公开(公告)号：US6127262A

公开(公告)日：2000-10-03

申请号：US852787

申请日：1997-05-07

Applicant: Judy H. Huang ,  Wai-Fan Yau ,  David Cheung ,  Chan-Lon Yang

Inventor： Judy H. Huang ,  Wai-Fan Yau ,  David Cheung ,  Chan-Lon Yang

IPC: H01L21/302 ,  C23C16/30 ,  C23C16/34 ,  C23C16/52 ,  G03F7/09 ,  H01L21/027 ,  H01L21/3065 ,  H01L21/311 ,  H01L21/316 ,  H01L21/3205 ,  H01L21/768

CPC classification number: C23C16/308 ,  C23C16/345 ,  C23C16/52 ,  G03F7/091 ,  H01L21/0276 ,  H01L21/31116 ,  H01L21/76802 ,  H01L21/76829

Abstract: A method and apparatus for depositing an etch stop layer. The method begins by introducing process gases into a processing chamber in which a substrate is disposed. An etch stop layer is then deposited over the substrate. An overlying layer is then deposited over the etch stop layer. The etch stop layer substantially protects underlying materials from the etchants used in patterning the overlying layer. Moreover, the etch stop layer also possesses advantageous optical characteristics, making it suitable for use as an antireflective coating in the patterning of layers underlying the etch stop layer.

Abstract translation: 一种沉积蚀刻停止层的方法和装置。 该方法开始于将工艺气体引入其中设置衬底的处理室中。 然后在衬底上沉积蚀刻停止层。 然后将上覆层沉积在蚀刻停止层上。 蚀刻停止层基本上保护用于图案化上覆层的蚀刻剂的下层材料。 此外，蚀刻停止层还具有有利的光学特性，使其适合用作在蚀刻停止层下面的图案图案中的抗反射涂层。

公开(公告)号：US6086952A

公开(公告)日：2000-07-11

申请号：US97365

申请日：1998-06-15

Applicant: Chi-I Lang ,  Yeming Jim Ma ,  Fong Chang ,  Peter Wai-Man Lee ,  Shin-Puu Jeng ,  David Cheung

Inventor： Chi-I Lang ,  Yeming Jim Ma ,  Fong Chang ,  Peter Wai-Man Lee ,  Shin-Puu Jeng ,  David Cheung

IPC: C08F212/12 ,  B05D7/24 ,  C08F230/08 ,  C08G61/12 ,  H01L21/312 ,  H01L21/316 ,  C23C16/00

CPC classification number: B05D1/60

Abstract: A method for forming thin polymer layers having low dielectric constants or semiconductor substrates. In one embodiment, the method includes the vaporization of stable di-p-xylylene, the pyrolytic conversion of such gaseous dimer material into reactive monomers, and blending of the resulting gaseous p-xylylene monomers with one or more comonomers having silicon-oxygen bonds and at least two pendent carbon--carbon double bonds. The copolymer films have low dielectric constants, improved thermal stability, and excellent adhesion to silicon oxide layers in comparison to parylene-N homopolymers.

Abstract translation: 一种形成具有低介电常数或半导体衬底的薄聚合物层的方法。 在一个实施方案中，该方法包括稳定的二对二甲苯的蒸发，将这种气态二聚体材料热解转化为反应性单体，以及将所得气态对二甲苯单体与一个或多个具有硅 - 氧键的共聚单体共混， 至少两个悬挂的碳 - 碳双键。 与聚对二甲苯-N均聚物相比，共聚物膜具有低介电常数，改善的热稳定性和与氧化硅层的优异粘附性。

公开(公告)号：US6054379A

公开(公告)日：2000-04-25

申请号：US21788

申请日：1998-02-11

Applicant: Wai-Fan Yau ,  David Cheung ,  Shin-Puu Jeng ,  Kuowei Liu ,  Yung-Cheng Yu

Inventor： Wai-Fan Yau ,  David Cheung ,  Shin-Puu Jeng ,  Kuowei Liu ,  Yung-Cheng Yu

IPC: C23C16/40 ,  H01L21/316 ,  H01L21/768 ,  H01L21/31

CPC classification number: H01L21/76834 ,  C23C16/401 ,  H01L21/02126 ,  H01L21/02164 ,  H01L21/02211 ,  H01L21/02274 ,  H01L21/02304 ,  H01L21/02362 ,  H01L21/3122 ,  H01L21/31612 ,  H01L21/31633 ,  H01L21/76801 ,  H01L21/7681 ,  H01L21/76828 ,  H01L21/76829 ,  H01L21/76832 ,  H01L21/76835 ,  H01L21/76837

Abstract: A method and apparatus for depositing a low dielectric constant film by reaction of an organo silane compound and an oxidizing gas. The oxidized organo silane film has excellent barrier properties for use as a liner or cap layer adjacent other dielectric layers. The oxidized organo silane film can also be used as an etch stop or an intermetal dielectric layer for fabricating dual damascene structures. The oxidized organo silane films also provide excellent adhesion between different dielectric layers. A preferred oxidized organo silane film is produced by reaction of methyl silane, CH.sub.3 SiH.sub.3, and N.sub.2 O.

公开(公告)号：US6045618A

公开(公告)日：2000-04-04

申请号：US741241

申请日：1996-10-30

Applicant: Sebastien Raoux ,  Tsutomu Tanaka ,  Mukul Kelkar ,  Hari Ponnekanti ,  Kevin Fairbairn ,  David Cheung

Inventor： Sebastien Raoux ,  Tsutomu Tanaka ,  Mukul Kelkar ,  Hari Ponnekanti ,  Kevin Fairbairn ,  David Cheung

IPC: B01D45/06 ,  B01D53/32 ,  B01D53/46 ,  B01J19/08 ,  B01J19/12 ,  B01J19/24 ,  C23C16/44 ,  C23F4/00 ,  H01J37/32 ,  H01L21/205 ,  H01L21/31 ,  H05H1/24 ,  B01D53/00

CPC classification number: H01J37/3244 ,  B01D45/06 ,  B01D53/32 ,  B01D53/46 ,  B01J19/08 ,  B01J19/088 ,  B01J19/126 ,  B01J19/249 ,  C23C16/4405 ,  C23C16/4412 ,  H01J37/32844 ,  H05H1/46 ,  B01D2257/206 ,  B01D2259/818 ,  B01J2219/2453 ,  B01J2219/2458 ,  B01J2219/2461 ,  B01J2219/2467 ,  B01J2219/247 ,  B01J2219/2474 ,  B01J2219/2475 ,  B01J2219/2487 ,  B01J2219/2493 ,  B01J2219/2496 ,  H01J2237/022 ,  H05H2001/4622 ,  H05H2001/4667 ,  H05H2245/1215 ,  Y02C20/30 ,  Y10S55/30

Abstract: An apparatus for minimizing deposition in an exhaust line of a substrate processing chamber. The apparatus includes first and second members having opposing surfaces that define a fluid conduit between them. The fluid conduit includes an inlet, an outlet and a collection chamber between the inlet and the outlet. The apparatus is connected at its inlet to receive the exhaust of the substrate processing chamber, and the collection chamber is structured and arranged to collect particulate matter flowing through the fluid conduit and to inhibit egress of the particulate matter from the collection chamber. A microwave plasma generation system supplies microwave energy within the fluid conduit to form a plasma from etchant gases within the fluid conduit. Constituents from the plasma react with the particulate matter collected in the collection chamber to form gaseous products that may be pumped out of the fluid conduit. The apparatus may further include an electrostatic collector to enhance particle collection in the collection chamber and to further inhibit egress of the particulate matter.

Abstract translation: 一种用于最小化衬底处理室的排气管线中沉积的装置。 该装置包括具有在它们之间限定流体导管的相对表面的第一和第二构件。 流体导管包括在入口和出口之间的入口，出口和收集室。 该设备在其入口处连接以接收基板处理室的排气，并且收集室被构造和布置成收集流过流体管道的颗粒物质并且抑制颗粒物质从收集室排出。 微波等离子体产生系统在流体导管内提供微波能量以从流体导管内的蚀刻剂气体形成等离子体。 来自等离子体的成分与收集室中收集的颗粒物质发生反应，形成可以从流体导管泵出的气体产物。 该装置还可以包括静电收集器以增强收集室中的颗粒收集并进一步抑制颗粒物质的排出。

公开(公告)号：US5968324A

公开(公告)日：1999-10-19

申请号：US672888

申请日：1996-06-28

Applicant: David Cheung ,  Joe Feng ,  Judy H. Huang ,  Wai-Fan Yau

Inventor： David Cheung ,  Joe Feng ,  Judy H. Huang ,  Wai-Fan Yau

IPC: G03F7/11 ,  C23C16/50 ,  G02B1/11 ,  G03F7/09 ,  H01L21/02 ,  H01L21/027 ,  C23C14/54

CPC classification number: G03F7/091

Abstract: A stable process for depositing an antireflective layer. Helium gas is used to lower the deposition rate of plasma-enhanced silane oxide, silane oxynitride, and silane nitride processes. Helium is also used to stabilize the process, so that different films can be deposited. The invention also provides conditions under which process parameters can be controlled to produce antireflective layers with varying optimum refractive index, absorptive index, and thickness for obtaining the desired optical behavior.

Abstract translation: 一种用于沉积抗反射层的稳定方法。 氦气用于降低等离子体增强硅烷氧化物，硅氮氧化物和氮化硅工艺的沉积速率。 氦也用于稳定工艺，使得可以沉积不同的膜。 本发明还提供了可以控制工艺参数以产生具有变化的最佳折射率，吸收指数和厚度以获得所需光学行为的抗反射层的条件。

公开(公告)号：USD318306S

公开(公告)日：1991-07-16

申请号：US182318

申请日：1988-04-15

Applicant: David Cheung

Designer： David Cheung

公开(公告)号：USD308991S

公开(公告)日：1990-07-03

申请号：US108047

申请日：1987-10-14

Applicant: David Cheung

Designer： David Cheung

公开(公告)号：USD926861S1

公开(公告)日：2021-08-03

申请号：US29727113

申请日：2020-03-09

Applicant: David Cheung

Designer： David Cheung

公开(公告)号：US09411656B2

公开(公告)日：2016-08-09

申请号：US12489366

申请日：2009-06-22

Applicant: Avinash Jindal ,  Deepak Bansal ,  Sam Htin Moy ,  David Cheung ,  Bing Wang ,  Mani Kancherla ,  Sridhar Devarapalli

Inventor： Avinash Jindal ,  Deepak Bansal ,  Sam Htin Moy ,  David Cheung ,  Bing Wang ,  Mani Kancherla ,  Sridhar Devarapalli

IPC: G06F15/173 ,  G06F9/50

CPC classification number: G06F9/5083

Abstract: A network device includes a plurality of blades, each having a plurality of CPU cores that process requests received by the network device. Each blade further includes an accumulator circuit. Each accumulator circuit periodically aggregates the local counter values of the CPU cores of the corresponding blade. One accumulator circuit is designated as a master, and the other accumulator circuit(s) are designated as slave(s). The slave accumulator circuits transmit their aggregated local counter values to the master accumulator circuit. The master accumulator circuit aggregates the sets of aggregated local counter values to create a set of global counter values. The master accumulator circuit transmits the global counter values to a management processor (for display), to the CPU cores located on its corresponding blade, and to each of the slave accumulator circuits. Each slave accumulator circuit then transmits the global counter values to the CPU cores located on its corresponding blade.

Abstract translation: 网络设备包括多个刀片，每个刀片具有处理由网络设备接收的请求的多个CPU内核。 每个叶片还包括一个蓄电池电路。 每个累加器电路周期性地聚集相应刀片的CPU内核的本地计数器值。 一个累加器电路被指定为主机，另一个累加器电路被指定为从机。 从累加器电路将其聚合的本地计数器值发送到主累加器电路。 主累加器电路聚合本地计数器值集合以创建一组全局计数器值。 主累加器电路将全局计数器值发送到管理处理器（用于显示），发送到位于其相应刀片上的CPU核心以及从属累加器电路中的每一个。 然后，每个从属累加器电路将全局计数器值发送到位于其相应刀片上的CPU核心。

公开(公告)号：US09202059B2

公开(公告)日：2015-12-01

申请号：US13410282

申请日：2012-03-01

Applicant: Apurva M. Bhansali ,  Mehul R. Patel ,  Kamal M. Dhanani ,  Rajnish S. Chauhan ,  David Cheung

Inventor： Apurva M. Bhansali ,  Mehul R. Patel ,  Kamal M. Dhanani ,  Rajnish S. Chauhan ,  David Cheung

IPC: G06F21/00 ,  G06F21/57

CPC classification number: G06F21/602 ,  G06F9/4406 ,  G06F21/31 ,  G06F21/575 ,  G06F2221/033

Abstract: A system for use with a computer is provided, the computer including a self-encrypting drive (SED), the SED including a nominal space and a pre-boot region, wherein the nominal space can be locked to prevent access to the nominal space. The system includes SED management software configured to be loaded in the pre-boot region of the SED. The SED management software includes a pre-boot operating system (OS) and an unlocking program. The unlocking program is configured (a) to execute within the pre-boot OS, and (b) upon successful authentication of a user, to unlock the nominal space of the SED. Other embodiments are described and claimed.

Abstract translation: 提供了一种与计算机一起使用的系统，所述计算机包括自加密驱动器（SED），所述SED包括标称空间和预引导区域，其中所述标称空间可被锁定以防止访问所述标称空间。 该系统包括配置为加载到SED的预引导区域的SED管理软件。 SED管理软件包括一个预引导操作系统（OS）和一个解锁程序。 解锁程序被配置为（a）在预引导OS内执行，以及（b）成功认证用户后，解锁SED的标称空间。 描述和要求保护其他实施例。