PLASMA BRIDGE NEUTRALIZER FOR ION BEAM ETCHING
    464.
    发明申请

    公开(公告)号:US20190259559A1

    公开(公告)日:2019-08-22

    申请号:US16270440

    申请日:2019-02-07

    Abstract: An ion beam neutralization system, often referred to as a plasma bridge neutralizer (PBN), as part of an ion beam (etch) system. The system utilizes an improved filament thermo-electron emitter PBN design, that when utilized in a particular method of operation, greatly extends filament life and minimizes variation in neutralizer operating parameters for long periods of operation. The PBN includes a solenoidal electromagnetic that produces an axial magnetic field within the PBN and a magnetic concentrator that facilitates the alignment of the magnetic field and inhibits stray fields. The PBN can readily provide a filament lifetime of at least 500 hours.

    Electron Gun and Electron Beam Device
    467.
    发明申请

    公开(公告)号:US20190080878A1

    公开(公告)日:2019-03-14

    申请号:US16123297

    申请日:2018-09-06

    Applicant: JEOL Ltd.

    Abstract: An electron gun includes an emitter, an electron gun electrode, and a short-circuiting mechanism for setting the emitter and the electron gun electrode at the same potential. The short-circuiting mechanism includes a first switch member provided with a first switch electrode that is connected to the emitter and a second switch electrode that is connected to the electron gun electrode, a second switch member provided with a third switch electrode, and a drive unit that operates at least one of the first switch member and the second switch member to switch between a state in which the first switch electrode and the second switch electrode are in contact with the third switch electrode and a state in which the first switch electrode and the second switch electrode are separated from the third switch electrode. The short-circuiting mechanism has the same potential as a predetermined voltage.

    LOW WORK FUNCTION ELECTRON BEAM FILAMENT ASSEMBLY

    公开(公告)号:US20180269024A1

    公开(公告)日:2018-09-20

    申请号:US15983967

    申请日:2018-05-18

    Abstract: A filament assembly can include: a button having a planar emitter region with one or more apertures extending from an emission surface of the planar emitter region to an internal surface opposite of the emission surface; an inlet electrical lead coupled to the button at a first side; an outlet electrical lead coupled to the button at a second side opposite of the first side; and a low work function object positioned adjacent to the internal surface of the planar emitter region and retained to the button. The planar emitter region can include a plurality of apertures. The low work function object can include a porous ceramic material having the barium, and may have a polished external surface. An electron gun can include the filament assembly. An additive manufacturing system can include the electron gun having the filament assembly.

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