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公开(公告)号：US07614229B2
公开(公告)日：2009-11-10
申请号：US11666441
申请日：2006-05-19
IPC分类号： F02D23/00
CPC分类号： F02B37/18 , F01N3/101 , F01N3/2006 , F01N13/009 , F01N13/0093 , F01N2430/08 , F02D41/0007 , F02D41/0255 , F02P5/1506 , Y02T10/144 , Y02T10/22 , Y02T10/26 , Y02T10/46
摘要： A control system for a supercharged internal combustion engine provided with a main exhaust passage (20) extending through a turbocharger turbine (21) and further through a catalyst (23, 24) to open to the outside air, an exhaust bypass passage (25) by passing the turbocharger turbine by branching from the main exhaust passage at the upstream side of the turbine and merging with the main exhaust passage before reaching the catalyst at the turbine downstream side, and an exhaust bypass valve (26) provided at the exhaust bypass passage, the control system for a supercharged internal combustion engine controlling the ignition timing in accordance with at least one of the engine warmup state and the catalyst warmup state until warmup of the internal combustion engine and warmup of the catalyst are completed and further controlling the opening degree of the exhaust bypass valve based on the control of the ignition timing, is provided.
摘要翻译： 一种用于增压内燃机的控制系统，其具有延伸穿过涡轮增压器涡轮机（21）并进一步通过向外部空气打开的催化剂（23,24）的主排气通道（20），排气旁通通道（25） 通过在涡轮机的上游侧从主排气通路分支而使涡轮增压器涡轮通过，并且在到达涡轮下游侧的催化剂之前与主排气通路并流，并且设置在排气旁路通路 根据发动机预热状态和催化剂预热状态中的至少一个，直到内燃机预热和催化剂预热完成，控制点火正时的增压内燃机的控制系统完成并进一步控制开度 的排气旁路阀基于点火正时的控制。
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62.发明申请Mask Pattern Designing Method Using Optical Proximity Correction in Optical Lithography, Designing Device, and Semiconductor Device Manufacturing Method Using the Same 审中-公开光学平版印刷中的光学接近校正的掩模图案设计方法，设计装置和使用其的半导体器件制造方法公开(公告)号：US20080276215A1
公开(公告)日：2008-11-06
申请号：US11910049
申请日：2006-03-28
申请人： Tetsuya Higuchi , Hirokazu Nosato , Masahiro Murakawa , Hidenori Sakanashi , Nobuyuki Yoshioka , Tsuneo Terasawa , Toshihiko Tanaka
发明人： Tetsuya Higuchi , Hirokazu Nosato , Masahiro Murakawa , Hidenori Sakanashi , Nobuyuki Yoshioka , Tsuneo Terasawa , Toshihiko Tanaka
IPC分类号： G06F17/50
CPC分类号： H01L27/0207 , G03F1/36 , G06N3/126
摘要： A method for designing a mask pattern realizes shortening the ever-growing time for the OPC treatment, decreases the fabrication TAT of a semiconductor device and cuts cost. A method for fabricating a semiconductor device uses the mask pattern designed. This invention performs the OPC treatment in advance on a cell library constituting the basic configuration of a semiconductor circuit pattern and prepares a semiconductor chip using the cell library that has undergone the OPC treatment. The method for designing a mask pattern includes the steps of designing a cell library pattern by executing for each of the cell libraries a treatment for correcting proximity effect directed to correcting the change of shape taking place during the formation of a pattern by the exposure of a mask pattern, designing a mask pattern by laying out the cell libraries and changing the amount of correction of proximity effect applied to the cell libraries in consideration of the influence of the cell library patterns disposed peripherally. This treatment for correction is executed by the degree of influence exerted by surrounding patterns collected in advance and the genetic algorithm.
摘要翻译： 用于设计掩模图案的方法实现缩短OPC处理的不断增长的时间，减少半导体器件的制造TAT并降低成本。 半导体器件的制造方法使用设计的掩模图案。 本发明预先在构成半导体电路图案的基本结构的单元库中进行OPC处理，并且使用已经经过OPC处理的单元库来制备半导体芯片。 用于设计掩模图案的方法包括以下步骤：通过针对每个单元库执行用于修正邻近效应的处理的设计单元库模式的步骤，所述处理用于校正在形成模式期间发生的形状变化 掩模图案，考虑到周边设置的细胞库图案的影响，通过铺设细胞库并改变施加到细胞库的邻近效应的校正量来设计掩模图案。 这种校正处理是通过预先收集的周围图案和遗传算法的影响程度来执行的。
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63.发明申请Method for designing mask pattern and method for manufacturing semiconductor device 审中-公开设计掩模图案的方法和制造半导体器件的方法公开(公告)号：US20070074146A1
公开(公告)日：2007-03-29
申请号：US11526783
申请日：2006-09-26
申请人： Toshihiko Tanaka , Osamu Suga , Tsuneo Terasawa , Tetsuya Higuchi , Hidenori Sakanashi , Hirokazu Nosato , Tetsuaki Matsunawa
发明人： Toshihiko Tanaka , Osamu Suga , Tsuneo Terasawa , Tetsuya Higuchi , Hidenori Sakanashi , Hirokazu Nosato , Tetsuaki Matsunawa
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： A semiconductor chip is manufactured using a cell library pattern obtained by performing OPC (optical proximity correction) process at the time of a cell single arrangement to a cell library pattern which forms a basic structure of a semiconductor circuit pattern in advance. A plurality of cell libraries are arranged to design a mask pattern and a correction amount of OPC performed to the cell libraries is changed with taking into account the influence of a pattern of cell libraries arranged around a target cell. Further, a cell group with the same arrangement of surrounding cells including the target cell is extracted and is registered as a cell set, and a cell set with the same cell arrangement as that of the registered cell set is produced by copying without re-calculating OPC inside the cell set.
摘要翻译： 使用通过在单元格单元配置时对预先形成半导体电路图案的基本结构的单元库图案执行OPC（光学邻近校正）处理而获得的单元库模式来制造半导体芯片。 布置多个单元库以设计掩模图案，并且考虑到布置在目标单元周围的单元库的图案的影响，改变对单元库执行的OPC的校正量。 此外，提取具有包括目标单元的周围单元的相同排列的单元组，并将其注册为单元组，并且通过复制产生具有与注册单元组相同单元布置的单元组，而不重新计算 OPC内部的单元格集。
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公开(公告)号：US07171234B2
公开(公告)日：2007-01-30
申请号：US11090640
申请日：2005-03-28
IPC分类号： H04M1/00
CPC分类号： H01P1/2135 , H01P1/15 , H04B1/0057 , H04B1/44 , H04B1/48
摘要： A high-frequency switch circuit is provided for switching a connection between a common transmission circuit and antenna side circuit in a plurality of transmitting and receiving systems. The high-frequency switch includes a connection between the antenna side circuit and a reception circuit in one of the plurality of transmitting and receiving systems, and a connection between the antenna side circuit and a reception circuit in the other of the plurality of transmitting and receiving systems, the high-frequency switch circuit comprising a first diode; a first distributed constant line; a second diode; a capacitor; a third diode; a second distributed constant line; and a fourth diode.
摘要翻译： 提供一种高频开关电路，用于切换多个发送和接收系统中的公共传输电路和天线侧电路之间的连接。 高频开关包括天线侧电路和多个发送和接收系统之一中的接收电路之间的连接，以及天线侧电路和多个发送和接收中的另一个中的接收电路之间的连接 系统，所述高频开关电路包括第一二极管; 第一个分布常数线; 第二个二极管; 电容器 第三个二极管; 第二个分布常数线; 和第四个二极管。
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公开(公告)号：US07105873B2
公开(公告)日：2006-09-12
申请号：US10282044
申请日：2002-10-29
IPC分类号： H01L27/10
CPC分类号： H01L27/10882 , G03F1/36 , H01L21/32139 , H01L23/528 , H01L27/105 , H01L27/10894 , H01L2924/0002 , H01L2924/00
摘要： In a masking pattern (a) for patterning word and data lines, length is changed between adjacent word lines so as to be shifted from each other at their tips, and furthermore, the tip of each word line is cut obliquely.It is thus possible to prevent the resist pattern from separation and contact of adjacent patterns. Consequently, it is also possible to prevent break failures of patterned lines and short failures between those patterned lines.
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公开(公告)号：US06954268B2
公开(公告)日：2005-10-11
申请号：US10801402
申请日：2004-03-15
申请人： Hiroshi Naiki , Toshihiko Tanaka
发明人： Hiroshi Naiki , Toshihiko Tanaka
CPC分类号： G01N21/9501 , G01N21/88 , G01N21/8806 , G01N2021/8841
摘要： The present invention provides a defect inspection apparatus comprising an inspection section which inspects a front surface and a rear surface of a sample, a control section which processes image data on the front surface and rear surface of the sample obtained by the inspection section, moving section provided in the inspection section and capable of reciprocating the sample, illumination section which illuminates the front surface and rear surface of the sample moved by the moving section, and image pickup section which picks up images of the front surface and rear surface of the sample illuminated by the illumination section, wherein at least one of an incidence angle of the illumination section on the sample and an image pickup angle of the image pickup section to the sample is changeable.
摘要翻译： 本发明提供了一种缺陷检查装置，包括检查样品的前表面和后表面的检查部分，处理由检查部分获得的样品的正面和背面的图像数据的控制部分，移动部分 设置在检查部中并且能够使照射由移动部移动的样本的前表面和后表面照明的样品照明部，以及拍摄被照射的样品的正面和背面的图像的图像拾取部 通过所述照明部分，其中所述样品上的照射部分的入射角和所述图像拾取部分对所述样品的图像拾取角度中的至少一个是可变的。
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公开(公告)号：US20050221769A1
公开(公告)日：2005-10-06
申请号：US11090640
申请日：2005-03-28
CPC分类号： H01P1/2135 , H01P1/15 , H04B1/0057 , H04B1/44 , H04B1/48
摘要： A high-frequency switch circuit is provided for switching a connection between a common transmission circuit and antenna side circuit in a plurality of transmitting and receiving systems. The high-frequency switch includes a connection between the antenna side circuit and a reception circuit in one of the plurality of transmitting and receiving systems, and a connection between the antenna side circuit and a reception circuit in the other of the plurality of transmitting and receiving systems, the high-frequency switch circuit comprising a first diode; a first distributed constant line; a second diode; a capacitor; a third diode; a second distributed constant line; and a fourth diode.
摘要翻译： 提供一种高频开关电路，用于切换多个发送和接收系统中的公共传输电路和天线侧电路之间的连接。 高频开关包括天线侧电路和多个发送和接收系统之一中的接收电路之间的连接，以及天线侧电路和多个发送和接收中的另一个中的接收电路之间的连接 系统，所述高频开关电路包括第一二极管; 第一个分布常数线; 第二个二极管; 电容器 第三个二极管; 第二个分布常数线; 和第四个二极管。
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公开(公告)号：US20050221768A1
公开(公告)日：2005-10-06
申请号：US11090218
申请日：2005-03-28
CPC分类号： H01P1/2135 , H01P1/15 , H04B1/0057 , H04B1/44 , H04B1/48
摘要： A high-frequency switch circuit is provided for switching a connection between a common transmission circuit and an antenna side circuit in a plurality of transmitting and receiving systems. The high-frequency switch includes a connection between the antenna side circuit and a reception circuit in one of the plurality of transmitting and receiving systems, and a connection between the antenna side circuit and a reception circuit in the other of the plurality of transmitting and receiving systems, the high-frequency switch circuit comprising a first diode, a second diode, and a distributed constant line, wherein a third diode is connected to the first and second diodes through the distributed constant line.
摘要翻译： 提供一种高频开关电路，用于在多个发送和接收系统中切换公共发送电路和天线侧电路之间的连接。 高频开关包括天线侧电路和多个发送和接收系统之一中的接收电路之间的连接，以及天线侧电路和多个发送和接收中的另一个中的接收电路之间的连接 系统，包括第一二极管，第二二极管和分布常数线路的高频开关电路，其中第三二极管通过分布常数线连接到第一和第二二极管。
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公开(公告)号：US06902868B2
公开(公告)日：2005-06-07
申请号：US10311456
申请日：2001-06-28
申请人： Norio Hasegawa , Joji Okada , Toshihiko Tanaka , Kazutaka Mori , Ko Miyazaki
发明人： Norio Hasegawa , Joji Okada , Toshihiko Tanaka , Kazutaka Mori , Ko Miyazaki
CPC分类号： G03F1/56 , G03F1/70 , G03F7/0035 , G03F7/70433 , G03F7/707 , H01L21/0274 , Y10S438/942 , Y10S438/945 , Y10S438/948 , Y10S438/95
摘要： In order to shorten the period for the development and manufacture of a semiconductor integrated circuit device, at the time of transferring integrated circuit patterns onto a wafer by an exposure process, a photomask PM1 is used which is provided partially with a light shielding patterns 3a formed of a resist film, in addition to light shielding patterns formed of a metal.
摘要翻译： 为了缩短开发和制造半导体集成电路器件的周期，在通过曝光处理将集成电路图案转印到晶片上时，使用光掩模PM 1，其部分地设置有遮光图案3 除了由金属形成的遮光图案之外还形成有抗蚀剂膜。
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70.发明申请公开(公告)号：US20050112504A1
公开(公告)日：2005-05-26
申请号：US11022758
申请日：2004-12-28
IPC分类号： G03F1/54 , G03F1/56 , G03F7/20 , H01L21/768 , G03F7/00
CPC分类号： G03F7/70425 , G03F1/00 , G03F1/56 , H01L2224/05001 , H01L2224/05008 , H01L2224/05022 , H01L2224/05024 , H01L2224/05569 , H01L2224/05572 , H01L2224/16225 , H01L2224/32225 , H01L2224/73204 , H01L2224/92125 , H01L2924/15311 , Y10S438/944 , Y10S438/946 , H01L2924/00
摘要： Productivity of a semiconductor integrated circuit device is improved. According to how many times the photomask is used, a photomask having an opaque pattern made of metal and a photomask having an opaque pattern made of a resist film are properly used, and thereby an exposure treatment is performed.
摘要翻译： 提高了半导体集成电路器件的生产率。 根据使用光掩模的次数，适当地使用具有由金属制成的不透明图案的光掩模和由抗蚀剂膜制成的不透明图案的光掩模，从而进行曝光处理。
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