PHOTORESIST FILM WITH ADHESIVE LAYER AND MICROSPHERES
    66.
    发明申请
    PHOTORESIST FILM WITH ADHESIVE LAYER AND MICROSPHERES 有权
    胶粘剂薄膜与胶粘剂和微胶囊

    公开(公告)号:US20150056414A1

    公开(公告)日:2015-02-26

    申请号:US13975581

    申请日:2013-08-26

    IPC分类号: B44C1/22

    摘要: The present invention provides, in at least one embodiment, a film and method for engraving objects. The film includes an adhesive layer configured to allow the film to be easily repositionable on the surface of an object. For example, the film can be shifted, rotated, or moved prior to pressure being applied and before the engraving. Additionally, the photoresist layer includes microspheres comprising small pockets of air which strengthen the photoresist layer by bouncing the engraving blast away and allow the photoresist layer to advantageously be designed thinner.

    摘要翻译: 本发明在至少一个实施例中提供了一种用于雕刻物体的胶片和方法。 膜包括被配置为允许膜容易地在物体表面上重新定位的粘合剂层。 例如,胶片可以在施加压力之前和雕刻之前移动,旋转或移动。 另外,光致抗蚀剂层包括微球,其包含小的空气袋,通过弹跳雕刻鼓风来加强光致抗蚀剂层,并允许光致抗蚀剂层有利地被设计为更薄。