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    Photosensitive film pattern and method for manufacturing a photosensitive film pattern
    62.
    发明授权
    Photosensitive film pattern and method for manufacturing a photosensitive film pattern 有权
    感光膜图案和感光膜图案的制造方法

    公开(公告)号：US08802356B2

    公开(公告)日：2014-08-12

    申请号：US13309679

    申请日：2011-12-02

    Applicant: Sang Hyun Yun ,  Cha-Dong Kim ,  Jung-In Park ,  Hi Kuk Lee ,  Su-Yeon Sim

    Inventor： Sang Hyun Yun ,  Cha-Dong Kim ,  Jung-In Park ,  Hi Kuk Lee ,  Su-Yeon Sim

    IPC: G03F7/00

    CPC classification number: G03F1/36 ,  G03F7/70441

    Abstract: A method for manufacturing a photosensitive film pattern includes: forming a thin film on a substrate; forming a photosensitive film on the thin film; arranging an exposure apparatus including a photo-modulation element on the photosensitive film; exposing the photosensitive film using the exposure apparatus according to an exposure pattern of the photo-modulation element; and developing the exposed photosensitive film to form a photosensitive film pattern. The exposure pattern includes a main pattern of a quadrangular shape and a at least one assistance pattern positioned at a corner of the main pattern. The photosensitive film pattern has a quadrangular shape with a long edge and a short edge, and a corner with a curved surface having a curvature radius of 20% to 40% of a length of the short edge.

    Abstract translation: 感光膜图案的制造方法包括：在基板上形成薄膜; 在薄膜上形成感光膜; 在感光膜上布置包括光调制元件的曝光装置; 根据光调制元件的曝光图案，使用曝光装置曝光感光膜; 并显影曝光的感光膜以形成感光膜图案。 曝光图案包括四边形的主图案和位于主图案的拐角处的至少一个辅助图案。 感光膜图案具有长边缘和短边缘的四边形形状，以及具有曲率半径为短边长度的20％至40％的曲面的拐角。

    DIGITAL EXPOSURE APPARATUS AND METHOD OF EXPOSING A SUBSTRATE USING THE SAME
    65.
    发明申请
    DIGITAL EXPOSURE APPARATUS AND METHOD OF EXPOSING A SUBSTRATE USING THE SAME 有权
    数字曝光装置及使用其的基板的曝光方法

    公开(公告)号：US20130016330A1

    公开(公告)日：2013-01-17

    申请号：US13406828

    申请日：2012-02-28

    Applicant: Sang-Hyun Yun ,  Cha-Dong Kim ,  Jung-In Park ,  Su-Yeon Sim ,  Hi-Kuk Lee

    Inventor： Sang-Hyun Yun ,  Cha-Dong Kim ,  Jung-In Park ,  Su-Yeon Sim ,  Hi-Kuk Lee

    IPC: G03B27/70

    CPC classification number: G03F7/70275

    Abstract: A digital exposure apparatus includes a displaceable stage, a light source part, a digital micro mirror part and a micro lens part. A substrate is disposed on the stage. The light source part generates a first light. The digital micro mirror part is disposed over the stage. The digital micro mirror part includes a plurality of digital micro mirrors. The digital micro mirror converts the first light into one or more second light beams. The micro lens part is disposed between the stage and the digital micro mirror part and includes a plurality of micro lenses. The micro lenses convert the one or more second light beams into one or more third light beams which are irradiated upon the substrate. The third light has an oval cross sectional shape.

    Abstract translation: 数字曝光装置包括可位移台，光源部分，数字微镜部分和微透镜部分。 衬底设置在平台上。 光源部分产生第一光。 数字微镜部分设置在舞台上。 数字微镜部分包括多个数字微镜。 数字微镜将第一光转换成一个或多个第二光束。 微透镜部分设置在平台和数字微镜部分之间并且包括多个微透镜。 微透镜将一个或多个第二光束转换成照射在基板上的一个或多个第三光束。 第三个光具有椭圆形横截面形状。

    Display panel, mask and method of manufacturing the same
    68.
    发明授权
    Display panel, mask and method of manufacturing the same 有权
    显示面板，面罩及其制造方法

    公开(公告)号：US08059076B2

    公开(公告)日：2011-11-15

    申请号：US11782236

    申请日：2007-07-24

    Applicant: Doo-Hee Jung ,  Jeong-Min Park ,  Kyung-Su Mun ,  Hi-Kuk Lee ,  Joo-Ae Youn

    Inventor： Doo-Hee Jung ,  Jeong-Min Park ,  Kyung-Su Mun ,  Hi-Kuk Lee ,  Joo-Ae Youn

    IPC: G09G3/36

    CPC classification number: G02F1/13454 ,  G02F2001/133388 ,  G02F2001/136236

    Abstract: A display panel includes a substrate, signal lines, a thin film transistor, a pixel electrode and a dummy opening. The substrate has a display area and a peripheral area surrounding the display area. The signal lines are disposed on the substrate and intersect each other to define a unit pixel. The thin film transistor is electrically connected to the signal lines and disposed at the unit pixel. The pixel electrode is electrically connected to the thin film transistor. The pixel electrode is formed in the unit pixel. The dummy opening is disposed at the peripheral area and spaced apart from the signal lines.

    Abstract translation: 显示面板包括基板，信号线，薄膜晶体管，像素电极和虚拟开口。 基板具有显示区域和围绕显示区域的周边区域。 信号线设置在基板上并彼此相交以限定单位像素。 薄膜晶体管电连接到信号线并且设置在单位像素处。 像素电极电连接到薄膜晶体管。 像素电极形成在单位像素中。 虚设开口设置在周边区域并与信号线间隔开。

    Photoresist composition, method of patterning thin film using the same, and method of manufacturing liquid crystal display panel using the same
    69.
    发明授权
    Photoresist composition, method of patterning thin film using the same, and method of manufacturing liquid crystal display panel using the same 有权
    光刻胶组合物，使用其的薄膜构图方法，以及使用其制造液晶显示面板的方法

    公开(公告)号：US07713677B2

    公开(公告)日：2010-05-11

    申请号：US11562714

    申请日：2006-11-22

    Applicant: Hi Kuk Lee ,  Byung Uk Kim ,  Hyoc Min Youn ,  Joo Pyo Yun ,  Woo Seok Jeon

    Inventor： Hi Kuk Lee ,  Byung Uk Kim ,  Hyoc Min Youn ,  Joo Pyo Yun ,  Woo Seok Jeon

    IPC: G03F7/00 ,  G03F7/004

    CPC classification number: G03F7/0392 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/118

    Abstract: A photoresist composition capable of forming a high resolution pattern without an additional heating process includes an alkali-soluble phenol polymer in an amount of 10 to 70 parts by weight, including at least one unit of Formula 1, a photo-acid generator in an amount of 0.5 to 10 parts by weight, a dissolution inhibitor in an amount of 5 to 50 parts by weight, including at least one unit of Formula 2, and a solvent in an amount of 10 to 90 parts by weight, wherein the amounts of the foregoing components is based on a total of 100 parts by weight of alkali-soluble phenol polymer, photo-acid generator, dissolution inhibitor, and solvent, and wherein Formulas 1 and 2 have the structures: wherein R is a methyl group, wherein R1, R2 and R3 are the same or different and are hydrogen or t-butyl vinyl ether protective groups.

    Abstract translation: 能够在没有附加加热方法的情况下形成高分辨率图案的光致抗蚀剂组合物包括10至70重量份的碱溶性苯酚聚合物，包括至少一个式1的单元，量的光酸产生剂 为0.5〜10重量份，5〜50重量份的溶解抑制剂，包含至少1个单元的式2，溶剂的量为10〜90重量份，其中， 前述组分基于总共100重量份的碱溶性酚聚合物，光酸发生剂，溶解抑制剂和溶剂，其中式1和式2具有以下结构：其中R是甲基，其中R1， R2和R3相同或不同，为氢或叔丁基乙烯基醚保护基。

    PHOTORESIST COMPOSITION, METHOD OF FORMING A METAL PATTERN, AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME
    70.
    发明申请
    PHOTORESIST COMPOSITION, METHOD OF FORMING A METAL PATTERN, AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME 审中-公开
    光电组合物，形成金属图案的方法以及使用其制造显示基板的方法

    公开(公告)号：US20100009482A1

    公开(公告)日：2010-01-14

    申请号：US12419764

    申请日：2009-04-07

    Applicant: Jeong-Min PARK ,  Jung-Soo LEE ,  Doo-Hee JUNG ,  Hi-Kuk LEE ,  Deok-Man KANG ,  Sae-Tae OH ,  Sang-Won SON ,  Young-Jin KIM

    Inventor： Jeong-Min PARK ,  Jung-Soo LEE ,  Doo-Hee JUNG ,  Hi-Kuk LEE ,  Deok-Man KANG ,  Sae-Tae OH ,  Sang-Won SON ,  Young-Jin KIM

    IPC: H01L21/02 ,  G03F7/004 ,  G03F7/20

    CPC classification number: H01L27/1288 ,  G03F7/0226 ,  G03F7/40 ,  H01L21/32139 ,  H01L27/1214

    Abstract: A photoresist composition includes 5% to 50% by weight of an alkali-soluble resin, 0.5% to 30% by weight of a quinone diazide compound, 0.1% to 15 % by weight of a curing agent, and a remainder of an organic solvent. A method of forming a metal pattern includes coating a photoresist composition on a base substrate having a metal layer, and forming a first photoresist film. The photoresist composition includes 5% to 50% by weight of an alkali-soluble resin, 0.5% to 30% by weight of a quinone diazide compound, 0.1% to 15% by weight of a curing agent, and a remainder of an organic solvent. The first photoresist film is patterned, and forms a first photo pattern. The base substrate having the first photo pattern is heated, and forms a first baked pattern. The metal layer is patterned using the first baked pattern, and forms a metal pattern.

    Abstract translation: 光致抗蚀剂组合物包含5重量％至50重量％的碱溶性树脂，0.5重量％至30重量％的醌二叠氮化合物，0.1重量％至15重量％的固化剂，以及剩余的有机溶剂 。 形成金属图案的方法包括在具有金属层的基底衬底上涂覆光致抗蚀剂组合物，并形成第一光致抗蚀剂膜。 光致抗蚀剂组合物包含5重量％至50重量％的碱溶性树脂，0.5重量％至30重量％的醌二叠氮化合物，0.1重量％至15重量％的固化剂，剩余的有机溶剂 。 对第一光致抗蚀剂膜进行图案化，并形成第一照相图案。 具有第一照片图案的基底基板被加热，并形成第一烘烤图案。 使用第一烘烤图案对金属层进行图案化，并形成金属图案。

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