公开(公告)号：US20140030429A1

公开(公告)日：2014-01-30

申请号：US13982339

申请日：2012-02-06

Applicant: Gerardus Aben ,  Ronnie Bernardus Maria De Rijk ,  Patrick Wilhelmus Antonius Vrijaldenhoven

Inventor： Gerardus Aben ,  Ronnie Bernardus Maria De Rijk ,  Patrick Wilhelmus Antonius Vrijaldenhoven

IPC: B05D5/06

CPC classification number: B05D5/061 ,  B05D3/04 ,  C03C17/007 ,  C03C2217/425 ,  C03C2217/732 ,  C03C2218/113 ,  G02B1/111

Abstract: The present invention relates to a process for depositing an anti-reflective layer on a transparent flat substrate comprising the steps of providing a liquid coating composition comprising at least one solvent, at least one inorganic oxide precursor, and at least one pore forming agent; applying the coating composition to the substrate; drying the applied coating layer, and curing the coating layer; wherein during drying a gas flow is provided to the substrate at a flow rate of between 0.2 and 6 m/s. The advantage of this process is that defects visible in edge areas of the coated substrate can be significantly reduced.

Abstract translation: 本发明涉及一种在透明平坦基材上沉积抗反射层的方法，包括以下步骤：提供包含至少一种溶剂，至少一种无机氧化物前体和至少一种成孔剂的液体涂料组合物; 将涂料组合物施加到基材上; 干燥涂覆的涂层，并固化涂层; 其中在干燥期间，以0.2至6m / s的流速向衬底提供气流。 该方法的优点是可以显着降低在涂覆的基材的边缘区域中可见的缺陷。

公开(公告)号：US20130295414A1

公开(公告)日：2013-11-07

申请号：US13899111

申请日：2013-05-21

Applicant: MITSUBISHI MATERIALS CORPORATION

Inventor： Jun Fujii ,  Hideaki Sakurai ,  Takashi Noguchi ,  Nobuyuki Soyama

IPC: H01B3/14

CPC classification number: H01L41/1876 ,  B05D3/02 ,  B05D3/0209 ,  B05D3/04 ,  B05D3/0406 ,  B05D3/0413 ,  B05D3/0453 ,  B05D3/0473 ,  C01G25/006 ,  C01P2002/50 ,  C01P2006/40 ,  C04B24/40 ,  C04B24/42 ,  C04B35/491 ,  C04B35/493 ,  C04B35/624 ,  C04B35/632 ,  C04B35/6325 ,  C04B2111/92 ,  C04B2235/3224 ,  C04B2235/3225 ,  C04B2235/3227 ,  C04B2235/3229 ,  C04B2235/3232 ,  C04B2235/3293 ,  C04B2235/3298 ,  C04B2235/3418 ,  C04B2235/44 ,  C04B2235/441 ,  C04B2235/443 ,  C04B2235/447 ,  C04B2235/449 ,  C04B2235/6585 ,  C23C18/1204 ,  C23C18/1225 ,  C23C18/1279 ,  C23C30/00 ,  H01B3/14 ,  H01G4/1245 ,  H01G4/206 ,  H01L21/02197 ,  H01L21/02282 ,  H01L21/31691 ,  H01L27/108 ,  H01L27/11502 ,  H01L28/55 ,  H01L41/18 ,  H01L41/1875 ,  H01L41/318

Abstract: Disclosed is a composition for ferroelectric thin film formation which is used in the formation of a ferroelectric thin film of one material selected from the group consisting of PLZT, PZT, and PT. The composition for ferroelectric thin film formation is a liquid composition for the formation of a thin film of a mixed composite metal oxide formed of a mixture of a composite metal oxide (A) represented by general formula (1): (PbxLay)(ZrzTi(1-z))O3 [wherein 0.9

Abstract translation: 公开了用于形成选自PLZT，PZT和PT的一种材料的铁电薄膜的铁电薄膜形成用组合物。 铁电薄膜形成用组合物是由通式（1）表示的复合金属氧化物（A）：（PbxLay）（ZrzTi（Zr x Ti y））的混合物形成的混合复合金属氧化物的薄膜的液体组合物， 1）表示的复合氧化物（B）或羧酸（B），通式（2）表示的化合物（其中0.9

公开(公告)号：US20090155475A1

公开(公告)日：2009-06-18

申请号：US11917409

申请日：2005-07-07

Applicant: Tomoyuki Goshima ,  Shigeji Matsumoto ,  Kosuke Shinomiya

Inventor： Tomoyuki Goshima ,  Shigeji Matsumoto ,  Kosuke Shinomiya

IPC: B05D1/02 ,  B01J35/04 ,  B05C11/00

CPC classification number: B01J35/04 ,  B01J37/0215 ,  B05D1/002 ,  B05D3/04 ,  B05D3/042 ,  B05D7/22 ,  B05D2254/04

Abstract: A device and a method which is capable of uniformly coating, without waste, any flow passages formed in a raw material with a slurry even if a slurry having high viscosity is fed thereto by an amount required for the use of coating without excess and shortage. When the slurry (S) fed to one end of the base material (M) in which a large number of flow passages (2 . . . ) are formed parallel with each other is forced into the flow passages (2 . . . ) by an air pressure to coat the inner walls (2w) of the flow passages, the slurry (S) is fed from a slurry feeding device (6) by a required amount to a slurry storage part (5) formed at the upper surface part of the base material (M) disposed so that both ends of the flow passages (2 . . . ) can be opened in the upper and bottom surfaces thereof. Then, before the slurry (S) is forced into the flow passages (2 . . . ), a centrifugal force and vibration are allowed to act on the slurry (S) by a liquid level uniformalizing mechanism (7) to uniformalize the level of the slurry.

Abstract translation: 即使将具有高粘度的浆料以不含过剩和不足的涂料所需的量供给到其中，也能够均匀地涂覆没有浪费的原料中形成的流浆通道的装置和方法。 当将彼此平行形成有大量流动通道（2 ...）的基材（M）的一端进料的浆料（S）通过 用于涂覆流路的内壁（2w）的空气压力，将浆料（S）从浆料供给装置（6）供给所需量的浆料储存部（5），形成在上述表面的上表面部 所述基材（M）设置成使得流动通道（2 ...）的两端能够在其上表面和底表面上打开。 然后，在泥浆（S）被迫进入流动通道（2 ...）之前，允许离心力和振动通过液位均匀化机构（7）作用在浆料（S）上，以使浆料 浆料。

公开(公告)号：US20090087665A1

公开(公告)日：2009-04-02

申请号：US12199097

申请日：2008-08-27

Applicant: Mineta SUZUKI ,  Takanobu SHIOKAWA ,  Kazuhiro YAMADA ,  Hiroyuki NAKAYAMA ,  Hideki YAMAGUCHI ,  Ayako Maruta

Inventor： Mineta SUZUKI ,  Takanobu SHIOKAWA ,  Kazuhiro YAMADA ,  Hiroyuki NAKAYAMA ,  Hideki YAMAGUCHI ,  Ayako Maruta

IPC: B05D3/02 ,  B32B27/36 ,  B32B17/06 ,  B32B27/32

CPC classification number: B05D3/04 ,  C01B33/148 ,  C01B33/1585 ,  C09D5/00 ,  C09D183/02 ,  C09D183/04 ,  G02B1/111 ,  G02B2207/107 ,  G02B2207/109 ,  Y10T428/31507 ,  Y10T428/31667

Abstract: A method for producing a silica aerogel film by hydrolyzing and polymerizing alkoxysilane in the presence of a base catalyst to prepare an alkaline sol, adding an acid catalyst to the alkaline sol to carry out further hydrolysis and polymerization to prepare a first acidic sol, hydrolyzing and polymerizing alkoxysilane in the presence of an acid catalyst to prepare a second acidic sol, applying a mixture of the first and second acidic sols to a substrate, and drying it.

Abstract translation: 一种通过在碱性催化剂的存在下水解和聚合烷氧基硅烷来制备二氧化硅气凝胶膜的方法以制备碱性溶胶，向碱性溶胶中加入酸催化剂进行进一步水解和聚合以制备第一酸性溶胶，水解和 在酸催化剂存在下聚合烷氧基硅烷以制备第二酸性溶胶，将第一和第二酸性溶胶的混合物施加到基材上，并将其干燥。

公开(公告)号：US20080173365A1

公开(公告)日：2008-07-24

申请号：US11932107

申请日：2007-10-31

Applicant: Marc A. Unger ,  Hou-Pu Chou ,  Todd A. Thorsen ,  Axel Scherer ,  Stephen R. Quake ,  Markus M. Enzelberger ,  Mark L. Adams ,  Carl L. Hansen

Inventor： Marc A. Unger ,  Hou-Pu Chou ,  Todd A. Thorsen ,  Axel Scherer ,  Stephen R. Quake ,  Markus M. Enzelberger ,  Mark L. Adams ,  Carl L. Hansen

IPC: F15C1/06

CPC classification number: B05D3/04 ,  B01J2219/00355 ,  B01J2219/00378 ,  B01J2219/00396 ,  B01J2219/00398 ,  B01J2219/00439 ,  B01J2219/005 ,  B01J2219/00527 ,  B01J2219/00605 ,  B01J2219/00612 ,  B01J2219/00621 ,  B01J2219/00659 ,  B01J2219/00707 ,  B01J2219/00722 ,  B01J2219/00725 ,  B01L3/502707 ,  B01L3/50273 ,  B01L3/502738 ,  B01L7/54 ,  B01L9/527 ,  B01L2200/025 ,  B01L2200/027 ,  B01L2200/0605 ,  B01L2200/10 ,  B01L2300/0681 ,  B01L2300/0861 ,  B01L2300/0887 ,  B01L2300/123 ,  B01L2300/14 ,  B01L2300/18 ,  B01L2400/046 ,  B01L2400/0481 ,  B01L2400/06 ,  B01L2400/0655 ,  B01L2400/0688 ,  B32B2037/1081 ,  B65B31/00 ,  B81B2201/036 ,  B81B2201/054 ,  B81C1/00119 ,  B81C2201/019 ,  C12Q1/6832 ,  C12Q1/6874 ,  C30B29/54 ,  F04B43/043 ,  F15C1/06 ,  F15C3/00 ,  F15C5/00 ,  F16K99/0001 ,  F16K99/0015 ,  F16K99/0046 ,  F16K99/0051 ,  F16K99/0059 ,  F16K2099/0074 ,  F16K2099/0076 ,  F16K2099/0078 ,  F16K2099/008 ,  F16K2099/0084 ,  F16K2099/0094 ,  Y10T137/0324 ,  Y10T137/0379 ,  Y10T137/0424 ,  Y10T137/206 ,  Y10T137/2082 ,  Y10T137/2164 ,  Y10T137/2169 ,  Y10T137/2174 ,  Y10T137/2202 ,  Y10T137/2224 ,  Y10T137/3084 ,  Y10T137/7837 ,  Y10T137/86027 ,  Y10T156/10 ,  Y10T428/24479 ,  Y10T428/24612 ,  C12Q2535/125

Abstract: A method of fabricating an elastomeric structure, comprising: forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess extending along a bottom surface of the first elastomeric layer; forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer; bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a control channel forms in the second recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channel forms in the first recess between the first elastomeric layer and the planar substrate.

公开(公告)号：US4471007A

公开(公告)日：1984-09-11

申请号：US481435

申请日：1983-04-01

Applicant: Michelle D. Pate

Inventor： Michelle D. Pate

IPC: C08L83/00 ,  B05D3/04 ,  B29C41/00 ,  B29K83/00 ,  C08J3/24 ,  C08J7/04 ,  C08K5/544 ,  C08L83/04 ,  C09J183/00 ,  B05D3/02

CPC classification number: B05D3/04 ,  C08L83/04 ,  C08G77/16

Abstract: A method for improving the adhesion of an amine-containing organopolysiloxane composition to a substrate which comprises coating the substrate with an amine-containing organopolysiloxane composition and thereafter heating the coated substrate to an elevated temperature prior to or during exposure to moisture and carbon dioxide in excess of that present in the atmosphere.

Abstract translation: 一种用于改善含胺的有机基聚硅氧烷组合物与基材的粘附性的方法，其包括用含胺的有机聚硅氧烷组合物涂覆该基材，然后在暴露于水分和二氧化碳过量之前或期间将涂覆的基材加热到升高的温度 那个现在在大气中。

公开(公告)号：US3203829A

公开(公告)日：1965-08-31

申请号：US22616962

申请日：1962-09-25

Applicant: EVERSHARP INC

Inventor： SEYER FRANK H ,  WEIDMAN CHARLES R

IPC: B05D3/04 ,  B26B21/60 ,  C09D123/28 ,  C09D127/00 ,  C09D127/12

CPC classification number: B05D3/04 ,  B26B21/60 ,  C09D123/28 ,  C09D127/00 ,  C09D127/12 ,  Y10S128/14

公开(公告)号：US2610131A

公开(公告)日：1952-09-09

申请号：US15848650

申请日：1950-04-27

Applicant: DEWEY AND ALMY CHEM COMP

Inventor： SHANKLIN DUNBAR L ,  ADAMS RICHARD C

IPC: B05D3/04 ,  B21D51/46 ,  B65D53/04

CPC classification number: B05D3/04 ,  B21D51/46 ,  B65D53/04

公开(公告)号：US1925429A

公开(公告)日：1933-09-05

申请号：US50340830

申请日：1930-12-19

Applicant: AMERICAN BANK NOTE CO

Inventor： PETER AITCHISON ,  WOOD FRANK T ,  WITTNEBEL ARTHUR A

IPC: B05D3/04

CPC classification number: B05D3/04

公开(公告)号：US1872015A

公开(公告)日：1932-08-16

申请号：US39605129

申请日：1929-09-30

Applicant: DEWEY AND ALMY CHEM COMP

Inventor： SHANKLIN DUNBAR L

IPC: B05D3/04

CPC classification number: B05D3/04