公开(公告)号：US5368887A

公开(公告)日：1994-11-29

申请号：US51285

申请日：1993-04-23

申请人： Sumio Hoshino ,  Masumi Ito ,  Hiroo Kanamori

发明人： Sumio Hoshino ,  Masumi Ito ,  Hiroo Kanamori

IPC分类号： C03B8/02 ,  C03C1/00 ,  C03C17/02 ,  C23C18/12 ,  B05D3/02

CPC分类号： C03C17/02 ,  C03C1/008 ,  C23C18/1212 ,  C23C18/1254 ,  C23C18/1275

摘要： A thin glass film is formed on a substrate using a sol-gel method by applying to the substrate a hydrolyzable solution which contains a metal alkoxide, water, an alcohol and an acid, contacting the applied solution with an atmosphere containing ammonia and an alcohol to polycondensate the metal alkoxide, and heating to form the thin glass film.

摘要翻译： 使用溶胶 - 凝胶法在基板上形成薄玻璃膜，通过向基板施加含有金属醇盐，水，醇和酸的可水解溶液，使所施加的溶液与含有氨和醇的气氛接触， 使金属醇盐缩聚，并加热形成薄玻璃膜。

公开(公告)号：US5057336A

公开(公告)日：1991-10-15

申请号：US532231

申请日：1990-06-05

申请人： Etsushi Adachi ,  Hiroshi Adachi ,  Osamu Hayashi ,  Kazuo Okahashi

发明人： Etsushi Adachi ,  Hiroshi Adachi ,  Osamu Hayashi ,  Kazuo Okahashi

IPC分类号： B05D1/40 ,  B05D3/04 ,  B05D7/24 ,  C08J7/00 ,  C23C18/12 ,  H01L21/312 ,  H01L21/316

CPC分类号： H01L21/316 ,  C23C18/1212 ,  C23C18/122 ,  C23C18/1279 ,  H01L21/02126 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/0234 ,  H01L21/3122

摘要： A material for forming a high purity thin film which includes a silicone ladder polymer dissolved in an organic solvent is applied to a substrate to form a thin film thereon. The thin film is then heated, thereby removing the solvent and simultaneously curing the thin film. Subsequently, the cured thin film is exposed to an oxygen plasma to form a high purity SiO.sub.2 thin film on the substrate. Although the method consists of simple processes and employs low treatment temperatures, it is capable of forming a high purity SiO.sub.2 thin film which exhibits excellent step coverage and high dielectric breakdown strength.

摘要翻译： 将用于形成包含溶解在有机溶剂中的硅树脂聚合物的高纯度薄膜的材料施加到基板上以在其上形成薄膜。 然后加热薄膜，从而除去溶剂并同时固化薄膜。 随后，将固化的薄膜暴露于氧等离子体，以在基板上形成高纯度的SiO 2薄膜。 虽然该方法由简单的方法组成并且采用低的处理温度，但是它能够形成高纯度的SiO 2薄膜，其表现出优异的台阶覆盖和高介电击穿强度。

公开(公告)号：US3834939A

公开(公告)日：1974-09-10

申请号：US27795872

申请日：1972-08-04

申请人： IBM

发明人： BEYER K ,  LEVER R

IPC分类号： C23C18/12 ,  H01L21/22 ,  H01L21/225 ,  H01L21/316 ,  H01L23/29 ,  B44D1/18

CPC分类号： H01L23/291 ,  C23C18/1212 ,  C23C18/122 ,  C23C18/1225 ,  C23C18/1295 ,  H01L21/2225 ,  H01L21/2255 ,  H01L21/316 ,  H01L23/293 ,  H01L2924/0002 ,  Y10S148/043 ,  Y10S148/118 ,  Y10S148/151 ,  H01L2924/00

摘要： METHODS OF FORMING IMPURITY DOPED SILICON OXIDE LAYERS ON SEMICONDUCTOR SUBSTRATES BY FIRST FORMING A PAINT-ON COMPOSITION COMPRISING A SILOXANE AND A SOLUBLE IMPURITY COMPOUND, SUCH AS ALKOXIDES CONTAINING THE SUITABLE IMPURITIES SUCH AS B, P, AS AND SB. A SUBSTRATE COATED WITH THE PAINT-ON COMPOSITION IS HEAT-TREATED IN AN OXIDATIVE ATMOSPHERE IN ORDER TO CHANGE THE COATING TO A LAYER CONTAINING SILICON DIOXIDE DOPED WITH AN OXIDE OF ONE OR MORE OF THE IMPURITY ELEMENTS. A REACTIVE SILOXANE POLYMER OF A PARTICULAR STRUCTURE MAY BE ADDED TO THE PAINT-ON COMPOSITION TO IMPROVE ITS PERTINENT CHARACTERISTICS. THE IMPURITY OXIDE CONTAINED IN THE SILICON DIOXIDE SERVED AS A CONCENTRATED DEPANT SOURCE FOR DIFFUSION. THUS, IN THE INTERFACE LAYER BETWEEN SILICON AND THE MIXTURE OF

THE IMPURITY OXIDE AND SILICON OXIDE THE SILICON REACTS WITH THE RESPECTIVE OXIDE TO FORM ELEMENTAL IMPURITIES AND SIO2. UNDER SILOXANES WE UNDERSTAND A CLASS OF COMPOUNDS DISTINGUISHED BY COVALENT LINKAGE OF SILICON-OXYGEN-SILICON WITH THE OTHER ELECTROVALENCE REQUIREMENTS SATISFIED BY ORGANIC AND/OR INORGANIC SUBSTITUENTS. THE TERM POLYSILOXANES REFERS TO MULTIPLE UNITS OF THE BASIC SILOXANE UNIT WHICH COMBINE TO FORM A BACKBONE STRUCTURE OF MOLECULES HAVING VARIOUS MOLECULAR WEIGHTS.

公开(公告)号：US20190031894A1

公开(公告)日：2019-01-31

申请号：US16150909

申请日：2018-10-03

申请人： GP&E AMERICA, INC.

发明人： Dong Gyu Lee ,  Il Hoon Cho ,  Young Yeol Yang

IPC分类号： C09D7/43 ,  C09D7/40 ,  C23C18/12

CPC分类号： C09D7/43 ,  C08K2003/329 ,  C09D1/04 ,  C09D7/40 ,  C23C18/04 ,  C23C18/1212 ,  C23C18/122 ,  C23C18/1283 ,  C23C22/62

摘要： An inorganic coating solution composition including an alkali metal silicate, a curing agent, a dispersant, a defoamer, and a solvent, wherein the curing agent is phosphoric acid (H2PO4), the dispersant is at least one selected from among Tween 20, Tween 40, Tween 60, Tween 80, polyvinyl pyrrolidone, polyethylene glycol 400 and polyvinyl alcohol, and the defoamer is at least one selected from among a silicone-based defoamer, an alcohol-based defoamer, a mineral oil-based defoamer and a powder defoamer.

公开(公告)号：US20180112331A1

公开(公告)日：2018-04-26

申请号：US15788972

申请日：2017-10-20

申请人： U.S. Army Research Laboratory ATTN: RDRL-LOC-I

发明人： Melanie Will Cole ,  Mathew P. Ivill ,  Daniel Shreiber

IPC分类号： C30B30/02 ,  B05D1/00 ,  B05D3/06 ,  C30B29/32 ,  C01G23/00

CPC分类号： C30B30/02 ,  B05D1/005 ,  B05D3/06 ,  C01G23/006 ,  C23C18/1212 ,  C23C18/1291 ,  C23C18/1295 ,  C30B7/00 ,  C30B29/32 ,  H01L29/786

摘要： Integrated non-linear complex oxide (NLCO) thin film artificial structures include tailored microstructural and crystalline phases for designed material architectures and a method of fabrication. A nano-scale poly crystal-amorphous composite film includes an amorphous matrix surrounding crystalline domains/inclusions of the form of particles, platelets, rods and/or needles, etc. Artificial thin film layered material configurations include bilayers, repeat “unit cell” bilayers with variable stacking periodicity (N), and multilayers whereby each individual layer, ni, exhibits a different microstructural crystallinity phase state, hence the microstructural phase state is variable in the vertical direction perpendicular to the substrate. NLCO elements can be organized in array configurations. The method to create the integrated NLCO thin film artificial structures combines metal-organic solution deposition (MOSD) film fabrication and microwave irradiation (MWI) processing, is tailorable and creates artificial thin film material structures composed of differing microstructural crystalline phase states simultaneously within a single thermal treatment step.

公开(公告)号：US09885417B2

公开(公告)日：2018-02-06

申请号：US14000263

申请日：2012-02-17

申请人： Kouhei Sugimoto ,  Yoshinari Watanabe ,  Toshikatsu Hayashi ,  Ryou Obara

发明人： Kouhei Sugimoto ,  Yoshinari Watanabe ,  Toshikatsu Hayashi ,  Ryou Obara

IPC分类号： F16J9/26 ,  C23C18/12

CPC分类号： F16J9/26 ,  C23C18/1212 ,  C23C18/122 ,  C23C18/1241 ,  C23C18/127

摘要： Provided is a piston ring capable of maintaining an excellent effect of preventing aluminum cohesion in a high output engine over a long period of time. At least one of the upper, lower, and side faces of the piston ring is coated with a silica-based coating in which hard nanoparticles are dispersed. The coating has a Martens hardness of 1,000 to 8,000 N/mm2. As the hard nanoparticles, carbon nanoparticles, nanodiamond particles, carbon nanotubes, or carbon nanofibers are used. To the coating, resin particles of a fluorine-based resin or a polyether-based resin may be added.

公开(公告)号：US20170121821A1

公开(公告)日：2017-05-04

申请号：US15317663

申请日：2015-06-10

申请人： SBA Materials, Inc.

发明人： Mark L. F. Phillips ,  Khashayar Pakbaz

IPC分类号： C23C18/12 ,  G02B1/115

CPC分类号： C23C18/1254 ,  C23C18/1208 ,  C23C18/1212 ,  C23C18/1225 ,  C23C18/1295 ,  G02B1/115 ,  G02B5/26

摘要： A method of preparing at least one layer of a multilayer dielectric (MLD) film stack by producing a sol from a mixture that comprises an epoxide and at least one precursor to a metal oxide, depositing the sol on a substrate, and preparing a metal oxide layer from the deposited sol. The mixture can also include one or any combination of a solvent, water, a precursor to a glassforming oxide, at least one modifier, a cosolvent, or a porogen. Two or more layers of the film stack can be prepared in similar fashion using the same or different sols.

公开(公告)号：US09637642B2

公开(公告)日：2017-05-02

申请号：US14771356

申请日：2014-02-28

申请人： Colorobbia Italia S.P.A.

发明人： Giovanni Baldi ,  Andrea Cioni ,  Valentina Dami

IPC分类号： C03C8/00 ,  C09D5/14 ,  C23C18/12 ,  C08K3/28 ,  C08K3/30 ,  C08K3/34

CPC分类号： C09D5/14 ,  C03C8/00 ,  C03C2204/02 ,  C03C2207/04 ,  C03C2207/10 ,  C08K3/28 ,  C08K3/30 ,  C08K3/34 ,  C08K2003/3045 ,  C23C18/1212 ,  C23C18/122 ,  C23C18/1241 ,  C23C18/1283

摘要： There are described new vitreous products having antibacterial properties for application to metal surfaces.

公开(公告)号：US20160348248A1

公开(公告)日：2016-12-01

申请号：US15152311

申请日：2016-05-11

申请人： GM GLOBAL TECHNOLOGY OPERATIONS LLC

发明人： Hua-tzu Fan ,  Jorge F. Arinez ,  Alejandro Hernan Plazas Torres

IPC分类号： C23C26/00

CPC分类号： C23C28/00 ,  B05D7/14 ,  B05D7/53 ,  B05D2350/63 ,  C23C18/1212 ,  C23C18/122 ,  C23C18/1241 ,  C23C18/1254 ,  C23C18/127

摘要： During an example coating method, a metallic substrate is provided. A foundation coat precursor is applied on the metallic substrate. The foundation coat precursor includes a matrix and a plurality of capsules present in the matrix. Each capsule includes a shell and a healing agent surrounded by the shell. A basecoat precursor is applied, and a clearcoat precursor is applied. The metallic substrate, the foundation coat precursor, the basecoat precursor, and the clearcoat precursor are heated i) after each respective application or ii) simultaneously, in order to cure the foundation coat, basecoat, and clearcoat precursors and respectively form a foundation coat, a basecoat, and a clearcoat. The foundation coat is ultraviolet (UV) stable and bonds the metallic substrate to the basecoat and the clearcoat.

摘要翻译： 在示例性涂布方法中，提供金属基底。 将基础涂层前体施加在金属基底上。 基础涂层前体包括基质和存在于基质中的多个胶囊。 每个胶囊包括外壳和被外壳包围的愈合剂。 应用底漆前体，并涂布清漆前体。 加热金属基材，底涂层前体，底涂层前体和透明涂料前体i）在每个相应的应用之后或ii）同时加热，以便固化底涂层，底涂层和透明涂料前体，并分别形成基底涂层， 底漆和清漆。 基底涂层是紫外线（UV）稳定的，并将金属基底粘合到底漆和透明涂层上。

公开(公告)号：US20160222265A1

公开(公告)日：2016-08-04

申请号：US15021434

申请日：2014-08-29

申请人： MITSUI MINING & SMELTING CO., LTD.

发明人： Sumikazu OGATA ,  Shigeki TOKUCHI ,  Yohei MARUYAMA ,  Motomi OSHIKA

IPC分类号： C09K3/14

CPC分类号： C09K3/1463 ,  B24B37/00 ,  C01G45/02 ,  C01P2004/03 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2004/84 ,  C09C3/063 ,  C09G1/02 ,  C09K3/1436 ,  C09K3/1445 ,  C23C18/1212 ,  C23C18/1216 ,  C23C18/1229 ,  H01L21/02024

摘要： A polishing material including polishing abrasive grains, the polishing abrasive grain having a core material that includes a metal oxide, and a cover layer that is provided on a surface of the core material and includes an oxide of a metal, that is different from the core material, or an oxide of a semimetal. When the polishing abrasive grains are observed with a scanning electron microscope after boiling a slurry including the polishing abrasive grains for 5 hours, a ratio of a longitudinal axis to a lateral axis of the polishing abrasive grain is 1.0 or greater and less than 1.5. The polishing abrasive grain preferably has a mass ratio of the cover layer to the core material, cover layer/core material, of from 0.3 mass % to 30 mass % inclusive. The cover layer preferably has a thickness of from 0.2 nm to 500 nm inclusive.

摘要翻译： 包括抛光磨粒的抛光材料，所述抛光磨粒具有包括金属氧化物的芯材，以及设置在所述芯材表面上并且包括与所述芯不同的金属氧化物的覆盖层 材料或半金属的氧化物。 当用包括抛光磨粒的浆料煮沸5小时后用扫描电子显微镜观察抛光磨粒时，抛光磨粒的纵轴与横轴的比例为1.0以上且小于1.5。 抛光磨粒优选具有0.3质量％至30质量％以下的覆盖层与芯材的覆盖层/芯材的质量比。 覆盖层优选具有0.2nm至500nm的厚度。