摘要:
The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Feedback timing control techniques are provided for controlling the relative timing of the discharges in the two chambers with an accuracy in the range of about 2 to 5 billionths of a second even in burst mode operation. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.
摘要:
A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. Preferably the electrodes are configured co-axially with the anode on the axis. The anode is preferably hollow and the active gas is introduced through the anode. This permits an optimization of the spectral line source and a separate optimization of the buffer gas. Preferred embodiments present optimization of capacitance values, anode length and shape and preferred active gas delivery systems are disclosed. Preferred embodiments also include a pulse power system comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer. A heat pipe cooling system is described for cooling the central anode.
摘要:
A narrow band laser system having two laser subsystems. The first laser subsystem is configured to provide a very narrow band pulsed output beam which is used to injection seed the second laser subsystem where the narrow band pulsed seed beam is amplified to produce a narrow band pulsed output beam. A pulse power supply is provided which is specially configured to precisely time the discharges in the two laser subsystem so that the discharges are properly synchronized. Preferred embodiments include a pulse power system with a pulse transformer unit having two sets of transformer cores. A single upstream pulse compression circuit provides high voltage pulses in parallel to the primary windings of all of the cores in both sets. Separate secondary conductors (one passing through one set of cores and the other passing through the other set of cores) provide very high voltage pulses respectively to separate downstream circuits supplying discharge pulses to the electrodes in each of two separate laser chambers. Preferred embodiments include KrF, ArF and F2 systems. In these preferred embodiments, line narrowing may be accomplished within the resonant cavity of the seed laser or the output of the seed laser could be line narrowed using a pre-gain filter.
摘要:
A high resolution etalon-grating spectrometer. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The etalon and the grating are placed in a leak-fight enclosure filled with a gas, such as nitrogen or helium. The wavelength scanning of the spectrometer is done by changing the gas pressure in the enclosure during the scan.
摘要:
A high pulse rate pulse power source for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source includes a pulse generating circuit including a charging capacitor, a solid state switch and a current limiting inductor. Pulses generated in the pulse generating circuit are compressed in at least two pulse compression circuits and a step-up pulse transformer increases peak voltage to at least 12,000 volts. A very fast regulated power supply is provided for charging the charging capacitor in less than 400 microseconds and a pulse control system including a programmed processor controls the charging of the charging capacitor to an accuracy of less than about one percent at a rate of at least 4000 charges per second. In a preferred embodiment capable of operating at pulse rates of 2000 to 4000 Hz or greater, water cooling of the saturable inductors is provided.
摘要:
An excimer laser with optical pulse multiplication. A pulse multiplier optical system receives the laser output beam and produces a multiplier output beam having a larger number of pulses, each with substantially reduced intensity values as compared to the laser output beam. The present invention is particularly important as an improvement to the ArF excimer laser to reduce two-photon absorption damage to optical equipment in lithography machines. For damage mechanisms involving two-photon processes, such as the compaction and solarization of fused silica in the DUV spectral region, a factor of 4 reduction in peak power decreases the quantity of two photon absorption damage done by the synthesized 4-pulse burst by a factor of about 16 compared to delivering all of the energy in the single pulse emitted by the laser. This is a useful method of prolonging the lifetime of very expensive beam delivery systems such as those used in photolithography stepper systems without reducing the total dose available at the wafer. In preferred embodiments, the pulse multiplier system is contained in a module which can be pre-aligned and quickly installed on the excimer laser.
摘要:
A simple, novel pulse power circuit is described, which improves the net coupling efficiency of a pulse power system used to drive a gas discharge laser, and minimizes current reversal and electrode erosion. The circuit, in accordance with an embodiment of the present invention, incorporates a saturable inductor. Contrary to conventional saturable inductor configurations, in which the saturable inductor is either not saturated or is presaturated in a reverse direction, in the present circuit the saturable inductor is presaturated in the forward direction.The saturable inductor is inserted between the final stage capacitor of a pulse power circuit and a gas discharge load, where it allows forward current but effectively blocks reverse current through the load. Elimination of reverse discharge current reduces electrode erosion and improves discharge chamber life.
摘要:
The resonator of the laser system employs a pair of anamorphic mirrors in combination with a pair of anamorphic lenses. The lenses are positioned between the mirrors on opposing ends of a laser resonator cavity. In one embodiment, both the mirrors and lenses have cylindrical cross-sections with the lenses oriented at ninety degrees from the mirrors. In use, a laser pulse is generated within a lasing cavity between the lenses and mirrors. The anamorphic configuration of the lenses and mirrors operates to minimize any differences between the vertical and horizontal divergence of the beam. Preferably, the beam consists of a sequence of individual pulses with the lenses and mirrors configured to ensure that differences in divergence are substantially eliminated after a selected number of laser pulse bounces. Method and apparatus embodiments are described herein.
摘要:
A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.
摘要:
A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.