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公开(公告)号：US20240219838A1
公开(公告)日：2024-07-04
申请号：US18341828
申请日：2023-06-27
Applicant: SEMES CO., LTD.
Inventor： Soo Bin YONG , Min Jung PARK
IPC: G03F7/16
Abstract: The inventive concept provides a substrate treating method. The substrate treating apparatus includes supplying a first liquid to a rotating substrate to treat a substrate; and supplying a second liquid which is different from the first liquid to the rotating substrate to coat the substrate with the second liquid, and wherein a rotation direction of the substrate is different at the supplying the first liquid and at the supplying the second liquid.
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公开(公告)号：US20240216957A1
公开(公告)日：2024-07-04
申请号：US18386914
申请日：2023-11-03
Applicant: SEMES CO., LTD.
Inventor： Sun Wook JUNG , Hyun YOON , Ha Neul YOO , Ho Jong HWANG
CPC classification number: B08B3/022 , B08B13/00 , H01L21/67051
Abstract: According to the present disclosure, provided is a bowl receiving incident droplets and preventing the same from scattering, or causing the same to scatter downwardly, the bowl including: a main body surrounding a substrate support unit; a groove formed in a spiral shape in at least a portion of an inner surface of the main body; and a separation wall disposed between adjacent grooves in a vertical direction on the inner surface of the main body, wherein a thickness at a first position in the main body in which the groove is formed is greater than a thickness at a second position, lower than the first position.
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公开(公告)号：US20240216940A1
公开(公告)日：2024-07-04
申请号：US18342797
申请日：2023-06-28
Applicant: SEMES CO., LTD.
Inventor： Jun Young CHOI , Gui Su PARK , Young Jin JANG , Eun Jung LEE , Jun Hyun LIM
CPC classification number: B05C9/06 , B05C11/1042 , B05C13/02 , B05D1/22
Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a liquid treating chamber; a support configured to support a substrate within the liquid treating chamber; a first treating liquid supply unit configured to supply a first treating liquid to the liquid treating chamber to treat the substrate with the first treating liquid; and a second treating liquid supply unit configured to supply a second treating liquid to the liquid treating chamber to treat the substrate with the second treating liquid, and wherein the second treating liquid supply unit includes a cooler for cooling the second treating liquid.
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44.发明授权公开(公告)号：US12025921B2
公开(公告)日：2024-07-02
申请号：US17487170
申请日：2021-09-28
Applicant: SEMES CO., LTD.
Inventor： Jun Ho Kim , Sang Hoon Lee , Jong Seok Seo
IPC: G03F7/40
CPC classification number: G03F7/40
Abstract: The inventive concept provides a cooling unit. In an embodiment, the cooling unit comprises: a cooling plate with a seating surface; a pin member arranged at the cooling plate and supporting a substrate; a decompression hole formed on the seating surface; a decompression path formed within the cooling plate and connected to the decompression hole; a decompression member for decompressing the decompression path; and a controller for controlling the decompression member, wherein the controller controls the decompression member to decompress a space between the substrate and the seating surface of the cooling plate and thereby adjusting a distance between the substrate and the seating surface of the cooling plate.
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公开(公告)号：US20240213069A1
公开(公告)日：2024-06-27
申请号：US18528362
申请日：2023-12-04
Applicant: SEMES CO., LTD. , Daekhon International Inc.
Inventor： Nahyun LEE , Myungjin LEE , Jongsuk CHOI , Eunsang YOON , Seungwhan SUH , Junghag CHA , Sungjin LIM , Jinkwan HEO
IPC: H01L21/677 , B65G49/06
CPC classification number: H01L21/67709 , B65G49/061 , H01L21/6773 , B65G2201/0297
Abstract: Provided is a tower lift including a frame extending in a vertical direction, a carriage configured to move along the frame, a first coil arranged on a first surface of the frame, the first surface facing the carriage, a second coil arranged on the first surface of the frame and separated from the first coil, a first magnet connected to the carriage and located between the first coil and the second coil, and a second magnet connected to the carriage, located between the first magnet and the second coil, and separated from the first magnet.
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Patent Agency Ranking
公开(公告)号：US20240213048A1
公开(公告)日：2024-06-27
申请号：US18391661
申请日：2023-12-21
Applicant: SEMES CO., LTD.
Inventor： Jongwha Kang , Sunwook Jung , Wooram Lee , Byoungdoo Choi , Arah Cho , Dongwoon Park
IPC: H01L21/67 , H01L21/677
CPC classification number: H01L21/67051 , H01L21/6719 , H01L21/67225 , H01L21/67742
Abstract: A substrate processing apparatus includes a processing unit including a processing vessel with an internal space and a support unit configured to support a substrate and rotate the substrate in a first rotation direction in the internal space, and an exhaust unit configured to exhaust a gas from the internal space, wherein the exhaust unit includes an exhaust pipe providing an exhaust path for the gas exhausted from the internal space, and one or more connectors connecting the processing vessel to the exhaust pipe, and one end of the exhaust pipe is closed, and an open outlet is formed at a remaining end of the exhaust pipe to discharge the gas.
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公开(公告)号：US20240212995A1
公开(公告)日：2024-06-27
申请号：US18390078
申请日：2023-12-20
Applicant: SEMES CO., LTD.
Inventor： Yoon Seok CHOI , Yun Sang KIM , Sang Jeong LEE , Jae Won SHIN , Jong Won PARK
IPC: H01J37/32
CPC classification number: H01J37/32697 , H01J37/32522 , H01J37/32541 , H01J37/3255 , H01J37/32724 , H01J2237/2007
Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a chamber having a treating space; a support unit configured to support a substrate in the treating space; a window plate positioned above the treating space; and a conductive layer formed on the window plate, and wherein a bottom surface of the window plate is exposed to the treating space, and the conductive layer is formed on a top surface among a top surface and a bottom surface of the window plate.
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公开(公告)号：US20240210836A1
公开(公告)日：2024-06-27
申请号：US18501265
申请日：2023-11-03
Applicant: SEMES CO., LTD.
Inventor： Myung A JEON , Young Seop CHOI , Bok Kyu LEE , Joo Sung LEE , Je Myung CHA
IPC: G03F7/42
CPC classification number: G03F7/422 , H01L21/67051
Abstract: Provided is a substrate processing apparatus and method capable of improving photoresist removal efficiency by using two different types of chemical liquids. The substrate processing apparatus comprises a substrate support unit for supporting and rotating a substrate; and a spray unit for discharging a substrate processing liquid onto the substrate using a nozzle structure, wherein the nozzle structure comprises a first inlet pipe for providing a first chemical liquid; a second inlet pipe for providing a second chemical liquid;
a reaction space module where the first chemical liquid and the second chemical liquid are mixed; and a discharge pipe for discharging a mixture solution of the first chemical liquid and the second chemical liquid into the substrate processing liquid, wherein the first chemical liquid contains ozone gas, and the second chemical liquid contains an OH component.-
公开(公告)号：US20240208240A1
公开(公告)日：2024-06-27
申请号：US18390705
申请日：2023-12-20
Applicant: SEMES CO., LTD.
Inventor： Yong-Deuk CHEONG
IPC: B41J2/21
CPC classification number: B41J2/2128 , B41J2/2132
Abstract: Disclosed is a droplet processing device which improves an operation of generating a droplet image during the conventional operation of generating a droplet image for forming a thin film on a substrate, thereby significantly reducing the generation time of the droplet image.
The droplet processing device includes: an inkjet system for receiving input of a droplet image and applying ink to cause the droplet image to be printed on a substrate; and a droplet image generating terminal for transmitting the droplet image to the inkjet system, in which the droplet image is generated by collecting a plurality of cell print data printed on the substrate and peripheral print data printed on a periphery of the cell into single polygonal information, and rasterising and halftoning the collected polygonal information.-
公开(公告)号：US20240208211A1
公开(公告)日：2024-06-27
申请号：US18182577
申请日：2023-03-13
Applicant: SEMES CO., LTD.
Inventor： Dong Hwa LEE , Dai Geon YOON , Bong Man CHOI , Jong Suk WON , Hyeong Jun CHO
CPC classification number: B41J2/04583 , B41J2/14451
Abstract: Provided is a pressure control device for stably controlling the internal air pressure of a reservoir. The pressure control device includes: an input terminal receiving source air pressure; an intake valve connected between the input terminal and an output terminal; an exhaust valve connected to the output terminal; a pressure sensor connected to the output terminal and generating a sensed value by sensing pressure at the output terminal; and a controller simultaneously operating the intake valve and the exhaust valve by simultaneously operating a first control loop for adjusting the degree of opening of the intake valve by comparing the sensed value with a first target value and a second control loop for adjusting the degree of opening of the exhaust valve by comparing the sensed value with a second target value.
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