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    Multi-Segment Brightness Compensation
    41.
    发明申请
    Multi-Segment Brightness Compensation 有权
    多段亮度补偿

    公开(公告)号：US20150237316A1

    公开(公告)日：2015-08-20

    申请号：US14183039

    申请日：2014-02-18

    Applicant: Microvision, Inc.

    Inventor： P. Selvan Viswanathan ,  Markus Duelli

    IPC: H04N9/31 ,  G02B26/10

    CPC classification number: H04N9/3182 ,  G02B26/101 ,  G02B26/105 ,  H04N9/3135

    Abstract: A scanning projector includes a brightness compensation component. The brightness compensation component modifies pixel brightness as a function of instantaneous scan phase of a sinusoidally scanning mirror. The brightness compensation component uses different brightness compensation functions based on whether the instantaneous scan phase is above or below a threshold. The threshold may correspond to a knee of a maximum laser power limit curve.

    Abstract translation: 扫描投影仪包括亮度补偿分量。 亮度补偿分量将像素亮度修正为正弦扫描镜的瞬时扫描相位的函数。 亮度补偿组件根据瞬时扫描相位是否高于或低于阈值，使用不同的亮度补偿功能。 阈值可以对应于最大激光功率限制曲线的膝盖。

    Apparatus of plural charged particle beams with multi-axis magnetic lens
    43.
    发明授权
    Apparatus of plural charged particle beams with multi-axis magnetic lens 有权
    具有多轴磁性透镜的多个带电粒子束的装置

    公开(公告)号：US09105440B2

    公开(公告)日：2015-08-11

    申请号：US14468674

    申请日：2014-08-26

    Applicant: Hermes-Microvision, Inc.

    Inventor： Zhongwei Chen ,  Weiming Ren ,  Xuerang Hu ,  Xuedong Liu

    IPC: H01J37/141 ,  H01J37/145 ,  H01J37/28

    CPC classification number: H01J37/141 ,  H01J37/145 ,  H01J37/28 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/15 ,  H01J2237/281 ,  H01J2237/2817

    Abstract: An apparatus of plural charged particle beams with multi-axis magnetic lens is provided to perform multi-functions of observing a specimen surface, such as high-throughput inspection and high-resolution review of interested features thereof and charge-up control for enhancing image contrast and image resolution. In the apparatus, two or more sub-columns are formed and each of the sub-columns performs one of the multi-functions. Basically the sub-columns take normal illumination to get high image resolutions, but one or more may take oblique illuminations to get high image contrasts.

    Abstract translation: 提供具有多轴磁性透镜的多个带电粒子束的装置，以执行观察样品表面的多功能，例如高通量检测和其感兴趣特征的高分辨率检查以及用于增强图像对比度的充电控制 和图像分辨率。 在该装置中，形成两个或多个子列，并且每个子列执行多功能之一。 基本上，子列采取正常照明以获得高图像分辨率，但是一个或多个可能采取倾斜照明以获得高图像对比度。

    Electron beam apparatus
    44.
    发明授权
    Electron beam apparatus 有权
    电子束装置

    公开(公告)号：US09048063B1

    公开(公告)日：2015-06-02

    申请号：US14611854

    申请日：2015-02-02

    Applicant: Hermes Microvision, Inc.

    Inventor： Weiming Ren ,  Shuai Li ,  Zhongwei Chen

    IPC: H01J37/12

    CPC classification number: H01J37/12 ,  H01J37/05 ,  H01J2237/04924 ,  H01J2237/0535 ,  H01J2237/057 ,  H01J2237/24485 ,  H01J2237/28

    Abstract: This invention provides a method for improving performance of a reflective type energy filter for a charged particle beam, which employs a beam-adjusting lens on an entrance side of a potential barrier of the energy filter to make the charged particle beam become a substantially parallel beam to be incident onto the potential barrier. The method makes the energy filter have both a fine energy-discrimination power over a large emission angle spread and a high uniformity of energy-discrimination powers over a large FOV. A LVSEM using this method in the energy filter can obviously improve image contrast. The invention also provides multiple energy-discrimination detection devices formed by using the advantages of the method.

    Abstract translation: 本发明提供了一种用于提高带电粒子束的反射型能量过滤器的性能的方法，该方法在能量过滤器的势垒的入口侧采用光束调节透镜，以使带电粒子束变成基本平行的光束 被发现在潜在的障碍之上。 该方法使得能量滤波器在大的发射角扩展上具有精细的能量鉴别能力，并且在大的FOV上具有高的能量鉴别能力的均匀性。 在能量过滤器中使用这种方法的LVSEM可以显着提高图像对比度。 本发明还提供了通过使用该方法的优点形成的多个能量鉴别检测装置。

    System and method for controlling charge-up in an electron beam apparatus
    45.
    发明授权
    System and method for controlling charge-up in an electron beam apparatus 有权
    用于控制电子束装置中的电荷的系统和方法

    公开(公告)号：US09000370B2

    公开(公告)日：2015-04-07

    申请号：US14512672

    申请日：2014-10-13

    Applicant: Hermes Microvision Inc.

    Inventor： Weiming Ren ,  Zhongwei Chen

    IPC: H01J37/02 ,  H01J37/28

    CPC classification number: H01J37/026 ,  H01J37/14 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/0045 ,  H01J2237/0262 ,  H01J2237/1405 ,  H01J2237/2801 ,  H01J2237/2803

    Abstract: The present invention provides means and corresponding embodiments to control charge-up in an electron beam apparatus, which can eliminate the positive charges soon after being generated on the sample surface within a frame cycle of imaging scanning. The means are to let some or all of secondary electrons emitted from the sample surface return back to neutralize positive charges built up thereon so as to reach a charge balance within a limited time period. The embodiments use control electrodes to generate retarding fields to reflect some of secondary electrons with low kinetic energies back to the sample surface.

    Abstract translation: 本发明提供了用于控制电子束装置中的充电的装置和相应的实施例，其可以在成像扫描的帧周期内在样品表面上产生后不久就消除正电荷。 该方法是使从样品表面发射的二次电子的一些或全部返回到中和积聚在其上的正电荷，从而在有限的时间段内达到电荷平衡。 这些实施例使用控制电极产生延迟场，以将具有低动能的一些二次电子反射回样品表面。

    METAL SEAL FOR ULTRA HIGH VACUUM SYSTEM
    46.
    发明申请
    METAL SEAL FOR ULTRA HIGH VACUUM SYSTEM 有权
    用于超高真空系统的金属密封

    公开(公告)号：US20150091258A1

    公开(公告)日：2015-04-02

    申请号：US14567075

    申请日：2014-12-11

    Applicant: Hermes Microvision, Inc.

    Inventor： Qingpo Xi ,  Tao Li ,  Feng Cao ,  Fumin He ,  Zhongwei Chen

    IPC: F16J15/08

    CPC classification number: F16J15/0881 ,  F16L23/20

    Abstract: The present invention introduces a metal seal flange assembly for a vacuum system. A new designed metal gasket has a crosses-section shape of irregular quadrangle with two sharp angle forms by the longer base and legs. The long base of the irregular quadrangle is the vertical inner wall of the metal gasket. A preferred cross section shape of the metal gasket is trapezoid or isosceles trapezoid. This design can reduce the normal force applied to the metal seal flange assembly and reduce the number of bolts used in a limit working space.

    Abstract translation: 本发明引入了用于真空系统的金属密封凸缘组件。 新设计的金属垫片具有不规则四边形的横截面形状，具有较长的底座和腿部的两个尖角形状。 不规则四边形的长基座是金属垫片的垂直内壁。 金属垫片的优选截面形状是梯形或等腰梯形。 该设计可以减少施加到金属密封凸缘组件的法向力，并减少在极限工作空间中使用的螺栓数量。

    Multi-axis magnetic lens for focusing a plurality of charged particle beams
    48.
    发明授权
    Multi-axis magnetic lens for focusing a plurality of charged particle beams 有权
    用于聚焦多个带电粒子束的多轴磁性透镜

    公开(公告)号：US08835867B2

    公开(公告)日：2014-09-16

    申请号：US13741654

    申请日：2013-01-15

    Applicant: Hermes-Microvision, Inc.

    Inventor： Zhongwei Chen ,  Weiming Ren ,  Xuedong Liu

    IPC: H01J3/14 ,  H01J3/26 ,  H01J49/42

    CPC classification number: H01J3/22 ,  B82Y10/00 ,  B82Y40/00 ,  H01F7/0205 ,  H01J3/20 ,  H01J37/14 ,  H01J37/3177 ,  H01J2237/1415 ,  H05K9/00

    Abstract: A cellular-type PD unit is proposed and a plurality of the cellular-type PD units is used in pairs in a multi-axis magnetic lens for focusing a plurality of charged beams. First type PD units or second type PD units (called as hybrid PD unit as well) can be applied to cellular-type PD units to flexibly construct sub-lenses. Furthermore, magnetic shielding plates with a plurality of through openings can be placed above and/or below the multi-axis magnetic lens to make magnetic flux leaking out of the multi-axis magnetic lens vanish away rapidly outside the magnetic shielding plates.

    Abstract translation: 提出了一种蜂窝型PD单元，并且多个蜂窝型PD单元成对地用于多轴磁性透镜中以聚焦多个带电波束。 可以将第一类PD单元或第二类PD单元（也称为混合PD单元）应用于蜂窝型PD单元以灵活地构建子透镜。 此外，具有多个通孔的磁屏蔽板可以放置在多轴磁性透镜的上方和/或下方，以使从多轴磁性透镜泄漏的磁通在磁屏蔽板之外快速消失。

    METHOD AND SYSTEM FOR MEASURING CRITICAL DIMENSION AND MONITORING FABRICATION UNIFORMITY
    50.
    发明申请
    METHOD AND SYSTEM FOR MEASURING CRITICAL DIMENSION AND MONITORING FABRICATION UNIFORMITY 有权
    用于测量关键尺寸和监测制造均匀性的方法和系统

    公开(公告)号：US20130202186A1

    公开(公告)日：2013-08-08

    申请号：US13785240

    申请日：2013-03-05

    Applicant: HERMES MICROVISION INC.

    Inventor： WEI FANG ,  JACK JAU ,  HONG XIAO

    IPC: G06T7/00

    CPC classification number: H04N7/18 ,  G06T7/0004 ,  G06T7/001 ,  G06T2207/10061 ,  G06T2207/20016 ,  G06T2207/30148 ,  H04N7/183

    Abstract: A method for measuring critical dimension (CD) includes steps of: scanning at least one area of interest of a die to obtain at least one scanned image; aligning the scanned image to at least one designed layout pattern to identify a plurality of borders within the scanned image; and averaging distances each measured from the border or the plurality of borders of a pattern associated with a specific type of CD corresponding to the designed layout pattern to obtain a value of CD of the die. The value of critical dimensions of dies can be obtained from the scanned image with lower resolution which is obtained by relatively higher scanning speed, so the above-mentioned method can obtain value of CD for every die within entire wafer to monitor the uniformity of the semiconductor manufacturing process within an acceptable inspection time.

    Abstract translation: 用于测量临界尺寸（CD）的方法包括以下步骤：扫描模具的至少一个感兴趣区域以获得至少一个扫描图像; 将扫描图像对准至少一个设计的布局图案，以识别扫描图像内的多个边界; 以及从与设计的布局图案对应的特定类型的CD相关联的图案的边界或多个边界测量的平均距离，以获得模具的CD的值。 可以通过相对较高的扫描速度获得的具有较低分辨率的扫描图像获得模具的临界尺寸的值，因此上述方法可以获得整个晶片内的每个管芯的CD值，以监测半导体的均匀性 制造过程在可接受的检验时间内。

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