公开(公告)号：US20230204354A1

公开(公告)日：2023-06-29

申请号：US18067406

申请日：2022-12-16

Applicant: SEMES CO., LTD.

Inventor： Su Jin CHAE ,  Sang Min HA ,  Dong Ok AHN ,  Ho Hyeong LEE ,  Yong-Jun SEO ,  Sang Hyun SON ,  Hyeong Jun CHO

IPC: G01C9/04 ,  G01C9/06

CPC classification number: G01C9/04 ,  G01C9/06

Abstract: The inventive concept provides a portable level measuring apparatus. The portable level measuring apparatus includes a sensor module having a sensor unit configured to measure an inclination of a measuring object and a wireless communication unit configured to transmit a measured information which is measured at the sensor unit; and a portable terminal connected to the sensor module through a wireless communication, and which displays the measured information, and wherein the sensor module combines with the portable terminal through a connector and which pairs immediately if separated with the portable terminal.

公开(公告)号：US20230203759A1

公开(公告)日：2023-06-29

申请号：US18146588

申请日：2022-12-27

Applicant: SEMES CO., LTD.

Inventor： Eunho SEO ,  Sangpyo JUN ,  Sunghyup BAEK ,  Hyochul KIM ,  Inkwang LEE

IPC: E01B26/00 ,  B61B5/02

CPC classification number: E01B26/005 ,  B61B5/02

Abstract: A transfer device may include a transfer part including transfer rails installed on a ceiling of a manufacturing line for an integrated circuit device and a transfer vehicle running along the transfer rails, and a safety fence disposed adjacent to the transfer part. The safety fence may include a plurality of first horizontal supporting portions disposed in parallel to the transfer rails, a plurality of second horizontal supporting portions connecting the plurality of first horizontal supporting portions to the transfer rails, a plurality of vertical supporting portions extended from the plurality of horizontal supporting portions, respectively, and a plate portion connected to the plurality of vertical supporting portions. The safety fence may be partially foldable and partially unfoldable.

公开(公告)号：US20230201863A1

公开(公告)日：2023-06-29

申请号：US18146740

申请日：2022-12-27

Applicant: SEMES CO., LTD.

Inventor： Eunwoo PARK ,  Jongwha KANG ,  Wooram LEE ,  Sung-Gyu LEE ,  Dongwoon PARK ,  Yongdae CHO ,  Donghoon KANG ,  Kisang EUM

IPC: B05C5/02

CPC classification number: B05C5/0275 ,  B05C5/0208

Abstract: Provided is an apparatus for processing a substrate. The substrate processing apparatus includes: a processing unit processing a substrate; and a gas supply unit supplying gas to the processing unit, in which the gas supply unit includes a first housing having a first internal space which is in fluid communication with a processing space of the processing unit, a second housing disposed in the first internal space, and having a second internal space which is in fluid communication with the first internal space, and a gas supply duct supplying the gas to the second internal space.

公开(公告)号：US20230200602A1

公开(公告)日：2023-06-29

申请号：US18063737

申请日：2022-12-09

Applicant: SEMES CO., LTD.

Inventor： Sang Jin SEO ,  Jung Ho JO ,  Myeong Ho LEE ,  Sung Jae LIM

IPC: A47L7/00 ,  A47L5/22 ,  A47L9/14 ,  A47L9/06

CPC classification number: A47L7/0047 ,  A47L5/22 ,  A47L9/1409 ,  A47L9/149 ,  A47L9/06

Abstract: Disclosed is a cleaning module for cleaning a storage apparatus. The cleaning module includes a housing that defines an inner space, a suction mechanism that is installed in the inner space and that forms an air flow introduced into the inner space, and an exhaust part that discharges the air flow introduced into the inner space by the suction mechanism to the outside of the housing.

公开(公告)号：US11684955B2

公开(公告)日：2023-06-27

申请号：US17138301

申请日：2020-12-30

Applicant: SEMES CO., LTD.

Inventor： Tae Suk Yun ,  Hyeon Suk Park

IPC: B08B3/08 ,  B08B3/02 ,  B08B13/00 ,  B08B3/10 ,  H01L21/67

CPC classification number: B08B3/08 ,  B08B3/02 ,  B08B3/10 ,  B08B13/00 ,  B08B2203/007 ,  H01L21/67017 ,  H01L21/67051

Abstract: An apparatus for processing a substrate includes a housing having a processing space in which the substrate is processed, a support unit that supports the substrate in the processing space, a nozzle that dispenses a chemical onto the substrate placed on the support unit, a chemical supply unit that supplies the chemical to the nozzle, and a controller that controls the chemical supply unit.

公开(公告)号：US20230197409A1

公开(公告)日：2023-06-22

申请号：US18083555

申请日：2022-12-18

Applicant: SEMES CO., LTD.

Inventor： Hyun Jin KIM ,  GALSTYAN OGSEN ,  Jung Hwan LEE ,  Dong Jun PARK ,  Sang Hyeok AHN

IPC: H01J37/32

CPC classification number: H01J37/3211 ,  H01J37/32183 ,  H01J2237/334

Abstract: An antenna assembly, which is capable of controlling widely an etching rate in a plasma treatment process, and a plasma processing equipment including the same are provided. The antenna assembly provided to generate plasma includes a feeding line to which a radio frequency (RF) signal may be applied, and a coil member including a plurality of unit coils coupled to the feeding line and spaced apart from each other in a vertical direction at a predetermined gap.

公开(公告)号：US20230196078A1

公开(公告)日：2023-06-22

申请号：US17971544

申请日：2022-10-21

Applicant: SEMES CO., LTD.

Inventor： Dong Hyun JUN

IPC: G06N3/0464 ,  G06N5/045

CPC classification number: G06N3/0464 ,  G06N5/045 ,  H01L22/12

Abstract: The present invention provides an apparatus and method for diagnosing semiconductor equipment for analyzing a determination result and a cause of a defect for a substrate using a deep learning algorithm and explainable AI. The semiconductor equipment diagnosis method comprises acquiring time series data for a parameter related to a substrate treating process of a substrate treating apparatus, generating table information based on the time series data, converting the table information into image information based on data included in the table information, extracting and classifying a feature from the image information, determining whether a substrate treated by the substrate treating apparatus is good or defective based on the feature, and analyzing a cause of a defect of the substrate in response to determining that the substrate is defective.

公开(公告)号：US20230194422A1

公开(公告)日：2023-06-22

申请号：US18080552

申请日：2022-12-13

Applicant: SEMES CO., LTD.

Inventor： Seung Tae YANG ,  Sang Woo PARK ,  Young Joon HAN ,  Gi Hun CHOI ,  Moon Soon CHOI ,  Seong Hyeon KIM ,  Bu Young JUNG

IPC: G01N21/3577 ,  B01L3/00

CPC classification number: G01N21/3577 ,  B01L3/502 ,  G01N2021/3595

Abstract: A chemical liquid supply unit includes a chemical liquid storage storing a chemical liquid, a chemical liquid supply line that is connected to the chemical liquid storage, the chemical liquid flowing through the chemical liquid supply line from the chemical liquid storage, and a chemical liquid inspection means detecting impurities from the chemical liquid flowing through the chemical liquid supply line using a spectroscopy method.

公开(公告)号：US20230191780A1

公开(公告)日：2023-06-22

申请号：US18081647

申请日：2022-12-14

Applicant: SEMES CO., LTD.

Inventor： Hong Joo LEE ,  Moo Hyung YI

IPC: B41J2/125 ,  B41J2/14 ,  B41J3/407

CPC classification number: B41J2/125 ,  B41J2/14 ,  B41J3/407 ,  B41J2002/14475 ,  B41J2203/01

Abstract: The present disclosure provides substrate processing apparatus and a substrate processing method for composing nozzles having different drop sizes into one or more pack units and performing pixel printing by using nozzles belonging to the thus composed packs. The substrate processing method includes extracting nozzles that have different drop sizes as different sized dropping nozzles, composing extracted nozzles into one or more packs, and performing pixel printing on the substrate with nozzles included in the pack by discharging a substrate treatment solution to a common target location on the substrate.

公开(公告)号：US11682577B2

公开(公告)日：2023-06-20

申请号：US16733688

申请日：2020-01-03

Applicant: SEMES CO., LTD.

Inventor： Jihwan Lee ,  Jungbong Choi ,  Chan Young Heo ,  Pil Kyun Heo

IPC: H01L21/687 ,  H01L21/67 ,  B08B3/04

CPC classification number: H01L21/6875 ,  B08B3/04 ,  H01L21/6704 ,  H01L21/67051 ,  H01L21/68728 ,  H01L21/68757

Abstract: The present disclosure relates to a spin head, apparatus and method for treating a substrate including the spin head. The spin head includes a supporting plate where a substrate is placed and a chuck pin placed on the supporting plate and supporting a lateral portion of the substrate, wherein the chuck pin includes an outer body and an inner body inserted in the outer body and provided with a different material from the outer body, wherein each outer body and the inner body is provided with any one of a first material or a second material, and wherein one material of the first material and the second material is provided with a material having lower heat conductivity and better thermal resistance than another one.