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155 条记录 (耗时 0.062 秒)

    Alignment Laser
    63.
    发明申请
    Alignment Laser 有权
    对准激光

    公开(公告)号：US20100327192A1

    公开(公告)日：2010-12-30

    申请号：US12638413

    申请日：2009-12-15

    申请人： Igor V. Fomenkov ,  Alexander I. Ershov ,  William N. Partlo ,  Jason Paxton ,  Nam-Hyong Kim ,  Jerzy R. Hoffman

    发明人： Igor V. Fomenkov ,  Alexander I. Ershov ,  William N. Partlo ,  Jason Paxton ,  Nam-Hyong Kim ,  Jerzy R. Hoffman

    IPC分类号： H05G2/00 ,  H01S3/22 ,  H01S3/08

    CPC分类号： H01S3/2232 ,  G03F7/70033 ,  H01S3/0014 ,  H01S3/0407 ,  H01S3/041 ,  H01S3/086 ,  H01S3/2308 ,  H05G2/008

    摘要： A method for producing extreme ultraviolet light includes producing a target material at a target location; supplying pump energy to a gain medium of at least one optical amplifier that has an amplification band to produce an amplified light beam; propagating the amplified light beam through the gain medium using one or more optical components of a set of optical components; delivering the amplified light beam to the target location using one or more optical components of the optical component set; producing with a guide laser a guide laser beam that has a wavelength outside of the amplification band of the gain medium and inside the wavelength range of the optical components; and directing the guide laser beam through the optical component set to thereby align one or more optical components of the optical component set.

    摘要翻译： 用于生产极紫外光的方法包括在目标位置产生目标材料; 向具有放大频带的至少一个光放大器的增益介质提供泵浦能量以产生放大的光束; 使用一组光学部件的一个或多个光学部件将放大的光束传播通过增益介质; 使用所述光学部件组的一个或多个光学部件将放大的光束传送到目标位置; 用导向激光器产生具有波长在增益介质的放大频带之外且在光学部件的波长范围内的引导激光束; 并且引导所述引导激光束通过所述光学部件组，从而对准所述光学部件组的一个或多个光学部件。

    Laser produced plasma euv light source
    66.
    发明申请
    Laser produced plasma euv light source 审中-公开
    激光产生等离子euv光源

    公开(公告)号：US20100024980A1

    公开(公告)日：2010-02-04

    申请号：US12587258

    申请日：2009-10-05

    申请人： Alexander I. Ershov ,  William N. Partlo ,  Norbert Bowering ,  Bjorn Hansson

    发明人： Alexander I. Ershov ,  William N. Partlo ,  Norbert Bowering ,  Bjorn Hansson

    IPC分类号： C23F1/08

    CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

    摘要： An EUV light source is disclosed that may include a laser source, e.g. CO2 laser, a plasma chamber, and a beam delivery system for passing a laser beam from the laser source into the plasma chamber. Embodiments are disclosed which may include one or more of the following; a bypass line may be provided to establish fluid communication between the plasma chamber and the auxiliary chamber, a focusing optic, e.g. mirror, for focusing the laser beam to a focal spot in the plasma chamber, a steering optic for steering the laser beam focal spot in the plasma chamber, and an optical arrangement for adjusting focal power.

    摘要翻译： 公开了一种EUV光源，其可以包括例如激光源。 CO2激光器，等离子体室和用于将激光束从激光源传递到等离子体室中的光束传送系统。 公开了可以包括以下中的一个或多个的实施例; 可以提供旁路管线以建立等离子体室和辅助室之间的流体连通，聚焦光学器件例如。 用于将激光束聚焦到等离子体室中的焦点的反射镜，用于转向等离子体室中的激光束焦斑的转向光学元件，以及用于调整焦度的光学装置。

    EUV light source collector erosion mitigation
    67.
    发明授权
    EUV light source collector erosion mitigation 有权
    EUV光源收集器侵蚀减轻

    公开(公告)号：US07180083B2

    公开(公告)日：2007-02-20

    申请号：US11238828

    申请日：2005-09-28

    申请人： William N. Partlo ,  Alexander I. Ershov ,  Igor V. Fomenkov

    发明人： William N. Partlo ,  Alexander I. Ershov ,  Igor V. Fomenkov

    IPC分类号： A61N5/06 ,  G01J3/10 ,  H05G2/00

    CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G01J1/429 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/067 ,  H05G2/003

    摘要： An EUV light source collector erosion mitigation system and method is disclosed which may comprise a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials created in an EUV light-creating plasma; a replacement material generator positioned to deliver replacement material comprising the capping material to the collector outer surface at a rate sufficient to replace the capping material removed due to the removing interaction. The replacement material generator may comprise a plurality of replacement material generators positioned to respectively deliver replacement material to a selected portion of the collector outer surface, which may comprise a sputtering mechanism sputtering replacement capping material onto the collector outer surface.

    摘要翻译： 公开了一种EUV光源收集器侵蚀缓解系统和方法，其可以包括收集器，其包括多层反射镜收集器，该多层反射镜收集器包括由封装材料构成的收集器外表面，该封盖材料由于与EUV发光等离子体中产生的材料的去除相互作用而被去除 ; 替代材料发生器定位成将包含封盖材料的替换材料以足以代替由于去除相互作用而去除的封盖材料的速率传送到收集器外表面。 替代材料发生器可以包括多个替换材料发生器，其被定位成分别将替代材料递送到集电器外表面的选定部分，其可以包括溅射机构将溅射替换封盖材料涂覆到集电器外表面上。

    Laser output beam wavefront splitter for bandwidth spectrum control
    68.
    发明授权
    Laser output beam wavefront splitter for bandwidth spectrum control 有权
    激光输出光束波前分离器，用于带宽频谱控制

    公开(公告)号：US07154928B2

    公开(公告)日：2006-12-26

    申请号：US10875662

    申请日：2004-06-23

    申请人： Richard L. Sandstrom ,  Daniel J. W. Brown ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  William N. Partlo

    发明人： Richard L. Sandstrom ,  Daniel J. W. Brown ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  William N. Partlo

    IPC分类号： H01S3/22 ,  H01S3/223

    CPC分类号： H01S3/0812 ,  G03F7/70025 ,  G03F7/70575 ,  H01S3/08059 ,  H01S3/097 ,  H01S3/1055 ,  H01S3/1305

    摘要： Apparatus/method providing bandwidth control in narrow band short pulse duration gas discharge laser output light pulse beam producing systems, producing a beam comprising pulses at selected pulse repetition races, e.g., comprising a dispersive bandwidth selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the beam containing the respective pulse on the optic; a tuning mechanism operative to select at least one angle of incidence of the beam containing the respective pulse upon the optic; the tuning mechanism comprising a plurality of incidence angle selection elements each defining an angle of incidence for a different spatially separated but not temporally separated portion of the pulse to return from the optic a laser light pulse comprising a plurality of spatially separated but not temporally separated portions, each having one of at least two different selected center wavelengths.

    摘要翻译： 在窄带短脉冲持续时间气体放电激光输出光脉冲光束产生系统中提供带宽控制的装置/方法，产生包括选定的脉冲重复轨迹的脉冲的波束，例如包括色散带宽选择光学器件，用于为每个脉冲选择至少一个中心波长 至少部分地由在光学元件上包含相应脉冲的光束的入射角确定; 调谐机构，用于选择在光学元件上包含相应脉冲的光束的至少一个入射角; 所述调谐机构包括多个入射角选择元件，每个入射角选择元件限定所述脉冲的不同的空间分离但不是时间上分离的部分的入射角，以从所述光学器件返回包括多个空间分离但不时间分离的部分的激光脉冲 每个具有至少两个不同选择的中心波长中的一个。

    EUV light source collector erosion mitigation
    69.
    发明授权
    EUV light source collector erosion mitigation 有权
    EUV光源收集器侵蚀减轻

    公开(公告)号：US07141806B1

    公开(公告)日：2006-11-28

    申请号：US11237649

    申请日：2005-09-27

    申请人： William N. Partlo ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  David W. Myers ,  William Oldham

    发明人： William N. Partlo ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  David W. Myers ,  William Oldham

    IPC分类号： G01J1/00

    CPC分类号： G21K1/062 ,  B82Y10/00 ,  H05G2/003 ,  H05G2/005

    摘要： An EUV light source collector erosion mitigation method and apparatus for a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials created in an EUV light-creating plasma, is disclosed which may comprise including within an EUV plasma source material a replacement material. The replacement material may comprise the same material as the capping material of the multilayered mirror. The replacement material may comprise a material that is essentially transparent to light in a selected band of EUV light, e.g., a spectrum of EUV light generated in a plasma of a plasma source material. The replacement material may comprise a material not susceptible to being etched by an etching material used to remove deposited plasma source material from the collector, e.g., a halogen etchant.

    摘要翻译： 公开了一种用于收集器的EUV光源收集器侵蚀缓解方法和装置，其包括多层反射镜收集器，其包括由由与在EUV发光等离子体中产生的材料的去除相互作用而被去除的封盖材料组成的收集器外表面。 可以包括在EUV等离子体源材料内包括替换材料。 替代材料可以包括与多层反射镜的封盖材料相同的材料。 替代材料可以包括对EUV光的选定频带中的光基本上透明的材料，例如在等离子体源材料的等离子体中产生的EUV光的光谱。 替代材料可以包括不易被蚀刻材料蚀刻的材料，用于从集电体例如卤素蚀刻剂去除沉积的等离子体源材料。