IMAGE PROCESSING DEVICE AND RECORDING MEDIUM STORING IMAGE PROCESSING PROGRAM
    51.
    发明申请
    IMAGE PROCESSING DEVICE AND RECORDING MEDIUM STORING IMAGE PROCESSING PROGRAM 有权
    图像处理设备和记录媒体存储图像处理程序

    公开(公告)号:US20090141979A1

    公开(公告)日:2009-06-04

    申请号:US12339925

    申请日:2008-12-19

    IPC分类号: G06K9/00

    CPC分类号: G06K9/00134

    摘要: An inspection apparatus includes an imaging device and an image processing device. The imaging device photographs a specimen and outputs a color image of the specimen to the image processing device. The image processing device subjects the color image of the specimen to negative-positive reversal. After detecting a mode value of the hue the color image having been subjected to negative-positive reversal, the image processing device changes the hue of the color image in accordance with a difference between a boundary value of two predefined hues and the detected mode value. In accordance with the change of the hue, a plurality of target pixels different in the saturation is extracted and the saturation and the intensity of each pixel are changed, or the gradation of each pixel is converted so that the plurality of target pixels becomes most distant from one another in a color space.

    摘要翻译: 检查装置包括成像装置和图像处理装置。 成像装置拍摄样本并将样本的彩色图像输出到图像处理装置。 图像处理装置使样本的彩色图像呈负反转。 在检测到彩色图像经受负反转后的色调的模式值之后,图像处理装置根据两个预定色调的边界值与检测到的模式值之间的差异来改变彩色图像的色调。 根据色调的变化,提取饱和度不同的多个目标像素,并且改变每个像素的饱和度和强度,或者转换每个像素的灰度,使得多个目标像素变得最远 在一个色彩空间中彼此之间。

    Method for Fabricating Micromachine Component of Resin
    52.
    发明申请
    Method for Fabricating Micromachine Component of Resin 失效
    制造树脂微机械成分的方法

    公开(公告)号:US20090035706A1

    公开(公告)日:2009-02-05

    申请号:US11922529

    申请日:2006-06-15

    IPC分类号: G03F7/20

    摘要: A method for fabricating a micromachine component of resin comprising step (a) of forming a sacrifice layer on a substrate, step (b) of forming at least two photosensitive resin composition layers sequentially on the sacrifice layer, and performing photolithography of each photosensitive resin composition layer to form an air gap portion defining the circumferential edge potion of the micromachine component and an air gap portion where an internal structure of the micromachine component is constituted to form a multilayer structure, step (c) for depositing dry film resist on the multilayer structure of the cured photosensitive resin composition layer, and performing photolithography of the dry film resist layer to form a cured dry film resist layer in which an air gap portion defining the circumferential edge of a shroud layer and an air gap where the structure of the shroud layer is constituted are formed, and step (d) for separating the micromachine component having the multilayer structure of the cured photosensitive resin composition layer and the cured dry film resist layer from the substrate by removing the sacrifice layer.

    摘要翻译: 一种用于制造树脂微机械部件的方法,包括在基板上形成牺牲层的步骤(a),在牺牲层上依次形成至少两个感光性树脂组合物层的步骤(b),并对各感光性树脂组合物进行光刻 以形成限定微机械部件的周向边缘部分的气隙部分和构成微机械部件的内部结构以形成多层结构的气隙部分,用于在多层结构上沉积干膜抗蚀剂的步骤(c) 并进行干膜抗蚀剂层的光刻,形成固化的干膜抗蚀剂层,其中限定了护罩层的周缘的气隙部分和护罩层的结构的气隙 形成,并且步骤(d)用于分离具有多层st的微机械部件 通过除去牺牲层从固化的光敏树脂组合物层和固化的干膜抗蚀剂层的结构。

    ELECTRON BEAM APPARATUS AND AN ABERRATION CORRECTION OPTICAL APPARATUS
    53.
    发明申请
    ELECTRON BEAM APPARATUS AND AN ABERRATION CORRECTION OPTICAL APPARATUS 有权
    电子束装置和抛光校正光学装置

    公开(公告)号:US20080067377A1

    公开(公告)日:2008-03-20

    申请号:US11760235

    申请日:2007-06-08

    IPC分类号: G21K7/00

    摘要: An electron beam apparatus for providing an evaluation of a sample, such as a semiconductor wafer, that includes a micro-pattern with a minimum line width not greater than 0.1 μm with high throughput. A primary electron beam generated by an electron gun is irradiated onto a sample and secondary electrons emanating from the sample are formed into an image on a detector by an image projection optical system. An electron gun 61 has a cathode 1 and a drawing electrode 3, and an electron emission surface 1a of the cathode defines a concave surface. The drawing electrode 3 has a convex surface 3a composed of a partial outer surface of a second sphere facing the electron emission surface 1a of the cathode and an aperture 73 formed through the convex surface for passage of the electrons. An aberration correction optical apparatus comprises two identically sized multi-polar Wien filters arranged such that their centers are in alignment with a 1/4 plane position and a ¾ plane position, respectively, along an object plane-image plane segment in the aberration correction optical apparatus, and optical elements having bidirectional focus disposed in an object plane position, an intermediate image-formation plane position and an image plane position, respectively, in the aberration correction optical apparatus.

    摘要翻译: 一种用于提供诸如半导体晶片的样品的评估的电子束装置,其包括具有不大于0.1μm的最小线宽的微量图案,具有高生产量。 由电子枪产生的一次电子束照射在样品上,从样品发出的二次电子通过图像投影光学系统形成检测器上的图像。 电子枪61具有阴极1和拉伸电极3,阴极的电子发射表面1a限定凹面。 拉制电极3具有由面对阴极的电子发射表面1a的第二球体的部分外表面和由电子通过凸面形成的孔73构成的凸面3a。 像差校正光学装置包括两个相同大小的多极维恩滤波器,其布置成使得它们的中心分别与像差校正光学中的物平面图像平面段的1/4平面位置和¾平面位置对准 装置和具有分别设置在像差校正光学装置中的物平面位置,中间图像形成平面位置和图像平面位置的双向焦点的光学元件。

    Nicotianamine synthase and gene encoding the same
    55.
    发明申请
    Nicotianamine synthase and gene encoding the same 失效
    烟碱合成酶和基因编码相同

    公开(公告)号:US20070150981A1

    公开(公告)日:2007-06-28

    申请号:US11702796

    申请日:2007-02-05

    摘要: A nicotianamine synthase is isolated and purified. Then the gene of this enzyme is cloned and the base sequence and amino acid sequence thereof are determined. This gene is employed in constructing plants, in particular, grass plants highly tolerant to iron-deficiency. A nicotianamine synthase involved in the mugineic acid biosynthesis pathway; the amino acid sequence thereof; a gene encoding the same; a vector containing this gene; cells transformed by the vector; a process for producing nicotianamine by using the same; plants transformed by the gene encoding the nicotianamine synthase; and an antibody against the nicotianamine syntase.

    摘要翻译: 分离和纯化烟碱胺合酶。 然后克隆该酶的基因,确定其碱基序列和氨基酸序列。 该基因用于构建植物,特别是高度耐铁缺乏的草本植物。 涉及木瓜酸生物合成途径的烟碱胺合酶; 其氨基酸序列; 编码该基因的基因; 含有该基因的载体; 由载体转化的细胞; 通过使用它来生产烟碱胺的方法; 由编码烟碱胺合成酶的基因转化的植物; 和针对烟碱胺合成酶的抗体。

    Permanent resist composition, cured product thereof, and use thereof
    56.
    发明申请
    Permanent resist composition, cured product thereof, and use thereof 审中-公开
    永久抗蚀剂组合物,其固化产物及其用途

    公开(公告)号:US20050260522A1

    公开(公告)日:2005-11-24

    申请号:US11054651

    申请日:2005-02-09

    摘要: A permanent photoresist composition comprising: (A) one or more bisphenol A-novolac epoxy resins according to Formula I; wherein each group R in Formula I is individually selected from glycidyl or hydrogen and k in Formula I is a real number ranging from 0 to about 30; (B) one or more epoxy resins selected from the group represented by Formulas BIIa and BIIb; wherein each R1, R2 and R3 in Formula BIIa are independently selected from the group consisting of hydrogen or alkyl groups having 1 to 4 carbon atoms and the value of p in Formula BIIa is a real number ranging from 1 to 30; the values of n and m in Formula BIIb are independently real numbers ranging from 1 to 30 and each R4 and R5 in Formula BIIb are independently selected from hydrogen, alkyl groups having 1 to 4 carbon atoms, or trifluoromethyl; (C) one or more cationic photoinitiators (also known as photoacid generators or PAGs); and (D) one or more solvents.

    摘要翻译: 一种永久性光致抗蚀剂组合物,其包含:(A)根据式I的一种或多种双酚A-酚醛清漆环氧树脂; 其中式I中的每个基团R各自选自缩水甘油基或氢,式I中的k为0至约30的实数; (B)选自由式BIIa和BIIb表示的基团中的一种或多种环氧树脂; 其中式BIIa中的每个R 1,R 2和R 3各自独立地选自氢或具有1至4个碳原子的烷基 碳原子,式BIIa中的p的值为1〜30的实数; 式BIIb中的n和m的值独立地为1至30的实数,并且式BIIb中的每个R 4和R 5独立地选自氢,烷基 具有1至4个碳原子,或三氟甲基; (C)一种或多种阳离子光引发剂(也称为光酸产生剂或PAG); 和(D)一种或多种溶剂。

    Phenolic resin, epoxy resin, and processes for producing these
    58.
    发明授权
    Phenolic resin, epoxy resin, and processes for producing these 有权
    酚醛树脂,环氧树脂及其制造方法

    公开(公告)号:US06451879B1

    公开(公告)日:2002-09-17

    申请号:US09807572

    申请日:2001-04-13

    IPC分类号: C08K506

    摘要: A process for producing a phenolic resin of good hue, characterized by reacting a hydroxylated aromatic compound with an unsaturated cyclic hydrocarbon compound in the presence of both active hydrogen and a reducing metal compound with the aid of an acid catalyst, subsequently deactivating the catalyst, and then removing the catalyst, the metal compound, and the starting materials remaining unreacted; and a process for producing an epoxy resin which comprises a step of reacting the phenolic resin with an epihalohydrin. By these processes, a phenolic resin and an epoxy resin are obtained which each is colored little and has an excellent hue. These resins are useful as resins for electrically insulating materials, especially as resins for semiconductor encapsulation materials and for laminated plates.

    摘要翻译: 一种生产具有良好色调的酚醛树脂的方法,其特征在于借助酸催化剂在活性氢和还原金属化合物的存在下使羟基化芳族化合物与不饱和环烃化合物反应,随后使催化剂失活,以及 然后除去催化剂,金属化合物和原料残留未反应; 以及环氧树脂的制造方法,其包括使酚醛树脂与表卤代醇反应的工序。 通过这些方法,得到酚酞树脂和环氧树脂,其各自着色少且具有优异的色调。 这些树脂可用作电绝缘材料的树脂,特别是用于半导体封装材料和层压板的树脂。

    Processes for producing phenolic resin and epoxy resin
    59.
    发明授权
    Processes for producing phenolic resin and epoxy resin 有权
    生产酚醛树脂和环氧树脂的工艺

    公开(公告)号:US06407150B1

    公开(公告)日:2002-06-18

    申请号:US09601975

    申请日:2000-08-10

    IPC分类号: C08K310

    摘要: A process for producing phenol resin having good color tone, which process comprises reacting hydroxyl group-containing aromatic compound and unsaturated cyclic hydrocarbon under the condition that the moisture is 100 ppm or less and the concentration of Friedel-Crafts catalyst is 0.07 mass % or less in a reaction system and a process for producing epoxy resin having good color tone, which process comprises reacting the obtained phenol resin and epihalohydrin in the presence of base catalyst, removing remaining catalyst and further removing unreacted epihalohydrin.

    摘要翻译: 一种生产具有良好色调的酚醛树脂的方法,该方法包括在水分为100ppm以下,Friedel-Crafts催化剂的浓度为0.07质量%以下的条件下使含羟基的芳香族化合物和不饱和环状烃反应 在反应体系和具有良好色调的环氧树脂的制备方法中,该方法包括在碱催化剂存在下使得到的酚醛树脂与表卤代醇反应,除去剩余的催化剂,并进一步除去未反应的表卤代醇。