Single layer resist liftoff process for nano track width
    61.
    发明授权
    Single layer resist liftoff process for nano track width 有权
    纳米轨道宽度的单层抗剥离工艺

    公开(公告)号:US08236484B2

    公开(公告)日:2012-08-07

    申请号:US10714305

    申请日:2003-11-14

    IPC分类号: G03F7/40

    摘要: As the critical dimensions of liftoff patterns grow smaller, it becomes increasingly more difficult to make liftoff resists that have the required resolution. This problem has been overcome by use of a combination of ion beam processing and ozone slimming to form lift-off patterns with undercuts from a single layer of photoresist. The ion beam process serves to harden the top portion of the resist while the ozone is used to oxidize and erode the lower portion resist sidewall to form the undercut.

    摘要翻译: 随着脱模模式的关键尺寸越来越小,制备具有所需分辨率的剥离抗蚀剂变得越来越困难。 通过使用离子束处理和臭氧纤维化的组合来克服这个问题,以形成具有来自单层光致抗蚀剂的底切的剥离图案。 离子束工艺用于使抗蚀剂的顶部硬化,同时使用臭氧来氧化和腐蚀下部抗蚀剂侧壁以形成底切。

    Method to print photoresist lines with negative sidewalls
    64.
    发明授权
    Method to print photoresist lines with negative sidewalls 失效
    打印具有负侧壁的光刻胶线的方法

    公开(公告)号:US07132221B2

    公开(公告)日:2006-11-07

    申请号:US10660914

    申请日:2003-09-12

    IPC分类号: G03C5/00

    摘要: It is very difficult to produce a negative wall angle from either negative or positive-tone chemically amplified resists, especially by e-beam lithography. This problem has now been overcome by first forming a photoresist pedestal in the conventional way, followed by flood exposing with electrons. Then, a second development treatment is given. This results in removal of additional material from the sidewalls, said removal being greatest at the substrate and least at the pedestal's top surface, resulting in negatively sloping sidewalls. Application of this method to a process for forming a pole tip for a vertical magnetic writer is also discussed.

    摘要翻译: 从负极或正音色化学放大抗蚀剂产生负的壁角是非常困难的,特别是通过电子束光刻。 现在通过首先以常规方式形成光致抗蚀剂基座,随后用电子暴露而克服了这个问题。 然后,给出第二次开发处理。 这导致从侧壁去除附加材料,所述去除在基底处至少在基座的顶表面处最大,导致负斜面的侧壁。 还讨论了该方法在用于形成用于垂直磁性写入器的极尖的处理中的应用。

    Bilayer carbon overcoating for magnetic data storage disks and magnetic head/slider constructions
    66.
    发明授权
    Bilayer carbon overcoating for magnetic data storage disks and magnetic head/slider constructions 失效
    用于磁数据存储盘和磁头/滑块结构的双层碳覆盖涂层

    公开(公告)号:US06524687B2

    公开(公告)日:2003-02-25

    申请号:US09777191

    申请日:2001-02-05

    IPC分类号: G11B5127

    摘要: A magnetic head/slider construction and a magnetic data recording disk, as well as a method for fabricating the magnetic head/slider construction and the magnetic data storage disk. To practice the method, there is formed over the air bearing surface of each of a magnetic head/slider construction and a magnetic data storage disk a wear resistant carbon layer. Over each of the wear resistant carbon layers is then formed a lubricating carbon layer. The lubricating carbon layers may be formed in-situ upon the wear resistant carbon layers. The wear resistant carbon layers may be formed from nitrogenated wear resistant carbon materials having a nitrogen content of from about 15 to about 30 atomic percent and hydrogenated wear resistant carbon materials having a hydrogen content of from about 15 to about 25 atomic percent. The lubricating carbon layer is preferably formed from a hydrogenated lubricating carbon material having a hydrogen content of from about 30 to about 40 atomic percent. Through the method, there is formed magnetic head/slider constructions and magnetic data recording disks simultaneously possessing improved wear resistance characteristics and improved lubricating properties.

    摘要翻译: 磁头/滑块结构和磁数据记录盘,以及用于制造磁头/滑块结构和磁数据存储盘的方法。 为了实现该方法,在磁头/滑块结构和磁数据存储盘的每个的空气轴承表面上形成耐磨碳层。 然后在每个耐磨碳层上形成润滑碳层。 润滑碳层可以在耐磨碳层上原位形成。 耐磨碳层可以由具有约15至约30原子%的氮含量的氮化耐磨碳材料和氢含量为约15至约25原子%的氢化耐磨碳材料形成。 润滑碳层优选由氢含量为约30至约40原子%的氢化润滑碳材料形成。 通过该方法,形成磁头/滑块结构和磁数据记录盘,同时具有改善的耐磨特性和改善的润滑性能。

    Merged Battery Cell with Interleaved Electrodes
    68.
    发明申请
    Merged Battery Cell with Interleaved Electrodes 有权
    合并电池与交错电极

    公开(公告)号:US20130224533A1

    公开(公告)日:2013-08-29

    申请号:US13406986

    申请日:2012-02-28

    摘要: A battery having the electrodes of multiple cell types interleaved to prevent thermal runaway by cooling a shorted region between electrodes. The battery includes multiple cell types where each cell type has multiple electrodes a first polarity. The electrodes of each of the cell types share a pair of the common electrodes having a second polarity. The electrodes of the multiple cell types and the multiple common electrodes are interleaved such that if the electrodes of the multiple cell types and the adjacent common electrodes of one or more cell types short together, the current within the shorted cells is sufficiently small to prevent thermal runaway and the electrodes of the adjacent cells of the other cell types of the first polarity and the common electrodes of the second polarity not having short circuits provide heat sinking for the heat generated by the short circuit to prevent thermal runaway.

    摘要翻译: 电池具有交错的多个电池类型的电极,以通过冷却电极之间的短路区域来防止热失控。 电池包括多种电池类型,其中每种电池类型具有多个电极为第一极性。 每个电池类型的电极共享具有第二极性的一对公共电极。 多个单元类型的电极和多个公共电极被交错,使得如果多个单元类型的电极和一个或多个单元类型的相邻公共电极在一起短路,则短路单元内的电流足够小以防止热 第一极性的其他电池类型的相邻电池的电极和不具有短路的第二极性的公共电极的电极为由短路产生的热量提供散热以防止热失控。

    Method to print photoresist lines with negative sidewalls
    70.
    发明申请
    Method to print photoresist lines with negative sidewalls 失效
    打印具有负侧壁的光刻胶线的方法

    公开(公告)号:US20070042299A1

    公开(公告)日:2007-02-22

    申请号:US11588574

    申请日:2006-10-27

    IPC分类号: G03C5/00

    摘要: It is very difficult to produce a negative wall angle from either negative or positive-tone chemically amplified resists, especially by e-beam lithography. This problem has now been overcome by first forming a photoresist pedestal in the conventional way, followed by flood exposing with electrons. Then, a second development treatment is given. This results in removal of additional material from the sidewalls, said removal being greatest at the substrate and least at the pedestal's top surface, resulting in negatively sloping sidewalls. Application of this method to a process for forming a pole tip for a vertical magnetic writer is also discussed.

    摘要翻译: 从负极或正音色化学放大抗蚀剂产生负的壁角是非常困难的,特别是通过电子束光刻。 现在已经通过首先以常规方式形成光致抗蚀剂基座,随后用电子暴露而克服了这个问题。 然后,给出第二次开发处理。 这导致从侧壁去除附加材料,所述去除在基底处至少在基座的顶表面处最大,导致负斜面的侧壁。 还讨论了该方法在用于形成用于垂直磁性写入器的极尖的处理中的应用。