Image Sensor with a Cross-Wafer Capacitator
    42.
    发明申请

    公开(公告)号:US20180342544A1

    公开(公告)日:2018-11-29

    申请号:US15994874

    申请日:2018-05-31

    Applicant: Apple Inc.

    Abstract: One or more cross-wafer capacitors are formed in an electronic component, circuit, or device that includes stacked wafers. One example of such a device is a stacked image sensor. The image sensor can include two or more wafers, with two wafers that are bonded to each other each including a conductive segment adjacent to, proximate, or abutting a bonding surface of the respective wafer. The conductive segments are positioned relative to each other such that each conductive element forms a plate of a capacitor. A cross-wafer capacitor is formed when the two wafers are attached to each other.

    Clamp circuit for electrical overstress and electrostatic discharge

    公开(公告)号:US10079487B2

    公开(公告)日:2018-09-18

    申请号:US15175792

    申请日:2016-06-07

    Applicant: Apple Inc.

    Abstract: An apparatus includes a device, a comparison circuit, and a switch. The device includes a first terminal coupled to a first power supply signal, and a second terminal coupled to a ground reference. The comparison circuit is configured to compare a first voltage level on the first power supply signal to a second voltage level of a second power supply signal, and enable the device in response to a determination that the first voltage level is greater than the second voltage level. The switch circuit is configured to couple a power supply terminal of the comparison circuit to the first power supply signal in response to determining that the first voltage level is greater than the second voltage level, and to couple the power supply terminal to the second power supply signal in response to determining that the first voltage level is less than the second voltage level.

    Electrostatic discharge (ESD) diode in FinFET technology

    公开(公告)号:US09653448B2

    公开(公告)日:2017-05-16

    申请号:US14533187

    申请日:2014-11-05

    Applicant: Apple Inc.

    CPC classification number: H01L27/0255 H01L29/785

    Abstract: In an embodiment, an ESD protection circuit is provided in which diodes may be formed between N+ and P+ diffusions within an insulated semiconductor region and in which additional diodes may be formed between adjacent insulated regions of opposite conduction type as well. The diodes may be used in parallel to form an ESD protection circuit, which may have low on resistance and may sink high ESD current per unit area. To support the formation of the ESD protection circuit, each silicon region may have alternating N+ and P+ diffusions, and adjacent silicon regions may have N+ and P+ diffusions alternating in opposite locations. That is a perpendicular drawn between the N+ diffusions of one adjacent region may intersect P+ diffusions in the other adjacent region, and vice versa.

    Hybrid image sensor
    46.
    发明授权
    Hybrid image sensor 有权
    混合图像传感器

    公开(公告)号:US09549099B2

    公开(公告)日:2017-01-17

    申请号:US13797851

    申请日:2013-03-12

    Applicant: Apple Inc.

    Inventor: Xiaofeng Fan

    Abstract: A method for performing correlated double sampling for a sensor, such as an image sensor. The method includes collecting a first charge corresponding to a first parameter, transferring the first charge to a first storage component, transferring the first charge from the first storage component to a second storage component, resetting the first storage component, transferring the first charge from the second storage component to the first storage component, and reading the first storage component to determine the first charge. The method may be implemented in electronic devices including image sensors.

    Abstract translation: 用于对诸如图像传感器的传感器执行相关双重采样的方法。 该方法包括收集对应于第一参数的第一电荷,将第一电荷转移到第一存储组件,将第一电荷从第一存储组件转移到第二存储组件,复位第一存储组件, 第二存储组件到第一存储组件,以及读取第一存储组件以确定第一充电。 该方法可以在包括图像传感器的电子设备中实现。

    Preventing artifacts due to underfill in flip chip imager assembly
    47.
    发明授权
    Preventing artifacts due to underfill in flip chip imager assembly 有权
    在倒装芯片成像器组装中防止由于底部填充物造成的伪影

    公开(公告)号:US09503622B2

    公开(公告)日:2016-11-22

    申请号:US14202256

    申请日:2014-03-10

    Applicant: Apple Inc.

    Abstract: A CMOS imager assembly may include an integrated circuit (IC) having an active-pixel image sensor that is mounted on a printed circuit board (PCB) substrate using flip chip packaging technology. The IC and the PCB may be physically and electrically connected to each other through multiple electrically conductive connectors. An underfill material (which may include an anti-reflective material) may, during assembly, be introduced around the connectors in the space between the IC and the PCB. A chemical or physical discontinuity on the integrated circuit may, during assembly, prevent the underfill material from entering an area framed by the discontinuity, which may include the pixel array of the image sensor. The discontinuity may include a dam-like structure built up on the IC, a trench-like structure created on the IC, or a low surface tension material that has been applied to the surface of the IC.

    Abstract translation: CMOS成像器组件可以包括具有使用倒装芯片封装技术安装在印刷电路板(PCB)衬底上的有源像素图像传感器的集成电路(IC)。 IC和PCB可以通过多个导电连接器物理和电连接。 在组装期间,底部填充材料(其可以包括抗反射材料)可以在IC和PCB之间的空间中的连接器周围引入。 在组装期间,集成电路上的化学或物理不连续性可以在组装期间防止底部填充材料进入由不连续构成的区域,其可以包括图像传感器的像素阵列。 不连续性可以包括在IC上构建的坝状结构,在IC上形成的沟槽状结构或已经施加到IC的表面的低表面张力材料。

    Image sensor with buried light shield and vertical gate
    48.
    发明授权
    Image sensor with buried light shield and vertical gate 有权
    图像传感器带埋地灯屏蔽和垂直门

    公开(公告)号:US09356061B2

    公开(公告)日:2016-05-31

    申请号:US13959362

    申请日:2013-08-05

    Applicant: Apple Inc.

    Abstract: A pixel in an image sensor can include a photodetector and a storage region disposed in one substrate, or a photodetector disposed in one substrate and a storage region in another substrate. A buried light shield is disposed between the photodetector and the storage region. A sense region, such as a floating diffusion, can be adjacent to the storage region, with the buried light shield disposed between the photodetector and the storage and sense regions. When the photodetector and the storage region are disposed in separate substrates, a vertical gate can be formed through the buried light shield and used to initiate the transfer of charge from the photodetector and the storage region. A transfer channel formed adjacent to, or around the vertical gate provides a channel for the charge to transfer from the photodetector to the storage region.

    Abstract translation: 图像传感器中的像素可以包括设置在一个基板中的光电检测器和存储区域,或者设置在一个基板中的光电检测器和另一个基板中的存储区域。 掩埋的光屏蔽设置在光电检测器和存储区之间。 诸如浮动扩散的感测区域可以与存储区域相邻,其中掩埋的光屏蔽件设置在光电检测器和存储和感测区域之间。 当光电检测器和存储区域设置在分离的基板中时,可以通过掩埋的光屏蔽形成垂直栅极,并且用于开始从光电检测器和存储区域传输电荷。 形成在垂直栅极附近或周围的转移通道提供用于电荷从光电检测器转移到存储区域的通道。

    Electrostatic Discharge (ESD) Silicon Controlled Rectifier (SCR) with Lateral Gated Section
    49.
    发明申请
    Electrostatic Discharge (ESD) Silicon Controlled Rectifier (SCR) with Lateral Gated Section 有权
    静电放电(ESD)硅控整流器(SCR)和侧门控截面

    公开(公告)号:US20160056146A1

    公开(公告)日:2016-02-25

    申请号:US14684872

    申请日:2015-04-13

    Applicant: Apple Inc.

    Abstract: In an embodiment, an ESD protection circuit may include an STI-bound SCR and a gated SCR that may be electrically in parallel with the STI-bound SCR. The gated SCR may be perpendicular to the STI-bound SCR in a plane of the semiconductor substrate. In an embodiment, the gated SCR may trigger more quickly and turn on more quickly than the STI-bound SCR. The STI-bound SCR may form the main current path for an ESD event. A low capacitive load with rapid response to ESD events may thus be formed. In an embodiment, the anode of the two SCRs may be shared.

    Abstract translation: 在一个实施例中,ESD保护电路可以包括可以与STI结合的SCR并联的STI结合的SCR和门控SCR。 门控SCR可以在半导体衬底的平面中垂直于STI结合的SCR。 在一个实施例中,门控SCR可以比STI结合的SCR更快地触发并且更快地触发。 STI结合的SCR可以形成用于ESD事件的主电流路径。 因此可以形成具有对ESD事件的快速响应的低容性负载。 在一个实施例中,两个SCR的阳极可以共享。

    VERTICALLY STACKED IMAGE SENSOR
    50.
    发明申请
    VERTICALLY STACKED IMAGE SENSOR 审中-公开
    垂直堆叠图像传感器

    公开(公告)号:US20160043126A1

    公开(公告)日:2016-02-11

    申请号:US14886029

    申请日:2015-10-17

    Applicant: Apple Inc.

    Inventor: Xiaofeng Fan

    Abstract: A vertically stacked image sensor having a photodiode chip and a transistor array chip. The photodiode chip includes at least one photodiode and a transfer gate extends vertically from a top surface of the photodiode chip. The image sensor further includes a transistor array chip stacked on top of the photodiode chip. The transistor array chip includes the control circuitry and storage nodes. The image sensor further includes a logic chip vertically stacked on the transistor array chip. The transfer gate communicates data from the at least one photodiode to the transistor array chip and the logic chip selectively activates the vertical transfer gate, the reset gate, the source follower gate, and the row select gate.

    Abstract translation: 具有光电二极管芯片和晶体管阵列芯片的垂直堆叠图像传感器。 光电二极管芯片包括至少一个光电二极管,并且传输门从光电二极管芯片的顶表面垂直延伸。 图像传感器还包括堆叠在光电二极管芯片顶部的晶体管阵列芯片。 晶体管阵列芯片包括控制电路和存储节点。 图像传感器还包括垂直堆叠在晶体管阵列芯片上的逻辑芯片。 传输门将数据从至少一个光电二极管传送到晶体管阵列芯片,逻辑芯片选择性地激活垂直传输门,复位栅极,源极跟随器栅极和行选择栅极。

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