Plasma focus light source with improved pulse power system
    52.
    发明授权
    Plasma focus light source with improved pulse power system 失效
    等离子聚焦光源具有改进的脉冲电源系统

    公开(公告)号:US06566667B1

    公开(公告)日:2003-05-20

    申请号:US09690084

    申请日:2000-10-16

    IPC分类号: H05H134

    摘要: A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. Preferably the electrodes are configured co-axially with the anode on the axis. The anode is preferably hollow and the active gas is introduced through the anode. This permits an optimization of the spectral line source and a separate optimization of the buffer gas. Preferred embodiments present optimization of capacitance values, anode length and shape and preferred active gas delivery systems are disclosed. Preferred embodiments also include a pulse power system comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer. A heat pipe cooling system is described for cooling the central anode.

    摘要翻译: 高能光子源。 一对等离子体夹紧电极位于真空室中。 该室包含工作气体,其包括贵重缓冲气体和被选择用于提供所需光谱线的活性气体。 脉冲电源在电压足够高的电压下提供电脉冲,以在电极之间产生放电,以在工作气体中产生非常高温度,高密度的等离子体夹持,从而在源或活性气体的光谱线处提供辐射。 优选地,电极与轴上的阳极同轴地配置。 阳极优选是中空的,并且活性气体通过阳极引入。 这允许对光谱线源进行优化和缓冲气体的单独优化。 本发明优选的实施例公开了电容值的优化,阳极长度和形状以及优选的活性气体输送系统。 优选实施例还包括脉冲功率系统,其包括充电电容器和包括脉冲变压器的磁压缩电路。 描述了用于冷却中央阳极的热管冷却系统。

    High resolution etalon-grating spectrometer

    公开(公告)号:US06538737B2

    公开(公告)日:2003-03-25

    申请号:US10003513

    申请日:2001-10-31

    IPC分类号: G01J314

    摘要: A high resolution etalon-grating spectrometer. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The etalon and the grating are placed in a leak-fight enclosure filled with a gas, such as nitrogen or helium. The wavelength scanning of the spectrometer is done by changing the gas pressure in the enclosure during the scan.

    High pulse rate pulse power system with liquid cooling
    55.
    发明授权
    High pulse rate pulse power system with liquid cooling 有权
    高脉冲脉冲电源系统具有液体冷却功能

    公开(公告)号:US06240112B1

    公开(公告)日:2001-05-29

    申请号:US09470288

    申请日:1999-12-22

    IPC分类号: H01S304

    摘要: A high pulse rate pulse power source for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source includes a pulse generating circuit including a charging capacitor, a solid state switch and a current limiting inductor. Pulses generated in the pulse generating circuit are compressed in at least two pulse compression circuits and a step-up pulse transformer increases peak voltage to at least 12,000 volts. A very fast regulated power supply is provided for charging the charging capacitor in less than 400 microseconds and a pulse control system including a programmed processor controls the charging of the charging capacitor to an accuracy of less than about one percent at a rate of at least 4000 charges per second. In a preferred embodiment capable of operating at pulse rates of 2000 to 4000 Hz or greater, water cooling of the saturable inductors is provided.

    摘要翻译: 用于以2000Hz或更高的速率提供受控高能电脉冲的高脉冲脉冲电源。 源包括一个包括充电电容器,固态开关和限流电感器的脉冲发生电路。 在脉冲发生电路中产生的脉冲在至少两个脉冲压缩电路中被压缩,并且升压脉冲变压器将峰值电压增加到至少12000伏特。 提供了一种非常快速的调节电源,用于在小于400微秒内为充电电容器充电,并且包括编程的处理器的脉冲控制系统以至少4000的速率控制充电电容器的充电,精度小于约百分之一 每秒收费 在能够以2000至4000Hz或更大的脉冲速率操作的优选实施例中,提供可饱和电感器的水冷却。

    Excimer laser with pulse multiplier
    56.
    发明授权
    Excimer laser with pulse multiplier 有权
    准分子激光脉冲倍增器

    公开(公告)号:US6067311A

    公开(公告)日:2000-05-23

    申请号:US148514

    申请日:1998-09-04

    IPC分类号: H01S3/225 H01S3/00 H01S3/10

    CPC分类号: H01S3/0057 H01S3/225

    摘要: An excimer laser with optical pulse multiplication. A pulse multiplier optical system receives the laser output beam and produces a multiplier output beam having a larger number of pulses, each with substantially reduced intensity values as compared to the laser output beam. The present invention is particularly important as an improvement to the ArF excimer laser to reduce two-photon absorption damage to optical equipment in lithography machines. For damage mechanisms involving two-photon processes, such as the compaction and solarization of fused silica in the DUV spectral region, a factor of 4 reduction in peak power decreases the quantity of two photon absorption damage done by the synthesized 4-pulse burst by a factor of about 16 compared to delivering all of the energy in the single pulse emitted by the laser. This is a useful method of prolonging the lifetime of very expensive beam delivery systems such as those used in photolithography stepper systems without reducing the total dose available at the wafer. In preferred embodiments, the pulse multiplier system is contained in a module which can be pre-aligned and quickly installed on the excimer laser.

    摘要翻译: 具有光脉冲倍增的准分子激光器。 脉冲倍增器光学系统接收激光输出光束并产生具有更大数量脉冲的乘法器输出光束,每个脉冲与激光输出光束相比具有显着降低的强度值。 本发明特别重要的是对ArF准分子激光器的改进,以减少光刻机中光学设备的双光子吸收损伤。 对于涉及双光子过程的损伤机制,例如DUV光谱区域中熔融石英的压实和太阳化,峰值功率降低4倍,可以减少由合成的4脉冲脉冲串所造成的两个光子吸收损伤的量 相比于在激光器发射的单个脉冲中提供所有能量的因子。 这是延长非常昂贵的光束输送系统的使用寿命的有用方法,例如在光刻步进系统中使用的系统,而不会降低在晶片可用的总剂量。 在优选实施例中,脉冲倍增器系统包含在可以预对准并快速安装在准分子激光器上的模块中。

    Current reversal prevention circuit for a pulsed gas discharge laser
    57.
    发明授权
    Current reversal prevention circuit for a pulsed gas discharge laser 失效
    用于脉冲气体放电激光器的电流反转防止电路

    公开(公告)号:US5940421A

    公开(公告)日:1999-08-17

    申请号:US990848

    申请日:1997-12-15

    摘要: A simple, novel pulse power circuit is described, which improves the net coupling efficiency of a pulse power system used to drive a gas discharge laser, and minimizes current reversal and electrode erosion. The circuit, in accordance with an embodiment of the present invention, incorporates a saturable inductor. Contrary to conventional saturable inductor configurations, in which the saturable inductor is either not saturated or is presaturated in a reverse direction, in the present circuit the saturable inductor is presaturated in the forward direction.The saturable inductor is inserted between the final stage capacitor of a pulse power circuit and a gas discharge load, where it allows forward current but effectively blocks reverse current through the load. Elimination of reverse discharge current reduces electrode erosion and improves discharge chamber life.

    摘要翻译: 描述了一种简单的新颖的脉冲功率电路,其提高用于驱动气体放电激光器的脉冲电源系统的净耦合效率,并且最小化电流反转和电极侵蚀。 根据本发明的实施例的电路结合有可饱和电感器。 与传统的可饱和电感器配置相反,其中饱和电感器不饱和或在相反方向上预饱和,在本电路中,可饱和电感器在正向方向上预饱和。 饱和电感器插入在脉冲电源电路的最终级电容器和气体放电负载之间,其中它允许正向电流,但是有效地阻止通过负载的反向电流。 消除反向放电电流可以减少电极腐蚀并改善放电室寿命。

    Laser system with anamorphic confocal unstable resonator
    58.
    发明授权
    Laser system with anamorphic confocal unstable resonator 失效
    具有变形共焦不稳定谐振器的激光系统

    公开(公告)号:US5684822A

    公开(公告)日:1997-11-04

    申请号:US341382

    申请日:1994-11-17

    申请人: William N. Partlo

    发明人: William N. Partlo

    IPC分类号: H01S3/08

    CPC分类号: H01S3/08081 H01S3/08059

    摘要: The resonator of the laser system employs a pair of anamorphic mirrors in combination with a pair of anamorphic lenses. The lenses are positioned between the mirrors on opposing ends of a laser resonator cavity. In one embodiment, both the mirrors and lenses have cylindrical cross-sections with the lenses oriented at ninety degrees from the mirrors. In use, a laser pulse is generated within a lasing cavity between the lenses and mirrors. The anamorphic configuration of the lenses and mirrors operates to minimize any differences between the vertical and horizontal divergence of the beam. Preferably, the beam consists of a sequence of individual pulses with the lenses and mirrors configured to ensure that differences in divergence are substantially eliminated after a selected number of laser pulse bounces. Method and apparatus embodiments are described herein.

    摘要翻译: 激光系统的谐振器采用一对变形镜与一对变形镜组合。 透镜位于激光谐振器腔的相对端上的反射镜之间。 在一个实施例中,反射镜和透镜都具有圆柱形横截面,透镜的方向与镜子成90度。 在使用中,在透镜和反射镜之间的激光腔内产生激光脉冲。 透镜和反射镜的变形构造用于最小化光束的垂直和水平发散之间的任何差异。 优选地,光束由具有透镜和反射镜的单独脉冲序列组成,以确保在所选数量的激光脉冲反弹之后基本上消除发散差异。 本文描述了方法和设备实施例。

    EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
    60.
    发明授权
    EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods 有权
    具有子系统的EUV光源,用于在EUV非输出期间维持LPP驱动激光输出

    公开(公告)号:US08653437B2

    公开(公告)日:2014-02-18

    申请号:US13157233

    申请日:2011-06-09

    IPC分类号: H05G2/00

    摘要: A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.

    摘要翻译: 本文公开的装置可包括产生目标材料的液滴的液滴发生器; 当液滴到达预选位置时提供拦截时间信号的传感器; 与所述传感器耦合的延迟电路,所述延迟电路产生从截取时间信号延迟的触发信号; 响应于触发信号产生激光脉冲的激光源; 以及控制所述延迟电路的系统,以提供从截取时间延迟第一延迟时间的触发信号,以产生聚焦在液滴上的光脉冲和从截取时间延迟第二延迟时间的触发信号,以产生 不聚焦在液滴上的光脉冲。