公开(公告)号：US07288777B2

公开(公告)日：2007-10-30

申请号：US11603471

申请日：2006-11-21

申请人： William N. Partlo ,  Alexander I. Ershov ,  Igor V. Fomenkov

发明人： William N. Partlo ,  Alexander I. Ershov ,  Igor V. Fomenkov

IPC分类号： H01J35/20

CPC分类号： H05G2/001 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062

摘要： An apparatus/method is disclosed that may comprise an EUV light source which may comprise a collector which may comprise an elliptical collector mirror having a first focus at a plasma initiation point and a second focus at an intermediate focus of the EUV light source; a debris shield intermediate the plasma initiation point and the elliptical collector mirror comprising a plurality of radially extending channels extending from the first focus and aligned to the second focus and in symmetry about an axis of rotation passing through the first focus and aligned to a longitudinal axis of the elliptical collector mirror. The plurality of channels may be formed between a plurality of generally planer foils extending radially from the first focus and aligned to the second focus and in symmetry about an axis of rotation passing through the first focus and aligned to a longitudinal axis of the collector mirror.

摘要翻译： 公开了一种可以包括EUV光源的装置/方法，该EUV光源可以包括收集器，该收集器可以包括在EUV光源的中间焦点处具有等离子体起始点的第一焦点和第二焦点的椭圆形收集器反射镜; 位于等离子体起始点之间的碎片屏蔽和椭圆形收集器镜，其包括从第一焦点延伸并对准到第二焦点并围绕穿过第一焦点的旋转轴对称的多个径向延伸的通道，并且对准纵向轴线 的椭圆收集镜。 多个通道可以形成在从第一焦点径向延伸并与第二焦点对准的多个大致平面的箔片之间并且围绕穿过第一焦点的旋转轴线对称并且与收集器反射镜的纵向轴线对准。

公开(公告)号：US07039086B2

公开(公告)日：2006-05-02

申请号：US10631349

申请日：2003-07-30

申请人： John P. Fallon ,  John A. Rule ,  Robert N. Jacques ,  Jacob Lipcon ,  Richard L. Sandstrom ,  William N. Partlo ,  Alexander I. Ershov ,  Toshihiko Ishihara ,  John Meisner ,  Richard M. Ness ,  Paul C. Melcher

发明人： John P. Fallon ,  John A. Rule ,  Robert N. Jacques ,  Jacob Lipcon ,  Richard L. Sandstrom ,  William N. Partlo ,  Alexander I. Ershov ,  Toshihiko Ishihara ,  John Meisner ,  Richard M. Ness ,  Paul C. Melcher

IPC分类号： H01S3/22

CPC分类号： H01S3/225 ,  G03F7/70025 ,  G03F7/70041 ,  H01S3/0057 ,  H01S3/03 ,  H01S3/036 ,  H01S3/0381 ,  H01S3/09702 ,  H01S3/1055 ,  H01S3/2258 ,  H01S3/2333

摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber.Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.

公开(公告)号：US06778584B1

公开(公告)日：2004-08-17

申请号：US09716041

申请日：2000-11-17

申请人： William N. Partlo ,  Richard L. Sandstrom ,  Raymond F. Cybulski ,  Igor V. Fomenkov ,  Alexander I. Ershov

发明人： William N. Partlo ,  Richard L. Sandstrom ,  Raymond F. Cybulski ,  Igor V. Fomenkov ,  Alexander I. Ershov

IPC分类号： H01S310

CPC分类号： G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0401 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/225

摘要： A helium purge for a grating based line narrowing device for minimizing thermal distortions in line narrowed lasers producing high energy laser beams at high repetition rates. Applicants have shown substantial improvement in performance with the uses of helium purge as compared to prior art nitrogen purges. In preferred embodiments a stream of helium gas is directed across the face of the grating. In other embodiments the purge gas pressure is reduced to reduce the optical effects of the hot gas layer.

摘要翻译： 用于基于光栅的线窄化装置的氦气吹扫，用于最大限度地减少线性窄激光器中的热失真，以高重复率产生高能激光束。 与现有技术的氮气吹扫相比，申请人已经显示出使用氦吹扫的性能方面的显着改进。在优选实施例中，氦气流被引导穿过光栅的表面。 在其它实施例中，减少吹扫气体压力以减少热气体层的光学效应。

公开(公告)号：US06690704B2

公开(公告)日：2004-02-10

申请号：US10210761

申请日：2002-07-31

申请人： John P. Fallon ,  Richard L. Sandstrom ,  William N. Partlo ,  Alexander I. Ershov ,  Toshihiko Ishihara ,  John Meisner ,  Richard M. Ness ,  Paul C. Melcher ,  John A. Rule ,  Robert N. Jacques

发明人： John P. Fallon ,  Richard L. Sandstrom ,  William N. Partlo ,  Alexander I. Ershov ,  Toshihiko Ishihara ,  John Meisner ,  Richard M. Ness ,  Paul C. Melcher ,  John A. Rule ,  Robert N. Jacques

IPC分类号： H01S322

CPC分类号： H01S3/2333 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2366

摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Feedback timing control techniques are provided for controlling the relative timing of the discharges in the two chambers with an accuracy in the range of about 2 to 5 billionths of a second even in burst mode operation. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.

摘要翻译： 本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。 在优选实施例中，激光器是具有主振荡器的生产线机器，该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。 提供了反馈定时控制技术，即使在脉冲串模式操作中，也可以精确地控制两个室中的放电的相对定时，其精确度在大约2至50亿分之一秒的范围内。 该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。

公开(公告)号：US06549551B2

公开(公告)日：2003-04-15

申请号：US09848043

申请日：2001-05-03

申请人： Richard M. Ness ,  Richard L. Sandstrom ,  William N. Partlo ,  Alexander I. Ershov

发明人： Richard M. Ness ,  Richard L. Sandstrom ,  William N. Partlo ,  Alexander I. Ershov

IPC分类号： H01S300

CPC分类号： H01S3/2366 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70483 ,  G03F7/70575 ,  H01S3/0057 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/10092 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2258 ,  H01S3/2325 ,  H01S3/2333

摘要： A narrow band laser system having two laser subsystems. The first laser subsystem is configured to provide a very narrow band pulsed output beam which is used to injection seed the second laser subsystem where the narrow band pulsed seed beam is amplified to produce a narrow band pulsed output beam. A pulse power supply is provided which is specially configured to precisely time the discharges in the two laser subsystem so that the discharges are properly synchronized. Preferred embodiments include a pulse power system with a pulse transformer unit having two sets of transformer cores. A single upstream pulse compression circuit provides high voltage pulses in parallel to the primary windings of all of the cores in both sets. Separate secondary conductors (one passing through one set of cores and the other passing through the other set of cores) provide very high voltage pulses respectively to separate downstream circuits supplying discharge pulses to the electrodes in each of two separate laser chambers. Preferred embodiments include KrF, ArF and F2 systems. In these preferred embodiments, line narrowing may be accomplished within the resonant cavity of the seed laser or the output of the seed laser could be line narrowed using a pre-gain filter.

公开(公告)号：US06538737B2

公开(公告)日：2003-03-25

申请号：US10003513

申请日：2001-10-31

申请人： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Daniel J. W. Brown

发明人： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Daniel J. W. Brown

IPC分类号： G01J314

CPC分类号： G01J3/12 ,  G01J1/4257 ,  G01J3/22 ,  G01J3/26 ,  G01J9/02

摘要： A high resolution etalon-grating spectrometer. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The etalon and the grating are placed in a leak-fight enclosure filled with a gas, such as nitrogen or helium. The wavelength scanning of the spectrometer is done by changing the gas pressure in the enclosure during the scan.

公开(公告)号：US08653491B2

公开(公告)日：2014-02-18

申请号：US12725178

申请日：2010-03-16

申请人： William N. Partlo ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  Chris C. Chrobak ,  James H. Crouch

发明人： William N. Partlo ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  Chris C. Chrobak ,  James H. Crouch

IPC分类号： H01G2/00 ,  H05G2/00 ,  G03F7/20

CPC分类号： H05G2/005 ,  G03F7/70033 ,  G21K5/00 ,  H05G2/003 ,  H05G2/006

摘要： An extreme ultraviolet light system and method includes a drive laser, a chamber including an extreme ultraviolet light collector and a target material dispenser including an adjustable target material outlet capable of outputting multiple portions of target material along a target material path. Also included: a drive laser steering device, a detection system including at least one detector and a controller coupled to the target material dispenser, the detector system and the drive laser steering device. The controller includes logic for detecting a location of the first portion of target material from the first light reflected from the first portion of target material and logic for adjusting the target material dispenser outlet to output a subsequent portion of target material to a waist of the focused drive laser. A system and a method for optimizing an extreme ultraviolet light output is also disclosed.

摘要翻译： 一种极紫外光系统和方法包括驱动激光器，包括极紫外光收集器的腔室和包括可调靶材料出口的目标材料分配器，其能够沿目标材料路径输出目标材料的多个部分。 还包括：驱动激光转向装置，包括至少一个检测器和耦合到目标材料分配器的控制器，检测器系统和驱动激光转向装置的检测系统。 控制器包括用于从目标材料的第一部分反射的第一光和逻辑上检测目标材料的第一部分的位置的逻辑，用于调节目标材料分配器出口，以将目标材料的后续部分输出到聚焦的腰部 驱动激光 还公开了一种用于优化极紫外光输出的系统和方法。

公开(公告)号：US20120223256A1

公开(公告)日：2012-09-06

申请号：US13088166

申请日：2011-04-15

申请人： Alexander N. Bykanov ,  Silvia De Dea ,  Alexander I. Ershov ,  Vladimir B. Fleurov ,  Igor V. Fomenkov ,  William N. Partlo

发明人： Alexander N. Bykanov ,  Silvia De Dea ,  Alexander I. Ershov ,  Vladimir B. Fleurov ,  Igor V. Fomenkov ,  William N. Partlo

IPC分类号： H05G2/00

CPC分类号： H05G2/008 ,  G03F7/70925 ,  H05G2/005

摘要： An extreme-ultraviolet (EUV) light source is described herein comprising an optic; a primary EUV light radiator generating an EUV light emitting plasma and producing a deposit on said optic; and a cleaning system comprising a gas and a secondary light radiator, the secondary light radiator generating a laser produced plasma and producing a cleaning species with the gas.

摘要翻译： 本文描述了一种极光紫外（EUV）光源，其包括光学元件; 产生EUV发光等离子体并在所述光学器件上产生沉积物的主要EUV光辐射体; 以及包括气体和次级光辐射器的清洁系统，所述次级光辐射体产生激光产生的等离子体并且产生具有气体的清洁物质。

公开(公告)号：US08170078B2

公开(公告)日：2012-05-01

申请号：US12987039

申请日：2011-01-07

申请人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt ,  Richard L. Sandstrom ,  Ivan Lalovic

发明人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt ,  Richard L. Sandstrom ,  Ivan Lalovic

IPC分类号： H01S3/22

CPC分类号： H01S3/225 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/083 ,  H01S3/10092 ,  H01S3/2251 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2383 ,  H01S2301/02

摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.

摘要翻译： 一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统，其可以包括种子激光振荡器，其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，其包括激光输出光束 脉冲，其可以包括环形功率放大级。

公开(公告)号：US08138487B2

公开(公告)日：2012-03-20

申请号：US12720190

申请日：2010-03-09

申请人： Georgiy O. Vaschenko ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard L. Sandstrom ,  Alexander I. Ershov ,  David Brandt ,  Joshua J. Miller

发明人： Georgiy O. Vaschenko ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard L. Sandstrom ,  Alexander I. Ershov ,  David Brandt ,  Joshua J. Miller

IPC分类号： A61N5/00

CPC分类号： H05G2/005 ,  G03F7/70033 ,  G21K5/00 ,  H05G2/003 ,  H05G2/006

摘要： A system and method generating an extreme ultraviolet light in an extreme ultraviolet light chamber including a collector mirror, a droplet generation system having a droplet outlet aligned to output a plurality of droplets along a target material path and a first catch including a first open end substantially aligned to the target material path and at least one internal surface oriented toward a second end of the first catch, the second end being opposite from the first open end.

摘要翻译： 一种在包括收集反射镜的极紫外光室中产生极紫外光的系统和方法，具有液滴出口的液滴产生系统，该液滴产生系统沿着目标材料路径排列以输出多个液滴;以及第一捕集器，其基本上包括第一开口端 与目标材料路径对准并且至少一个内表面朝向第一卡扣的第二端定向，第二端与第一开口端相对。