公开(公告)号：US20070046619A1

公开(公告)日：2007-03-01

申请号：US11510557

申请日：2006-08-28

Applicant: Yutaka Sano ,  Takashi Kunimori ,  Masanori Yasumori ,  Toshihiko Tanaka

Inventor： Yutaka Sano ,  Takashi Kunimori ,  Masanori Yasumori ,  Toshihiko Tanaka

IPC: G09G3/36

CPC classification number: G09G3/3406 ,  G02F2001/13312 ,  G09G3/3648 ,  G09G2300/0426 ,  G09G2300/0456 ,  G09G2320/0626 ,  G09G2360/144

Abstract: A liquid crystal display device 1 of the invention has a liquid crystal display panel in which a liquid crystal layer 14 is provided between a TFT substrate 2 and a CF substrate 25 that has a common electrode 26, a light sensing component LS1 with a TFT photosensor that senses external light, and an illuminating means controlled according to the output of the light sensing component. The light sensing component is deployed at the periphery of the TFT substrate's display area DA and uses a thin film transistor as photosensor. A capacitor C is connected between source and drain electrodes SL, DL for such TFT photosensor. One of the capacitor's terminals is connected to a standard voltage source VS via a switch element SW, and the other to the common electrode 26. Voltage that is always lower than the voltage applied to the common electrode by an amount corresponding to a reverse bias voltage is applied to the gate electrode GL for the TFT photosensor. The capacitor's voltage a certain time after the switch element turns off is output. As a result, it will be possible to provide a liquid crystal display device in which the light sensing component incorporated in the liquid crystal display panel is not susceptible to the influence of the drive signals for the display panel, and in which the light sensing component does not induce deterioration of the liquid crystals.

Abstract translation: 本发明的液晶显示装置1具有液晶显示面板，其中液晶层14设置在TFT基板2和具有公共电极26的CF基板25之间，具有TFT的光感测部件LS 1 感测外部光的光电传感器，以及根据光检测部件的输出控制的照明装置。 光感测部件配置在TFT基板的显示区域DA的周围，并且使用薄膜晶体管作为光电传感器。 对于这种TFT光电传感器，电容器C连接在源电极和漏电极S L L，D L L之间。 电容器的端子中的一个通过开关元件SW连接到标准电压源V SUB，另一个连接到公共电极26.电压总是低于通过公共电极施加到公共电极的电压 将对应于反向偏置电压的量施加到用于TFT光电传感器的栅电极G L L。 输出开关元件关闭后一定时间内的电容器电压。 结果，可以提供一种液晶显示装置，其中结合在液晶显示面板中的感光元件不受显示面板的驱动信号的影响，并且其中感光部件 不会引起液晶的劣化。

公开(公告)号：US20060273405A1

公开(公告)日：2006-12-07

申请号：US11504738

申请日：2006-08-16

Applicant: Tomonori Sekiguchi ,  Toshihiko Tanaka ,  Toshiaki Yamanaka ,  Takeshi Sakata ,  Katsutaka Kimura

Inventor： Tomonori Sekiguchi ,  Toshihiko Tanaka ,  Toshiaki Yamanaka ,  Takeshi Sakata ,  Katsutaka Kimura

IPC: H01L29/76 ,  H01L29/94 ,  H01L31/00

CPC classification number: H01L27/10882 ,  G03F1/36 ,  H01L21/32139 ,  H01L23/528 ,  H01L27/105 ,  H01L27/10894 ,  H01L2924/0002 ,  H01L2924/00

Abstract: In a masking pattern (a) for patterning word and data lines, length is changed between adjacent word lines so as to be shifted from each other at their tips, and furthermore, the tip of each word line is cut obliquely. It is thus possible to prevent the resist pattern from separation and contact of adjacent patterns. Consequently, it is also possible to prevent break failures of patterned lines and short failures between those patterned lines.

公开(公告)号：US20060251348A1

公开(公告)日：2006-11-09

申请号：US10561662

申请日：2004-06-10

Applicant: Masaki Egami ,  Seiji Shimizu ,  Toshihiko Tanaka

Inventor： Masaki Egami ,  Seiji Shimizu ,  Toshihiko Tanaka

IPC: F16C19/00

CPC classification number: F16C13/006 ,  F16C33/10 ,  F16C33/201

Abstract: A cam follower includes a shaft member which is cantilevered at one end and a slide bearing fitted onto the outer periphery of the other end of the shaft member. The slide bearing is composed of a cylindrical matrix made of an Fe-based sintered metal material having an Fe content of 90 wt % or more and a slide layer formed from the inner peripheral surface to the both end faces of the matrix. The slide layer is made of a slide material composition having a base material such as polyethylene resin blended with a lubricant such as silicone oil and a globular porous silica impregnated with this lubricant.

Abstract translation: 凸轮从动件包括在一端悬臂的轴构件和装配在轴构件的另一端的外周上的滑动轴承。 滑动轴承由Fe含量为90重量％以上的Fe系烧结金属材料制成的圆筒形基体和从基体的内周面到两端面形成的滑动层构成。 滑动层由具有诸如聚硅氧烷等润滑剂的聚乙烯树脂等基材的滑动材料组合物和浸渍有该润滑剂的球状多孔二氧化硅构成。

公开(公告)号：US20060125758A1

公开(公告)日：2006-06-15

申请号：US11288742

申请日：2005-11-29

Applicant: Kuni Yamamura ,  Michiru Senda ,  Ryoichi Yokoyama ,  Yasushi Miyajima ,  Toshihiko Tanaka

Inventor： Kuni Yamamura ,  Michiru Senda ,  Ryoichi Yokoyama ,  Yasushi Miyajima ,  Toshihiko Tanaka

IPC: G09G3/36

CPC classification number: G09G3/3688 ,  G09G3/2085

Abstract: A driving circuit of an LCD display apparatus, which adjusts the sampling timing of a video signal. Driving signals from a driving IC and a reference power source are supplied via a flexible printed circuit FPC to an LCD panel. A horizontal clock signal is subjected to switching adjustment in a propagation delay adjustment circuit, which alternatively switches a delay amount of the horizontal clock signal between two levels, and the resulting horizontal clock signal subjected to the switching adjustment is then supplied to a horizontal shift register. The FPC generates a switching signal by branching from either a high potential voltage signal VDD or a low potential voltage signal VSS and supplies the switching signal to the propagation delay adjustment circuit. A phase switching circuit having a function similar to that of the propagation delay adjustment circuit may be provided within the driving IC.

Abstract translation: LCD显示装置的驱动电路，其调整视频信号的采样定时。 来自驱动IC和参考电源的驱动信号通过柔性印刷电路FPC提供给LCD面板。 水平时钟信号在传播延迟调整电路中进行切换调整，交替地将两个电平之间的水平时钟信号的延迟量切换，然后将经过切换调整的结果水平时钟信号提供给水平移位寄存器 。 FPC通过从高电位电压信号VDD或低电位电压信号VSS分支而产生开关信号，并将切换信号提供给传播延迟调节电路。 可以在驱动IC内设置具有与传播延迟调整电路类似的功能的相位切换电路。

公开(公告)号：US06936406B2

公开(公告)日：2005-08-30

申请号：US10364702

申请日：2003-02-12

Applicant: Norio Hasegawa ,  Joji Okada ,  Toshihiko Tanaka ,  Kazutaka Mori ,  Ko Miyazaki

Inventor： Norio Hasegawa ,  Joji Okada ,  Toshihiko Tanaka ,  Kazutaka Mori ,  Ko Miyazaki

IPC: G03F1/54 ,  G03F1/56 ,  G03F1/62 ,  G03F1/68 ,  G03F1/70 ,  G03F7/00 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F1/56 ,  G03F1/70 ,  G03F7/0035 ,  G03F7/70433 ,  G03F7/707 ,  H01L21/0274 ,  Y10S438/942 ,  Y10S438/945 ,  Y10S438/948 ,  Y10S438/95

Abstract: In order to shorten the period for the development and manufacture of a semiconductor integrated circuit device, at the time of transferring integrated circuit patterns onto a wafer by an exposure process, a photomask PM1 is used which is provided partially with light shielding patterns 3a formed of a resist film, in addition to light shielding patterns formed of a metal.

公开(公告)号：US06780781B2

公开(公告)日：2004-08-24

申请号：US10445068

申请日：2003-05-27

Applicant: Takahiro Odaka ,  Toshihiko Tanaka ,  Takashi Hattori ,  Hiroshi Fukuda

Inventor： Takahiro Odaka ,  Toshihiko Tanaka ,  Takashi Hattori ,  Hiroshi Fukuda

IPC: H01L21302

CPC classification number: G03F1/32 ,  G03F1/56 ,  G03F7/405 ,  H01L21/76802 ,  Y10S438/942 ,  Y10S438/945 ,  Y10S438/947 ,  Y10S438/948 ,  Y10S438/949

Abstract: A method for manufacturing an electronic device is provided. In one example of the method, the method prevents deformation of a resist mask caused by the irradiation of exposure light. The resist mask has a resist as an opaque element, and can afford mask patterns undergoing little change even with an increase in the number of wafers subjected to exposure processing. The resist mask maintains a high dimensional accuracy. A photomask pattern is formed using as an opaque element a resist comprising a base resin and Si incorporated therein or a resist with a metal such as Si incorporated thereby by a silylation process, to improve the resistance to active oxygen. The deformation of a resist opaque pattern in a photomask is prevented. The dimensional accuracy of patterns transferred onto a Si wafer is improved in repeated use of the photomask.

Abstract translation: 提供了一种用于制造电子设备的方法。 在该方法的一个示例中，该方法防止由曝光光的照射引起的抗蚀剂掩模的变形。 抗蚀剂掩模具有作为不透明元素的抗蚀剂，并且即使随着经受曝光处理的晶片数量的增加，也可以提供几乎没有变化的掩模图案。 抗蚀剂掩模保持高尺寸精度。 使用作为不透明元件的抗蚀剂形成光掩模图案，该抗蚀剂包含掺入其中的基础树脂和Si，或通过甲硅烷基化方法掺入其中的诸如Si的金属的抗蚀剂，以提高对活性氧的耐受性。 防止光掩模中的抗蚀剂不透明图案的变形。 转移到Si晶片上的图案的尺寸精度在光掩模的重复使用中得到改善。

公开(公告)号：US06703328B2

公开(公告)日：2004-03-09

申请号：US10044987

申请日：2002-01-15

Applicant: Toshihiko Tanaka ,  Takashi Hattori

Inventor： Toshihiko Tanaka ,  Takashi Hattori

IPC: H01L21027

CPC classification number: G03F7/70541 ,  G03F1/38 ,  G03F1/42 ,  G03F7/70741

Abstract: A circuit pattern, a reticle alignment mark, a bar code, and a discrimination mark which are formed on a glass plate of a photo mask is constituted of a photo sensitive and photo attenuative material containing a fine particle material and a binder. Discrimination of the photo mask is performed by irradiating predetermined discrimination light on the discrimination mark or the bar code. Alignment of the photo mask by an aligner is performed by irradiating predetermined detection light on the reticle alignment mark. In an exposure process, the pattern on the photo mask is transferred onto a semiconductor wafer by using exposure light having a wavelength different from that of the discrimination light or that of the detection light.

Abstract translation: 在光掩模的玻璃板上形成的电路图案，标线片对准标记，条形码和鉴别标记由含有细颗粒材料和粘合剂的光敏光敏材料构成。 通过对鉴别标记或条形码照射预定的鉴别光来进行光掩模的识别。 通过在掩模版对准标记上照射预定的检测光来进行对准器的光掩模的对准。 在曝光处理中，通过使用不同于鉴别光或检测光的波长的曝光光将光掩模上的图案转印到半导体晶片上。

公开(公告)号：US06667135B2

公开(公告)日：2003-12-23

申请号：US09953962

申请日：2001-09-18

Applicant: Toshihiko Tanaka ,  Norio Hasegawa ,  Tsuneo Terasawa

Inventor： Toshihiko Tanaka ,  Norio Hasegawa ,  Tsuneo Terasawa

IPC: G03F900

CPC classification number: G03F1/72 ,  G03F1/68

Abstract: After a shade pattern constituted by a resist film formed on a photomask is stripped, a new shade pattern constituted by a resist film is formed on the photomask to reclaim a photomask.

公开(公告)号：USRE38296E1

公开(公告)日：2003-11-04

申请号：US08408788

申请日：1995-03-23

Applicant: Noboru Moriuchi ,  Yoshiki Yamaguchi ,  Toshihiko Tanaka ,  Norio Hasegawa ,  Yoshifumi Kawamoto ,  Shin-ichiro Kimura ,  Toru Kaga ,  Tokuo Kure

Inventor： Noboru Moriuchi ,  Yoshiki Yamaguchi ,  Toshihiko Tanaka ,  Norio Hasegawa ,  Yoshifumi Kawamoto ,  Shin-ichiro Kimura ,  Toru Kaga ,  Tokuo Kure

IPC: H01L27108

CPC classification number: H01L27/10808 ,  H01L27/105 ,  H01L27/10852

Abstract: A semiconductor memory wherein a memory cell region having a plurality of memory cells and a relatively high altitude above the surface of semiconductor substrate is formed at a recessed part of the semiconductor substrate having the recessed part and a projected part, and wherein a peripheral circuit region having a comparatively low altitude from the surface of the semiconductor substrate is formed at the projected part of the semiconductor substrate.

公开(公告)号：US06617265B2

公开(公告)日：2003-09-09

申请号：US09927318

申请日：2001-08-13

Applicant: Toshihiko Tanaka ,  Norio Hasegawa

Inventor： Toshihiko Tanaka ,  Norio Hasegawa

IPC: H01L2131

CPC classification number: G03F1/56 ,  H01L21/0276

Abstract: A resist mask having a satisfactory resolution effect may be obtained even in the case of use of exposure light having a wavelength of 200 nm or more. An opaque pattern 2a comprising an organic layer for transferring a pattern is constituted by a multi-layer formed by a photo-absorptive organic layer 3a having an light shielding effect or a light attenuating effect even relative to exposure light having a wavelength of 200 nm or more, and a resist layer 4a for chiefly patterning this.