公开(公告)号：US20100327192A1

公开(公告)日：2010-12-30

申请号：US12638413

申请日：2009-12-15

申请人： Igor V. Fomenkov ,  Alexander I. Ershov ,  William N. Partlo ,  Jason Paxton ,  Nam-Hyong Kim ,  Jerzy R. Hoffman

发明人： Igor V. Fomenkov ,  Alexander I. Ershov ,  William N. Partlo ,  Jason Paxton ,  Nam-Hyong Kim ,  Jerzy R. Hoffman

IPC分类号： H05G2/00 ,  H01S3/22 ,  H01S3/08

CPC分类号： H01S3/2232 ,  G03F7/70033 ,  H01S3/0014 ,  H01S3/0407 ,  H01S3/041 ,  H01S3/086 ,  H01S3/2308 ,  H05G2/008

摘要： A method for producing extreme ultraviolet light includes producing a target material at a target location; supplying pump energy to a gain medium of at least one optical amplifier that has an amplification band to produce an amplified light beam; propagating the amplified light beam through the gain medium using one or more optical components of a set of optical components; delivering the amplified light beam to the target location using one or more optical components of the optical component set; producing with a guide laser a guide laser beam that has a wavelength outside of the amplification band of the gain medium and inside the wavelength range of the optical components; and directing the guide laser beam through the optical component set to thereby align one or more optical components of the optical component set.

摘要翻译： 用于生产极紫外光的方法包括在目标位置产生目标材料; 向具有放大频带的至少一个光放大器的增益介质提供泵浦能量以产生放大的光束; 使用一组光学部件的一个或多个光学部件将放大的光束传播通过增益介质; 使用所述光学部件组的一个或多个光学部件将放大的光束传送到目标位置; 用导向激光器产生具有波长在增益介质的放大频带之外且在光学部件的波长范围内的引导激光束; 并且引导所述引导激光束通过所述光学部件组，从而对准所述光学部件组的一个或多个光学部件。

公开(公告)号：US20100140514A1

公开(公告)日：2010-06-10

申请号：US12658133

申请日：2010-02-02

申请人： Alexander N. Bykanov ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  David C. Brandt

发明人： Alexander N. Bykanov ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  David C. Brandt

IPC分类号： G21K5/00

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008 ,  Y10S422/906

摘要： Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.

摘要翻译： 本文描述了装置和相应的使用方法，其可以包括限定闭环流动路径的封闭结构和在等离子体位置处产生等离子体的系统，例如， 激光产生的等离子体系统，其中等离子体位置可以与流动路径流体连通。 对于该装置，气体可以设置在封闭结构中，其可以包括离子停止缓冲气体和/或蚀刻剂。 可以提供泵以迫使气体通过闭环流动路径。 可以提供一种或多种热交换器来从流动路径中流动的气体中除去热量。 在一些布置中，可以使用过滤器来从在流动路径中流动的气体中去除至少一部分目标物种。

公开(公告)号：US20100127186A1

公开(公告)日：2010-05-27

申请号：US12655987

申请日：2010-01-11

申请人： Alexander N. Bykanov ,  Norbert Bowering ,  Igor V. Fomenkov ,  David C. Brandt ,  Alexander I. Ershov ,  Oleh Khodykin ,  William N. Partlo

发明人： Alexander N. Bykanov ,  Norbert Bowering ,  Igor V. Fomenkov ,  David C. Brandt ,  Alexander I. Ershov ,  Oleh Khodykin ,  William N. Partlo

IPC分类号： G21K5/00 ,  G21K1/06

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70908 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/008

摘要： A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic. In one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.

公开(公告)号：US20100108913A1

公开(公告)日：2010-05-06

申请号：US11787180

申请日：2007-04-13

申请人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt ,  Richard L. Sandstrom ,  Ivan Lalovic

发明人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt ,  Richard L. Sandstrom ,  Ivan Lalovic

IPC分类号： G21G5/00 ,  H01S3/225 ,  H01S3/083

CPC分类号： H01S3/225 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/083 ,  H01S3/10092 ,  H01S3/2251 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2383 ,  H01S2301/02

摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.

公开(公告)号：US20100074295A1

公开(公告)日：2010-03-25

申请号：US12592228

申请日：2009-11-20

申请人： William N. Partlo ,  Alexander I. Ershov ,  German Rylov ,  Igor V. Fomenkov ,  Daniel J.W. Brown ,  Christian J. Wittak ,  Rajasekhar M. Rao ,  Robert A. Bergstedt ,  John Fitzgerald ,  Richard L. Sandstrom ,  Vladimir B. Fleurov ,  Robert N. Jacques ,  Ed Danielewicz ,  Robin Swain ,  Edmond Arriola ,  Mike Wyatt ,  Walter Crosby

发明人： William N. Partlo ,  Alexander I. Ershov ,  German Rylov ,  Igor V. Fomenkov ,  Daniel J.W. Brown ,  Christian J. Wittak ,  Rajasekhar M. Rao ,  Robert A. Bergstedt ,  John Fitzgerald ,  Richard L. Sandstrom ,  Vladimir B. Fleurov ,  Robert N. Jacques ,  Ed Danielewicz ,  Robin Swain ,  Edmond Arriola ,  Mike Wyatt ,  Walter Crosby

IPC分类号： H01S3/22

CPC分类号： H01S3/0057 ,  G03F7/70341 ,  G03F7/70583

摘要： An apparatus and method are disclosed which may comprise a pulsed gas discharge laser lithography light source which may comprise a seed laser portion providing a seed laser output light beam of seed pulses; an amplifier portion receiving the seed laser output light beam and amplifying the optical intensity of each seed pulse to provide a high power laser system output light beam of output pulses; the amplifier portion may comprise a ring power amplifier comprising amplifier portion injection optics comprising at least one beam expanding prism, a beam reverser and an input/output coupler; the beam expansion optics and the output coupler may be mounted on an optics assembly with the beam expansion optics rigidly mounted with respect to the optics assembly and the input/output coupler mounted for relative movement with respect to the optics assembly for optical alignment purposes.

摘要翻译： 公开了一种可以包括脉冲气体放电激光光刻光源的装置和方法，脉冲气体放电激光光刻光源可以包括提供种子脉冲的种子激光输出光束的种子激光部分; 接收种子激光输出光束并放大每个种子脉冲的光强度的放大器部分，以提供输出脉冲的大功率激光系统输出光束; 放大器部分可以包括环形功率放大器，其包括放大器部分注入光学器件，其包括至少一个光束扩展棱镜，光束反向器和输入/输出耦合器; 光束扩展光学器件和输出耦合器可以安装在光学组件上，其中光束扩展光学器件相对于光学组件刚性地安装，并且输入/输出耦合器被安装成相对于用于光学对准目的的光学组件的相对运动。

公开(公告)号：US20090095925A1

公开(公告)日：2009-04-16

申请号：US12288970

申请日：2008-10-24

申请人： Alexander I. Ershov ,  Alexander N. Bykanov ,  Oleh Khodykin ,  Igor V. Fomenkov

发明人： Alexander I. Ershov ,  Alexander N. Bykanov ,  Oleh Khodykin ,  Igor V. Fomenkov

IPC分类号： G01J3/10

CPC分类号： H05G2/003 ,  H05G2/008

摘要： An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 μm at an effective plasma producing energy is not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO2 laser. The drive laser redirecting mechanism may comprise a mirror.

摘要翻译： 公开了一种可以包括激光产生等离子体EUV系统的装置和方法，其可以包括产生驱动激光束的驱动激光器; 具有第一轴的驱动激光束第一路径; 驱动激光重定向机构，其将所述驱动激光束从所述第一路径传递到第二路径，所述第二路径具有第二轴线; 具有中心定位的孔的EUV收集器光学元件; 以及在第二路径中的聚焦反射镜并且定位在孔内并将驱动激光束聚焦到沿着第二轴线定位的等离子体起始位置。 该装置和方法可以包括驱动激光束由具有波长的驱动激光器产生，使得在有效的等离子体产生能量下聚焦在小于约100mum的EUV目标液滴在所涉及的几何形状的约束条件下是不切实际的 聚焦镜头。 驱动激光器可以包括CO2激光器。 驱动激光重定向机构可以包括镜子。

公开(公告)号：US07405416B2

公开(公告)日：2008-07-29

申请号：US11067124

申请日：2005-02-25

申请人： J. Martin Algots ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  William N. Partlo ,  Richard L. Sandstrom ,  Oscar Hemberg ,  Alexander N. Bykanov ,  Dennis W. Cobb

发明人： J. Martin Algots ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  William N. Partlo ,  Richard L. Sandstrom ,  Oscar Hemberg ,  Alexander N. Bykanov ,  Dennis W. Cobb

IPC分类号： H05G2/00

CPC分类号： H05G2/003 ,  H05G2/005 ,  H05G2/006

摘要： An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.

摘要翻译： 公开了一种EUV等离子体形成靶递送系统和方法，其可以包括：目标液滴形成机构，其包括磁阻或电子限制材料，终止于输出孔的液体等离子体源材料通道; 将电荷施加到液滴形成喷射流或沿着选定路径离开通道的各个液滴的充电机构; 在输出孔之间的液滴偏转器和等离子体引发位置周期性地偏转来自所选择的路径的液滴;液体靶材料输送机构，包括具有输入开口和输出孔的液体靶材料输送通道; 产生在液体目标材料内的干扰力的电动干扰力产生机构，具有输出孔的液体目标传送液滴形成机构; 和/或围绕输出孔周边的润湿屏障。

公开(公告)号：US07180083B2

公开(公告)日：2007-02-20

申请号：US11238828

申请日：2005-09-28

申请人： William N. Partlo ,  Alexander I. Ershov ,  Igor V. Fomenkov

发明人： William N. Partlo ,  Alexander I. Ershov ,  Igor V. Fomenkov

IPC分类号： A61N5/06 ,  G01J3/10 ,  H05G2/00

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G01J1/429 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/067 ,  H05G2/003

摘要： An EUV light source collector erosion mitigation system and method is disclosed which may comprise a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials created in an EUV light-creating plasma; a replacement material generator positioned to deliver replacement material comprising the capping material to the collector outer surface at a rate sufficient to replace the capping material removed due to the removing interaction. The replacement material generator may comprise a plurality of replacement material generators positioned to respectively deliver replacement material to a selected portion of the collector outer surface, which may comprise a sputtering mechanism sputtering replacement capping material onto the collector outer surface.

摘要翻译： 公开了一种EUV光源收集器侵蚀缓解系统和方法，其可以包括收集器，其包括多层反射镜收集器，该多层反射镜收集器包括由封装材料构成的收集器外表面，该封盖材料由于与EUV发光等离子体中产生的材料的去除相互作用而被去除 ; 替代材料发生器定位成将包含封盖材料的替换材料以足以代替由于去除相互作用而去除的封盖材料的速率传送到收集器外表面。 替代材料发生器可以包括多个替换材料发生器，其被定位成分别将替代材料递送到集电器外表面的选定部分，其可以包括溅射机构将溅射替换封盖材料涂覆到集电器外表面上。

公开(公告)号：US07154928B2

公开(公告)日：2006-12-26

申请号：US10875662

申请日：2004-06-23

申请人： Richard L. Sandstrom ,  Daniel J. W. Brown ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  William N. Partlo

发明人： Richard L. Sandstrom ,  Daniel J. W. Brown ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  William N. Partlo

IPC分类号： H01S3/22 ,  H01S3/223

CPC分类号： H01S3/0812 ,  G03F7/70025 ,  G03F7/70575 ,  H01S3/08059 ,  H01S3/097 ,  H01S3/1055 ,  H01S3/1305

摘要： Apparatus/method providing bandwidth control in narrow band short pulse duration gas discharge laser output light pulse beam producing systems, producing a beam comprising pulses at selected pulse repetition races, e.g., comprising a dispersive bandwidth selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the beam containing the respective pulse on the optic; a tuning mechanism operative to select at least one angle of incidence of the beam containing the respective pulse upon the optic; the tuning mechanism comprising a plurality of incidence angle selection elements each defining an angle of incidence for a different spatially separated but not temporally separated portion of the pulse to return from the optic a laser light pulse comprising a plurality of spatially separated but not temporally separated portions, each having one of at least two different selected center wavelengths.

摘要翻译： 在窄带短脉冲持续时间气体放电激光输出光脉冲光束产生系统中提供带宽控制的装置/方法，产生包括选定的脉冲重复轨迹的脉冲的波束，例如包括色散带宽选择光学器件，用于为每个脉冲选择至少一个中心波长 至少部分地由在光学元件上包含相应脉冲的光束的入射角确定; 调谐机构，用于选择在光学元件上包含相应脉冲的光束的至少一个入射角; 所述调谐机构包括多个入射角选择元件，每个入射角选择元件限定所述脉冲的不同的空间分离但不是时间上分离的部分的入射角，以从所述光学器件返回包括多个空间分离但不时间分离的部分的激光脉冲 每个具有至少两个不同选择的中心波长中的一个。

公开(公告)号：US07141806B1

公开(公告)日：2006-11-28

申请号：US11237649

申请日：2005-09-27

申请人： William N. Partlo ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  David W. Myers ,  William Oldham

发明人： William N. Partlo ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  David W. Myers ,  William Oldham

IPC分类号： G01J1/00

CPC分类号： G21K1/062 ,  B82Y10/00 ,  H05G2/003 ,  H05G2/005

摘要： An EUV light source collector erosion mitigation method and apparatus for a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials created in an EUV light-creating plasma, is disclosed which may comprise including within an EUV plasma source material a replacement material. The replacement material may comprise the same material as the capping material of the multilayered mirror. The replacement material may comprise a material that is essentially transparent to light in a selected band of EUV light, e.g., a spectrum of EUV light generated in a plasma of a plasma source material. The replacement material may comprise a material not susceptible to being etched by an etching material used to remove deposited plasma source material from the collector, e.g., a halogen etchant.

摘要翻译： 公开了一种用于收集器的EUV光源收集器侵蚀缓解方法和装置，其包括多层反射镜收集器，其包括由由与在EUV发光等离子体中产生的材料的去除相互作用而被去除的封盖材料组成的收集器外表面。 可以包括在EUV等离子体源材料内包括替换材料。 替代材料可以包括与多层反射镜的封盖材料相同的材料。 替代材料可以包括对EUV光的选定频带中的光基本上透明的材料，例如在等离子体源材料的等离子体中产生的EUV光的光谱。 替代材料可以包括不易被蚀刻材料蚀刻的材料，用于从集电体例如卤素蚀刻剂去除沉积的等离子体源材料。