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    Charged particle beam apparatus and dimension measuring method
    52.
    发明申请
    Charged particle beam apparatus and dimension measuring method 有权
    带电粒子束装置和尺寸测量方法

    公开(公告)号：US20080100832A1

    公开(公告)日：2008-05-01

    申请号：US11723457

    申请日：2007-03-20

    申请人： Mitsugu Sato ,  Katsuhiko Sakai ,  Atsushi Takane ,  Yoshihiko Nakayama

    发明人： Mitsugu Sato ,  Katsuhiko Sakai ,  Atsushi Takane ,  Yoshihiko Nakayama

    IPC分类号： G01N21/00 ,  G01N23/00

    CPC分类号： H01J37/244 ,  H01J37/21 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/21 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/24592 ,  H01J2237/2816 ,  H01J2237/2817

    摘要： There is provided a charged particle beam apparatus which allows implementation of a high-reliability and high-accuracy dimension measurement even if height differences exist on the surface of a sample. The charged particle beam apparatus includes the following configuration components: An acquisition unit for acquiring a plurality of SEM images whose focus widths are varied in correspondence with the focal depths, a determination unit for determining, from the plurality of SEM images acquired, a SEM image for which the image sharpness degree of the partial domain including a dimension-measuring domain becomes the maximum value, and a measurement unit for measuring the dimension of the predetermined domain from the SEM image whose image sharpness degree is the maximum value.

    摘要翻译： 提供了一种带电粒子束装置，即使在样品的表面上存在高差也允许实现高可靠性和高精度尺寸测量。 带电粒子束装置包括以下配置部件：用于获取与焦点深度相对应的聚焦宽度变化的多个SEM图像的获取单元，确定单元，用于从所获取的多个SEM图像中确定SEM图像 包括尺寸测量区域的部分域的图像清晰度变为最大值;以及测量单元，用于从图像锐度度为最大值的SEM图像测量预定域的尺寸。

    Charged particle beam apparatus
    53.
    发明申请
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号：US20070120065A1

    公开(公告)日：2007-05-31

    申请号：US11599611

    申请日：2006-11-15

    申请人： Atsushi Takane ,  Satoru Yamaguchi ,  Mitsugu Sato

    发明人： Atsushi Takane ,  Satoru Yamaguchi ,  Mitsugu Sato

    IPC分类号： G01K1/08

    CPC分类号： H01J37/1471 ,  H01J37/265 ,  H01J2237/1501 ,  H01J2237/216 ,  H01J2237/28

    摘要： A charged particle beam apparatus is provided which can prevent the accuracy of positional shift detection from being degraded owing to differences in picture quality, so that even when the state of a charged particle beam is changed at the time that optical conditions are changed or the optical axis changes with time, an auto adjustment of the optical axis can be realized easily and highly accurately. In the charged particle beam apparatus, evaluation or adjustment of focusing is conducted before the deflection condition of an alignment deflector for optical axis adjustment is changed or a table of focus adjustment amounts in correspondence with deflection conditions of the alignment deflector is provided, whereby when the deflection condition of the alignment deflector is changed, a focus adjustment is carried out in accordance with the table.

    摘要翻译： 提供一种带电粒子束装置，其可以防止由于图像质量的差异而导致的位置偏移检测的精度降低，使得即使当光学条件改变时带电粒子束的状态改变或光学条件改变时， 轴随时间变化，可以容易且高精度地实现光轴的自动调节。 在带电粒子束装置中，在用于光轴调节的对准偏转器的偏转状态改变之前进行聚焦的评估或调整，或者提供与对准偏转器的偏转条件相对应的焦点调整量表， 改变对准偏转器的偏转状态，根据该表进行焦点调整。

    Charged particle beam apparatus and dimension measuring method
    54.
    发明授权
    Charged particle beam apparatus and dimension measuring method 有权
    带电粒子束装置和尺寸测量方法

    公开(公告)号：US07214936B2

    公开(公告)日：2007-05-08

    申请号：US11242129

    申请日：2005-10-04

    申请人： Mitsugu Sato ,  Katsuhiko Sakai ,  Atsushi Takane ,  Yoshihiko Nakayama

    发明人： Mitsugu Sato ,  Katsuhiko Sakai ,  Atsushi Takane ,  Yoshihiko Nakayama

    IPC分类号： H01J37/21

    CPC分类号： H01J37/244 ,  H01J37/21 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/21 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/24592 ,  H01J2237/2816 ,  H01J2237/2817

    摘要： There is provided a charged particle beam apparatus which allows implementation of a high-reliability and high-accuracy dimension measurement even if height differences exist on the surface of a sample. The charged particle beam apparatus includes the following configuration components: An acquisition unit for acquiring a plurality of SEM images whose focus widths are varied in correspondence with the focal depths, a determination unit for determining, from the plurality of SEM images acquired, a SEM image for which the image sharpness degree of the partial domain including a dimension-measuring domain becomes the maximum value, and a measurement unit for measuring the dimension of the predetermined domain from the SEM image whose image sharpness degree is the maximum value.

    摘要翻译： 提供了一种带电粒子束装置，即使在样品的表面上存在高差也允许实现高可靠性和高精度尺寸测量。 带电粒子束装置包括以下配置部件：用于获取与焦点深度相对应的聚焦宽度变化的多个SEM图像的获取单元，确定单元，用于从所获取的多个SEM图像中确定SEM图像 包括尺寸测量区域的部分域的图像清晰度变为最大值;以及测量单元，用于从图像锐度度为最大值的SEM图像测量预定域的尺寸。

    Charged particle beam apparatus, method of displaying sample image, and method of measuring image shift sensitivity
    56.
    发明申请
    Charged particle beam apparatus, method of displaying sample image, and method of measuring image shift sensitivity 审中-公开
    带电粒子束装置，显示样本图像的方法以及测量图像偏移灵敏度的方法

    公开(公告)号：US20060219907A1

    公开(公告)日：2006-10-05

    申请号：US11311425

    申请日：2005-12-20

    申请人： Takeshi Ogashiwa ,  Mitsugu Sato ,  Atsushi Takane

    发明人： Takeshi Ogashiwa ,  Mitsugu Sato ,  Atsushi Takane

    IPC分类号： G21K7/00 ,  G01N23/00

    CPC分类号： H01J37/222

    摘要： A sample image display method and an image shift sensitivity measuring method to be executed in a charged particle beam apparatus are provided for accurately correcting an image drift in any observing and analyzing condition such as an accelerating voltage, a working distance or a raster rotation. When obtaining a reference image used for detecting a drift, the process is executed to obtain an image having the different image shift amount from that of the reference image at a time and to occasionally measure an image shift sensitivity. Then, the process is executed to automatically register this reference image and the image shift sensitivity and to detect a drift amount and control an image shift (correct a drift) according to the registered conditions when correcting the drift.

    摘要翻译： 在带电粒子束装置中执行的样本图像显示方法和图像偏移灵敏度测量方法被提供用于在诸如加速电压，工作距离或光栅旋转的观察和分析条件中精确校正图像漂移。 当获得用于检测漂移的参考图像时，执行该处理以一次获得具有与参考图像的图像偏移量不同的图像偏移量的图像，并且偶尔测量图像偏移灵敏度。 然后，执行该处理以自动登记该参考图像和图像移位灵敏度，并且在校正漂移时根据注册条件来检测漂移量并控制图像偏移（校正漂移）。

    Scanning electron microscope
    59.
    发明申请
    Scanning electron microscope 失效
    扫描电子显微镜

    公开(公告)号：US20050139773A1

    公开(公告)日：2005-06-30

    申请号：US11064819

    申请日：2005-02-25

    申请人： Yoichi Ose ,  Hideo Todokoro ,  Makoto Ezumi ,  Mitsugu Sato

    发明人： Yoichi Ose ,  Hideo Todokoro ,  Makoto Ezumi ,  Mitsugu Sato

    IPC分类号： G01Q30/02 ,  G21K7/00 ,  H01J37/147 ,  H01J37/28 ,  G01N23/00

    CPC分类号： H01J37/147 ,  H01J37/1471 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/12 ,  H01J2237/14 ,  H01J2237/1516 ,  H01J2237/244 ,  H01J2237/2817

    摘要： The present invention is intended to prevent the deterioration of resolution due to increase in off-axis aberration resulting from the deviation of a primary electron bean from the optical axis of a scanning electron microscope. A scanning electron microscope is provided with an image shifting deflector system including two deflectors disposed respectively at upper and lower stages. The deflector disposed at the lower stage is a multipole electrostatic deflecting electrode and is disposed in an objective. Even if the distance of image shifting is great, an image of a high resolution can be formed and dimensions can be measured in a high accuracy. The SEM is able to achieving precision inspection at a high throughput when applied to inspection in semiconductor device fabricating processes that process a wafer having a large area and provided with very minute circuit elements.

    摘要翻译： 本发明旨在防止由于一次电子束与扫描型电子显微镜的光轴的偏离引起的离轴像差的增加而导致的分辨率的劣化。 扫描电子显微镜设置有分别设置在上部和下部的两个偏转器的图像偏转偏转器系统。 设置在下级的偏转器是多极静电偏转电极，并且设置在物镜中。 即使图像偏移的距离大，也可以形成高分辨率的图像，并且可以高精度地测量尺寸。 当在用于处理具有大面积的晶片并且具有非常微小的电路元件的半导体器件制造工艺中进行检查时，SEM能够以高产量实现精密检查。