公开(公告)号：US07545483B2

公开(公告)日：2009-06-09

申请号：US12008879

申请日：2008-01-15

申请人： Bernhard Gellrich ,  Jens Kugler ,  Thomas Schletterer ,  Guido Limbach ,  Julian Kaller ,  Hans-Juergen Scherle ,  Detlev Mueller ,  Dieter Schmerek

发明人： Bernhard Gellrich ,  Jens Kugler ,  Thomas Schletterer ,  Guido Limbach ,  Julian Kaller ,  Hans-Juergen Scherle ,  Detlev Mueller ,  Dieter Schmerek

IPC分类号： G03B27/54

CPC分类号： G02B27/0006 ,  G02B1/18 ,  G02B7/023 ,  G03B27/52 ,  G03F7/70341 ,  G03F7/70808 ,  G03F7/70833 ,  G03F7/70933

摘要： An optical element unit is provided comprising an optical element group; a housing receiving said optical element group and having an inner housing part and an exit end; and a purge unit connected to said housing and providing a purge medium to said inner housing part. The optical element group comprises an ultimate optical element. The ultimate optical element is located at the exit end of housing and separates the inner housing part from an environment external to the housing. The ultimate optical element and the housing define a sealing gap. The purge unit provides purge medium to the sealing gap to prevent intrusion of contaminants into the inner housing part.

摘要翻译： 提供一种光学元件单元，包括光学元件组; 接收所述光学元件组并具有内部壳体部分和出口端的壳体; 以及净化单元，其连接到所述壳体并且向所述内壳体部件提供净化介质。 光学元件组包括极限光学元件。 最终的光学元件位于壳体的出口端处，并将内部壳体部件与壳体外部的环境分离。 最终的光学元件和壳体限定了密封间隙。 净化单元向密封间隙提供净化介质，以防止污染物侵入内壳体部分。

公开(公告)号：US20080186467A1

公开(公告)日：2008-08-07

申请号：US11985884

申请日：2007-11-19

申请人： Stefan Hembacher ,  Bernhard Gellrich ,  Jens Kugler ,  Sascha Bleidistel

发明人： Stefan Hembacher ,  Bernhard Gellrich ,  Jens Kugler ,  Sascha Bleidistel

IPC分类号： G03B27/54

CPC分类号： G03F7/70883 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70825

摘要： There is provided an optical imaging device, in particular for microlithography, comprising at least one optical element and at least one holding device associated to the optical element (109), wherein the holding device holds the optical element and a first part (109.1) of the optical element contacts a first atmosphere and a second part (109.2) of the optical element at least temporarily contacts a second atmosphere. There is provided a reduction device at least reducing dynamic fluctuations in the pressure difference between the first atmosphere and the second atmosphere.

公开(公告)号：US20080174758A1

公开(公告)日：2008-07-24

申请号：US12029165

申请日：2008-02-11

申请人： Bernhard Gellrich ,  Ulrich Weber

发明人： Bernhard Gellrich ,  Ulrich Weber

IPC分类号： G03B27/54

CPC分类号： G03F7/70825 ,  G03F7/70308 ,  G03F7/70691

摘要： Replacement devices for at least one replaceable optical element mounted at least indirectly in a lithographic projection exposure apparatus are disclosed. Lithography objectives and illumination systems are also disclosed. Methods for positioning a replaceable optical element within a lithographic projection exposure apparatus of this type, and methods for replacing a replaceable optical element within a lithographic projection exposure apparatus via a replacement device are also disclosed.

摘要翻译： 公开了至少一个至少间接安装在光刻投影曝光装置中的可更换光学元件的替换装置。 还公开了光刻目标和照明系统。 在这种类型的光刻投影曝光装置内定位可更换光学元件的方法以及通过更换装置替代光刻投影曝光装置内的可更换光学元件的方法也被公开。

公开(公告)号：US20080042079A1

公开(公告)日：2008-02-21

申请号：US11974718

申请日：2007-10-16

申请人： Wolfgang Singer ,  Wilhelm Egle ,  Markus Weiss ,  Joachim Hainz ,  Joachim Wietzorrek ,  Johannes Wangler ,  Frank Melzer ,  Bernhard Gellrich ,  Bernhard Geuppert ,  Erich Schubert ,  Martin Antoni

发明人： Wolfgang Singer ,  Wilhelm Egle ,  Markus Weiss ,  Joachim Hainz ,  Joachim Wietzorrek ,  Johannes Wangler ,  Frank Melzer ,  Bernhard Gellrich ,  Bernhard Geuppert ,  Erich Schubert ,  Martin Antoni

IPC分类号： G01J3/10

CPC分类号： B82Y10/00 ,  G02B5/09 ,  G02B7/182 ,  G02B17/006 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G03F7/70158 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/70825 ,  G21K1/06 ,  G21K5/04

摘要： There is provided a system that includes a first optical sub-system contained in a first space, and a second optical sub-system contained in a second space. The first and said second spaces are separated by a structure selected from the group consisting of a diaphragm and a valve.

摘要翻译： 提供了一种包括包含在第一空间中的第一光学子系统和包含在第二空间中的第二光学子系统的系统。 第一和第二空间由选自隔膜和阀门的结构分开。

公开(公告)号：US07321126B2

公开(公告)日：2008-01-22

申请号：US11416447

申请日：2006-05-02

申请人： Wolfgang Singer ,  Wilhelm Egle ,  Markus Weiss ,  Joachim Hainz ,  Joachim Wietzorrek ,  Johannes Wangler ,  Frank Melzer ,  Bernhard Gellrich ,  Bernhard Geuppert ,  Erich Schubert ,  Martin Antoni

发明人： Wolfgang Singer ,  Wilhelm Egle ,  Markus Weiss ,  Joachim Hainz ,  Joachim Wietzorrek ,  Johannes Wangler ,  Frank Melzer ,  Bernhard Gellrich ,  Bernhard Geuppert ,  Erich Schubert ,  Martin Antoni

IPC分类号： A61N5/00

CPC分类号： B82Y10/00 ,  G02B5/09 ,  G02B7/182 ,  G02B17/006 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G03F7/70158 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/70825 ,  G21K1/06 ,  G21K5/04

摘要： There is provided a projection exposure system operable in a scanning mode along a scanning direction. The projection exposure system includes a collector that receives light having a wavelength ≦193 nm and illuminates a region in a plane. The plane is defined by a local coordinate system having a y-direction parallel to the scanning direction and an x-direction perpendicular to the scanning direction. The collector includes (a) a first mirror shell, (b) a second mirror shell within the first mirror shell, and (c) a fastening device for fastening the first and second mirror shells. The mirror shells are substantially rotational symmetric about a common rotational axis. The fastening device has a support spoke that extends in a radial direction of the mirror shells, and the support spoke, when projected into the plane, yields a projection that is non-parallel to the y-direction.

摘要翻译： 提供了沿着扫描方向以扫描模式操作的投影曝光系统。 投影曝光系统包括收集器，其收集波长<= 193nm的光并照亮平面中的区域。 平面由具有与扫描方向平行的y方向和垂直于扫描方向的x方向的局部坐标系限定。 收集器包括（a）第一镜壳，（b）第一镜壳内的第二镜壳，以及（c）用于紧固第一镜壳和第二镜壳的紧固装置。 镜壳基本上围绕公共旋转轴线旋转对称。 紧固装置具有在镜壳的径向方向上延伸的支撑辐条，并且当​​投影到平面中时支撑辐条产生不平行于y方向的突起。

公开(公告)号：US20080002170A1

公开(公告)日：2008-01-03

申请号：US10580179

申请日：2004-11-22

申请人： Bernhard Gellrich ,  Andreas Wurmbrand ,  Jens Kugler ,  Armin Schoeppach ,  Christian Zengerling ,  Stephane Bruynooghe

发明人： Bernhard Gellrich ,  Andreas Wurmbrand ,  Jens Kugler ,  Armin Schoeppach ,  Christian Zengerling ,  Stephane Bruynooghe

IPC分类号： G03F7/20 ,  G02B7/02

CPC分类号： G03F7/70341 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70891

摘要： A holding device for an optical element in an objective has a mount that is connected to the objective, on the one hand, and at least indirectly to the optical element, on the other hand. Arranged between the mount and the optical element is a reinforcing element whose coefficient of thermal expansion corresponds substantially to the coefficient of thermal expansion of the optical element.

摘要翻译： 另一方面，用于目标中的光学元件的保持装置具有一方面连接到物镜并且至少间接连接到光学元件的安装座。 在安装件和光学元件之间布置的是其热膨胀系数基本上对应于光学元件的热膨胀系数的增强元件。

公开(公告)号：US20060262704A1

公开(公告)日：2006-11-23

申请号：US11395719

申请日：2006-03-31

申请人： Hans-Jurgen Scherle ,  Yim-Bun Kwan ,  Stefan Xalter ,  Johannes Lippert ,  Ulrich Weber ,  Bernhard Geuppert ,  Bernhard Gellrich ,  Jens Kugler ,  Franz Sorg ,  Willi Heintel ,  Harald Kirchner ,  Wolfgang Keller ,  Andreas Frommeyer ,  Fraser Morrison

发明人： Hans-Jurgen Scherle ,  Yim-Bun Kwan ,  Stefan Xalter ,  Johannes Lippert ,  Ulrich Weber ,  Bernhard Geuppert ,  Bernhard Gellrich ,  Jens Kugler ,  Franz Sorg ,  Willi Heintel ,  Harald Kirchner ,  Wolfgang Keller ,  Andreas Frommeyer ,  Fraser Morrison

IPC分类号： G11B7/135

CPC分类号： G03F7/70225 ,  G02B17/0812

摘要： There is provided an optical element comprising an optical element body, a reflecting area and an optical passageway. The optical element body defines an axis of rotational symmetry. The reflecting area is disposed on the optical element body and adapted to be optically used in an exposure process. The optical passageway is arranged within the optical element body and allows light to pass the optical element body, the optical passageway being arranged eccentrically with respect to the axis of rotational symmetry.

摘要翻译： 提供了一种包括光学元件主体，反射区域和光学通道的光学元件。 光学元件主体限定旋转对称轴。 反射区域设置在光学元件主体上并且适于在曝光过程中被光学地使用。 光学通道布置在光学元件主体内并允许光通过光学元件主体，光学通道相对于旋转对称轴线偏心地布置。

公开(公告)号：US06897599B2

公开(公告)日：2005-05-24

申请号：US10075797

申请日：2002-02-12

申请人： Franz Sorg ,  Stefan Xalter ,  Frank Melzer ,  Bernhard Gellrich ,  Michael Muehlbeyer

发明人： Franz Sorg ,  Stefan Xalter ,  Frank Melzer ,  Bernhard Gellrich ,  Michael Muehlbeyer

IPC分类号： F16F15/00 ,  F16F15/02 ,  F16L55/04 ,  G03F7/20 ,  H01L21/027 ,  H01L41/09 ,  H01L41/08

CPC分类号： G03F7/70991 ,  F16F15/005 ,  F16F15/02 ,  G03F7/709

摘要： In a system for overcoming or at least damping oscillations in or through channels (9) which carry fluid in a component, in particular coolant in cooling channels in an optical element (1), in particular a projection objective lens (1a) for semiconductor lithography, oscillations which occur are detected and evaluated by sensors (5), after which the result is passed, in the form of an adaptronic control loop to piezoelectric elements (9), which are integrated in the optical element, and are in the form of thin plates, films or layers which, when activated, produce the oscillations or frequencies which counteract oscillations and natural frequencies produced by the turbulence.

摘要翻译： 在用于克服或至少阻挡在通道（9）中或至少阻尼振荡的系统中，所述通道（9）承载组件中的流体，特别是光学元件（1）中的冷却通道中的冷却剂，特别是用于半导体的投影物镜（1a） 光刻，发生的振荡由传感器（5）检测和评估，之后结果通过自适应控制环路形式的压电元件（9）的形式，压电元件（9）集成在光学元件中，呈现形式 薄板，薄膜或层，当被激活时，产生抵消由湍流产生的振荡和固有频率的振荡或频率。

公开(公告)号：US06580570B2

公开(公告)日：2003-06-17

申请号：US10002097

申请日：2001-10-18

申请人： Jochen Becker ,  Bernhard Gellrich ,  Werner Lang ,  Alexander Kohl ,  Sascha Kraus

发明人： Jochen Becker ,  Bernhard Gellrich ,  Werner Lang ,  Alexander Kohl ,  Sascha Kraus

IPC分类号： G02B702

CPC分类号： G02B7/026

摘要： In the case of a mounting apparatus, an optical element having an inner mount and an outer mount, in particular a lens in a projection lens system for semiconductor lithography, the inner mount is connected to the outer mount via three circumferentially distributed solid-state articulations. Manipulators, by means of which the inner mount can be displaced, act on the solid-state articulations. The solid-state articulations are T-shaped in cross section with a T-bar and a T-support. Attachment points between the inner mount and the outer mount are located in each case in the region of the outer ends of the T-bar. The manipulators act on the T-support in each case.

公开(公告)号：US06445510B1

公开(公告)日：2002-09-03

申请号：US09678715

申请日：2000-10-04

申请人： Karlheinz Schuster ,  Thomas Bischoff ,  Bernhard Gellrich ,  Michael Muehlbeyer ,  Guenter Maul

发明人： Karlheinz Schuster ,  Thomas Bischoff ,  Bernhard Gellrich ,  Michael Muehlbeyer ,  Guenter Maul

IPC分类号： G02B900

CPC分类号： G03F7/7025 ,  G02B5/005

摘要： An optical imaging device, in particular a lens system, has a system diaphragm (1). An aperture of the system diaphragm (1) is adjustable in its opening diameter (D). The axial position of the aperture of the system diaphragm (1) with respect to the optical axis (4) of the system diaphragm (1) is fixed in dependence on the opening diameter (D) of the system diaphragm (1).

摘要翻译： 光学成像装置，特别是透镜系统，具有系统隔膜（1）。 系统隔膜（1）的孔径可以在其开口直径（D）上调节。 系统隔膜（1）的孔径相对于系统隔膜（1）的光轴（4）的轴向位置根据系统隔膜（1）的开口直径（D）固定。