Method for fabricating carbon nanotube-based field emission device
    42.
    发明授权
    Method for fabricating carbon nanotube-based field emission device 有权
    制造基于碳纳米管的场致发射器件的方法

    公开(公告)号:US07811149B2

    公开(公告)日:2010-10-12

    申请号:US11490810

    申请日:2006-07-21

    IPC分类号: H01J19/24

    摘要: An exemplary method for fabricating a carbon nanotube-based field emission device is provided. A substrate is provided. A catalyst layer is formed on the substrate. A carbon nanotube array is grown from the catalyst layer. The carbon nanotube array includes a root portion and an opposite top portion respectively being in contact with and away from the catalyst layer. A cathode base with an adhesive layer formed thereon is provided. The top portion of the carbon nanotube array is immersed into the adhesive layer. The adhesive layer is solidified to embed the immersed top portion into the solidified adhesive layer. The root portion of the carbon nanotube array is exposed.

    摘要翻译: 提供了一种用于制造基于碳纳米管的场致发射器件的示例性方法。 提供基板。 在基板上形成催化剂层。 从催化剂层生长碳纳米管阵列。 碳纳米管阵列包括分别与催化剂层接触并远离催化剂层的根部和相对的顶部。 提供其上形成有粘合剂层的阴极基体。 将碳纳米管阵列的顶部浸入粘合剂层中。 将粘合剂层固化以将浸入的顶部部分嵌入固化的粘合剂层中。 碳纳米管阵列的根部露出。

    Semiconductor Device and Method of Forming Compact Coils for High Performance Filter
    48.
    发明申请
    Semiconductor Device and Method of Forming Compact Coils for High Performance Filter 有权
    形成用于高性能滤波器的紧凑型线圈的半导体器件和方法

    公开(公告)号:US20100140738A1

    公开(公告)日:2010-06-10

    申请号:US12705790

    申请日:2010-02-15

    IPC分类号: H01L29/86 H01L21/02

    摘要: A semiconductor device has a first coil structure formed over the substrate. A second coil structure is formed over the substrate adjacent to the first coil structure. A third coil structure is formed over the substrate adjacent to the second coil structure. The first and second coil structures are coupled by mutual inductance, and the second and third coil structures are coupled by mutual inductance. The first, second, and third coil structures each have a height greater than a skin current depth of the coil structure defined as a depth which current reduces to 1/(complex permittivity) of a surface current value. In the case of copper, the coil structures have a height greater than 5 micrometers.The first, second, and third coil structures are arranged in rounded or polygonal pattern horizontally across the substrate with a substantially flat vertical profile.

    摘要翻译: 半导体器件具有形成在衬底上的第一线圈结构。 在与第一线圈结构相邻的衬底上形成第二线圈结构。 在与第二线圈结构相邻的衬底上形成第三线圈结构。 第一和第二线圈结构通过互感耦合,并且第二和第三线圈结构通过互感耦合。 第一,第二和第三线圈结构各自具有高于线圈结构的皮肤电流深度的高度,其被定义为电流减小到表面电流值的1 /(复数介电常数)的深度。 在铜的情况下,线圈结构的高度大于5微米。 第一,第二和第三线圈结构以基本上平坦的垂直轮廓横跨衬底水平布置成圆形或多边形图案。