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176 条记录 (耗时 0.038 秒)

    METHOD FOR PRODUCING PHOTOVOLTAIC CELL
    41.
    发明申请
    METHOD FOR PRODUCING PHOTOVOLTAIC CELL 审中-公开
    生产光伏电池的方法

    公开(公告)号：US20120122265A1

    公开(公告)日：2012-05-17

    申请号：US13298582

    申请日：2011-11-17

    申请人： Youichi Machii ,  Masato Yoshida ,  Takeshi Nojiri ,  Kaoru Okaniwa ,  Mitsunori Iwamuro ,  Shuuichirou Adachi ,  Akihiro Orita ,  Tetsuya Satou ,  Keiko Kizawa

    发明人： Youichi Machii ,  Masato Yoshida ,  Takeshi Nojiri ,  Kaoru Okaniwa ,  Mitsunori Iwamuro ,  Shuuichirou Adachi ,  Akihiro Orita ,  Tetsuya Satou ,  Keiko Kizawa

    IPC分类号： H01L31/0232

    CPC分类号： H01L31/022441 ,  H01L31/18 ,  Y02E10/50

    摘要： The method for producing a photovoltaic cell includes applying an n-type diffusion layer forming composition including an n-type impurity-containing glass powder and a dispersion medium onto a first region on one surface side of a semiconductor substrate; applying a p-type diffusion layer forming composition including a p-type impurity-containing glass powder and a dispersion medium onto a second region other than the first region on the surface of the semiconductor substrate where the first region is provided; a thermal diffusion process in which an n-type diffusion layer and a p-type diffusion layer are formed by heat-treating the semiconductor substrate onto which the n-type diffusion layer forming composition and the p-type diffusion layer forming composition are applied; and forming an electrode on each of the first region where the n-type diffusion layer is formed and the second region where the p-type diffusion layer is formed, respectively.

    摘要翻译： 制造光伏电池的方法包括在半导体衬底的一个表面侧的第一区域上施加包含n型含杂质玻璃粉末和分散介质的n型扩散层形成组合物; 将包含p型含杂质的玻璃粉末和分散介质的p型扩散层形成用组合物涂布在设置有所述第一区域的所述半导体基板的表面上的除了所述第一区域以外的第二区域上; 通过对施加了n型扩散层形成组合物和p型扩散层形成组合物的半导体衬底进行热处理形成n型扩散层和p型扩散层的热扩散工艺; 并且在形成有n型扩散层的第一区域和形成p型扩散层的第二区域分别形成电极。

    CMP ABRASIVE, METHOD FOR POLISHING SUBSTRATE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME, AND ADDITIVE FOR CMP ABRASIVE
    48.
    发明申请
    CMP ABRASIVE, METHOD FOR POLISHING SUBSTRATE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME, AND ADDITIVE FOR CMP ABRASIVE 有权
    CMP磨料，抛光底材的方法和使用其制造半导体器件的方法和用于CMP磨料的添加剂

    公开(公告)号：US20090253355A1

    公开(公告)日：2009-10-08

    申请号：US12484973

    申请日：2009-06-15

    申请人： Naoyuki Koyama ,  Kouji Haga ,  Masato Yoshida ,  Keizou Hirai ,  Toranosuke Ashizawa ,  Youiti Machii

    发明人： Naoyuki Koyama ,  Kouji Haga ,  Masato Yoshida ,  Keizou Hirai ,  Toranosuke Ashizawa ,  Youiti Machii

    IPC分类号： B24B1/00 ,  B24B7/22 ,  B24B57/02

    CPC分类号： H01L21/31053 ,  C09G1/02 ,  C09K3/1409 ,  C09K3/1463 ,  H01L21/30625

    摘要： The present invention discloses a CMP abrasive comprising cerium oxide particles, a dispersant, an organic polymer having an atom or a structure capable of forming a hydrogen bond with a hydroxyl group present on a surface of a film to be polished and water, a method for polishing a substrate comprising polishing a film to be polished by moving a substrate on which the film to be polished is formed and a polishing platen while pressing the substrate against the polishing platen and a polishing cloth and supplying the CMP abrasive between the film to be polished and the polishing cloth, a method for manufacturing a semiconductor device comprising the steps of the above-mentioned polishing method, and an additive for a CMP abrasive comprising an organic polymer having an atom or a structure capable of forming a hydrogen bond with a hydroxyl group present on a surface of a film to be polished, and water.

    摘要翻译： 本发明公开了一种CMP研磨剂，其包含氧化铈颗粒，分散剂，具有能够与待抛光的膜表面上存在的羟基形成氢键的原子或结构的有机聚合物和水， 抛光衬底，其包括通过移动其上形成有待抛光的膜的衬底抛光待抛光的膜和抛光台板，同时将衬底压靠在抛光台板和抛光布上并将CMP磨料供应在待抛光的膜之间 抛光布，半导体器件的制造方法，包括上述抛光方法的步骤和用于CMP研磨剂的添加剂，其包含具有能够与羟基形成氢键的原子或结构的有机聚合物 存在于要抛光的膜的表面上，以及水。

    Cmp polishing compound and polishing method
    49.
    发明申请
    Cmp polishing compound and polishing method 有权
    CMP抛光复合和抛光方法

    公开(公告)号：US20060148667A1

    公开(公告)日：2006-07-06

    申请号：US10544073

    申请日：2004-01-30

    申请人： Masato Fukasawa ,  Masato Yoshida ,  Naoyuki Koyama ,  Yuto Ootsuki ,  Chiaki Yamagishi ,  Kazuhiro Enomoto ,  Kouji Haga ,  Yasushi Kurata

    发明人： Masato Fukasawa ,  Masato Yoshida ,  Naoyuki Koyama ,  Yuto Ootsuki ,  Chiaki Yamagishi ,  Kazuhiro Enomoto ,  Kouji Haga ,  Yasushi Kurata

    IPC分类号： C11D7/50

    CPC分类号： H01L21/31053 ,  C09G1/02 ,  C09K3/1409 ,  C09K3/1463

    摘要： The present invention relates to a CMP polishing slurry, comprising cerium oxide particles, a dispersing agent, a water-soluble polymer and water, wherein the water-soluble polymer is a compound having a skeleton of any one of an N-mono-substituted product and an N,N-di-substituted product of any one selected from the group consisting of acrylamide, methacrylamide and α-substituted products thereof. The amount of the water-soluble polymer is preferably in the range of 0.01 part or more by weight and 10 parts or less by weight for 100 parts by weight of the polishing slurry. Thus it is possible to provide a polishing slurry and a polishing method which make it possible to polish a film made of silicon oxide or the like effectively and rapidly and further control the process therefor easily in CMP technique for flattening an interlayer insulating film, a BPSG film, an insulator film for shallow trench isolation, and other films.

    摘要翻译： 本发明涉及一种包括氧化铈颗粒，分散剂，水溶性聚合物和水的CMP抛光浆料，其中水溶性聚合物是具有任意一种N-单取代产物的骨架的化合物 和选自丙烯酰胺，甲基丙烯酰胺及其α-取代产物的任何一种的N，N-二取代的产物。 对于100重量份的研磨浆料，水溶性聚合物的量优选为0.01重量份以上且10重量份以下。 因此，可以提供可以有效地快速地研磨由氧化硅等制成的膜的抛光浆料和抛光方法，并且在用于使层间绝缘膜，BPSG的平坦化的CMP技术中容易地进一步控制其工艺 薄膜，用于浅沟槽隔离的绝缘膜，以及其他薄膜。

    Toroidal type continuously variable transmission
    50.
    发明授权
    Toroidal type continuously variable transmission 失效
    环形无级变速器

    公开(公告)号：US07001305B2

    公开(公告)日：2006-02-21

    申请号：US10754561

    申请日：2004-01-12

    申请人： Masato Yoshida ,  Kouji Ishikawa ,  Takashi Imanishi

    发明人： Masato Yoshida ,  Kouji Ishikawa ,  Takashi Imanishi

    IPC分类号： F16H15/38

    CPC分类号： F16H57/0434 ,  F16H15/38 ,  F16H57/049

    摘要： In a toroidal continuously variable transmission the amount of traction oil provided to contact areas between the power rollers and the input and output discs is increased as a power to be transmitted is increased. Nozzle holes formed in rockable trunnions of the transmission so that the traction oil ejected from the nozzle holes is sprayed to circumferential positions of inner surfaces of input and output discs that are in contact with peripheral surfaces of power rollers. Transmission efficiency is enhanced while maintaining endurance and reliability without supplying excessive traction oil.

    摘要翻译： 在环形无级变速器中，提供给动力辊与输入和输出盘之间的接触区域的牵引油的量随着待传输的功率的增加而增加。 在变速器的可摆动耳轴中形成喷嘴孔，使得从喷嘴孔喷出的牵引油被喷射到与动力辊的周面接触的输入和输出盘的内表面的圆周位置。 传输效率提高，同时保持耐久性和可靠性，而不会提供过量的牵引油。