公开(公告)号：US20070128538A1

公开(公告)日：2007-06-07

申请号：US11673177

申请日：2007-02-09

申请人： KEVIN FAIRBAIRN ,  Michael Rice ,  Timothy Weidman ,  Christopher Ngai ,  Ian Latchford ,  Christopher Bencher ,  Yuxiang Wang

发明人： KEVIN FAIRBAIRN ,  Michael Rice ,  Timothy Weidman ,  Christopher Ngai ,  Ian Latchford ,  Christopher Bencher ,  Yuxiang Wang

IPC分类号： G03C8/00

CPC分类号： H01L21/76829 ,  C23C16/26 ,  H01L21/0276 ,  H01L21/28035 ,  H01L21/3081 ,  H01L21/3088 ,  H01L21/31138 ,  H01L21/31144 ,  H01L21/3146 ,  H01L21/31612 ,  H01L21/32137 ,  H01L21/76802 ,  H01L21/76807

摘要： A method of forming an integrated circuit using an amorphous carbon film. The amorphous carbon film is formed by thermally decomposing a gas mixture comprising a hydrocarbon compound and an inert gas. The amorphous carbon film is compatible with integrated circuit fabrication processes. In one integrated circuit fabrication process, the amorphous carbon film is used as a hardmask. In another integrated circuit fabrication process, the amorphous carbon film is an anti-reflective coating (ARC) for deep ultraviolet (DUV) lithography. In yet another integrated circuit fabrication process, a multi-layer amorphous carbon anti-reflective coating is used for DUV lithography.

摘要翻译： 一种使用无定形碳膜形成集成电路的方法。 无定形碳膜通过热分解包含烃化合物和惰性气体的气体混合物而形成。 无定形碳膜与集成电路制造工艺兼容。 在一个集成电路制造工艺中，非晶碳膜用作硬掩模。 在另一个集成电路制造工艺中，无定形碳膜是用于深紫外（DUV）光刻的抗反射涂层（ARC）。 在又一集成电路制造工艺中，多层无定形碳抗反射涂层用于DUV光刻。

公开(公告)号：US20070112465A1

公开(公告)日：2007-05-17

申请号：US11617035

申请日：2006-12-28

申请人： Iraj Sadighi ,  Jeff Hudgens ,  Michael Rice ,  Gary Wyka

发明人： Iraj Sadighi ,  Jeff Hudgens ,  Michael Rice ,  Gary Wyka

IPC分类号： G06F19/00

CPC分类号： H01L21/67259 ,  B25J9/1692 ,  B25J9/1697 ,  G05B2219/45031 ,  H01L21/681

摘要： A vision system and method for calibrating motion of a robot disposed in a processing system is provided. In one embodiment, a vision system for a processing system includes a camera and a calibration wafer that are positioned in a processing system. The camera is positioned on the robot and is adapted to obtain image data of the calibration wafer disposed in a predefined location within the processing system. The image data is utilized to calibrate the robots motion.

摘要翻译： 提供了一种用于校准设置在处理系统中的机器人的运动的视觉系统和方法。 在一个实施例中，用于处理系统的视觉系统包括位于处理系统中的相机和校准晶片。 相机位于机器人上，并且适于获得设置在处理系统内的预定位置的校准晶片的图像数据。 图像数据用于校准机器人运动。

公开(公告)号：US20070059861A1

公开(公告)日：2007-03-15

申请号：US11555252

申请日：2006-10-31

申请人： Michael Rice ,  Eric Englhardt ,  Vinay Shah ,  Martin Elliott ,  Robert Lowrance ,  Jeffrey Hudgens

发明人： Michael Rice ,  Eric Englhardt ,  Vinay Shah ,  Martin Elliott ,  Robert Lowrance ,  Jeffrey Hudgens

IPC分类号： H01L21/00

CPC分类号： H01L21/67727 ,  H01L21/67276 ,  H01L21/67769 ,  H01L21/67778 ,  Y02P80/40 ,  Y02P90/86

摘要： In a first aspect, a method of managing work in progress within a small lot size semiconductor device manufacturing facility is provided. The first method includes providing a small lot size semiconductor device manufacturing facility having (1) a plurality of processing tools; and (2) a high speed transport system adapted to transport small lot size substrate carriers among the processing tools. The method further includes maintaining a predetermined work in progress level within the small lot size semiconductor device manufacturing facility by (1) increasing an average cycle time of low priority substrates within the small lot size semiconductor device manufacturing facility; and (2) decreasing an average cycle time of high priority substrates within the small lot size semiconductor device manufacturing facility so as to approximately maintain the predetermined work in progress level within the small lot size semiconductor device manufacturing facility. Numerous other aspects are provided.

摘要翻译： 在第一方面，提供了一种在小批量半导体器件制造设施内管理正在进行的工作的方法。 第一种方法包括提供具有（1）多个处理工具的小批量半导体器件制造设备; 和（2）适于在处理工具之间运输小批量衬底载体的高速运输系统。 该方法还包括：（1）增加小批量半导体器件制造设备内的低优先级衬底的平均周期时间，使小批量半导体器件制造设备内的预定工作保持在进行中; 和（2）减小小批量半导体器件制造设备内的高优先级衬底的平均周期时间，以便在小批量半导体器件制造设备内大致维持预定工作进行中的水平。 提供了许多其他方面。

公开(公告)号：US20070059153A1

公开(公告)日：2007-03-15

申请号：US11521575

申请日：2006-09-13

申请人： Robert Lowrance ,  Eric Englhardt ,  Michael Rice ,  Vinay Shah ,  Sushant Koshti ,  Jeffrey Hudgens

发明人： Robert Lowrance ,  Eric Englhardt ,  Michael Rice ,  Vinay Shah ,  Sushant Koshti ,  Jeffrey Hudgens

IPC分类号： B65F9/00

CPC分类号： B65G47/52 ,  B65G29/00 ,  B65G47/28 ,  B65G2203/025 ,  H01L21/67706 ,  H01L21/67715 ,  Y10S414/135 ,  Y10S414/14

摘要： Systems, methods and apparatus are provided for a transport lift assembly that includes a chassis, at least one set of wheels mounted on the chassis, a lift assembly mounted on the chassis, a controller adapted to control the lift assembly, and a motor magnet array mounted on the chassis. The transport lift assembly is adapted to be driven in response to application of an external magnetic field and to load and unload substrate carriers from moving conveyors.

摘要翻译： 提供了一种用于运输提升组件的系统，方法和装置，其包括底盘，安装在底盘上的至少一组轮，安装在底盘上的升降组件，适于控制升降组件的控制器，以及马达磁体阵列 安装在底盘上。 传送提升组件适于响应于施加外部磁场而被驱动，并且从移动的传送器加载和卸载基板载体。

公开(公告)号：US20070059144A1

公开(公告)日：2007-03-15

申请号：US11521576

申请日：2006-09-13

申请人： Robert Lowrance ,  Eric Englhardt ,  Michael Rice ,  Vinay Shah ,  Sushant Koshti ,  Jeffrey Hudgens

发明人： Robert Lowrance ,  Eric Englhardt ,  Michael Rice ,  Vinay Shah ,  Sushant Koshti ,  Jeffrey Hudgens

IPC分类号： B65G47/90

CPC分类号： B65G47/52 ,  B65G29/00 ,  B65G47/28 ,  B65G2203/025 ,  H01L21/67706 ,  H01L21/67715 ,  Y10S414/135 ,  Y10S414/14

摘要： Systems, methods and apparatus are provided for a conveyor-to-conveyor transfer station that includes a track having a drive mechanism, a control system coupled to the drive mechanism, and a plurality of transport lift assemblies. Each of the transport lift assemblies are adapted to be individually controlled, travel on the track, remove at least one carrier from a first conveyor, and mount the carrier onto a second conveyor.

摘要翻译： 提供了一种用于输送机到输送机传送站的系统，方法和装置，其包括具有驱动机构，耦合到驱动机构的控制系统和多个传送提升组件的轨道。 每个运输提升组件适于单独控制，在轨道上移动，从第一输送机移除至少一个托架，并将托架安装到第二输送机上。

公开(公告)号：US07085622B2

公开(公告)日：2006-08-01

申请号：US10126493

申请日：2002-04-19

申请人： Iraj Sadighi ,  Jeff Hudgens ,  Michael Rice ,  Gary Wyka

发明人： Iraj Sadighi ,  Jeff Hudgens ,  Michael Rice ,  Gary Wyka

IPC分类号： G06F19/00

CPC分类号： H01L21/67259 ,  B25J9/1697 ,  H01L21/681

摘要： Generally a method and apparatus for viewing images within a processing system is provided. In one embodiment, an apparatus includes a plate having a camera, transmitter and battery coupled thereto. The plate is adapted to be transported about a semiconductor processing system by a substrate transfer robot thereby allowing images within the system to be viewed remotely from the system. The viewed images may be used for system inspection and calibration of robot position, among other uses.

公开(公告)号：US20060134330A1

公开(公告)日：2006-06-22

申请号：US11112932

申请日：2005-04-22

申请人： Tetsuya Ishikawa ,  Rick Roberts ,  Helen Armer ,  Leon Volfovski ,  Jay Pinson ,  Michael Rice ,  David Quach ,  Mohsen Salek ,  Robert Lowrance ,  William Weaver ,  Charles Carlson ,  Chongyang Wang ,  Jeffrey Hudgens ,  Harald Herchen ,  Brian Lue ,  John Backer

发明人： Tetsuya Ishikawa ,  Rick Roberts ,  Helen Armer ,  Leon Volfovski ,  Jay Pinson ,  Michael Rice ,  David Quach ,  Mohsen Salek ,  Robert Lowrance ,  William Weaver ,  Charles Carlson ,  Chongyang Wang ,  Jeffrey Hudgens ,  Harald Herchen ,  Brian Lue ,  John Backer

IPC分类号： C23C16/00

CPC分类号： H01L21/67225 ,  G03B27/32 ,  G03D13/006 ,  G03F7/40 ,  G05B19/41825 ,  G05B2219/40476 ,  G05B2219/45031 ,  G05B2219/49137 ,  H01L21/67109 ,  H01L21/6715 ,  H01L21/67161 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/67748 ,  H01L21/67754 ,  H01L21/6831 ,  H01L21/6838 ,  H01L21/68707 ,  H01L22/26 ,  Y02P90/087 ,  Y10S414/135 ,  Y10S414/136 ,  Y10T29/53187 ,  Y10T29/5323

摘要： Embodiments generally provide an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased system throughput, increased system reliability, substrates processed in the cluster tool have a more repeatable wafer history, and also the cluster tool has a smaller system footprint. In one embodiment, the cluster tool is adapted to perform a track lithography process in which a substrate is coated with a photosensitive material, is then transferred to a stepper/scanner, which exposes the photosensitive material to some form of radiation to form a pattern in the photosensitive material, which is then removed in a developing process completed in the cluster tool. In track lithography type cluster tools, since the chamber processing times tend to be rather short, and the number of processing steps required to complete a typical track system process is large, a significant portion of the time it takes to process a substrate is taken up by the processes of transferring the substrates in a cluster tool between the various processing chambers. In one embodiment of the cluster tool, the cost of ownership is reduced by grouping substrates together and transferring and processing the substrates in groups of two or more to improve system throughput, and reduces the number of moves a robot has to make to transfer a batch of substrates between the processing chambers, thus reducing wear on the robot and increasing system reliability. In one aspect of the invention, the substrate processing sequence and cluster tool are designed so that the substrate transferring steps performed during the processing sequence are only made to chambers that will perform the next processing step in the processing sequence. Embodiments also provide for a method and apparatus that are used to improve the coater chamber, the developer chamber, the post exposure bake chamber, the chill chamber, and the bake chamber process results. Embodiments also provide for a method and apparatus that are used to increase the reliability of the substrate transfer process to reduce system down time.

公开(公告)号：US20060061979A1

公开(公告)日：2006-03-23

申请号：US11219332

申请日：2005-09-02

申请人： Martin Elliott ,  Michael Rice

发明人： Martin Elliott ,  Michael Rice

IPC分类号： G06F19/00 ,  H05K7/04

CPC分类号： H01L21/67353 ,  H01L21/67379

摘要： A first substrate carrier is provided that includes a body adapted to store one or more substrates; and either (1) a bottom surface having one or more coupling features that extend into a storage region of the body or (2) coupling features that extend alongside the body, so that the substrate carrier's overall height is not increased by the entire height of the coupling feature. Numerous other aspects are provided.

摘要翻译： 提供了第一衬底载体，其包括适于存储一个或多个衬底的主体; 和（1）具有一个或多个连接特征的底表面，其延伸到主体的存储区域中，或者（2）耦合沿着身体延伸的特征，使得基板载体的整体高度不会增加整个高度 耦合功能。 提供了许多其他方面。

公开(公告)号：US20050186063A1

公开(公告)日：2005-08-25

申请号：US10987956

申请日：2004-11-12

申请人： Michael Rice ,  Eric Englhardt ,  Robert Lowrance ,  Martin Elliott ,  Jeffrey Hudgens ,  Kirk Katwyk ,  Amit Puri

发明人： Michael Rice ,  Eric Englhardt ,  Robert Lowrance ,  Martin Elliott ,  Jeffrey Hudgens ,  Kirk Katwyk ,  Amit Puri

IPC分类号： H01L21/68 ,  B65G49/05 ,  B65G49/06 ,  B65G49/07 ,  H01L21/00 ,  H01L21/677 ,  B65F3/02

CPC分类号： H01L21/67769 ,  H01L21/67253 ,  H01L21/67276

摘要： In a first aspect, a first method of calibrating a substrate carrier loader to a moving conveyor is provided. The first method includes the steps of (1) providing a substrate carrier loader adapted to load substrate carriers onto a moving conveyor; (2) aligning the substrate carrier loader to the moving conveyor; and (3) calibrating the substrate carrier loader to the moving conveyor. Numerous other aspects are provided.

摘要翻译： 在第一方面，提供了一种将基板载体加载器校准到移动输送机的第一种方法。 第一种方法包括以下步骤：（1）提供适于将基板载体加载到移动输送机上的基底载体加载器; （2）将基板载体装载器对准移动的输送机; 和（3）将衬底载体装载器校准到移动的输送机。 提供了许多其他方面。

公开(公告)号：US20050135903A1

公开(公告)日：2005-06-23

申请号：US10987452

申请日：2004-11-12

申请人： Michael Rice ,  Eric Englhardt ,  Robert Lowrance ,  Martin Elliott ,  Jeffrey Hudgens

发明人： Michael Rice ,  Eric Englhardt ,  Robert Lowrance ,  Martin Elliott ,  Jeffrey Hudgens

IPC分类号： H01L21/677 ,  B65G1/00

CPC分类号： H01L21/67769 ,  H01L21/67775 ,  H01L21/67778 ,  Y10S414/135 ,  Y10S414/136

摘要： In a first aspect, a wafer loading station adapted to exchange wafer carriers with a wafer carrier transport system comprises a biasing element adapted to urge the end effector of the wafer loading station away from a moveable conveyor of the wafer carrier transport system upon the occurrence of a unscheduled event such as a power failure or an emergency shutdown. In a second aspect, an uninterruptible power supply commands a controller to cause the wafer carrier handler to retract the end effector from the wafer carrier transport system upon the occurrence of the unscheduled event, and provides the power necessary for the same. Numerous other aspects are provided.

摘要翻译： 在第一方面，一种适于与晶片载体传输系统交换晶片载体的晶片装载站包括偏置元件，该偏置元件适于在晶片载体传输系统发生时将晶片载体站的末端执行器远离晶片载体传输系统的可移动传送器 一个非计划的事件，如停电或紧急停机。 在第二方面，不间断电源命令控制器使晶片载体处理器在发生非预定事件时从晶片载体传输系统缩回端部执行器，并提供其所需的功率。 提供了许多其他方面。