公开(公告)号：US20050211918A1

公开(公告)日：2005-09-29

申请号：US11132260

申请日：2005-05-19

Applicant: Satoru Oishi ,  Hideki Ina ,  Takehiko Suzuki ,  Koichi Sentoku

Inventor： Satoru Oishi ,  Hideki Ina ,  Takehiko Suzuki ,  Koichi Sentoku

IPC: G02B17/08 ,  G03F1/22 ,  G03F1/24 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68 ,  G01J1/00 ,  A61N5/00 ,  G01N21/00

CPC classification number: G03F9/7065 ,  G03F7/70233 ,  G03F7/70283 ,  G03F9/7011 ,  G03F9/7015 ,  G03F9/7088

Abstract: An alignment apparatus for aligning a reflective reticle includes a light source for emitting alignment light, an optical alignment mark provided on the reticle, and a reference mark provided on a reticle stage that holds the reticle. A detecting unit detects the alignment light reflected from the alignment mark and the reference mark, and the reticle is aligned on the basis of the result of detection by the detection unit.

Abstract translation: 用于对准反射标线的对准装置包括用于发射对准光的光源，设置在光罩上的光学对准标记，以及设置在保持光罩的标线片台上的参考标记。 检测单元检测从对准标记和参考标记反射的对准光，并且基于检测单元的检测结果对准标线。

公开(公告)号：US06950179B2

公开(公告)日：2005-09-27

申请号：US10156921

申请日：2002-05-30

Applicant: Hideki Ina ,  Koichi Sentoku ,  Takahiro Matsumoto

Inventor： Hideki Ina ,  Koichi Sentoku ,  Takahiro Matsumoto

IPC: G01B11/22 ,  B24B49/10 ,  B24B49/12 ,  G01B11/24 ,  G01B21/00 ,  G01B21/02 ,  G01B21/20 ,  G01Q10/02 ,  G01Q30/02 ,  G01Q60/00 ,  G01Q60/24 ,  G01Q60/34 ,  G01Q60/38 ,  G01Q80/00 ,  G03F9/00 ,  G01N21/00 ,  G01N23/00

CPC classification number: G01Q30/02 ,  B24B37/005 ,  B24B37/042 ,  B24B49/10 ,  B24B49/12 ,  G01B11/2441 ,  G01B21/20 ,  Y10S977/868

Abstract: A shape measuring method for measuring a shape of a surface of an object. The method includes a first measuring step for measuring the surface of the object by detecting light from the object, and a second measuring step for measuring the surface of the object by relatively scanning a probe and the object. A scanning speed changes on the basis of the result of the first measurement step.

Abstract translation: 一种用于测量物体表面形状的形状测量方法。 该方法包括：第一测量步骤，用于通过检测来自物体的光来测量物体的表面;以及第二测量步骤，用于通过相对扫描探针和物体来测量物体的表面。 基于第一测量步骤的结果，扫描速度改变。

公开(公告)号：US20050195405A1

公开(公告)日：2005-09-08

申请号：US11115366

申请日：2005-04-27

Applicant: Hideki Ina ,  Minoru Yoshii ,  Masanobu Hasegawa ,  Takashi Satoh

Inventor： Hideki Ina ,  Minoru Yoshii ,  Masanobu Hasegawa ,  Takashi Satoh

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00 ,  G01B11/00

CPC classification number: G03F7/70633 ,  G03F9/7049 ,  G03F9/7069 ,  G03F9/7088

Abstract: A position detecting system includes a light source device for providing coherent light, an incoherence-transforming device for transforming the coherent light from the light source device, into incoherent light, an optical system for dividing the incoherent light from the incoherence-transforming device into divided light, wherein one of the divided light beams produces an intermediate image, and light from the intermediate image is directed to illuminate a target upon a surface of an object while another of divided light beams is directed to be reflected by a surface which is optically conjugate with the intermediate image, and wherein light from the target and light reflected by the conjugate surface are re-combined, an image pickup device for producing an imagewise signal corresponding to the target on the basis of the light re-combined by the optical system, wherein positional information related to a position of the target with respect to a direction along the surface of the object can be produced on the basis of the imagewise signal, and an image contrast adjusting device for adjusting image contrast of an image of a portion close to the target, as picked up by the image pickup device.

Abstract translation: 位置检测系统包括用于提供相干光的光源装置，用于将来自光源装置的相干光变换成非相干光的非相干变换装置，用于将来自不相干变换装置的非相干光分成分为 光，其中所述分割光束中的一个产生中间图像，并且来自所述中间图像的光被引导以在对象的表面上照射目标，而另一个分割光束被指向由光学共轭的表面反射 并且其中来自所述目标的光和由所述共轭表面反射的光被重新组合，用于根据由所述光学系统重新组合的光产生对应于所述目标的成像信号的图像拾取装置， 其中与所述目标相对于沿着所述表面的方向的位置相关的位置信息 可以基于图像信号产生ct，以及用于调整由图像拾取装置拾取的靠近目标的部分的图像的图像对比度的图像对比度调整装置。

公开(公告)号：US20050137837A1

公开(公告)日：2005-06-23

申请号：US10901106

申请日：2004-07-29

Applicant: Satoru Oishi ,  Hideki Ina ,  Takehiko Suzuki ,  Koichi Sentoku ,  Takahiro Matsumoto

Inventor： Satoru Oishi ,  Hideki Ina ,  Takehiko Suzuki ,  Koichi Sentoku ,  Takahiro Matsumoto

IPC: G03F9/00 ,  G03F7/20 ,  G05B19/418 ,  H01L21/027 ,  G06F17/50

CPC classification number: G03F7/70633 ,  G03F7/705 ,  G03F7/70525 ,  G03F9/7092 ,  G05B2219/32018 ,  Y02P90/22

Abstract: A management apparatus which manages a parameter for an industrial device acquires AGA measurement results obtained by operating the industrial device with an operation job parameter value and non-operation job parameter value. An inspection apparatus acquires an “inspection result” obtained by inspecting the result of operating the industrial device in the operation job. A change in inspection result upon a change in parameter value is estimated on the basis of the AGA measurement result and inspection result. A variable which minimizes (extreme) both or at least one of the sensitivity (slope) of the inspection result upon a change in parameter value and variations (3σ) in inspection result between objects to be processed (e.g., wafers) is set as an optimal parameter.

Abstract translation: 管理工业设备的参数的管理装置获取通过操作工作装置具有操作作业参数值和非操作作业参数值而获得的AGA测量结果。 检查装置获取通过检查操作工作中的工业装置的操作结果而获得的“检查结果”。 根据AGA测量结果和检查结果估计参数值变化时检查结果的变化。 将待处理对象（例如，晶片）之间的参数值和检查结果中的变化（3sigma）的检查结果的灵敏度（斜率）两者或至少一个最小化（极端）的变量设置为 最优参数。

公开(公告)号：US06770408B2

公开(公告)日：2004-08-03

申请号：US10223301

申请日：2002-08-20

Applicant: Hideki Ina ,  Kenji Itoga

Inventor： Hideki Ina ,  Kenji Itoga

IPC: G03F900

CPC classification number: G03F1/22 ,  G03F1/84 ,  Y10S430/167 ,  Y10S430/168

Abstract: Disclosed is an X-ray mask for use in an exposure apparatus for transferring a circuit pattern onto an exposure substrate by use of an X-ray beam to produce a semiconductor device, wherein the X-ray mask includes an X-ray transmission film having a layered X-ray absorptive material formed thereon, and a holding frame for holding the X-ray transmission film, and wherein the X-ray transmission film is held by the holding frame with an even step-like structure defined at its peripheral portion. With this arrangement, a dust particle adhered to the X-ray mask surface and having a predetermined height can be detected precisely, such that a large integration device can be produced effectively.

Abstract translation: 公开了一种用于曝光装置中的X射线掩模，用于通过使用X射线束将电路图案转印到曝光衬底上以制造半导体器件，其中X射线掩模包括具有 形成在其上的分层X射线吸收材料和用于保持X射线透射膜的保持框架，并且其中X射线透射膜由其周边部分限定的均匀阶梯状结构由保持框架保持。 通过这种布置，可以精确地检测粘附到X射线掩模表面并具有预定高度的灰尘颗粒，从而可以有效地产生大的一体化装置。

公开(公告)号：US06636303B2

公开(公告)日：2003-10-21

申请号：US09822338

申请日：2001-04-02

Applicant: Hideki Ina ,  Koichi Sentoku ,  Takahiro Matsumoto

Inventor： Hideki Ina ,  Koichi Sentoku ,  Takahiro Matsumoto

IPC: G01N2100

CPC classification number: G01N21/94 ,  G01N21/9503

Abstract: A foreign substance inspecting method includes the steps of detecting a height of a foreign substance attaching to a periphery of a wafer by irradiating a light beam from a light source to the wafer, thereby detecting the presence/absence of a foreign substance with not less than a predetermined height. The predetermined height is set to be substantially equal to a gap between the wafer and a mask at a wafer exposure.

Abstract translation: 异物检查方法包括以下步骤：通过将来自光源的光束照射到晶片来检测附着到晶片周边的异物的高度，从而检测异物的存在与否不少于 一个预定的高度。 预定高度被设置为基本上等于在晶片曝光时晶片和掩模之间的间隙。

公开(公告)号：US06563573B1

公开(公告)日：2003-05-13

申请号：US09394416

申请日：1999-09-13

Applicant: Hiroshi Morohoshi ,  Hideki Ina

Inventor： Hiroshi Morohoshi ,  Hideki Ina

IPC: G01B900

CPC classification number: G03F9/7026 ,  G03F7/706 ,  G03F7/70616 ,  G03F9/7088

Abstract: A method of evaluating an imaging performance of an imaging optical system includes providing a member having a measurement mark with a predetermined surface level difference, illuminating the member having the measurement mark through the imaging optical system, and receiving reflection light from the illuminated measurement mark again through the imaging optical system. A detection signal is produced based on the measurement mark, illuminated through the imaging optical system, wherein the detection signal is produced while changing a focus within a depth of focus of the imaging optical system. A positional deviation is measured on the basis of the detection signal, and the imaging performance is evaluated of the imaging optical system on the basis of a change in a measured value of the positional deviation measurement with respect to a change in the focus.

Abstract translation: 评估成像光学系统的成像性能的方法包括提供具有预定表面水平差的测量标记的部件，通过成像光学系统照亮具有测量标记的部件，并再次接收来自照亮测量标记的反射光 通过影像光学系统。 基于通过成像光学系统照射的测量标记产生检测信号，其中在改变成像光学系统的焦深的焦点的同时产生检测信号。 基于检测信号测量位置偏差，并且基于相对于焦点变化的位置偏差测量的测量值的变化来评估成像光学系统的成像性能。

公开(公告)号：US06559924B2

公开(公告)日：2003-05-06

申请号：US09866604

申请日：2001-05-30

Applicant: Hideki Ina ,  Koichi Sentoku ,  Takahiro Matsumoto

Inventor： Hideki Ina ,  Koichi Sentoku ,  Takahiro Matsumoto

IPC: G03B2742

CPC classification number: G03F9/7061 ,  B82Y10/00 ,  G03F9/7076 ,  G03F9/7092

Abstract: An alignment method includes the steps of (i) in order to expose a pattern of a first object onto a second object, measuring positions of a plurality of marks on the second object with a mark detection device and aligning the first and second objects with each other, and (ii) measuring shapes of the plurality of marks on the second object, thereby obtaining offsets that should be reflected in the measured values of the mark detection device. The shapes of the plurality of the marks are measured with a shape measurement device with no possibility of coming into contact with the mark, through calibration with reference to a shape measurement device with a possibility of coming into contact with the mark.

Abstract translation: 对准方法包括以下步骤：（i）为了将第一物体的图案曝光到第二物体上，用标记检测装置测量第二物体上的多个标记的位置，并将第一和第二物体与每个 和（ii）测量第二物体上的多个标记的形状，从而获得应反映在标记检测装置的测量值中的偏移。 使用形状测量装置测量多个标记的形状，通过参照具有与标记接触的形状测量装置的校准，可以不用与标记接触的形状测量装置。

公开(公告)号：US06529625B2

公开(公告)日：2003-03-04

申请号：US09083962

申请日：1998-05-26

Applicant: Koichi Sentoku ,  Hideki Ina

Inventor： Koichi Sentoku ,  Hideki Ina

IPC: G06K900

CPC classification number: H01L21/682 ,  G03F7/70775 ,  G03F7/7085 ,  G03F9/7015 ,  G03F9/7038 ,  G03F9/7088

Abstract: A position detecting method and a position detecting device which make it possible to detect with high accuracy by an image processing method the relative positions of two objects spaced apart in the optical axis direction of a detection optical system, and a semiconductor device manufacturing method using the position detecting method and the position detecting device. In detecting the relative positions of a first object (e.g., a mask) and a second object (e.g., a wafer), there is provided a third object equipped with separate reference alignment marks, and optical images of the reference alignment marks on the third object and optical images of the position detecting marks on the first and second objects are detected by an image pickup device, thereby detecting positional deviation between the first and second objects.

Abstract translation: 一种位置检测方法和位置检测装置，其使得可以通过图像处理方法以高精度检测在检测光学系统的光轴方向上间隔开的两个物体的相对位置和使用该检测光学系统的半导体器件制造方法 位置检测方法和位置检测装置。 在检测第一物体（例如，掩模）和第二物体（例如，晶片）的相对位置时，提供了具有单独的参考对准标记的第三物体，以及在第三物体上的参考对准标记的光学图像 通过图像拾取装置检测第一和第二物体上的位置检测标记的物体和光学图像，从而检测第一和第二物体之间的位置偏差。

公开(公告)号：US6097472A

公开(公告)日：2000-08-01

申请号：US61072

申请日：1998-04-16

Applicant: Nobuyoshi Tanaka ,  Kenji Saito ,  Hideki Ina ,  Yoshiyuki Sekine

Inventor： Nobuyoshi Tanaka ,  Kenji Saito ,  Hideki Ina ,  Yoshiyuki Sekine

IPC: G03F7/20 ,  G03F7/24 ,  G03B27/58 ,  G03B27/42

CPC classification number: G03F7/24 ,  G03F7/703 ,  G03H2001/043 ,  G03H2001/085

Abstract: An exposure apparatus for exposing a pattern on a device material includes a holder for chucking and holding a silicon ball, a spherical reticle on which a hologram of a circuit pattern to be exposed is formed, a light source, a focusing optical system for focusing light emitted by the light source on a first position, and an elliptic mirror having a first focal point at the first position and a second focal point at the central position of the silicon ball (reticle). The center of the reticle coincides with the center of the silicon ball.

Abstract translation: 用于在装置材料上曝光图案的曝光装置包括用于夹持和保持硅球的保持器，其上形成有要暴露的电路图案的全息图的球形掩模版，光源，用于聚焦光的聚焦光学系统 由光源在第一位置发射的椭圆镜和在第一位置具有第一焦点的椭圆镜和位于硅球（掩模版）的中心位置处的第二焦点）。 掩模版的中心与硅球的中心重合。