从孔开始并且第一表面相对于目标表面的平移运动将所述产品施加并分配到目标表面上。 在优选实施例中，多个孔与相应的储存器相关联，所述储存器在手持式施用器的一端附近形成输送区，并且片材优选地在压缩和弯曲中都具有弹性，以符合不规则的目标表面。 考虑了各种各样的物质，包括特别是止汗剂/除臭剂产品。 其他实施例包括供给多个孔的单个储存器。