Abstract:
A photovoltaic device can include a doped contact layer adjacent to a semiconductor absorber layer, where the doped contact layer includes a metal base material and a dopant.
Abstract:
A photovoltaic device can include an intrinsic metal layer adjacent to a semiconductor absorber layer; and a doped metal contact layer adjacent to the intrinsic metal layer, where the doped metal contact layer includes a metal base material and a dopant.
Abstract:
Silicon on insulator (SOI) devices and methods for fabricating the same are provided. An exemplary embodiment of a SOI device comprises a substrate. A first insulating layer is formed over the substrate. A plurality of semiconductor islands is formed over the first insulating layer, wherein the semiconductor islands are isolated from each other. A second insulating layer is formed over the first insulating layer, protruding over the semiconductor islands and surrounding thereof. At least one recess is formed in a portion of the second insulating layer adjacent to a pair of the semiconductor islands. A first dielectric layer is formed on a portion of each of the semiconductor islands. A conductive layer is formed over the first dielectric layer and over the second insulating layer exposed by the recess. A pair of source/drain regions is oppositely formed in portions of each of the semiconductor islands not covered by the first dielectric layer and the conductive layer.
Abstract:
An apparatus, system, and method are disclosed for reducing the loading time of a web page. In one embodiment, the apparatus, system, and method comprise requesting a web page from a web server, wherein requesting a web page from a web server comprises sending a browser parameter comprising an indicator to the web server, the indicator indicating that a browser is capable of receiving an archive. The present invention may further comprise receiving one or more archives from the web server, the one or more archives each comprising a plurality of archivable objects referenced by the web page, and rendering the web page using the plurality of archivable objects from the one or more archives.
Abstract:
An organic thin film transistor array substrate including a substrate divided into an LCD region and an OTFT region; a first dielectric layer formed on the substrate in the LCD region and having a first uneven portion; an organic semiconducting layer formed on the substrate in the OTFT region; a gate, source, and drain formed in the OTFT region, wherein the source and drain are in contact with the organic semiconducting layer to form a channel between the source and drain; and a pixel electrode formed on the first uneven portion of the first dielectric layer in the LCD region.
Abstract:
The image data compression method involves the performing of steps: a block dividing step for dividing a computer processor pipeline statistic image to be displayed into a plurality of blocks with predetermined block width and block height; a block list creating step for creating a block list for indexed blocks containing meaningful pixels in said divided blocks such that said indexed blocks are associated with each other, wherein said meaningful pixels are pixels corresponding to the computer processor pipeline raw trace data; and a pixel information compressing step for compressing original pixel information on the meaningful pixels in said indexed blocks and storing it in said block list. Apparatus for performing the method is also provided.
Abstract:
A method of forming a semiconductor structure includes providing a semiconductor substrate comprising a first region and a second region, forming a first PMOS device in the first region wherein a first gate electrode of the first PMOS device has a first p-type impurity concentration, forming a stress memorization layer over the first PMOS device, reducing the stress memorization layer in the first region, performing an annealing after the step of reducing the stress memorization layer in the first region, and removing the stress memorization layer. The same stress memorization layer is not reduced in a region having an NMOS device. The same stress memorization layer may not be reduced in a region including a second PMOS device.
Abstract:
A method for selectively assembling a molecular device on a substrate comprises contacting the first substrate with a solution containing molecular devices; impeding bonding of the molecular devices to the substrate such that application of a voltage potential to the substrate results in assembly of the molecular device on the substrate at a rate that is at least 1.5 times the rate of assembly of the molecular device on a voltage-neutral substrate; and applying a voltage potential to the substrate so as to cause the molecular devices to assemble on the substrate. A nanoscale computing device is described that includes a substrate, a pair of conductive input/output electrodes carried on this substrate and disposed in spaced-apart relationship and a substantially disordered assembly of nanowires formed on the substrate in a region between the electrodes, thereby forming at least one programmable conductive pathway between the pair of electrodes.
Abstract:
An organic thin film transistor array substrate including a substrate divided into an LCD region and an OTFT region; a first dielectric layer formed on the substrate in the LCD region and having a first uneven portion; an organic semiconducting layer formed on the substrate in the OTFT region; a gate, source, and drain formed in the OTFT region, wherein the source and drain are in contact with the organic semiconducting layer to form a channel between the source and drain; and a pixel electrode formed on the first uneven portion of the first dielectric layer in the LCD region.
Abstract:
An organic integrated device for thin film transistor and light emitting diode. The organic integrated device of the present invention includes a top-gate organic thin film transistor (top-gate OTFT) and an organic light emitting diode (OLED), both formed on the same substrate. In the organic integrated device, some layers can be commonly used by both OTFT and OLED, and some layers can be made of the same material and formed in the same course, which simplifies the entire process.